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H01L21/02299

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02299pre-treatment

Industries

Patents Grantslast 30 patents

Information Patent Grant
Dielectric layer, interconnection structure using the same, and man...
- Patent number 12,014,919
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Chen Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and related methods
- Patent number 11,848,241
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jiu Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 11,725,274
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,610,775
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a FinFET device by implantation through capping l...
- Patent number 11,532,730
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Cheng Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition and etch processes of chromium-containing thin films for...
- Patent number 11,289,328
- Issue date Mar 29, 2022
- Applied Materials Inc.
- Thomas Knisley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gallium nitride based semiconductor device and manufacturing method...
- Patent number 11,257,676
- Issue date Feb 22, 2022
- Fuji Electric Co., Ltd.
- Hideaki Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device and film deposition...
- Patent number 11,075,076
- Issue date Jul 27, 2021
- Tokyo Electron Limited
- Takahito Umehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PERC solar cell capable of improving photoelectric conversion effic...
- Patent number 11,024,753
- Issue date Jun 1, 2021
- Guangdong Aiko Solar Energy Technology Co., Ltd.
- Chun-Wen Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to improve front-side process uniformity by back-side metal...
- Patent number 10,982,322
- Issue date Apr 20, 2021
- Skyworks Solutions, Inc.
- Kezia Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric layer, interconnection structure using the same, and man...
- Patent number 10,950,426
- Issue date Mar 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Chen Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor including electrode and dielectric layer each containing...
- Patent number 10,923,560
- Issue date Feb 16, 2021
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Takahiro Koyanagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanolaminate structure, semiconductor device and method of forming...
- Patent number 10,840,350
- Issue date Nov 17, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zi-Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dislocation SMT for FinFET device
- Patent number 10,727,319
- Issue date Jul 28, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Cheng Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of evaluating semiconductor substrate and method of manufact...
- Patent number 10,641,708
- Issue date May 5, 2020
- Sumco Corporation
- Kazutaka Eriguchi
- G01 - MEASURING TESTING
Information Patent Grant
Critical methodology in vacuum chambers to determine gap and leveli...
- Patent number 10,599,043
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Hiroyuki Ogiso
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mitigation of hot carrier damage in field-effect transistors
- Patent number 10,566,446
- Issue date Feb 18, 2020
- GLOBALFOUNDRIES Inc.
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for filling a structure using selective surface modifica...
- Patent number 10,559,496
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Kurtis Leschkies
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of dielectric materials
- Patent number 10,553,480
- Issue date Feb 4, 2020
- Imec VZW
- Murad Redzheb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-limiting and saturating chemical vapor deposition of a silicon...
- Patent number 10,553,425
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Jessica S. Kachian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
INP-based transistor fabrication
- Patent number 10,541,315
- Issue date Jan 21, 2020
- Purdue Research Foundation
- Peide Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform gate dielectric for DRAM device
- Patent number 10,522,549
- Issue date Dec 31, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Baonian Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for gap filling improvement
- Patent number 10,515,953
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ying-Hao Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Engineering of ferroelectric materials in semiconductor devices by...
- Patent number 10,388,514
- Issue date Aug 20, 2019
- GLOBALFOUNDRIES Inc.
- Lars Mueller-Meskamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolayer film mediated precision film deposition
- Patent number 10,340,137
- Issue date Jul 2, 2019
- Tokyo Electron Limited
- Peter Ventzek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Robust high performance low hydrogen silicon carbon nitride (SiCNH)...
- Patent number 10,242,865
- Issue date Mar 26, 2019
- International Business Machines Corporation
- Thomas J. Haigh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Robust high performance low hydrogen silicon carbon nitride (SiCNH)...
- Patent number 10,236,176
- Issue date Mar 19, 2019
- International Business Machines Corporation
- Thomas J. Haigh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,062,571
- Issue date Aug 28, 2018
- Samsung Electronics Co., Ltd.
- Hyun-chul Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective gas phase film deposition on a substrate by mod...
- Patent number 10,062,564
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Kandabara N. Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of modulating the morphology of epitaxial semiconductor mat...
- Patent number 9,953,873
- Issue date Apr 24, 2018
