Protection means

Industry

CPC
H01J37/32559

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32559Protection means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,080,526
- Issue date Sep 3, 2024
- Jusung Engineering Co., Ltd.
- Woong Kyo Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 12,051,569
- Issue date Jul 30, 2024
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of component and plasma processing apparatus
- Patent number 11,967,487
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,170
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and method of cleaning vacuum processin...
- Patent number 11,901,162
- Issue date Feb 13, 2024
- ULVAC, Inc.
- Takehisa Miyaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source utilizing a macro-particle reduction coating and meth...
- Patent number 11,875,976
- Issue date Jan 16, 2024
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,862,436
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Toru Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,834,744
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, plasma generating apparatus, and me...
- Patent number 11,804,365
- Issue date Oct 31, 2023
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intake plasma generator systems and methods
- Patent number 11,773,811
- Issue date Oct 3, 2023
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,721,528
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pre-coating method and film forming method
- Patent number 11,718,910
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Takeshi Itatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scrubbing device for cleaning, sanitizing or disinfecting
- Patent number 11,717,585
- Issue date Aug 8, 2023
- Gojo Industries, Inc.
- Jeffrey S. Louis
- A47 - FURNITURE DOMESTIC ARTICLES OR APPLIANCES COFFEE MILLS SPICE MILLS SUCT...
Information Patent Grant
Gas discharge tube having glass seal
- Patent number 11,715,631
- Issue date Aug 1, 2023
- Bourns, Inc.
- Zuoyi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,664,198
- Issue date May 30, 2023
- Tokyo Electron Limited
- Hirofumi Ohta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution production systems and methods, and plasma reacti...
- Patent number 11,664,242
- Issue date May 30, 2023
- Samsung Electronics Co., Ltd.
- Beom Jin Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and coating method
- Patent number 11,646,182
- Issue date May 9, 2023
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 11,637,001
- Issue date Apr 25, 2023
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atmospheric-pressure plasma processing apparatus and method using a...
- Patent number 11,610,765
- Issue date Mar 21, 2023
- APJeT, Inc.
- Gregory A. Roche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,591,693
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc source with confined magnetic field
- Patent number 11,578,401
- Issue date Feb 14, 2023
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Siegfried Krassnitzer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Protective metal oxy-fluoride coatings
- Patent number 11,572,617
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- David Fenwick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Protective material ring
- Patent number 11,545,345
- Issue date Jan 3, 2023
- THINKON NEW TECHNOLOGY JAPAN CORPORATION
- Atsushi Ikari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component for use in plasma processing apparatus, plasma processing...
- Patent number 11,473,182
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Koji Mitsuhashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,437,221
- Issue date Sep 6, 2022
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rare-earth oxide based coatings based on ion assisted deposition
- Patent number 11,424,136
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator and information processing method
- Patent number 11,412,606
- Issue date Aug 9, 2022
- FUJI CORPORATION
- Shinji Takikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COATING METHOD
- Publication number 20240420914
- Publication date Dec 19, 2024
- Jiangsu Favored Nanotechnology Co., Ltd.
- Jian ZONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
- Publication number 20240304425
- Publication date Sep 12, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Othmar ZÜGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240297024
- Publication date Sep 5, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Ren ARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240249922
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS
- Publication number 20240234099
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Michishige Saito
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE
- Publication number 20240186120
- Publication date Jun 6, 2024
- Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Zhiyuan LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMP...
- Publication number 20240066161
- Publication date Feb 29, 2024
- TellaPure, LLC
- Edgar Bryan Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...
- Publication number 20240055237
- Publication date Feb 15, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM
- Publication number 20230402263
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20230343563
- Publication date Oct 26, 2023
- SEMES CO., LTD.
- Jin Hee HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTAKE PLASMA GENERATOR SYSTEMS AND METHODS
- Publication number 20230332564
- Publication date Oct 19, 2023
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BATCH TYPE SUBSTRATE PROCESSING APPARATUS
- Publication number 20230282459
- Publication date Sep 7, 2023
- EUGENE TECHNOLOGY CO., LTD.
- Jeong Hee JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME
- Publication number 20230253190
- Publication date Aug 10, 2023
- SAMSUNG DISPLAY CO., LTD.
- Kwan Yong LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BATCH TYPE SUBSTRATE PROCESSING APPARATUS
- Publication number 20230253191
- Publication date Aug 10, 2023
- EUGENE TECHNOLOGY CO., LTD.
- Sung Ho KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
- Publication number 20230203657
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROTECTIVE METAL OXY-FLUORIDE COATINGS
- Publication number 20230141782
- Publication date May 11, 2023
- Applied Materials, Inc.
- David Fenwick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20230116058
- Publication date Apr 13, 2023
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20220328289
- Publication date Oct 13, 2022
- Kokusai Electric Corporation
- Yasutoshi TSUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTAKE PLASMA GENERATOR SYSTEMS AND METHODS
- Publication number 20220298995
- Publication date Sep 22, 2022
- ThrivalTech, LLC
- Garrett Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20220285131
- Publication date Sep 8, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220285135
- Publication date Sep 8, 2022
- Jusung Engineering Co., Ltd.
- Woong Kyo OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISCHARGE TUBE HAVING GLASS SEAL
- Publication number 20220238305
- Publication date Jul 28, 2022
- BOURNS, INC
- Zuoyi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND ASSEMBLY FOR DISTRIBUTING GAS
- Publication number 20220208516
- Publication date Jun 30, 2022
- SEMES CO., LTD.
- Hyoung Kyu SON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANODE FOR PVD PROCESSES
- Publication number 20220205079
- Publication date Jun 30, 2022
- VTD VAKUUMTECHNIK DRESDEN GMBH
- Wolfgang FUKAREK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...
- Publication number 20220181125
- Publication date Jun 9, 2022
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS
- Publication number 20220148843
- Publication date May 12, 2022
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND METHOD OF CLEANING VACUUM PROCESSIN...
- Publication number 20220081774
- Publication date Mar 17, 2022
- ULVAC, Inc.
- Takehisa MIYAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220044914
- Publication date Feb 10, 2022
- TOKYO ELECTRON LIMITED
- Toru Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037118
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Satoru KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS

