Radiation-activated cross-linking agent containing

Industry

CPC
Y10S430/128

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/128Radiation-activated cross-linking agent containing

Industries

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition, and compound
- Patent number 9,023,584
- Issue date May 5, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive polymer, resist composition including the photosensi...
- Patent number 9,023,582
- Issue date May 5, 2015
- Samsung Display Co., Ltd.
- Sang-Jun Choi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition and patterning process
- Patent number 9,023,587
- Issue date May 5, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Film, method for manufacturing the film and masking method using th...
- Patent number 9,017,920
- Issue date Apr 28, 2015
- Shenzhen Futaihong Precision Industry Co., Ltd.
- Quan Zhou
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 9,017,922
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 8,999,624
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,986,918
- Issue date Mar 24, 2015
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,956,802
- Issue date Feb 17, 2015
- FUJIFILM Corporation
- Kaoru Iwato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hybrid photoresist composition and pattern forming method using the...
- Patent number 8,932,796
- Issue date Jan 13, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,841,060
- Issue date Sep 23, 2014
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound, photosensitive composition comprising the same and photos...
- Patent number 8,828,644
- Issue date Sep 9, 2014
- LG Chem, Ltd.
- Keon Woo Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type photosensitive resin composition and cured film manuf...
- Patent number 8,828,651
- Issue date Sep 9, 2014
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, pattern, chemical amplification resist comp...
- Patent number 8,808,965
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Patterning process and photoresist with a photodegradable base
- Patent number 8,658,344
- Issue date Feb 25, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 8,592,133
- Issue date Nov 26, 2013
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 8,586,282
- Issue date Nov 19, 2013
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of producing semiconductor device using resist underlayer fi...
- Patent number 8,227,172
- Issue date Jul 24, 2012
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Patterning process and chemical amplified photoresist with a photod...
- Patent number 8,216,767
- Issue date Jul 10, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist pattern thickening material and process for forming resist p...
- Patent number 8,198,009
- Issue date Jun 12, 2012
- Fujitsu Limited
- Miwa Kozawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition, polymer compound, method of formi...
- Patent number 8,173,349
- Issue date May 8, 2012
- FUJIFILM Corporation
- Masanori Hikita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 8,168,367
- Issue date May 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Underlayer coating forming composition for lithography containing p...
- Patent number 8,163,460
- Issue date Apr 24, 2012
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming pattern, and material for forming coating film
- Patent number 8,124,312
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for forming a pattern using the same
- Patent number 8,053,164
- Issue date Nov 8, 2011
- Samsung Electronics Co., Ltd.
- Bo-Sung Kim
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,043,795
- Issue date Oct 25, 2011
- Tokyo Ohika Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Acrylic polymer-containing gap fill material forming composition fo...
- Patent number 8,007,979
- Issue date Aug 30, 2011
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition and method of forming a photoresist pattern...
- Patent number 7,989,136
- Issue date Aug 2, 2011
- Samsung Electronics Co., Ltd.
- Jeong-Min Park
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of forming a pattern of a semiconductor device
- Patent number 7,964,332
- Issue date Jun 21, 2011
- Samsung Electronics Co., Ltd.
- Hyo-Jin Yun
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material for forming resist protective film and method for forming...
- Patent number 7,951,523
- Issue date May 31, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive hardmask for microlithography
- Patent number 7,939,244
- Issue date May 10, 2011
- Brewer Science Inc.
- Hao Xu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140212810
- Publication date Jul 31, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOSENSITIVE POLYMER, RESIST COMPOSITION INCLUDING THE PHOTOSENSI...
- Publication number 20140141372
- Publication date May 22, 2014
- Sang-Jun Choi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140080055
- Publication date Mar 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20140072916
- Publication date Mar 13, 2014
- International Business Machines Corporation
- Gregory Breyta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
NEW COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PH...
- Publication number 20140065543
- Publication date Mar 6, 2014
- LG CHEM, LTD.
- Keon Woo Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, AND COMPOUND
- Publication number 20130280658
- Publication date Oct 24, 2013
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130202999
- Publication date Aug 8, 2013
- FUJIFILM CORPORATION
- Kaoru IWATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...
- Publication number 20130160939
- Publication date Jun 27, 2013
- FIH (HONG KONG) LIMITED
- QUAN ZHOU
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...
- Publication number 20130122421
- Publication date May 16, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20130004740
- Publication date Jan 3, 2013
- FUJIFILM CORPORATION
- Shohei KATAOKA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...
- Publication number 20120288691
- Publication date Nov 15, 2012
- FUJIFILM CORPORATION
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE
- Publication number 20120264057
- Publication date Oct 18, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120183892
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120183893
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND CHEMICAL AMPLIFIED PHOTORESIST WITH A PHOTOD...
- Publication number 20110059396
- Publication date Mar 10, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST P...
- Publication number 20100305248
- Publication date Dec 2, 2010
- Fujitsu Limited
- Miwa Kozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMI...
- Publication number 20100080963
- Publication date Apr 1, 2010
- FUJIFILM CORPORATION
- Masanori HIKITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100062379
- Publication date Mar 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING A PATTERN USING THE SAME
- Publication number 20100055611
- Publication date Mar 4, 2010
- Bo-Sung Kim
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM
- Publication number 20100035177
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing semiconductor device using resist underlayer fi...
- Publication number 20100022092
- Publication date Jan 28, 2010
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20100009299
- Publication date Jan 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive hardmask for microlithography
- Publication number 20090297784
- Publication date Dec 3, 2009
- Hao Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING...
- Publication number 20090197199
- Publication date Aug 6, 2009
- Tokyo Ohka Kogyo Co., LTD.
- Keita Ishizuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE
- Publication number 20090162796
- Publication date Jun 25, 2009
- Samsung Electronics Co., Ltd.
- Hyo-Jin YUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN...
- Publication number 20090042127
- Publication date Feb 12, 2009
- Samsung Electronics Co., Ltd.
- Jeong-Min PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AMINE-ARRESTING ADDITIVES FOR MATERIALS USED IN PHOTOLITHOGRAPHIC P...
- Publication number 20090011361
- Publication date Jan 8, 2009
- Marc W. Weimer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlayer Coating Forming Composition for Lithography Containing P...
- Publication number 20080318158
- Publication date Dec 25, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Photoresist Formulation For High Aspect Ratio Plating
- Publication number 20070248896
- Publication date Oct 25, 2007
- FormFactor, Inc.
- Treliant Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cyclic compound, photoresist composition and method of forming a ph...
- Publication number 20070141511
- Publication date Jun 21, 2007
- Kyoung-Mi Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Radiation-activated cross-linking agent containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiation-sensitive composition, and compound

