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H01J2237/30438

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/30438Registration

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Patents Grantslast 30 patents

Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of preparing integrated circuits for backside pro...
- Patent number 11,605,525
- Issue date Mar 14, 2023
- FEI Company
- James Vickers
- G01 - MEASURING TESTING
Information Patent Grant
Lithography system and method for processing a target, such as a wafer
- Patent number RE49241
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Niels Vergeer
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam universal cutter
- Patent number 10,578,970
- Issue date Mar 3, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,191,376
- Issue date Jan 29, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component handling assembly and method of adjusting a component han...
- Patent number 10,157,475
- Issue date Dec 18, 2018
- Ismeca Semiconductor Holding SA
- Pierrick Abrial
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ebeam three beam aperture array
- Patent number 10,067,416
- Issue date Sep 4, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unidirectional metal on layer with ebeam
- Patent number 10,014,256
- Issue date Jul 3, 2018
- Intel Corporation
- Donald W. Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam three beam aperture array
- Patent number 9,897,908
- Issue date Feb 20, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method for processing a target, such as a wafer
- Patent number 9,760,028
- Issue date Sep 12, 2017
- Mapper Lithography IP B.V.
- Niels Vergeer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interferometer module
- Patent number 9,690,215
- Issue date Jun 27, 2017
- Mapper Lithography IP B.V.
- Guido de Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system with differential interferometer module
- Patent number 9,678,443
- Issue date Jun 13, 2017
- Mapper Lithography IP B.V.
- Guido de Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring beam position of multi charged particle beam, a...
- Patent number 9,653,262
- Issue date May 16, 2017
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam drawing apparatus
- Patent number 9,466,465
- Issue date Oct 11, 2016
- NuFlare Technology, Inc.
- Keita Ideno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,455,119
- Issue date Sep 27, 2016
- Hitachi High-Tech Science Corporation
- Makoto Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment sensor and height sensor
- Patent number 9,366,524
- Issue date Jun 14, 2016
- KLA-Tencor Corporation
- Mark A. McCord
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,336,987
- Issue date May 10, 2016
- Hitachi High-Tech Science Corporation
- Shota Torikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment of an interferometer module for use in an exposure tool
- Patent number 9,261,800
- Issue date Feb 16, 2016
- Mapper Lithography IP B.V.
- Guido de Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion sources, systems and methods
- Patent number 9,236,225
- Issue date Jan 12, 2016
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interferometer module
- Patent number 9,069,265
- Issue date Jun 30, 2015
- Mapper Lithography IP B.V.
- Guido de Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining coordinates
- Patent number 9,043,181
- Issue date May 26, 2015
- FREESCALE SEMICONDUCTOR, INC.
- Motohiko Masuda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 9,035,248
- Issue date May 19, 2015
- Canon Kabushiki Kaisha
- Naosuke Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion sources, systems and methods
- Patent number 9,012,867
- Issue date Apr 21, 2015
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam apparatus, drawing apparatus, and method of m...
- Patent number 8,847,180
- Issue date Sep 30, 2014
- Canon Kabushiki Kaisha
- Takehiko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam drawing apparatus and method of manufacturing...
- Patent number 8,766,215
- Issue date Jul 1, 2014
- Canon Kabushiki Kaisha
- Shigeo Koya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus and charged particle beam d...
- Patent number 8,748,843
- Issue date Jun 10, 2014
- Nuflare Technology, Inc.
- Kaoru Tsuruta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion sources, systems and methods
- Patent number 8,748,845
- Issue date Jun 10, 2014
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and methods for electron beam detection
- Patent number 8,692,204
- Issue date Apr 8, 2014
- KLA-Tencor Corporation
- Shinichi Kojima
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
WAFER POSITIONING METHOD AND APPARATUS
- Publication number 20240274478
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...
- Publication number 20240186109
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING METHOD, MULTI-CHARGED-PARTICLE-...
- Publication number 20230078311
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Positioning Method and Apparatus
- Publication number 20220415719
- Publication date Dec 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Positioning Method and Apparatus
- Publication number 20220415606
- Publication date Dec 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20180143526
- Publication date May 24, 2018
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE
- Publication number 20170277043
- Publication date Sep 28, 2017
- MAPPER LITHOGRAPHY IP BV
- Guido de Boer
- G01 - MEASURING TESTING
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140346349
- Publication date Nov 27, 2014
- Canon Kabushiki Kaisha
- Naosuke NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE
- Publication number 20140322654
- Publication date Oct 30, 2014
- Canon Kabushiki Kaisha
- Koichi Sentoku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20140306121
- Publication date Oct 16, 2014
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Application
Linear Stage and Metrology Architecture for Reflective Electron Bea...
- Publication number 20130342827
- Publication date Dec 26, 2013
- KLA-Tencor Corporation
- Upendra Ummethala
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR DETERMINING COORDINATES
- Publication number 20130325393
- Publication date Dec 5, 2013
- FREESCALE SEMICONDUCTOR, INC.
- Motohiko Masuda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKIN...
- Publication number 20130266894
- Publication date Oct 10, 2013
- Multibeam Corporation
- John C. Wiesner
- B82 - NANO-TECHNOLOGY
Information Patent Application
DETECTION APPARATUS, LITHOGRAPHY APPARATUS, CHARGED PARTICLE BEAM A...
- Publication number 20130265575
- Publication date Oct 10, 2013
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, DRAWING APPARATUS, AND METHOD OF M...
- Publication number 20130224662
- Publication date Aug 29, 2013
- Canon Kabushiki Kaisha
- Takehiko SUZUKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20130168569
- Publication date Jul 4, 2013
- Canon Kabushiki Kaisha
- Wataru YAMAGUCHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20130037724
- Publication date Feb 14, 2013
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING...
- Publication number 20130020502
- Publication date Jan 24, 2013
- Canon Kabushiki Kaisha
- Shigeo Koya
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHODS FOR ELECTRON BEAM DETECTION
- Publication number 20120273686
- Publication date Nov 1, 2012
- Shinichi KOJIMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
INTERFEROMETER MODULE
- Publication number 20120250026
- Publication date Oct 4, 2012
- Guido do Boer
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE
- Publication number 20120249984
- Publication date Oct 4, 2012
- Guido de Boer
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT OF AN INTERFEROMETER MODULE FOR USE IN AN EXPOSURE TOOL
- Publication number 20120250030
- Publication date Oct 4, 2012
- Guido de Boer
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING A PHOTOMASK
- Publication number 20120214092
- Publication date Aug 23, 2012
- Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20120141693
- Publication date Jun 7, 2012
- ALIS Corporation
- Billy W. Ward
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, METHOD FOR DETECTING POSITION...
- Publication number 20100237256
- Publication date Sep 23, 2010
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for correcting a position error of lithography apparatus
- Publication number 20100209831
- Publication date Aug 19, 2010
- Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...
- Publication number 20100084582
- Publication date Apr 8, 2010
- Varian Semiconductor Equipment Associates, Inc.
- D. Jeffrey LISCHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam profile measurement
- Publication number 20100072392
- Publication date Mar 25, 2010
- The Boeing Company
- Jason Andrew Koehn
- G01 - MEASURING TESTING
Information Patent Application
ION SOURCES, SYSTEMS AND METHODS
- Publication number 20090179161
- Publication date Jul 16, 2009
- ALIS Corporation
- BILLY W. WARD
- B82 - NANO-TECHNOLOGY

