provided with a window for inspecting the surface of the work being lapped

Industry

CPC
B24B37/205

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B37/00Lapping machines or devices Accessories

Current Industry

B24B37/205provided with a window for inspecting the surface of the work being lapped

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-layered windows for use in chemical-mechanical planarization...
- Patent number 12,138,735
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Chung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Fixing device and detection system
- Patent number 12,005,545
- Issue date Jun 11, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chao Li
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad comprising window similar in hardness to polishing layer
- Patent number 11,964,360
- Issue date Apr 23, 2024
- SK ENPULSE CO., LTD.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad construction with composite material properties using addit...
- Patent number 11,958,162
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, method for producing the same and method of fabricat...
- Patent number 11,951,591
- Issue date Apr 9, 2024
- SK ENPULSE CO., LTD.
- Hye Young Heo
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus
- Patent number 11,883,922
- Issue date Jan 30, 2024
- Ebara Corporation
- Yuki Watanabe
- B24 - GRINDING POLISHING
Information Patent Grant
Window in thin polishing pad
- Patent number 11,826,875
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Yongqi Hu
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with annular platen or polishing pad
- Patent number 11,780,046
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and method for producing same
- Patent number 11,780,057
- Issue date Oct 10, 2023
- SK ENPULSE CO., LTD.
- Joonsung Ryou
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polish edge uniformity control with secondary fluid dispense
- Patent number 11,724,355
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Justin H. Wong
- B24 - GRINDING POLISHING
Information Patent Grant
Endpoint detection for chemical mechanical polishing based on spect...
- Patent number 11,715,672
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Dominic J. Benvegnu
- B24 - GRINDING POLISHING
Information Patent Grant
Light transmitting member, polishing pad, and substrate polishing a...
- Patent number 11,673,224
- Issue date Jun 13, 2023
- Ebara Corporation
- Masaki Kinoshita
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,667,007
- Issue date Jun 6, 2023
- Ebara Corporation
- Mitsunori Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP polishing pad with uniform window
- Patent number 11,633,830
- Issue date Apr 25, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mauricio E. Guzman
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with secondary window seal
- Patent number 11,618,124
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Rajkumar Alagarsamy
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having excellent airtightness
- Patent number 11,571,783
- Issue date Feb 7, 2023
- SKC solmics Co., Ltd.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Recycled polishing pad
- Patent number 11,541,504
- Issue date Jan 3, 2023
- Samsung Electronics Co., Ltd.
- Bong Su Ahn
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing system with support post and annular platen or polishing pad
- Patent number 11,511,388
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and manufacturing method of polishing pad and polishi...
- Patent number 11,498,181
- Issue date Nov 15, 2022
- IV Technologies Co., Ltd.
- Yu-Piao Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 11,413,720
- Issue date Aug 16, 2022
- Ebara Corporation
- Nobuyuki Takahashi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with multipurpose composite window
- Patent number 11,325,221
- Issue date May 10, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Leakage-proof polishing pad and process for preparing the same
- Patent number 11,267,098
- Issue date Mar 8, 2022
- SKC solmics Co., Ltd.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Method and systems to control optical transmissivity of a polish pa...
- Patent number 11,219,982
- Issue date Jan 11, 2022
- Thomas West, Inc.
- Thomas West
- B24 - GRINDING POLISHING
Information Patent Grant
Endpointing detection for chemical mechanical polishing based on sp...
- Patent number 11,183,435
- Issue date Nov 23, 2021
- Applied Materials, Inc.
- Dominic J. Benvegnu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Window in thin polishing pad
- Patent number 11,161,218
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Yongqi Hu
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with window and manufacturing methods thereof
- Patent number 11,072,050
- Issue date Jul 27, 2021
- Applied Materials, Inc.
- Boyi Fu
- B24 - GRINDING POLISHING
Information Patent Grant
Dressing apparatus and dressing method for substrate rear surface p...
- Patent number 11,059,145
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Yoshiki Okamoto
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,045,921
- Issue date Jun 29, 2021
- Ebara Corporation
- Toshifumi Kimba
- B24 - GRINDING POLISHING
Information Patent Grant
Printing chemical mechanical polishing pad having window or control...
- Patent number 11,007,618
- Issue date May 18, 2021
- Applied Materials, Inc.
- Laxman Murugesh
- B24 - GRINDING POLISHING
Information Patent Grant
Display of spectra contour plots versus time for semiconductor proc...
- Patent number 10,948,900
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Jeffrey Drue David