- GLOBALFOUNDRIES Inc.
- Bhupesh Chandra
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Processing Using a Two-Dimensional Polymer
- Publication number 20240363333
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...
- Publication number 20240297038
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chen HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20240290610
- Publication date Aug 29, 2024
- Tokyo Electron Limited
- Takashi FUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...
- Publication number 20240249934
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Naomi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230207309
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Viljami PORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20210313167
- Publication date Oct 7, 2021
- ASM IP HOLDING B.V.
- Viljami PORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...
- Publication number 20210202241
- Publication date Jul 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chen HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Selective Deposition of Dielectric Films
- Publication number 20210043448
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dislocation SMT For FinFet Device
- Publication number 20200357900
- Publication date Nov 12, 2020
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wen-Cheng Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...
- Publication number 20200058495
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chen HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition And Etch Processes Of Chromium-Containing Thin Films For...
- Publication number 20200006056
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Thomas Knisley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MITIGATION OF HOT CARRIER DAMAGE IN FIELD-EFFECT TRANSISTORS
- Publication number 20190371918
- Publication date Dec 5, 2019
- GLOBALFOUNDRIES INC.
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO IMPROVE FRONT-SIDE PROCESS UNIFORMITY BY BACK-SIDE METAL...
- Publication number 20190316250
- Publication date Oct 17, 2019
- SKYWORKS SOLUTIONS, INC.
- Kezia Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND FILM DEPOSITION...
- Publication number 20190172707
- Publication date Jun 6, 2019
- TOKYO ELECTRON LIMITED
- Takahito UMEHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROBUST HIGH PERFORMANCE LOW HYDROGEN SILICON CARBON NITRIDE (SiCNH)...
- Publication number 20190172704
- Publication date Jun 6, 2019
- International Business Machines Corporation
- Thomas J. Haigh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENGINEERING OF FERROELECTRIC MATERIALS IN SEMICONDUCTOR DEVICES BY...
- Publication number 20190108998
- Publication date Apr 11, 2019
- GLOBALFOUNDRIES INC.
- Lars Mueller-Meskamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOLAMINATE STRUCTURE, SEMICONDUCTOR DEVICE AND METHOD OF FORMING...
- Publication number 20180122916
- Publication date May 3, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Zi-Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRITICAL METHODOLOGY IN VACUUM CHAMBERS TO DETERMINE GAP AND LEVELI...
- Publication number 20180046088
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Hiroyuki OGISO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Structure for Gap Filling Improvement
- Publication number 20180040617
- Publication date Feb 8, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ying-Hao SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF EVALUATING SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACT...
- Publication number 20180038797
- Publication date Feb 8, 2018
- SUMCO CORPORATION
- Kazutaka ERIGUCHI
- G01 - MEASURING TESTING
Information Patent Application
MONOLAYER FILM MEDIATED PRECISION FILM DEPOSITION
- Publication number 20180025908
- Publication date Jan 25, 2018
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...
- Publication number 20180019116
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- Jessica S. KACHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INP-BASED TRANSISTOR FABRICATION
- Publication number 20180019320
- Publication date Jan 18, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Peide Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF THE MORPHOLOGY OF EPITAXIAL SEMICONDUCTOR MATERIAL
- Publication number 20170345719
- Publication date Nov 30, 2017
- GLOBALFOUNDRIES INC.
- Bhupesh Chandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROBUST HIGH PERFORMANCE LOW HYDROGEN SILICON CARBON NITRIDE (SiCNH)...
- Publication number 20170263451
- Publication date Sep 14, 2017
- International Business Machines Corporation
- Thomas J. Haigh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dislocation SMT For FinFet Device
- Publication number 20170154979
- Publication date Jun 1, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wen-Cheng Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...
- Publication number 20170040159
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Jessica S. KACHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A SEMICONDUCTOR DEVICE
- Publication number 20160049296
- Publication date Feb 18, 2016
- INFINEON TECHNOLOGIES AG
- Hans-Joachim Schulze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD FOR FORMING SILICON OXIDE FILM ON TUNGSTEN FILM...
- Publication number 20150332917
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Jun SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN-FREE SILICON-BASED DEPOSITED DIELECTRIC FILMS FOR NANO DEV...
- Publication number 20150287593
- Publication date Oct 8, 2015
- International Business Machines Corporation
- Donald Francis Canaperi
- H01 - BASIC ELECTRIC ELEMENTS

pre-treatment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dielectric layer, interconnection structure using the same, and man...