Registration

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-charged-particle-beam writing method, multi-charged-particle-...

Wafer positioning method and apparatus

System and method of preparing integrated circuits for backside pro...

Lithography system and method for processing a target, such as a wafer

Cross scan proximity correction with ebeam universal cutter

Ebeam universal cutter

Cross scan proximity correction with ebeam universal cutter

Component handling assembly and method of adjusting a component han...

Ebeam three beam aperture array

Unidirectional metal on layer with ebeam

Ebeam three beam aperture array

Lithography system and method for processing a target, such as a wafer

Interferometer module

Lithography system with differential interferometer module

Method of measuring beam position of multi charged particle beam, a...

Charged particle beam drawing apparatus

Charged particle beam apparatus

Alignment sensor and height sensor

Charged particle beam apparatus

Alignment of an interferometer module for use in an exposure tool

Ion sources, systems and methods

Interferometer module

Method for determining coordinates

Drawing apparatus, and method of manufacturing article

Ion sources, systems and methods

Charged particle beam apparatus, drawing apparatus, and method of m...

Charged particle beam drawing apparatus and method of manufacturing...

Charged particle beam drawing apparatus and charged particle beam d...

Ion sources, systems and methods

Apparatus and methods for electron beam detection

Patents Applicationslast 30 patents

WAFER POSITIONING METHOD AND APPARATUS

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOC...

MULTI-CHARGED-PARTICLE-BEAM WRITING METHOD, MULTI-CHARGED-PARTICLE-...

Wafer Positioning Method and Apparatus

Wafer Positioning Method and Apparatus

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

EBEAM THREE BEAM APERTURE ARRAY

LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

LITHOGRAPHY APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE

ION SOURCES, SYSTEMS AND METHODS

Linear Stage and Metrology Architecture for Reflective Electron Bea...

METHOD FOR DETERMINING COORDINATES

CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKIN...

DETECTION APPARATUS, LITHOGRAPHY APPARATUS, CHARGED PARTICLE BEAM A...

CHARGED PARTICLE BEAM APPARATUS, DRAWING APPARATUS, AND METHOD OF M...

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING...

APPARATUS AND METHODS FOR ELECTRON BEAM DETECTION

INTERFEROMETER MODULE

LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE

ALIGNMENT OF AN INTERFEROMETER MODULE FOR USE IN AN EXPOSURE TOOL

METHOD OF MANUFACTURING A PHOTOMASK

ION SOURCES, SYSTEMS AND METHODS

CHARGED PARTICLE BEAM WRITING METHOD, METHOD FOR DETECTING POSITION...

Method for correcting a position error of lithography apparatus

METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN...

Charged particle beam profile measurement

ION SOURCES, SYSTEMS AND METHODS