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LAYERED WINDOWS FOR USE IN CHEMICAL-MECHANICAL PLANARIZATION...
- Publication number 20240383095
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Chung Chen
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND MANUFACTURING METHOD OF POLISHING PAD AND POLISHI...
- Publication number 20240383094
- Publication date Nov 21, 2024
- IV Technologies CO., Ltd.
- Ko-Wen Chen
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20240300066
- Publication date Sep 12, 2024
- SK enpulse Co., Ltd.
- Chang Gyu IM
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH ENDPOINT WINDOW
- Publication number 20240253175
- Publication date Aug 1, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yu-Chung SU
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH ENDPOINT DETECTION WINDOW
- Publication number 20240253177
- Publication date Aug 1, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yu-Chung SU
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH ENDPOINT WINDOW
- Publication number 20240253176
- Publication date Aug 1, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yu-Chung SU
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, POLISHING APPARATUS, AND POLISHING METHOD
- Publication number 20240189959
- Publication date Jun 13, 2024
- EBARA CORPORATION
- Keisuke NAMIKI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS
- Publication number 20240157502
- Publication date May 16, 2024
- Samsung Electronics Co., Ltd.
- DONGHOON KWON
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240100647
- Publication date Mar 28, 2024
- Samsung Electronics Co., Ltd.
- Donghoon Kwon
- B24 - GRINDING POLISHING
Information Patent Application
Endpoint detection window, chemical mechanical polishing pad with w...
- Publication number 20240009797
- Publication date Jan 11, 2024
- InvenTech Materials Co., Ltd.
- Hongqi XIANG
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE
- Publication number 20230339066
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Justin H. WONG
- B24 - GRINDING POLISHING
Information Patent Application
Polishing Pad with Secondary Window Seal
- Publication number 20230278158
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Rajkumar Alagarsamy
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
- Publication number 20230166380
- Publication date Jun 1, 2023
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH WINDOW AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230158633
- Publication date May 25, 2023
- SK HYNIX INC.
- Yu Jin HEO
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USI...
- Publication number 20230052322
- Publication date Feb 16, 2023
- SKC solmics Co., Ltd.
- Sung Hoon YUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACOUSTIC WINDOW IN PAD BACKING LAYER FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20230009737
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Nicholas A. Wiswell
- B24 - GRINDING POLISHING
Information Patent Application
ACOUSTIC WINDOW WITH LIQUID-FILLED PORES FOR CHEMICAL MECHANICAL PO...
- Publication number 20230011626
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Nicholas A. Wiswell
- B24 - GRINDING POLISHING
Information Patent Application
COUPLING OF ACOUSTIC SENSOR FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20230009048
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Nicholas A. Wiswell
- B24 - GRINDING POLISHING
Information Patent Application
ACOUSTIC WINDOW IN PAD POLISHING AND BACKING LAYER FOR CHEMICAL MEC...
- Publication number 20230009519
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Nicholas A. Wiswell
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SYSTEM WITH ANNULAR PLATEN OR POLISHING PAD
- Publication number 20220410335
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURI...
- Publication number 20220371155
- Publication date Nov 24, 2022
- SKC solmics Co., Ltd.
- Sung Hoon YUN
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
- Publication number 20220234167
- Publication date Jul 28, 2022
- CMC Materials, Inc.
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD WITH WINDOW HAVING TRANSPARENCY AT LOW WAVELENGTH...
- Publication number 20220203495
- Publication date Jun 30, 2022
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Application
FIXING DEVICE AND DETECTION SYSTEM
- Publication number 20220152775
- Publication date May 19, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Chao Li
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, METHOD FOR PRODUCING THE SAME AND METHOD OF FABRICAT...
- Publication number 20220143778
- Publication date May 12, 2022
- SKC solmics Co., Ltd.
- Hye Young HEO
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE
- Publication number 20220097198
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Justin H. WONG
- B24 - GRINDING POLISHING
Information Patent Application
ENDPOINT DETECTION FOR CHEMICAL MECHANICAL POLISHING BASED ON SPECT...
- Publication number 20220077006
- Publication date Mar 10, 2022
- Applied Materials, Inc.
- Dominic J. Benvegnu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING...
- Publication number 20220072678
- Publication date Mar 10, 2022
- SKC solmics Co., Ltd.
- Eun Sun JOENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WINDOW IN THIN POLISHING PAD
- Publication number 20220023990
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Yongqi Hu
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD WITH UNIFORM WINDOW
- Publication number 20210402556
- Publication date Dec 30, 2021
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mauricio E. Guzman
- B24 - GRINDING POLISHING

provided with a window for inspecting the surface of the work being lapped

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-layered windows for use in chemical-mechanical planarization...

Fixing device and detection system

Polishing pad comprising window similar in hardness to polishing layer

CMP pad construction with composite material properties using addit...

Polishing pad, method for producing the same and method of fabricat...

Substrate processing apparatus

Window in thin polishing pad

Polishing system with annular platen or polishing pad

Polishing pad and method for producing same

Substrate polish edge uniformity control with secondary fluid dispense

Endpoint detection for chemical mechanical polishing based on spect...

Light transmitting member, polishing pad, and substrate polishing a...

Polishing apparatus and polishing method

CMP polishing pad with uniform window

Polishing pad with secondary window seal

Polishing pad having excellent airtightness

Recycled polishing pad

Polishing system with support post and annular platen or polishing pad

Polishing pad and manufacturing method of polishing pad and polishi...

Polishing apparatus

Polishing pad with multipurpose composite window

Leakage-proof polishing pad and process for preparing the same

Method and systems to control optical transmissivity of a polish pa...

Endpointing detection for chemical mechanical polishing based on sp...

Window in thin polishing pad

Polishing pad with window and manufacturing methods thereof

Dressing apparatus and dressing method for substrate rear surface p...

Polishing apparatus and polishing method

Printing chemical mechanical polishing pad having window or control...

Display of spectra contour plots versus time for semiconductor proc...

Patents Applicationslast 30 patents

MULTI-LAYERED WINDOWS FOR USE IN CHEMICAL-MECHANICAL PLANARIZATION...

POLISHING PAD AND MANUFACTURING METHOD OF POLISHING PAD AND POLISHI...

POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE

POLISHING PAD WITH ENDPOINT WINDOW

POLISHING PAD WITH ENDPOINT DETECTION WINDOW

POLISHING PAD WITH ENDPOINT WINDOW

POLISHING PAD, POLISHING APPARATUS, AND POLISHING METHOD

CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Endpoint detection window, chemical mechanical polishing pad with w...

SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE

Polishing Pad with Secondary Window Seal

ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE

POLISHING PAD WITH WINDOW AND METHOD OF MANUFACTURING THE SAME

POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USI...

ACOUSTIC WINDOW IN PAD BACKING LAYER FOR CHEMICAL MECHANICAL POLISHING

ACOUSTIC WINDOW WITH LIQUID-FILLED PORES FOR CHEMICAL MECHANICAL PO...

COUPLING OF ACOUSTIC SENSOR FOR CHEMICAL MECHANICAL POLISHING

ACOUSTIC WINDOW IN PAD POLISHING AND BACKING LAYER FOR CHEMICAL MEC...

POLISHING SYSTEM WITH ANNULAR PLATEN OR POLISHING PAD

POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURI...

ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE

CMP POLISHING PAD WITH WINDOW HAVING TRANSPARENCY AT LOW WAVELENGTH...

FIXING DEVICE AND DETECTION SYSTEM

POLISHING PAD, METHOD FOR PRODUCING THE SAME AND METHOD OF FABRICAT...

SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE

ENDPOINT DETECTION FOR CHEMICAL MECHANICAL POLISHING BASED ON SPECT...

POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING...

WINDOW IN THIN POLISHING PAD

CMP POLISHING PAD WITH UNIFORM WINDOW