Semiconductor structure and related methods

Integrated cluster tool for selective area deposition

Method and apparatus for filling a gap

Method of forming a FinFET device by implantation through capping l...

Deposition and etch processes of chromium-containing thin films for...

Gallium nitride based semiconductor device and manufacturing method...

Method for manufacturing a semiconductor device and film deposition...

PERC solar cell capable of improving photoelectric conversion effic...

Methods to improve front-side process uniformity by back-side metal...

Dielectric layer, interconnection structure using the same, and man...

Capacitor including electrode and dielectric layer each containing...

Nanolaminate structure, semiconductor device and method of forming...

Dislocation SMT for FinFET device

Method of evaluating semiconductor substrate and method of manufact...

Critical methodology in vacuum chambers to determine gap and leveli...

Mitigation of hot carrier damage in field-effect transistors

Techniques for filling a structure using selective surface modifica...

Selective deposition of dielectric materials

Self-limiting and saturating chemical vapor deposition of a silicon...

INP-based transistor fabrication

Uniform gate dielectric for DRAM device

Method and structure for gap filling improvement

Engineering of ferroelectric materials in semiconductor devices by...

Monolayer film mediated precision film deposition

Robust high performance low hydrogen silicon carbon nitride (SiCNH)...

Robust high performance low hydrogen silicon carbon nitride (SiCNH)...

Method of manufacturing semiconductor device

Method of selective gas phase film deposition on a substrate by mod...

Methods of modulating the morphology of epitaxial semiconductor mat...

Patents Applicationslast 30 patents

Semiconductor Processing Using a Two-Dimensional Polymer

DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...

FILM FORMING METHOD AND FILM FORMING APPARATUS

INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...

METHOD AND APPARATUS FOR FILLING A GAP

METHOD AND APPARATUS FOR FILLING A GAP

DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...

Method and Apparatus for Selective Deposition of Dielectric Films

Dislocation SMT For FinFet Device

DIELECTRIC LAYER, INTERCONNECTION STRUCTURE USING THE SAME, AND MAN...

Deposition And Etch Processes Of Chromium-Containing Thin Films For...

MITIGATION OF HOT CARRIER DAMAGE IN FIELD-EFFECT TRANSISTORS

METHODS TO IMPROVE FRONT-SIDE PROCESS UNIFORMITY BY BACK-SIDE METAL...

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND FILM DEPOSITION...

ROBUST HIGH PERFORMANCE LOW HYDROGEN SILICON CARBON NITRIDE (SiCNH)...

ENGINEERING OF FERROELECTRIC MATERIALS IN SEMICONDUCTOR DEVICES BY...

NANOLAMINATE STRUCTURE, SEMICONDUCTOR DEVICE AND METHOD OF FORMING...

CRITICAL METHODOLOGY IN VACUUM CHAMBERS TO DETERMINE GAP AND LEVELI...

Method and Structure for Gap Filling Improvement

METHOD OF EVALUATING SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACT...

MONOLAYER FILM MEDIATED PRECISION FILM DEPOSITION

SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...

INP-BASED TRANSISTOR FABRICATION

MODULATION OF THE MORPHOLOGY OF EPITAXIAL SEMICONDUCTOR MATERIAL

ROBUST HIGH PERFORMANCE LOW HYDROGEN SILICON CARBON NITRIDE (SiCNH)...

Dislocation SMT For FinFet Device

SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...

METHOD FOR FORMING A SEMICONDUCTOR DEVICE

FILM-FORMING METHOD FOR FORMING SILICON OXIDE FILM ON TUNGSTEN FILM...

HYDROGEN-FREE SILICON-BASED DEPOSITED DIELECTRIC FILMS FOR NANO DEV...