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H01J2237/30461

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/30461pre-calculated

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 11,276,558
- Issue date Mar 15, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method, ion implantation apparatus and semiconduct...
- Patent number 11,195,695
- Issue date Dec 7, 2021
- Infineon Technologies AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,170,976
- Issue date Nov 9, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, method of adjusting beam i...
- Patent number 11,145,483
- Issue date Oct 12, 2021
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 11,127,566
- Issue date Sep 21, 2021
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window analysis
- Patent number 10,720,367
- Issue date Jul 21, 2020
- Applied Materials Israel Ltd.
- Idan Kaizerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 10,658,157
- Issue date May 19, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Grant
Method of performing dose modulation, in particular for electron be...
- Patent number 10,522,328
- Issue date Dec 31, 2019
- Aselta Nanographics
- Mohamed Saib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,460,908
- Issue date Oct 29, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 10,444,629
- Issue date Oct 15, 2019
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus and positional displacement correct...
- Patent number 10,410,830
- Issue date Sep 10, 2019
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device and ion milling method
- Patent number 10,332,722
- Issue date Jun 25, 2019
- Hitachi High-Technologies Corporation
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, method of adjusting beam i...
- Patent number 10,192,712
- Issue date Jan 29, 2019
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus, method of adjusting beam i...
- Patent number 9,824,849
- Issue date Nov 21, 2017
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for generating parameter pattern, ion implantation method an...
- Patent number 9,697,989
- Issue date Jul 4, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting drift of accelerating voltage, method for cor...
- Patent number 9,508,528
- Issue date Nov 29, 2016
- NuFlare Technology, Inc.
- Hironori Mizoguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle radiation device and specimen preparation method u...
- Patent number 9,449,786
- Issue date Sep 20, 2016
- Hitachi High-Technologies Corporation
- Miki Tsuchiya
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Charged particle beam writing apparatus, method of adjusting beam i...
- Patent number 9,236,223
- Issue date Jan 12, 2016
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Cathode operating temperature adjusting method, and writing apparatus
- Patent number 9,082,586
- Issue date Jul 14, 2015
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and method of dosage profile control
- Patent number 8,925,479
- Issue date Jan 6, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keung Hui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing system for semiconductor device capable of controllin...
- Patent number 8,735,181
- Issue date May 27, 2014
- Kabushiki Kaisha Toshiba
- Osamu Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern modification schemes for improved FIB patterning
- Patent number 8,624,206
- Issue date Jan 7, 2014
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 8,610,091
- Issue date Dec 17, 2013
- Nuflare Technology, Inc.
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 8,563,953
- Issue date Oct 22, 2013
- Nuflare Technology, Inc.
- Noriaki Nakayamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam pattern forming apparatus and charged particl...
- Patent number 8,502,175
- Issue date Aug 6, 2013
- Nuflare Technology, Inc.
- Noriaki Nakayamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure apparatus and electron beam exposure method
- Patent number 8,487,281
- Issue date Jul 16, 2013
- Advantest Corp.
- Masaki Kurokawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning electron microscope
- Patent number 8,481,935
- Issue date Jul 9, 2013
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230029715
- Publication date Feb 2, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210027987
- Publication date Jan 28, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210027986
- Publication date Jan 28, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200341380
- Publication date Oct 29, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200328060
- Publication date Oct 15, 2020
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...
- Publication number 20200251306
- Publication date Aug 6, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Application
PROCESS WINDOW ANALYSIS
- Publication number 20190355628
- Publication date Nov 21, 2019
- APPLIED MATERIALS ISRAEL LTD.
- Idan KAIZERMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190333734
- Publication date Oct 31, 2019
- NuFlare Technology, Inc.
- Hideki MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...
- Publication number 20190115185
- Publication date Apr 18, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20180342371
- Publication date Nov 29, 2018
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BE...
- Publication number 20180204707
- Publication date Jul 19, 2018
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND POSITIONAL DISPLACEMENT CORRECT...
- Publication number 20180090299
- Publication date Mar 29, 2018
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...
- Publication number 20180076002
- Publication date Mar 15, 2018
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD...
- Publication number 20140322833
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, AND WRITING APPARATUS
- Publication number 20140239200
- Publication date Aug 28, 2014
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...
- Publication number 20140203185
- Publication date Jul 24, 2014
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20130134329
- Publication date May 30, 2013
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Pattern Modification Schemes for Improved FIB Patterning
- Publication number 20130092826
- Publication date Apr 18, 2013
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method of Dosage Profile Control
- Publication number 20130068162
- Publication date Mar 21, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keung Hui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...
- Publication number 20130032707
- Publication date Feb 7, 2013
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD
- Publication number 20120256106
- Publication date Oct 11, 2012
- Masaki Kurokawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME
- Publication number 20120104253
- Publication date May 3, 2012
- Hitachi High-Technologies Corporation
- Ruriko Tsuneta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20120068089
- Publication date Mar 22, 2012
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
System and Method of Dosage Profile Control
- Publication number 20120009692
- Publication date Jan 12, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keung Hui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICL...
- Publication number 20120007002
- Publication date Jan 12, 2012
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20110278454
- Publication date Nov 17, 2011
- Hitachi High-Technologies Corporation
- Akira IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20110253911
- Publication date Oct 20, 2011
- Hiroshi Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-column electron beam lithography apparatus and electron beam...
- Publication number 20110204224
- Publication date Aug 25, 2011
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...
- Publication number 20110121208
- Publication date May 26, 2011
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING
- Publication number 20110049382
- Publication date Mar 3, 2011
- FEI Company
- Tom Miller
- H01 - BASIC ELECTRIC ELEMENTS

pre-calculated

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-beam writing method and multi-beam writing apparatus

Exposure apparatus and exposure method, lithography method, and dev...

Ion implantation method, ion implantation apparatus and semiconduct...

Multi-beam writing method and multi-beam writing apparatus

Charged particle beam writing apparatus, method of adjusting beam i...

Bias correction for lithography

Multi charged particle beam writing apparatus and multi charged par...

Bias correction for lithography

Process window analysis

Exposure apparatus and exposure method, lithography method, and dev...

Method of performing dose modulation, in particular for electron be...

Multi charged particle beam writing apparatus and multi charged par...

Bias correction for lithography

Charged particle beam apparatus and positional displacement correct...

Ion milling device and ion milling method

Charged particle beam writing apparatus, method of adjusting beam i...

Charged particle beam writing apparatus, method of adjusting beam i...

Method for generating parameter pattern, ion implantation method an...

Method for correcting drift of accelerating voltage, method for cor...

Charged particle radiation device and specimen preparation method u...

Charged particle beam writing apparatus, method of adjusting beam i...

Cathode operating temperature adjusting method, and writing apparatus

System and method of dosage profile control

Manufacturing system for semiconductor device capable of controllin...

Pattern modification schemes for improved FIB patterning

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam pattern forming apparatus and charged particl...

Electron beam exposure apparatus and electron beam exposure method

Scanning electron microscope

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

BIAS CORRECTION FOR LITHOGRAPHY

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...

PROCESS WINDOW ANALYSIS

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BE...

CHARGED PARTICLE BEAM APPARATUS AND POSITIONAL DISPLACEMENT CORRECT...

CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...

IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD...

CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, AND WRITING APPARATUS

CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Pattern Modification Schemes for Improved FIB Patterning

System and Method of Dosage Profile Control

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...

ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD

CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

System and Method of Dosage Profile Control

CHARGED PARTICLE BEAM PATTERN FORMING APPARATUS AND CHARGED PARTICL...

SCANNING ELECTRON MICROSCOPE

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

Multi-column electron beam lithography apparatus and electron beam...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFF...

PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING