Polycyclic aromatic halogenated hydrocarbons

Industry

CPC
C07C25/18

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Parent Industries

CCHEMISTRY METALLURGY C07Organic chemistry C07CACYCLIC OR CARBOCYCLIC COMPOUNDS C07C25/00Compounds containing at least one halogen atom bound to a six-membered aromatic ring

Current Industry

C07C25/18Polycyclic aromatic halogenated hydrocarbons

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,288
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Masafumi Kojima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, composition, liquid crystal composition, and device
- Patent number 11,952,525
- Issue date Apr 9, 2024
- DIC Corporation
- Masanao Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Liquid crystal mixture and liquid crystal display
- Patent number 11,939,511
- Issue date Mar 26, 2024
- Merck Patent GmbH
- Lars Lietzau
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Electrolytes for lithium-containing battery cells
- Patent number 11,881,558
- Issue date Jan 23, 2024
- Apple Inc.
- Woo Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 11,773,059
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt compound, chemically amplified resist composition and pa...
- Patent number 11,762,287
- Issue date Sep 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Mass polymerizable polycycloolefin compositions containing soluble...
- Patent number 11,760,817
- Issue date Sep 19, 2023
- PROMERUS, LLC
- Paul D Byrne
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,733,608
- Issue date Aug 22, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,550,217
- Issue date Jan 10, 2023
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Materials for organic electroluminescent devices
- Patent number 11,538,996
- Issue date Dec 27, 2022
- Merck Patent GmbH
- Frank Voges
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the manufacture of fluoroaryl compounds and derivatives
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- Issue date Aug 23, 2022
- Hongjun Du
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, photosensitive resin composition, electronic component and d...
- Patent number 11,333,976
- Issue date May 17, 2022
- Toray Industries, Inc.
- Tomoyuki Yuba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aromatic compounds
- Patent number 11,104,628
- Issue date Aug 31, 2021
- Merck Patent GmbH
- Philipp Stoessel
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Bimesogenic compounds and mesogenic media
- Patent number 10,711,196
- Issue date Jul 14, 2020
- Merck Patent GmbH
- Kevin Adlem
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Halogenated nanohoop compounds and methods of making and using the...
- Patent number 10,654,780
- Issue date May 19, 2020
- University of Oregon
- Ramesh Jasti
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,649,330
- Issue date May 12, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, compound fabrication method, and graphene nanoribbon fabr...
- Patent number 10,636,539
- Issue date Apr 28, 2020
- Fujitsu Limited
- Manabu Ohtomo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for the synthesis of 9,10-bis(chloromethyl)anthracene
- Patent number 10,597,342
- Issue date Mar 24, 2020
- Universidad de Castilla-la Mancha
- Francisco José Ortega Higueruelo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Anti-fibrotic pyridinones
- Patent number 10,544,161
- Issue date Jan 28, 2020
- InterMune, Inc.
- Johnnie Y. Ramphal
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator
- Patent number 10,509,315
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials, LLC
- William Williams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carbon-modified titanium dioxide nanoparticles and the photocatalyt...
- Patent number 10,471,289
- Issue date Nov 12, 2019
- King Abdulaziz University
- Yasser A. Shaban
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Nematic liquid crystal composition, and liquid crystal display elem...
- Patent number 10,465,113
- Issue date Nov 5, 2019
- DIC Corporation
- Go Sudo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Materials for organic electroluminescent devices
- Patent number 10,454,041
- Issue date Oct 22, 2019
- Merck Patent GmbH
- Teresa Mujica-Fernaud
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Liquid crystal composition and a liquid crystal display including t...
- Patent number 10,421,907
- Issue date Sep 24, 2019
- Samsung Display Co., Ltd.
- Min Hee Kim
- G02 - OPTICS
Information Patent Grant
Compounds and mesogenic media
- Patent number 10,343,982
- Issue date Jul 9, 2019
- Merck Patent GmbH
- Kevin Adlem
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Biphenyl derivative and uses thereof
- Patent number 10,329,243
- Issue date Jun 25, 2019
- XI'AN LIBANG PHARMACEUTICAL CO., LTD
- Rutao Wang
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Photoacid generator
- Patent number 10,317,795
- Issue date Jun 11, 2019
- Rohm and Haas Electronic Materials LLC
- William Williams
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
N-cycloalkyl-N-{[2-(1-substitutedcycloalkyl)phenyl]methylene}-(thio...
- Patent number 10,244,757
- Issue date Apr 2, 2019
- BAYER CROPSCIENCE AKTIENGESELLSCHAFT
- Pierre Cristau
- A01 - AGRICULTURE FORESTRY ANIMAL HUSBANDRY HUNTING TRAPPING FISHING

