Polymer of unsaturated acid or ester

Industry

CPC
Y10S430/111

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/111Polymer of unsaturated acid or ester

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Polymers and photoresist compositions
- Patent number 9,983,477
- Issue date May 29, 2018
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 9,650,451
- Issue date May 16, 2017
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 9,233,919
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-type photoresist composition for thick film and use thereof
- Patent number 9,170,491
- Issue date Oct 27, 2015
- Everlight Chemical Industrial Corporation
- Yi Jing Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated monomer, polymer, resist composition, and patterning pr...
- Patent number 9,115,074
- Issue date Aug 25, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 9,052,594
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,017,931
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, chemically amplified positive resist composition,...
- Patent number 9,017,918
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 9,012,123
- Issue date Apr 21, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,621
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing sulfonic acid salts, photo-acid generator and r...
- Patent number 8,993,212
- Issue date Mar 31, 2015
- Central Glass Company, Limited
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
(Meth)acrylate derivative, polymer and photoresist composition havi...
- Patent number 8,969,483
- Issue date Mar 3, 2015
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern-forming method
- Patent number 8,945,810
- Issue date Feb 3, 2015
- FUJIFILM Corporation
- Fumiyuki Nishiyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoacid generators
- Patent number 8,932,797
- Issue date Jan 13, 2015
- Dow Global Technologies LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition and pattern forming method usin...
- Patent number 8,932,794
- Issue date Jan 13, 2015
- FUJIFILM Corporation
- Toshiaki Fukuhara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,921,027
- Issue date Dec 30, 2014
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,921,029
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,916,333
- Issue date Dec 23, 2014
- JSR Corporation
- Hiroshi Tomioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,911,928
- Issue date Dec 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, chemically amplified resist composition, and patterning pr...
- Patent number 8,900,793
- Issue date Dec 2, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, photoresist composition, and method for producing photoresist...
- Patent number 8,889,333
- Issue date Nov 18, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number 8,859,181
- Issue date Oct 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist materials and photolithography processes
- Patent number 8,848,163
- Issue date Sep 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsien-Cheng Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,846,293
- Issue date Sep 30, 2014
- FUJIFILM Corporation
- Yusuke Iizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition
- Patent number 8,846,294
- Issue date Sep 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20140296561
- Publication date Oct 2, 2014
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...
- Publication number 20140171584
- Publication date Jun 19, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20140114080
- Publication date Apr 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140051025
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Akinobu TANAKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140051026
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...
- Publication number 20130209938
- Publication date Aug 15, 2013
- CENTRAL GLASS COMPANY, LTD
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Application
(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...
- Publication number 20130122419
- Publication date May 16, 2013
- NEC Corporation
- Katsumi Maeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130084528
- Publication date Apr 4, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS
- Publication number 20130029269
- Publication date Jan 31, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130022926
- Publication date Jan 24, 2013
- JSR Corporation
- Hiroshi Tomioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING...
- Publication number 20130011783
- Publication date Jan 10, 2013
- DOW GLOBAL TECHNOLOGIES LLC
- Matthias S. Ober
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120329969
- Publication date Dec 27, 2012
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION US...
- Publication number 20120308920
- Publication date Dec 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Daisuke DOMON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20120308928
- Publication date Dec 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20120308932
- Publication date Dec 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120264061
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20120264060
- Publication date Oct 18, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL TARC MATERIAL FOR IMMERSION WATERMARK REDUCTION
- Publication number 20120258400
- Publication date Oct 11, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu Chang
- G02 - OPTICS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120251948
- Publication date Oct 4, 2012
- FUJIFILM CORPORATION
- Yusuke IIZUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20120251946
- Publication date Oct 4, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120231393
- Publication date Sep 13, 2012
- FUJIFILM CORPORATION
- Kana FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...
- Publication number 20120225383
- Publication date Sep 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219898
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219906
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219908
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219909
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219912
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Polymer of unsaturated acid or ester

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polymers and photoresist compositions

Fluorine-containing compounds and their polymers useful for anti-re...

Sulfonium salt-containing polymer, resist composition, patterning p...

Negative-type photoresist composition for thick film and use thereof

Fluorinated monomer, polymer, resist composition, and patterning pr...

Positive photosensitive composition and method of forming pattern u...

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition, method of forming resist pattern, polymeric com...

Patterning process and resist composition

Monomer, polymer, chemically amplified positive resist composition,...

Resist composition, method of forming resist pattern, novel compoun...

Positive resist composition and pattern forming method using the same

Pattern forming method, chemical amplification resist composition a...

Fluorine-containing sulfonic acid salts, photo-acid generator and r...

Positive resist composition and method of forming resist pattern

(Meth)acrylate derivative, polymer and photoresist composition havi...

Positive resist composition and pattern-forming method

Photoacid generators

Positive photosensitive composition and pattern forming method usin...

Radiation-sensitive resin composition

Resist composition and method for producing resist pattern

Radiation-sensitive resin composition

Resist composition, method of forming resist pattern, polymeric com...

Polymer, chemically amplified resist composition, and patterning pr...

Salt, photoresist composition, and method for producing photoresist...

Chemically amplified negative resist composition and patterning pro...

Photoresist materials and photolithography processes

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Photoresist composition

Patents Applicationslast 30 patents

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVI...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION

MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION US...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PR...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST...

NOVEL TARC MATERIAL FOR IMMERSION WATERMARK REDUCTION

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PHOTORESIST COMPOSITION

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN