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Industry
CPC
B24B37/00
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Parent Industries
B
PERFORMING OPERATIONS TRANSPORTING
B24
Grinding technology
B24B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
Current Industry
B24B37/00
Lapping machines or devices Accessories
Sub Industries
B24B37/005
Control means for lapping machines or devices
B24B37/0053
detecting loss or breakage of a workpiece during lapping
B24B37/0056
taking regard of the pH-value of lapping agents
B24B37/013
Devices or means for detecting lapping completion
B24B37/015
Temperature control
B24B37/02
designed for working surfaces of revolution
B24B37/022
characterised by the movement of the work between two lapping plates
B24B37/025
designed for working spherical surfaces
B24B37/04
designed for working plane surfaces
B24B37/042
operating processes therefor
B24B37/044
characterised by the composition of the lapping agent
B24B37/046
using electric current
B24B37/048
of sliders and magnetic heads of hard disc drives or the like
B24B37/07
characterised by the movement of the work or lapping tool
B24B37/08
for double side lapping
B24B37/10
for single side lapping
B24B37/102
the workpieces or work carriers being able to rotate freely due to a frictional contact with the lapping tool
B24B37/105
the workpieces or work carriers being actively moved by a drive
B24B37/107
in a rotary movement only, about an axis being stationary during lapping
B24B37/11
Lapping tools
B24B37/12
Lapping plates for working plane surfaces
B24B37/14
characterised by the composition or properties of the plate materials
B24B37/16
characterised by the shape of the lapping plate surface
B24B37/20
Lapping pads for working plane surfaces
B24B37/205
provided with a window for inspecting the surface of the work being lapped
B24B37/22
characterised by a multi-layered structure
B24B37/24
characterised by the composition or properties of the pad materials
B24B37/245
Pads with fixed abrasives
B24B37/26
characterised by the shape of the lapping pad surface
B24B37/27
Work carriers
B24B37/28
for double side lapping of plane surfaces
B24B37/30
for single side lapping of plane surfaces
B24B37/32
Retaining rings
B24B37/34
Accessories
B24B37/345
Feeding, loading or unloading work specially adapted to lapping
Industries
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Patents Grants
last 30 patents
Information
Patent Grant
Polishing pad and method of fabricating semiconductor device using...
Patent number
12,258,460
Issue date
Mar 25, 2025
SK ENPULSE CO., LTD.
Eun Sun Joeng
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Machine vision as input to a CMP process control algorithm
Patent number
12,257,665
Issue date
Mar 25, 2025
Applied Materials, Inc.
Benjamin Cherian
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Surface height measurement method using dummy disk
Patent number
12,257,666
Issue date
Mar 25, 2025
Ebara Corporation
Hiroyuki Shinozaki
B24 - GRINDING POLISHING
Information
Patent Grant
Controlling chemical mechanical polishing pad stiffness by adjustin...
Patent number
12,257,664
Issue date
Mar 25, 2025
Applied Materials, Inc.
Kevin H. Song
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing apparatus and method
Patent number
12,251,789
Issue date
Mar 18, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Chun-Hsi Huang
B24 - GRINDING POLISHING
Information
Patent Grant
Modular chemical mechanical polisher with simultaneous polishing an...
Patent number
12,251,787
Issue date
Mar 18, 2025
Applied Materials, Inc.
Steven M. Zuniga
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing head with local wafer pressure
Patent number
12,251,788
Issue date
Mar 18, 2025
Applied Materials, Inc.
Andrew Nagengast
B24 - GRINDING POLISHING
Information
Patent Grant
Polyurethane for polishing layers, polishing layer and polishing pad
Patent number
12,252,634
Issue date
Mar 18, 2025
Kuraray Co., Ltd.
Mitsuru Kato
B24 - GRINDING POLISHING
Information
Patent Grant
Filter apparatus for semiconductor device fabrication process
Patent number
12,251,786
Issue date
Mar 18, 2025
Taiwan Semiconductor Manufacturing Company, Ltd
Chwen Yu
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical planarization equipment, wafer transfer method,...
Patent number
12,251,785
Issue date
Mar 18, 2025
HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
EdwardLiCang Lee
B24 - GRINDING POLISHING
Information
Patent Grant
Planarization strategy in nano-sized fabrication
Patent number
12,254,906
Issue date
Mar 18, 2025
Seagate Technology LLC
Cheng Bi
B24 - GRINDING POLISHING
Information
Patent Grant
Perpendicularly magnetized ferromagnetic layers having an oxide int...
Patent number
12,249,450
Issue date
Mar 11, 2025
Taiwan Semiconductor Manufacturing Company, Ltd
Luc Thomas
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad and method of fabricating semiconductor device using...
Patent number
12,246,408
Issue date
Mar 11, 2025
SK ENPULSE CO., LTD.
Eun Sun Joeng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polishing head, and polishing treatment device
Patent number
12,240,074
Issue date
Mar 4, 2025
MICRO ENGINEERING, INC.
Akio Komura
B24 - GRINDING POLISHING
Information
Patent Grant
Detection signal processing apparatus and detection signal processi...
Patent number
12,241,738
Issue date
Mar 4, 2025
Ebara Corporation
Hiroto Yamada
B24 - GRINDING POLISHING
Information
Patent Grant
Cleaning system for polishing liquid delivery arm
Patent number
12,240,078
Issue date
Mar 4, 2025
Applied Materials, Inc.
Roy C. Nangoy
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing system with capacitive shear sensor
Patent number
12,233,505
Issue date
Feb 25, 2025
Applied Materials, Inc.
Nicholas A. Wiswell
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate transporter and substrate processing apparatus including...
Patent number
12,237,194
Issue date
Feb 25, 2025
EBARA CORPORATION
Akihiro Yazawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus and substrate processing method
Patent number
12,230,515
Issue date
Feb 18, 2025
Tokyo Electron Limited
Nobuhiko Mouri
B08 - CLEANING
Information
Patent Grant
Substrate holding apparatus, substrate suction determination method...
Patent number
12,230,529
Issue date
Feb 18, 2025
Ebara Corporation
Osamu Nabeya
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical mechanical polishing pad and preparation thereof
Patent number
12,220,784
Issue date
Feb 11, 2025
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bainian Qian
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature controlled substrate carrier and polishing components
Patent number
12,217,979
Issue date
Feb 4, 2025
Axus Technology, LLC
Daniel Ray Trojan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature control of chemical mechanical polishing
Patent number
12,214,468
Issue date
Feb 4, 2025
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing head retaining ring tilting moment control
Patent number
12,214,469
Issue date
Feb 4, 2025
Applied Materials, Inc.
Andrew Nagengast
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Skate blade sharpening system
Patent number
12,214,467
Issue date
Feb 4, 2025
Velasa Sports, Inc.
Russell K. Layton
A63 - SPORTS GAMES AMUSEMENTS
Information
Patent Grant
Liquid supplying device and method for draining liquid thereof
Patent number
12,208,428
Issue date
Jan 28, 2025
Ebara Corporation
Fujihiko Toyomasu
B08 - CLEANING
Information
Patent Grant
Microreplicated polishing surface with enhanced co-planarity
Patent number
12,208,483
Issue date
Jan 28, 2025
3M Innovative Properties Company
Kenneth A. P. Meyer
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical mechanical polishing apparatus and method
Patent number
12,208,487
Issue date
Jan 28, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Chun-Hsi Huang
B24 - GRINDING POLISHING
Information
Patent Grant
Coupling mechanism with spherical bearing, method of determining be...
Patent number
12,208,488
Issue date
Jan 28, 2025
Ebara Corporation
Hiroyuki Shinozaki
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate processing apparatus and substrate processing method
Patent number
12,211,733
Issue date
Jan 28, 2025
Ebara Corporation
Nobuyuki Takada
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
CHEMICAL PLANARIZATION OF NON-METALLIC MATERIALS
Publication number
20250091176
Publication date
Mar 20, 2025
CHEMPOWER CORPORATION
Sudhanshu Misra
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING COMPOSITION AND SURFACE TREATMENT METHOD
Publication number
20250092284
Publication date
Mar 20, 2025
FUJIMI INCORPORATED
Toshio SHINODA
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
SLURRY AND POLISHING METHOD
Publication number
20250084294
Publication date
Mar 13, 2025
Resonac Corporation
Satoyuki NOMURA
C01 - INORGANIC CHEMISTRY
Information
Patent Application
CHEMICAL MECHANICAL POLISHING PROCESS USING STEAM FOR POLISHING FLU...
Publication number
20250083282
Publication date
Mar 13, 2025
WESTERN DIGITAL TECHNOLOGIES, INC.,
Yohei YAMADA
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING PAD
Publication number
20250083278
Publication date
Mar 13, 2025
KURARAY CO., LTD.
Azusa SUNAYAMA
B24 - GRINDING POLISHING
Information
Patent Application
RETAINER RING MODULE AND CHEMICAL MECHANICAL POLISHING APPARATUS IN...
Publication number
20250073843
Publication date
Mar 6, 2025
Samsung Electronics Co., Ltd.
Imbi Yeo
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, AND ABNORMALITY DETERMINATION METHOD
Publication number
20250073841
Publication date
Mar 6, 2025
EBARA CORPORATION
Yoshimasa OZONE
B24 - GRINDING POLISHING
Information
Patent Application
FREE JOINT STRUCTURE, PUSH-PULL DEVICE, AND SUBSTRATE PROCESSING MO...
Publication number
20250073851
Publication date
Mar 6, 2025
EBARA CORPORATION
MATSUTARO MIYAMOTO
B24 - GRINDING POLISHING
Information
Patent Application
MULTILAYER CMP PADS
Publication number
20250073842
Publication date
Mar 6, 2025
Rajeev BAJAJ
B24 - GRINDING POLISHING
Information
Patent Application
INTEGRATED MACHINE FOR AUTOMATIC CUTTING, POLISHING, STACKING AND U...
Publication number
20250073808
Publication date
Mar 6, 2025
SOUTHWEST PETROLEUM UNIVERSITY
Yang TANG
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Application
ECO-FRIENDLY POLISHING PAD AND MANUFACTURING METHOD THEREOF
Publication number
20250065467
Publication date
Feb 27, 2025
SK enpulse Co., Ltd.
Mingyeong JI
B24 - GRINDING POLISHING
Information
Patent Application
CONTAINMENT AND EXHAUST SYSTEM FOR SUBSTRATE POLISHING COMPONENTS
Publication number
20250065473
Publication date
Feb 27, 2025
AXUS TECHNOLOGY, LLC
Daniel Ray Trojan
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING PAD AND POLISHING APPARATUS
Publication number
20250065468
Publication date
Feb 27, 2025
Canon Kabushiki Kaisha
YOSHIKI KONUMA
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE POLISHING DEVICE, SUBSTRATE PROCESSING SYSTEM AND POLISHI...
Publication number
20250065469
Publication date
Feb 27, 2025
Samsung Electronics Co., Ltd.
DONGHOON KWON
B24 - GRINDING POLISHING
Information
Patent Application
AUTOMATED SEMICONDUCTOR SUBSTRATE POLISHING AND CLEANING METHODS
Publication number
20250062148
Publication date
Feb 20, 2025
GLOBALWAFERS CO., LTD.
ShinBae Park
B08 - CLEANING
Information
Patent Application
ACOUSTIC MONITORING FOR PROCESS RELIABILITY DURING POLISHING
Publication number
20250062163
Publication date
Feb 20, 2025
Applied Materials, Inc.
Nicholas A. Wiswell
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WAVINESS PREDICTION DEVICE, WAVINESS PREDICTION METHOD, PROCESSING...
Publication number
20250058425
Publication date
Feb 20, 2025
Resonac Corporation
Shuki HASHIMOTO
B24 - GRINDING POLISHING
Information
Patent Application
LEVERAGED POROMERIC POLISHING PAD
Publication number
20250058426
Publication date
Feb 20, 2025
Rohm and Haas Electronic Materials CMP Holdings, INC.
Wei-Wen TSAI
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS FOR POLISHING, PROCESSING SYSTEM, AND METHOD OF POLISHING
Publication number
20250058431
Publication date
Feb 20, 2025
EBARA CORPORATION
Takuya MORIURA
B24 - GRINDING POLISHING
Information
Patent Application
INFORMATION PROCESSING APPARATUS, INFERENCE APPARATUS, MACHINE-LEAR...
Publication number
20250050461
Publication date
Feb 13, 2025
EBARA CORPORATION
Kenichi TAKEBUCHI
B24 - GRINDING POLISHING
Information
Patent Application
PAD CONDITIONING DISK GIMBALING CONTROL
Publication number
20250041985
Publication date
Feb 6, 2025
Applied Materials, Inc.
Justin H. WONG
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING DEVICE, POLISHING METHOD, AND COMPUTER-READABLE STORAGE M...
Publication number
20250041986
Publication date
Feb 6, 2025
SANOH INDUSTRIAL CO., LTD.
Hideo AIDA
B24 - GRINDING POLISHING
Information
Patent Application
DEVICE FOR MEASURING WAFER POLISHING AMOUNT, AND MEASUREMENT METHOD...
Publication number
20250041988
Publication date
Feb 6, 2025
SK SILTRON CO., LTD.
Sangho LEE
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS
Publication number
20250041987
Publication date
Feb 6, 2025
EBARA CORPORATION
Masaki KINOSHITA
B24 - GRINDING POLISHING
Information
Patent Application
PEDESTAL POLISHING APPARATUS
Publication number
20250041990
Publication date
Feb 6, 2025
LAM RESEARCH CORPORATION
Robert McKinney
B24 - GRINDING POLISHING
Information
Patent Application
UV CURABLE PRINTABLE FORMULATIONS FOR POROSITY CONTROL IN HIGH PERF...
Publication number
20250034296
Publication date
Jan 30, 2025
Applied Materials, Inc.
Xinyi LU
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS
Publication number
20250033159
Publication date
Jan 30, 2025
SAMSUNG ELECTRONICS CO,. LTD.
Seyun PARK
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING PAD FORMED FROM DUAL CURATIVE
Publication number
20250033161
Publication date
Jan 30, 2025
DuPont Electronic Materials Holding, Inc.
Fengji Yeh
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING PAD WITH REDUCED DEFECT AND METHOD OF PREPARING A SEMICON...
Publication number
20250033160
Publication date
Jan 30, 2025
SK enpulse Co., Ltd.
Yujin SHIN
B24 - GRINDING POLISHING
Information
Patent Application
MICROREPLICATED POLISHING PAD INCLUDING FLUORINATED POLYMER WINDOW
Publication number
20250033162
Publication date
Jan 30, 2025
3M Innovative Properties Company
Qin Lin
B24 - GRINDING POLISHING