Photosensitive polymer, resist composition including the photosensi...

Negative resist composition and patterning process

Film, method for manufacturing the film and masking method using th...

Chemically amplified resist composition and patterning process

Developable bottom antireflective coating composition and pattern f...

Hybrid photoresist composition and pattern forming method using the...

Pattern forming method, chemical amplification resist composition a...

Hybrid photoresist composition and pattern forming method using the...

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

Compound, photosensitive composition comprising the same and photos...

Positive-type photosensitive resin composition and cured film manuf...

Pattern forming method, pattern, chemical amplification resist comp...

Patterning process and photoresist with a photodegradable base

Resist composition and patterning process

Resist composition and patterning process

Method of producing semiconductor device using resist underlayer fi...

Patterning process and chemical amplified photoresist with a photod...

Resist pattern thickening material and process for forming resist p...

Photosensitive resin composition, polymer compound, method of formi...

Resist composition and patterning process

Underlayer coating forming composition for lithography containing p...

Method for forming pattern, and material for forming coating film

Resist composition and method for forming a pattern using the same

Method of forming resist pattern

Acrylic polymer-containing gap fill material forming composition fo...

Photoresist composition and method of forming a photoresist pattern...

Methods of forming a pattern of a semiconductor device

Material for forming resist protective film and method for forming...

Photosensitive hardmask for microlithography

Patents Applicationslast 30 patents

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

PHOTOSENSITIVE POLYMER, RESIST COMPOSITION INCLUDING THE PHOTOSENSI...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

NEW COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PH...

RADIATION-SENSITIVE COMPOSITION, AND COMPOUND

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

FILM, METHOD FOR MANUFACTURING THE FILM AND MASKING METHOD USING TH...

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THE...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...

PATTERNING PROCESS AND PHOTORESIST WITH A PHOTODEGRADABLE BASE

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND CHEMICAL AMPLIFIED PHOTORESIST WITH A PHOTOD...

RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST P...

PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMI...

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING A PATTERN USING THE SAME

METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM

Method of producing semiconductor device using resist underlayer fi...

Resist composition and patterning process

Photosensitive hardmask for microlithography

MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING...

METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE

PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN...

AMINE-ARRESTING ADDITIVES FOR MATERIALS USED IN PHOTOLITHOGRAPHIC P...

Underlayer Coating Forming Composition for Lithography Containing P...

Photoresist Formulation For High Aspect Ratio Plating

Cyclic compound, photoresist composition and method of forming a ph...