Scanning means

Industry

CPC
H01J37/1474

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/1474Scanning means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam apparatus with multiple detectors and methods...
- Patent number 12,142,455
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual speed acquisition for drift corrected, fast, low dose, adaptiv...
- Patent number 12,136,532
- Issue date Nov 5, 2024
- FEI Company
- Pavel Potocek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source charged particle illumination apparatus
- Patent number 12,125,671
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Stijn Wilem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and ion beam irradiati...
- Patent number 12,040,155
- Issue date Jul 16, 2024
- Kioxia Corporation
- Junichi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Beam adjustment method and three-dimensional powder bed fusion addi...
- Patent number 12,020,894
- Issue date Jun 25, 2024
- Jeol Ltd.
- Shio En
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,984,295
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission charged particle microscope with an electron energy lo...
- Patent number 11,955,310
- Issue date Apr 9, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for adjusting beam condition of charged par...
- Patent number 11,948,772
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for real time stereo imaging using multiple ele...
- Patent number 11,942,303
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed charged-particle beam system
- Patent number 11,942,302
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Arno Jan Bleeker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number RE49784
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Weiming Ren
Information Patent Grant
Objective lens system for fast scanning large FOV
- Patent number 11,837,431
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring relative rotational angle and scanning transmis...
- Patent number 11,837,433
- Issue date Dec 5, 2023
- Jeol Ltd.
- Akiho Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system, method of operating a charged particl...
- Patent number 11,810,749
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Eugen Foca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High framerate and high dynamic range electron microscopy
- Patent number 11,804,359
- Issue date Oct 31, 2023
- INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
- Ruth Bloom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle assessment tool, inspection method
- Patent number 11,798,783
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Marco Jan-Jaco Wieland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus
- Patent number 11,784,022
- Issue date Oct 10, 2023
- HITACHI HIGH-TECH CORPORATION
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multistage-connected multipole, multistage multipole unit, and char...
- Patent number 11,769,650
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Hideto Dohi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multipole unit and charged particle beam device
- Patent number 11,769,649
- Issue date Sep 26, 2023
- HITACHI HIGH-TECH CORPORATION
- Masanori Mita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,749,497
- Issue date Sep 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Shunsuke Mizutani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and analysis method
- Patent number 11,710,615
- Issue date Jul 25, 2023
- Jeol Ltd.
- Kenichi Tsutsumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for scanning a sample by a charged particle beam system
- Patent number 11,658,004
- Issue date May 23, 2023
- ASML Netherlands B.V.
- Adam Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Time-dependent defect inspection apparatus
- Patent number 11,651,935
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Chih-Yu Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam etch
- Patent number 11,646,171
- Issue date May 9, 2023
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for adjusting beam condition of charged par...
- Patent number 11,569,060
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Heated Plasma Flood Gun Sweeper
- Publication number 20240371602
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
- Publication number 20240355577
- Publication date Oct 24, 2024
- Eldico Scientific AG
- Gunther STEINFELD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
- Publication number 20240339294
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Marijke SCOTUZZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE OPTICAL DEVICE
- Publication number 20240321547
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE
- Publication number 20240297012
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Atsuko Shintani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...
- Publication number 20240290571
- Publication date Aug 29, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPERATING A PARTICLE BEAM APPARATUS
- Publication number 20240274397
- Publication date Aug 15, 2024
- CARL ZEISS MICROSCOPY GMBH
- Sebastian Schaedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LO...
- Publication number 20240258067
- Publication date Aug 1, 2024
- FEI Company
- Peter Christiaan TIEMEIJER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
- Publication number 20240249912
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM
- Publication number 20240234080
- Publication date Jul 11, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240234085
- Publication date Jul 11, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...
- Publication number 20240203684
- Publication date Jun 20, 2024
- Carl Zeiss MultiSEM GmbH
- David Disterheft
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR INSPECTION BY DEFLECTOR CONTROL IN A CHARGED...
- Publication number 20240153732
- Publication date May 9, 2024
- ASML NETHERLANDS B.V.
- Datong ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV
- Publication number 20240145209
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Analyzing Method and Analyzer
- Publication number 20240142395
- Publication date May 2, 2024
- JEOL Ltd.
- Koki Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM
- Publication number 20240136146
- Publication date Apr 25, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...
- Publication number 20240136150
- Publication date Apr 25, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN AND ELECTRON BEAM APPLICATION APPARATUS
- Publication number 20240120168
- Publication date Apr 11, 2024
- Hitachi High-Tech Corporation
- Takashi Ohshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FRAMERATE AND HIGH DYNAMIC RANGE ELECTRON MICROSCOPY
- Publication number 20240105418
- Publication date Mar 28, 2024
- Integrated Dynamic Electron Solutions, Inc.
- Ruth BLOOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS IN...
- Publication number 20240105421
- Publication date Mar 28, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM
- Publication number 20240096592
- Publication date Mar 21, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Yehuda Zur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...
- Publication number 20240079207
- Publication date Mar 7, 2024
- Carl Zeiss MultiSEM GmbH
- Michael Behnke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION DEVICE AND INSPECTION METHOD
- Publication number 20240055223
- Publication date Feb 15, 2024
- KIOXIA Corporation
- Chihiro IDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Energy Filter Assembly for Ion Implantation System with at least on...
- Publication number 20240047168
- Publication date Feb 8, 2024
- mi2-factory GmbH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM, METHOD OF OPERATING A CHARGED PARTICL...
- Publication number 20240038482
- Publication date Feb 1, 2024
- Carl Zeiss SMT GMBH
- Eugen Foca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM AND METHOD
- Publication number 20230420213
- Publication date Dec 28, 2023
- FEI Company
- Alexander HENSTRA
- H01 - BASIC ELECTRIC ELEMENTS

Scanning means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam apparatus with multiple detectors and methods...

Dual speed acquisition for drift corrected, fast, low dose, adaptiv...

Multi-source charged particle illumination apparatus

Apparatus for multiple charged-particle beams

Charged particle beam device and inspection method

Method of manufacturing semiconductor device and ion beam irradiati...

Beam adjustment method and three-dimensional powder bed fusion addi...

Particle beam apparatus, defect repair method, lithographic exposur...

Charged particle assessment tool, inspection method

Transmission charged particle microscope with an electron energy lo...

Methods and apparatuses for adjusting beam condition of charged par...

Systems and methods for real time stereo imaging using multiple ele...

Pulsed charged-particle beam system

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Objective lens system for fast scanning large FOV

Method of measuring relative rotational angle and scanning transmis...

Charged particle beam system, method of operating a charged particl...

High framerate and high dynamic range electron microscopy

Charged particle assessment tool, inspection method

Electron beam apparatus

Multistage-connected multipole, multistage multipole unit, and char...

Multipole unit and charged particle beam device

Charged particle beam apparatus

Charged particle beam device and analysis method

Method for scanning a sample by a charged particle beam system

Time-dependent defect inspection apparatus

Scanning ion beam etch

Apparatus of plural charged-particle beams

Methods and apparatuses for adjusting beam condition of charged par...

Patents Applicationslast 30 patents

Heated Plasma Flood Gun Sweeper

CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS

CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD

CHARGED-PARTICLE OPTICAL DEVICE

Device and Method for Calibrating a Charged-Particle Beam

CHARGED PARTICLE BEAM DEVICE AND INSPECTION DEVICE

CHARGED PARTICLE OPTICS, CHARGED PARTICLE BEAM APPARATUS, AND METHO...

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

OPERATING A PARTICLE BEAM APPARATUS

TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LO...

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

CHARGED PARTICLE APPARATUS AND METHOD

MULTI-BEAM PARTICLE BEAM SYSTEM

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE...

SYSTEM AND METHOD FOR INSPECTION BY DEFLECTOR CONTROL IN A CHARGED...

OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV

Analyzing Method and Analyzer

MULTI-BEAM PARTICLE BEAM SYSTEM

METHOD FOR CREATING A SMOOTH DIAGONAL SURFACE USING A FOCUSED ION B...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ELECTRON GUN AND ELECTRON BEAM APPLICATION APPARATUS

HIGH FRAMERATE AND HIGH DYNAMIC RANGE ELECTRON MICROSCOPY

ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS IN...

OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM

MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WO...

INSPECTION DEVICE AND INSPECTION METHOD

Energy Filter Assembly for Ion Implantation System with at least on...

CHARGED PARTICLE BEAM SYSTEM, METHOD OF OPERATING A CHARGED PARTICL...

FOCUSED ION BEAM SYSTEM AND METHOD