Polyolefin or halogen containing

Industry

CPC
Y10S430/108

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/108Polyolefin or halogen containing

Industries

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition
- Patent number 9,897,913
- Issue date Feb 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 9,650,451
- Issue date May 16, 2017
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorinated monomer, polymer, resist composition, and patterning pr...
- Patent number 9,115,074
- Issue date Aug 25, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,034,558
- Issue date May 19, 2015
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 9,023,576
- Issue date May 5, 2015
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,622
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,921,029
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,846,292
- Issue date Sep 30, 2014
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,802,349
- Issue date Aug 12, 2014
- FUJIFILM Corporation
- Masahiro Yoshidome
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition, method of forming resist pattern and p...
- Patent number 8,771,921
- Issue date Jul 8, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 8,741,554
- Issue date Jun 3, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 8,697,329
- Issue date Apr 15, 2014
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compounds and their polymers useful for anti-re...
- Patent number 8,691,491
- Issue date Apr 8, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing sulfonates having polymerizable anions and manu...
- Patent number 8,663,897
- Issue date Mar 4, 2014
- Central Glass Company, Limited
- Takashi Masubuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer, polymer, resist composition, and patterning pr...
- Patent number 8,647,808
- Issue date Feb 11, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,592,132
- Issue date Nov 26, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymerizable fluorine-containing compound
- Patent number 8,592,622
- Issue date Nov 26, 2013
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,574,812
- Issue date Nov 5, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,574,813
- Issue date Nov 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,563,219
- Issue date Oct 22, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,563,218
- Issue date Oct 22, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,563,217
- Issue date Oct 22, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for immersion exposure and method of forming res...
- Patent number 8,518,629
- Issue date Aug 27, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing compound, fluorine-containing polymer, negative...
- Patent number 8,513,457
- Issue date Aug 20, 2013
- Central Glass Company, Limited
- Yoshimi Isono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive compositions
- Patent number 8,507,176
- Issue date Aug 13, 2013
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,475,997
- Issue date Jul 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material and method for photolithography
- Patent number 8,460,856
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition, method of forming resist pattern and p...
- Patent number 8,404,426
- Issue date Mar 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Sho Abe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming method
- Patent number 8,343,708
- Issue date Jan 1, 2013
- FUJIFILM Corporation
- Toshiaki Fukuhara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...
- Publication number 20140171584
- Publication date Jun 19, 2014
- Central Glass Company, Limited
- Shinichi Sumida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20140114080
- Publication date Apr 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130115556
- Publication date May 9, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20130115557
- Publication date May 9, 2013
- FUJIFILM Corporation
- Shuhei Yamaguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...
- Publication number 20120225383
- Publication date Sep 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Makiko Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...
- Publication number 20120226070
- Publication date Sep 6, 2012
- Central Glass Company, Limited
- Yoshimi Isono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219898
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219906
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219908
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219909
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219912
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20120171379
- Publication date Jul 5, 2012
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...
- Publication number 20120164581
- Publication date Jun 28, 2012
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120094236
- Publication date Apr 19, 2012
- Daiju SHIONO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20120034564
- Publication date Feb 9, 2012
- FUJIFILM CORPORATION
- Toshiaki Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20120015301
- Publication date Jan 19, 2012
- FUJIFILM CORPORATION
- Masahiro Yoshidome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY
- Publication number 20120009524
- Publication date Jan 12, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...
- Publication number 20110311917
- Publication date Dec 22, 2011
- Tsuyoshi KUROSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20110305991
- Publication date Dec 15, 2011
- FUJIFILM CORPORATION
- Fumiyuki NISHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20110250539
- Publication date Oct 13, 2011
- Masayoshi SAGEHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110236824
- Publication date Sep 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Compounds and their Polymers Useful for Anti-Re...
- Publication number 20110196121
- Publication date Aug 11, 2011
- Central Glass Company, Limited
- Shinichi Sumida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorine-Containing Sulfonates Having Polymerizable Anions and Manu...
- Publication number 20110177453
- Publication date Jul 21, 2011
- CENTRAL GLASS COMPANY, LIMITED
- Takashi Masubuchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITIONS
- Publication number 20110159429
- Publication date Jun 30, 2011
- Rohm and Haas Electronic Materials L.L.C.
- James W. THACKERAY
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymerizable Fluorine-Containing Compound
- Publication number 20110098500
- Publication date Apr 28, 2011
- Central Glass Company, Limited
- Yoshimi ISONO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...
- Publication number 20110076622
- Publication date Mar 31, 2011
- FUJIFILM CORPORATION
- Haruki Inabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMIN...
- Publication number 20110045413
- Publication date Feb 24, 2011
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110008735
- Publication date Jan 13, 2011
- Youichi OHSAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20100304297
- Publication date Dec 2, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Polyolefin or halogen containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiation-sensitive composition

Fluorine-containing compounds and their polymers useful for anti-re...

Fluorinated monomer, polymer, resist composition, and patterning pr...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Positive resist composition for immersion exposure and pattern-form...

Pattern forming method, chemical amplification resist composition a...

Positive resist composition and method of forming resist pattern

Resist composition and method for producing resist pattern

Radiation-sensitive composition

Actinic ray-sensitive or radiation-sensitive resin composition and...

Negative resist composition, method of forming resist pattern and p...

Patterning process and resist composition

Positive resist composition and pattern forming method using the same

Fluorine-containing compounds and their polymers useful for anti-re...

Fluorine-containing sulfonates having polymerizable anions and manu...

Fluorinated monomer, polymer, resist composition, and patterning pr...

Resist composition and method for producing resist pattern

Polymerizable fluorine-containing compound

Resist composition and method for producing resist pattern

Resist composition for immersion exposure and method of forming res...

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Resist composition for immersion exposure and method of forming res...

Fluorine-containing compound, fluorine-containing polymer, negative...

Photosensitive compositions

Resist composition for immersion exposure, method of forming resist...

Material and method for photolithography

Negative resist composition, method of forming resist pattern and p...

Positive resist composition and pattern forming method

Patents Applicationslast 30 patents

Fluorine-Containing Compounds and Their Polymers Useful for Anti-Re...

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...

Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RADIATION-SENSITIVE COMPOSITION

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RES...

POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Fluorine-Containing Compounds and their Polymers Useful for Anti-Re...

Fluorine-Containing Sulfonates Having Polymerizable Anions and Manu...

PHOTOSENSITIVE COMPOSITIONS

Polymerizable Fluorine-Containing Compound

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...

RESIST COMPOSITION FOR NEGATIVE TONE DEVELOPMENT AND PATTERN FORMIN...

SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION