Protective or antiabrasion layer

Industry

CPC
Y10S430/162

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/162Protective or antiabrasion layer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,146,142
- Issue date Dec 4, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,606,448
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,442,388
- Issue date Sep 13, 2016
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Patterning
- Patent number 9,034,736
- Issue date May 19, 2015
- Cambridge Enterprise Limited
- Henning Sirringhaus
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,208,124
- Issue date Jun 26, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming a fine pattern in a semicondutor device
- Patent number 8,067,146
- Issue date Nov 29, 2011
- Hynix Semiconductor Inc.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure method and device manufacturing method
- Patent number 7,914,972
- Issue date Mar 29, 2011
- Nikon Corporation
- Tomoharu Fujiwara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing method, substrate processing apparatus, and ma...
- Patent number 7,794,923
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method and method of manufacturing semiconductor de...
- Patent number 7,794,922
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Water soluble resin composition and method for pattern formation us...
- Patent number 7,745,093
- Issue date Jun 29, 2010
- AZ Electronic Materials USA Corp.
- Takeshi Nishibe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing wiring circuit board
- Patent number 7,572,351
- Issue date Aug 11, 2009
- Nitto Denko Corporation
- Naito Toshiki
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Composite layer method for minimizing PED effect
- Patent number 7,368,229
- Issue date May 6, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lang Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing wiring circuit board
- Patent number 7,354,697
- Issue date Apr 8, 2008
- Nitto Denko Corporation
- Toshiki Naito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Topcoats for use in immersion lithography
- Patent number 7,348,127
- Issue date Mar 25, 2008
- International Business Machines Corporation
- William Dinan Hinsberg, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Device manufacturing method and a substrate
- Patent number 7,326,522
- Issue date Feb 5, 2008
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoacid generating polymer, its preparation method, top anti-refl...
- Patent number 7,303,858
- Issue date Dec 4, 2007
- Hynix Semiconductor Inc.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Topcoats for use in immersion lithography
- Patent number 7,205,093
- Issue date Apr 17, 2007
- International Business Machines Corporation
- William Dinan Hinsberg, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally transferable image protective sheet, method for protectiv...
- Patent number 7,169,546
- Issue date Jan 30, 2007
- Dai Nippon Printing Co., Ltd.
- Taro Suzuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally developable materials with abrasion-resistant backside co...
- Patent number 7,153,636
- Issue date Dec 26, 2006
- Eastman Kodak Company
- Thomas J. Ludemann
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organic anti-reflective coating composition and pattern forming met...
- Patent number 7,132,217
- Issue date Nov 7, 2006
- Hynix Semiconductor Inc.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally developable materials with narrow disperse amorphous silica
- Patent number 7,105,284
- Issue date Sep 12, 2006
- Eastman Kodak Company
- Darlene F. Philip
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally development imaging materials having backside stabilizers
- Patent number 7,094,524
- Issue date Aug 22, 2006
- Eastman Kodak Company
- Steven H. Kong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photolithographic mask having a structure region covered by a thin...
- Patent number 7,078,134
- Issue date Jul 18, 2006
- Infineon Technologies AG
- Stefan Wurm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Expansion of color gamut for silver halide media
- Patent number 7,063,925
- Issue date Jun 20, 2006
- Eastman Kodak Company
- William T. Rochford
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Protective overcoat and process for thermal dye sublimation prints
- Patent number 7,056,551
- Issue date Jun 6, 2006
- Eastman Kodak Company
- Rukmini B. Lobo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally developable materials containing cationic overcoat polymer
- Patent number 7,056,650
- Issue date Jun 6, 2006
- Eastman Kodak Company
- Jon A. Hammerschmidt
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally developable materials containing ionic polymer interlayer
- Patent number 7,049,054
- Issue date May 23, 2006
- Eastman Kodak Company
- Jon A. Hammerschmidt
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Barrier layers for use in substantially light-insensitive thermogra...
- Patent number 7,033,743
- Issue date Apr 25, 2006
- Agfa-Gevaert
- Ingrid Geuens
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally developable imaging materials having backside stabilizers
- Patent number 7,029,834
- Issue date Apr 18, 2006
- Eastman Kodak Company
- Steven H. Kong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thermally-transferable polyester image-protecting layer
- Patent number 7,026,092
- Issue date Apr 11, 2006
- Imperial Chemical Industries PLC
- Julie C. Double
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190086819
- Publication date Mar 21, 2019
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140347642
- Publication date Nov 27, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140071420
- Publication date Mar 13, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERNING
- Publication number 20120280216
- Publication date Nov 8, 2012
- Henning Sirringhaus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120013868
- Publication date Jan 19, 2012
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Hardening Coating Agent
- Publication number 20110275746
- Publication date Nov 10, 2011
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Forming Method and Method of Manufacturing Semiconductor De...
- Publication number 20110039214
- Publication date Feb 17, 2011
- Kabushiki Kaisha Toshiba
- Shinichi ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Water Soluble Resin Composition and Method for Pattern Formation Us...
- Publication number 20080193880
- Publication date Aug 14, 2008
- Takeshi Nishibe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming a Fine Pattern in a Semicondutor Device
- Publication number 20080166665
- Publication date Jul 10, 2008
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR PRODUCING WIRING CIRCUIT BOARD
- Publication number 20070207415
- Publication date Sep 6, 2007
- Nitto Denko Corporation
- Toshiki Naito
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070201012
- Publication date Aug 30, 2007
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure Method And Device Manufacturing Method
- Publication number 20070196774
- Publication date Aug 23, 2007
- Tomoharu Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method, substrate processing apparatus, and ma...
- Publication number 20070190462
- Publication date Aug 16, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOATS FOR USE IN IMMERSION LITHOGRAPHY
- Publication number 20070128543
- Publication date Jun 7, 2007
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Topcoats for use in immersion lithography
- Publication number 20060275704
- Publication date Dec 7, 2006
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method of manufacturing semiconductor de...
- Publication number 20060263726
- Publication date Nov 23, 2006
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMALLY DEVELOPABLE MATERIALS WITH NARROW DISPERSE AMORPHOUS SILICA
- Publication number 20060210931
- Publication date Sep 21, 2006
- Eastman Kodak Company
- Darlene F. Philip
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoacid generating polymer, its preparation method and top anti-r...
- Publication number 20060127804
- Publication date Jun 15, 2006
- HYNIX SEMICONDUCTOR INC.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Thermally developable materials containing cationic overcoat polymer
- Publication number 20060051713
- Publication date Mar 9, 2006
- Eastman Kodak Company
- Jon A. Hammerschmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMALLY DEVELOPABLE MATERIALS CONTAINING IONIC POLYMER INTERLAYER
- Publication number 20060051712
- Publication date Mar 9, 2006
- Eastman Kodak Company
- Jon A. Hammerschmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermally transferable image protective sheet, method for protectiv...
- Publication number 20060025305
- Publication date Feb 2, 2006
- DAI NIPPON PRINTING CO., LTD.
- Taro Suzuki
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Composite layer method for minimizing PED effect
- Publication number 20050244721
- Publication date Nov 3, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Protective overcoat and process for thermal dye sublimation prints
- Publication number 20050192179
- Publication date Sep 1, 2005
- Rukmini B. Lobo
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Device manufacturing method and a substrate
- Publication number 20050175940
- Publication date Aug 11, 2005
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermally developable imaging materials with barrier layer
- Publication number 20050095540
- Publication date May 5, 2005
- Eastman Kodak Company
- Kumars Sakizadeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Highly lubricated imaging element with elastomeric matte
- Publication number 20050084810
- Publication date Apr 21, 2005
- Eastman Kodak Company
- Christopher J. Haller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermally developable imaging materials having backside stabilizers
- Publication number 20050084808
- Publication date Apr 21, 2005
- Eastman Kodak Company
- Steven H. Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermally development imaging materials having backside stabilizers
- Publication number 20050084809
- Publication date Apr 21, 2005
- Eastman Kodak Company
- Steven H. Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of transferring a protective overcoat to a dye-donor element
- Publication number 20050064320
- Publication date Mar 24, 2005
- William H. Simpson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Process of transferring transferable protection overcoat to a dye-d...
- Publication number 20050064319
- Publication date Mar 24, 2005
- William H. Simpson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Protective or antiabrasion layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Patterning

Lithographic apparatus and device manufacturing method

Method for forming a fine pattern in a semicondutor device

Exposure method and device manufacturing method

Substrate processing method, substrate processing apparatus, and ma...

Pattern forming method and method of manufacturing semiconductor de...

Water soluble resin composition and method for pattern formation us...

Process for producing wiring circuit board

Composite layer method for minimizing PED effect

Process for producing wiring circuit board

Topcoats for use in immersion lithography

Device manufacturing method and a substrate

Photoacid generating polymer, its preparation method, top anti-refl...

Topcoats for use in immersion lithography

Thermally transferable image protective sheet, method for protectiv...

Thermally developable materials with abrasion-resistant backside co...

Organic anti-reflective coating composition and pattern forming met...

Thermally developable materials with narrow disperse amorphous silica

Thermally development imaging materials having backside stabilizers

Photolithographic mask having a structure region covered by a thin...

Expansion of color gamut for silver halide media

Protective overcoat and process for thermal dye sublimation prints

Thermally developable materials containing cationic overcoat polymer

Thermally developable materials containing ionic polymer interlayer

Barrier layers for use in substantially light-insensitive thermogra...

Thermally developable imaging materials having backside stabilizers

Thermally-transferable polyester image-protecting layer

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PATTERNING

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Pattern Hardening Coating Agent

Pattern Forming Method and Method of Manufacturing Semiconductor De...

Water Soluble Resin Composition and Method for Pattern Formation Us...

Method for Forming a Fine Pattern in a Semicondutor Device

PROCESS FOR PRODUCING WIRING CIRCUIT BOARD

Lithographic apparatus and device manufacturing method

Exposure Method And Device Manufacturing Method

Substrate processing method, substrate processing apparatus, and ma...

TOPCOATS FOR USE IN IMMERSION LITHOGRAPHY

Topcoats for use in immersion lithography

Pattern forming method and method of manufacturing semiconductor de...

THERMALLY DEVELOPABLE MATERIALS WITH NARROW DISPERSE AMORPHOUS SILICA

Photoacid generating polymer, its preparation method and top anti-r...

Thermally developable materials containing cationic overcoat polymer

THERMALLY DEVELOPABLE MATERIALS CONTAINING IONIC POLYMER INTERLAYER

Thermally transferable image protective sheet, method for protectiv...

Composite layer method for minimizing PED effect

Protective overcoat and process for thermal dye sublimation prints

Device manufacturing method and a substrate

Thermally developable imaging materials with barrier layer

Highly lubricated imaging element with elastomeric matte

Thermally developable imaging materials having backside stabilizers

Thermally development imaging materials having backside stabilizers

Method of transferring a protective overcoat to a dye-donor element

Process of transferring transferable protection overcoat to a dye-d...