Scattering mask

Industry

CPC
H01J2237/31791

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31791Scattering mask

Industries

Patents Grantslast 30 patents

Information Patent Grant
Mask-making member and its production method, mask and its making m...
- Patent number 7,220,975
- Issue date May 22, 2007
- Sony Corporation
- Kaoru Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask-making member and its production method, mask and its making m...
- Patent number 7,126,231
- Issue date Oct 24, 2006
- Sony Corporation
- Kaoru Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask-making member and its production method, mask and its making m...
- Patent number 7,102,243
- Issue date Sep 5, 2006
- Sony Corporation
- Kaoru Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scattering-reticle assemblies for electron-beam microlithography in...
- Patent number 6,767,691
- Issue date Jul 27, 2004
- Nikon Corporation
- Shintaro Kawata
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged-particle-beam microlithography methods exhibiting reduced c...
- Patent number 6,756,182
- Issue date Jun 29, 2004
- Nikon Corporation
- Sumito Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin tantalum silicon composite film formation and annealing for us...
- Patent number 6,696,205
- Issue date Feb 24, 2004
- International Business Machines Corporation
- Cameron J. Brooks
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Scattering-reticle assemblies for electron-beam microlithography in...
- Patent number 6,620,558
- Issue date Sep 16, 2003
- Nikon Corporation
- Shintaro Kawata
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Test method of mask for electron-beam exposure and method of electr...
- Patent number 6,603,120
- Issue date Aug 5, 2003
- NEC Electronics Corporation
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of electron-beam exposure
- Patent number 6,509,127
- Issue date Jan 21, 2003
- NEC Corporation
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron guns for lithography tools
- Patent number 6,492,647
- Issue date Dec 10, 2002
- Agere Systems, INC
- Victor Katsap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam imaging apparatus
- Patent number 6,420,714
- Issue date Jul 16, 2002
- Agere Systems Guardian Corp.
- Victor Katsap
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reticles for charged-particle beam microlithography
- Patent number 6,403,268
- Issue date Jun 11, 2002
- Nikon Corporation
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, its method of formation, and a semiconductor device made thereby
- Patent number 6,355,384
- Issue date Mar 12, 2002
- Motorola, Inc.
- William J. Dauksher
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of processing a substrate utilizing specific chuck
- Patent number 5,989,760
- Issue date Nov 23, 1999
- Motorola, Inc.
- Pawitter Jit Singh Mangat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection lithography apparatus
- Patent number 5,701,014
- Issue date Dec 23, 1997
- Lucent Technologies Inc.
- Steven David Berger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for device fabrication using projection lithography and an...
- Patent number 5,561,008
- Issue date Oct 1, 1996
- Lucent Technologies Inc.
- Steven D. Berger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Proximity effect compensation in scattering-mask lithographic proje...
- Patent number 5,532,496
- Issue date Jul 2, 1996
- International Business Machines Corporation
- Charles A. Gaston
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device manufacture involving lithographic processing
- Patent number 5,258,246
- Issue date Nov 2, 1993
- AT&T Bell Laboratories
- Steven D. Berger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device manufacture involving lithographic processing
- Patent number 5,130,213
- Issue date Jul 14, 1992
- AT&T Bell Laboratories
- Steven D. Berger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device manufacture involving lithographic processing
- Patent number 5,079,112
- Issue date Jan 7, 1992
- AT&T Bell Laboratories
- Steven D. Berger
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MASK-MAKING MEMBER AND ITS PRODUCTION METHOD, MASK AND ITS MAKING M...
- Publication number 20070114450
- Publication date May 24, 2007
- Kaoru Koike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask-making member and its production method, mask and its making m...
- Publication number 20050174553
- Publication date Aug 11, 2005
- Kaoru Koike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask-making member and its production method, mask and its making m...
- Publication number 20040096755
- Publication date May 20, 2004
- Kaoru Koike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scattering-reticle assemblies for electron-beam microlithography in...
- Publication number 20040081916
- Publication date Apr 29, 2004
- NIKON CORPORATION
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged-particle-beam microlithography methods exhibiting reduced c...
- Publication number 20020187411
- Publication date Dec 12, 2002
- NIKON CORPORATION
- Sumito Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask-making member and its production method, mask and its making m...
- Publication number 20020130425
- Publication date Sep 19, 2002
- Kaoru Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin tantalum silicon composite film formation and annealing for us...
- Publication number 20020114999
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Cameron J. Brooks
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Scattering-reticle assemblies for electron-beam microlithography in...
- Publication number 20020042006
- Publication date Apr 11, 2002
- NIKON CORPORATION
- Shintaro Kawata
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Method for correcting opaque defects in reticles for charged-partic...
- Publication number 20020024011
- Publication date Feb 28, 2002
- NIKON CORPORATION
- Sumito Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Test method of mask for electron-beam exposure and method of electr...
- Publication number 20010054697
- Publication date Dec 27, 2001
- Hiroshi Yamashita
- B82 - NANO-TECHNOLOGY

Scattering mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask-making member and its production method, mask and its making m...

Mask-making member and its production method, mask and its making m...

Mask-making member and its production method, mask and its making m...

Scattering-reticle assemblies for electron-beam microlithography in...

Charged-particle-beam microlithography methods exhibiting reduced c...

Thin tantalum silicon composite film formation and annealing for us...

Scattering-reticle assemblies for electron-beam microlithography in...

Test method of mask for electron-beam exposure and method of electr...

Method of electron-beam exposure

Electron guns for lithography tools

Electron beam imaging apparatus

Reticles for charged-particle beam microlithography

Mask, its method of formation, and a semiconductor device made thereby

Method of processing a substrate utilizing specific chuck

Projection lithography apparatus

Process for device fabrication using projection lithography and an...

Proximity effect compensation in scattering-mask lithographic proje...

Device manufacture involving lithographic processing

Device manufacture involving lithographic processing

Device manufacture involving lithographic processing

Patents Applicationslast 30 patents

MASK-MAKING MEMBER AND ITS PRODUCTION METHOD, MASK AND ITS MAKING M...

Mask-making member and its production method, mask and its making m...

Mask-making member and its production method, mask and its making m...

Scattering-reticle assemblies for electron-beam microlithography in...

Charged-particle-beam microlithography methods exhibiting reduced c...

Mask-making member and its production method, mask and its making m...

Thin tantalum silicon composite film formation and annealing for us...

Scattering-reticle assemblies for electron-beam microlithography in...

Method for correcting opaque defects in reticles for charged-partic...

Test method of mask for electron-beam exposure and method of electr...