Protection means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Spatial control of plasma processing environments

Control of plasma sheath with bias supplies

Substrate processing apparatus

Deposition apparatus and deposition method using the same

Forming method of component and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Vacuum processing apparatus and method of cleaning vacuum processin...

Plasma source utilizing a macro-particle reduction coating and meth...

Plasma processing apparatus and plasma processing method

Spatial monitoring and control of plasma processing environments

Ceramic showerheads with conductive electrodes

Substrate processing apparatus, plasma generating apparatus, and me...

Intake plasma generator systems and methods

Plasma processing apparatus and control method

Pre-coating method and film forming method

Scrubbing device for cleaning, sanitizing or disinfecting

Gas discharge tube having glass seal

Plasma processing apparatus

Cleaning solution production systems and methods, and plasma reacti...

Coating apparatus and coating method

Deposition apparatus and deposition method using the same

Atmospheric-pressure plasma processing apparatus and method using a...

Ceramic showerheads with conductive electrodes

Arc source with confined magnetic field

Protective metal oxy-fluoride coatings

Protective material ring

Component for use in plasma processing apparatus, plasma processing...

Spatial monitoring and control of plasma processing environments

Rare-earth oxide based coatings based on ion assisted deposition

Plasma generator and information processing method

Patents Applicationslast 30 patents

COATING METHOD

ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM

ACTIVE GAS GENERATION APPARATUS

PLASMA PROCESSING APPARATUS

FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS

ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE

METHODS AND APPARATUS FOR GENERATING ATMOSPHERIC PRESSURE, LOW TEMP...

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...

PLASMA TREATMENT DEVICE AND ELECTRODE MECHANISM

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

SUBSTRATE TREATING APPARATUS

INTAKE PLASMA GENERATOR SYSTEMS AND METHODS

BATCH TYPE SUBSTRATE PROCESSING APPARATUS

DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME

BATCH TYPE SUBSTRATE PROCESSING APPARATUS

CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES

PROTECTIVE METAL OXY-FLUORIDE COATINGS

SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

INTAKE PLASMA GENERATOR SYSTEMS AND METHODS

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SUBSTRATE PROCESSING APPARATUS

GAS DISCHARGE TUBE HAVING GLASS SEAL

APPARATUS FOR TREATING SUBSTRATE AND ASSEMBLY FOR DISTRIBUTING GAS

ANODE FOR PVD PROCESSES

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...

APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS

VACUUM PROCESSING APPARATUS AND METHOD OF CLEANING VACUUM PROCESSIN...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD