Secondary charged particle

Industry

CPC
H01J2237/2806

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2806Secondary charged particle

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,165,830
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Shichen Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and image acquiring method
- Patent number 12,148,594
- Issue date Nov 19, 2024
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-talk cancellation in multiple charged-particle beam inspection
- Patent number 12,080,513
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 12,080,515
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral recess measurement in a semiconductor specimen
- Patent number 11,921,063
- Issue date Mar 5, 2024
- Applied Materials Israel Ltd.
- Michael Chemama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,798,780
- Issue date Oct 24, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,756,763
- Issue date Sep 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Teruo Kohashi
- G01 - MEASURING TESTING
Information Patent Grant
Method of recording an image using a particle microscope
- Patent number 11,728,130
- Issue date Aug 15, 2023
- Carl Zeiss SMT GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,657,999
- Issue date May 23, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for aligning electron beams in multi-beam inspect...
- Patent number 11,614,416
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeam scanning apparatus and multibeam scanning method
- Patent number 11,569,061
- Issue date Jan 31, 2023
- Kioxia Corporation
- Osamu Nagano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and beam irradiation method
- Patent number 11,562,883
- Issue date Jan 24, 2023
- Kioxia Corporation
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Theta stage mechanism and electron beam inspection apparatus
- Patent number 11,538,658
- Issue date Dec 27, 2022
- NuFlare Technology, Inc.
- Takahiro Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging device capturing images of a sample including a plurality o...
- Patent number 11,417,499
- Issue date Aug 16, 2022
- HITACHI HIGH-TECH CORPORATION
- Maasa Yano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,398,368
- Issue date Jul 26, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,335,535
- Issue date May 17, 2022
- HITACHI HIGH-TECH CORPORATION
- Yohei Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for compensating dispersion of a beam separator...
- Patent number 11,328,894
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, apparatus, and method for determining elemental composition...
- Patent number 11,310,438
- Issue date Apr 19, 2022
- Direct Electron, LP
- Benjamin Bammes
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 11,302,514
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for image adjustment and charged particle beam system
- Patent number 11,276,552
- Issue date Mar 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Yuki Tomizawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for high dynamic range counting by pixelated d...
- Patent number 11,252,339
- Issue date Feb 15, 2022
- Direct Electron, LP
- Benjamin Bammes
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Charged particle beam device
- Patent number 11,239,052
- Issue date Feb 1, 2022
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for charged particle microscopy with improved ima...
- Patent number 11,120,969
- Issue date Sep 14, 2021
- KLA Corporation
- Doug K. Masnaghetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating a result image
- Patent number 11,092,557
- Issue date Aug 17, 2021
- Carl Zeiss Microscopy GmbH
- Luyang Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source
- Patent number 11,075,053
- Issue date Jul 27, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for the particle-optical examinatio...
- Patent number 11,049,686
- Issue date Jun 29, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20250006456
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION SYSTEM
- Publication number 20240151665
- Publication date May 9, 2024
- Hitachi High-Tech Corporation
- Yohei NAKAMURA
- G01 - MEASURING TESTING
Information Patent Application
MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...
- Publication number 20240087838
- Publication date Mar 14, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Image Acquisition Method
- Publication number 20230402252
- Publication date Dec 14, 2023
- JEOL Ltd.
- Nobuyuki Ikeo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL PATTERN INSPECTION METHOD AND FOCUSED ION BEAM APPARATUS
- Publication number 20230326714
- Publication date Oct 12, 2023
- V Technology Co., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ALIGNING ELECTRON BEAMS IN MULTI-BEAM INSPECT...
- Publication number 20230280293
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- G01 - MEASURING TESTING
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230170182
- Publication date Jun 1, 2023
- Hitachi High-Tech Corporation
- Kazufumi YACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...
- Publication number 20230037583
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERAL RECESS MEASUREMENT IN A SEMICONDUCTOR SPECIMEN
- Publication number 20230023363
- Publication date Jan 26, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Michael CHEMAMA
- G01 - MEASURING TESTING
Information Patent Application
Charged Particle Beam Apparatus and Image Acquiring Method
- Publication number 20220392738
- Publication date Dec 8, 2022
- JEOL Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD, MULTIPLE ELECTRON...
- Publication number 20220336183
- Publication date Oct 20, 2022
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Inspection Method
- Publication number 20220328279
- Publication date Oct 13, 2022
- Hitachi High-Tech Corporation
- Momoyo ENYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIBEAM SCANNING APPARATUS AND MULTIBEAM SCANNING METHOD
- Publication number 20220301814
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Osamu NAGANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20220301811
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR...
- Publication number 20220262594
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20220246393
- Publication date Aug 4, 2022
- Hitachi High-Tech Corporation
- Teruo Kohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20220246395
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN MEASUREMENT SYSTEM AND PATTERN MEASUREMENT METHOD
- Publication number 20220230842
- Publication date Jul 21, 2022
- HITACHI HIGH-TECH CORPORATION
- Wei SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20220122804
- Publication date Apr 21, 2022
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki YOKOSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THETA STAGE MECHANISM AND ELECTRON BEAM INSPECTION APPARATUS
- Publication number 20220076916
- Publication date Mar 10, 2022
- NuFlare Technology, Inc.
- Takahiro MURATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE
- Publication number 20220068589
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Imaging Device
- Publication number 20210351000
- Publication date Nov 11, 2021
- Hitachi High-Tech Corporation
- Maasa YANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...
- Publication number 20210313137
- Publication date Oct 7, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF RECORDING AN IMAGE USING A PARTICLE MICROSCOPE
- Publication number 20210296089
- Publication date Sep 23, 2021
- Carl Zeiss SMT GMBH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20210193433
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Image Adjustment and Charged Particle Beam System
- Publication number 20210183611
- Publication date Jun 17, 2021
- HITACHI HIGH-TECH CORPORATION
- Yuki TOMIZAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USE OF ELECTRON BEAM SCANNING ELECTRON MICROSCOPY FOR CHARACTERIZAT...
- Publication number 20210090852
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Ofer YULI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20210042943
- Publication date Feb 11, 2021
- Shimadzu Corporation
- Ryuta MATSUMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20210043415
- Publication date Feb 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Yohei Nakamura
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON MICROSCOPE AND BEAM IRRADIATION METHOD
- Publication number 20200411278
- Publication date Dec 31, 2020
- KIOXIA Corporation
- Takamitsu NAGAI
- H01 - BASIC ELECTRIC ELEMENTS

Secondary charged particle

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multiple charged-particle beam apparatus with low crosstalk

Charged particle beam apparatus and image acquiring method

Cross-talk cancellation in multiple charged-particle beam inspection

Apparatus for multiple charged-particle beams

Charged particle beam device and inspection method

Lateral recess measurement in a semiconductor specimen

Charged particle beam device

Scanning electron microscope

Method of recording an image using a particle microscope

Apparatus of plural charged-particle beams

Particle beam system and method for the particle-optical examinatio...

System and method for aligning electron beams in multi-beam inspect...

Multibeam scanning apparatus and multibeam scanning method

Electron microscope and beam irradiation method

Theta stage mechanism and electron beam inspection apparatus

Imaging device capturing images of a sample including a plurality o...

Apparatus of plural charged-particle beams

Charged particle beam apparatus

Systems and methods for compensating dispersion of a beam separator...

System, apparatus, and method for determining elemental composition...

Apparatus for multiple charged-particle beams

Method for image adjustment and charged particle beam system

Apparatus and method for high dynamic range counting by pixelated d...

Charged particle beam device

Apparatus of plural charged-particle beams

Method and system for charged particle microscopy with improved ima...

Method for generating a result image

Charged particle source

Apparatus of plural charged-particle beams

Particle beam system and method for the particle-optical examinatio...

Patents Applicationslast 30 patents

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

INSPECTION SYSTEM

MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...

Charged Particle Beam Device and Image Acquisition Method

METAL PATTERN INSPECTION METHOD AND FOCUSED ION BEAM APPARATUS

SYSTEM AND METHOD FOR ALIGNING ELECTRON BEAMS IN MULTI-BEAM INSPECT...

Charged Particle Beam Apparatus

APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...

LATERAL RECESS MEASUREMENT IN A SEMICONDUCTOR SPECIMEN

Charged Particle Beam Apparatus and Image Acquiring Method

MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD, MULTIPLE ELECTRON...

Charged Particle Beam Device and Inspection Method

MULTIBEAM SCANNING APPARATUS AND MULTIBEAM SCANNING METHOD

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR...

SCANNING ELECTRON MICROSCOPE

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

PATTERN MEASUREMENT SYSTEM AND PATTERN MEASUREMENT METHOD

Charged Particle Beam Device

THETA STAGE MECHANISM AND ELECTRON BEAM INSPECTION APPARATUS

CHARGED PARTICLE SOURCE

Imaging Device

PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATIO...

METHOD OF RECORDING AN IMAGE USING A PARTICLE MICROSCOPE

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Method for Image Adjustment and Charged Particle Beam System

USE OF ELECTRON BEAM SCANNING ELECTRON MICROSCOPY FOR CHARACTERIZAT...

SCANNING ELECTRON MICROSCOPE

CHARGED PARTICLE BEAM APPARATUS

ELECTRON MICROSCOPE AND BEAM IRRADIATION METHOD