Patents Applicationslast 30 patents

Information Patent Application
ORGANIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME
- Publication number 20250017101
- Publication date Jan 9, 2025
- P&H TECH Co., Ltd
- Seo-Yong HYUN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Ink Composition, Organic Material Layer Comprising Same, and Organi...
- Publication number 20240376327
- Publication date Nov 14, 2024
- LG CHEM, LTD.
- Keunsoo Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240377733
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20240361688
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist Material, Resist Composition, Patterning Process, And Monomer
- Publication number 20240361690
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
- Publication number 20240360069
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240337927
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...
- Publication number 20240295812
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240280900
- Publication date Aug 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240201589
- Publication date Jun 20, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240192592
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240184199
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240176236
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive Resist Material And Patterning Process
- Publication number 20240168378
- Publication date May 23, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240152048
- Publication date May 9, 2024
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ELECTROLYTES FOR LITHIUM-CONTAINING BATTERY CELLS
- Publication number 20240136585
- Publication date Apr 25, 2024
- Apple Inc.
- Woo Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240036466
- Publication date Feb 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, COMPOSITION, LIQUID CRYSTAL COMPOSITION, AND DEVICE
- Publication number 20230313044
- Publication date Oct 5, 2023
- DIC CORPORATION
- Masanao HAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LIQUID CRYSTAL COMPOUNDS AND COMPOSITIONS FOR TUNABLE LENSES
- Publication number 20230212458
- Publication date Jul 6, 2023
- Apple Inc.
- Huiyang Deng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...
- Publication number 20230094313
- Publication date Mar 30, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230075188
- Publication date Mar 9, 2023
- FUJIFILM CORPORATION
- Taro MIYOSHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL ONIUM SALT AND PHOTOACID GENERATOR
- Publication number 20220315530
- Publication date Oct 6, 2022
- SAN-APRO LTD.
- Yoshihiko AKAZAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20220146931
- Publication date May 12, 2022
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...
- Publication number 20220113626
- Publication date Apr 14, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING SOLUBLE...
- Publication number 20210380733
- Publication date Dec 9, 2021
- PROMERUS, LLC
- PAUL D. BYRNE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210356862
- Publication date Nov 18, 2021
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL COMPOUND, AND COMPOSITION FOR FORMING HOLE TRANSPORTING LAYER...
- Publication number 20210319957
- Publication date Oct 14, 2021
- TOKYO CHEMICAL INDUSTRY CO., LTD.
- Hidetaka NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
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LIQUID CRYSTAL MIXTURE AND LIQUID CRYSTAL DISPLAY
- Publication number 20210292652
- Publication date Sep 23, 2021
- Merck Patent GmbH
- Lars LIETZAU
- G02 - OPTICS
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210294211
- Publication date Sep 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTROLYTES FOR LITHIUM-CONTAINING BATTERY CELLS
- Publication number 20210218061
- Publication date Jul 15, 2021
- Apple Inc.
- Woo Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS

Polycyclic aromatic halogenated hydrocarbons

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photoresist composition, coated substrate including the photoresist...

Compound, composition, liquid crystal composition, and device

Liquid crystal mixture and liquid crystal display

Electrolytes for lithium-containing battery cells

Onium salt, chemically amplified negative resist composition, and p...

Onium salt compound, chemically amplified resist composition and pa...

Mass polymerizable polycycloolefin compositions containing soluble...

Resist composition and patterning process

Photoresist composition, coated substrate including the photoresist...

Materials for organic electroluminescent devices

Iodonium salt, resist composition, and pattern forming process

Process for the manufacture of fluoroaryl compounds and derivatives

Resin, photosensitive resin composition, electronic component and d...

Aromatic compounds

Bimesogenic compounds and mesogenic media

Halogenated nanohoop compounds and methods of making and using the...

Resist composition, method of forming resist pattern, compound, and...

Compound, compound fabrication method, and graphene nanoribbon fabr...

Method for the synthesis of 9,10-bis(chloromethyl)anthracene

Anti-fibrotic pyridinones

Photoacid generator

Carbon-modified titanium dioxide nanoparticles and the photocatalyt...

Nematic liquid crystal composition, and liquid crystal display elem...

Materials for organic electroluminescent devices

Liquid crystal composition and a liquid crystal display including t...

Compounds and mesogenic media

Biphenyl derivative and uses thereof

Photoacid generator

N-cycloalkyl-N-{[2-(1-substitutedcycloalkyl)phenyl]methylene}-(thio...

Patents Applicationslast 30 patents

ORGANIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME

Ink Composition, Organic Material Layer Comprising Same, and Organi...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

Resist Material, Resist Composition, Patterning Process, And Monomer

Monomer, Resist Material, Resist Composition, And Patterning Process

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

Onium Salt, Resist Composition, And Patterning Process

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

Positive Resist Material And Patterning Process

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

ELECTROLYTES FOR LITHIUM-CONTAINING BATTERY CELLS

Onium Salt, Resist Composition, And Patterning Process

COMPOUND, COMPOSITION, LIQUID CRYSTAL COMPOSITION, AND DEVICE

LIQUID CRYSTAL COMPOUNDS AND COMPOSITIONS FOR TUNABLE LENSES

PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

NOVEL ONIUM SALT AND PHOTOACID GENERATOR

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND P...

MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING SOLUBLE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

NOVEL COMPOUND, AND COMPOSITION FOR FORMING HOLE TRANSPORTING LAYER...

LIQUID CRYSTAL MIXTURE AND LIQUID CRYSTAL DISPLAY

RESIST COMPOSITION AND PATTERNING PROCESS

ELECTROLYTES FOR LITHIUM-CONTAINING BATTERY CELLS