Semiconductor substrate

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H01J2237/0437

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0437Semiconductor substrate

Industries

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Patents Grantslast 30 patents

Information Patent Grant
RFSOI semiconductor structures including a nitrogen-doped charge-tr...
- Patent number 11,984,477
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 11,728,123
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, multi-charged-particle beam writing apparatus...
- Patent number 11,721,520
- Issue date Aug 8, 2023
- NuFlare Technology, Inc.
- Kei Obara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma block with integrated cooling
- Patent number 11,710,630
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Tanmay P. Gurjar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 11,387,075
- Issue date Jul 12, 2022
- Oxford Instruments Nanotechnology Tools, Ltd.
- Michael Cooke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RFSOI semiconductor structures including a nitrogen-doped charge-tr...
- Patent number 11,362,176
- Issue date Jun 14, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and operating method of plasma processi...
- Patent number 11,244,803
- Issue date Feb 8, 2022
- HITACHI HIGH-TECH CORPORATION
- Keisuke Akinaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,189,554
- Issue date Nov 30, 2021
- NuFlare Technology, Inc.
- Shiro Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,183,366
- Issue date Nov 23, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam deflection device
- Patent number 11,158,483
- Issue date Oct 26, 2021
- Kabushiki Kaisha Toshiba
- Kazuya Ohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged-particle beam writing apparatus and multi-charged-par...
- Patent number 11,145,489
- Issue date Oct 12, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beams irradiation apparatus
- Patent number 11,145,485
- Issue date Oct 12, 2021
- NUFLARE TECHNOLOGY, INC.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Set of aperture substrates for multiple beams and multi charged par...
- Patent number 11,139,146
- Issue date Oct 5, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill pattern to enhance e-beam process margin
- Patent number 11,107,658
- Issue date Aug 31, 2021
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle blocking element, exposure apparatus comprising su...
- Patent number 11,101,099
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing apparatus and multiple charg...
- Patent number 10,916,406
- Issue date Feb 9, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking deflector, and multi charged particle beam writing apparat...
- Patent number 10,784,073
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,784,081
- Issue date Sep 22, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,685,809
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture set for multi-beam
- Patent number 10,658,158
- Issue date May 19, 2020
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implant system having grid assembly
- Patent number 10,636,935
- Issue date Apr 28, 2020
- Intevac, Inc.
- Babak Adibi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device, manufacturing method, and exposure apparatus
- Patent number 10,573,491
- Issue date Feb 25, 2020
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam staggered beam aperture array
- Patent number 10,386,722
- Issue date Aug 20, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam exposure method, and multi charged part...
- Patent number 10,269,532
- Issue date Apr 23, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage mechanism
- Patent number 10,256,070
- Issue date Apr 9, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems including a beam projection device providing variable expos...
- Patent number 10,115,562
- Issue date Oct 30, 2018
- Samsung Electronics Co., Ltd.
- Suyoung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagnosis method, charged particle beam lithography apparatus, and...
- Patent number 10,109,454
- Issue date Oct 23, 2018
- NuFlare Technology, Inc.
- Kei Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam exposure method, and multi charged part...
- Patent number 10,062,540
- Issue date Aug 28, 2018
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...
- Publication number 20240274659
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DETECTOR, MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, A...
- Publication number 20240071714
- Publication date Feb 29, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...
- Publication number 20240013999
- Publication date Jan 11, 2024
- NuFlare Technology, Inc.
- Toshiki KIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...
- Publication number 20230402253
- Publication date Dec 14, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20230335366
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System and Charged Particle Beam Apparatus
- Publication number 20230314128
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaya GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITI...
- Publication number 20230260748
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Kota IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...
- Publication number 20230260749
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...
- Publication number 20230055778
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY UNIT
- Publication number 20220392731
- Publication date Dec 8, 2022
- NuFlare Technology, Inc.
- Shuji YOSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS SURFACE MONITORING
- Publication number 20220380896
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...
- Publication number 20220320277
- Publication date Oct 6, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Ta WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS...
- Publication number 20220270850
- Publication date Aug 25, 2022
- NuFlare Technology, Inc.
- Kei OBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20210384002
- Publication date Dec 9, 2021
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20210358713
- Publication date Nov 18, 2021
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BLOCK WITH INTEGRATED COOLING
- Publication number 20210335603
- Publication date Oct 28, 2021
- Applied Materials, Inc.
- Tanmay P. Gurjar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND OPERATING METHOD OF PLASMA PROCESSI...
- Publication number 20210296082
- Publication date Sep 23, 2021
- Hitachi High-Tech Corporation
- Keisuke Akinaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEFLECTION DEVICE
- Publication number 20210287873
- Publication date Sep 16, 2021
- Kabushiki Kaisha Toshiba
- Kazuya OHIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD
- Publication number 20210249224
- Publication date Aug 12, 2021
- ASML NETHERLANDS B.V.
- Erwin Paul SMAKMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210013002
- Publication date Jan 14, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROCESSING APPARATUS
- Publication number 20200321192
- Publication date Oct 8, 2020
- Oxford Instruments Nanotechnology Tools Limited
- Michael Cooke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SET OF APERTURE SUBSTRATES FOR MULTIPLE BEAMS AND MULTI CHARGED PAR...
- Publication number 20200273668
- Publication date Aug 27, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20200266033
- Publication date Aug 20, 2020
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20200258716
- Publication date Aug 13, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAMS IRRADIATION APPARATUS
- Publication number 20200211812
- Publication date Jul 2, 2020
- NUFLARE TECHNOLOGY, INC.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...
- Publication number 20200194214
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20200091056
- Publication date Mar 19, 2020
- NuFlare Technology, Inc.
- Shiro Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20200043701
- Publication date Feb 6, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20190198293
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS

Semiconductor substrate

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

RFSOI semiconductor structures including a nitrogen-doped charge-tr...

Blanking aperture array unit

Charged particle blocking element, exposure apparatus comprising su...

Semiconductor device, multi-charged-particle beam writing apparatus...

Plasma block with integrated cooling

Fill pattern to enhance ebeam process margin

Surface processing apparatus

RFSOI semiconductor structures including a nitrogen-doped charge-tr...

Plasma processing apparatus and operating method of plasma processi...

Semiconductor device

Multi-beam writing method and multi-beam writing apparatus

Charged particle beam deflection device

Multi-charged-particle beam writing apparatus and multi-charged-par...

Multiple electron beams irradiation apparatus

Set of aperture substrates for multiple beams and multi charged par...

Fill pattern to enhance e-beam process margin

Charged particle blocking element, exposure apparatus comprising su...

Multiple charged particle beam writing apparatus and multiple charg...

Blanking deflector, and multi charged particle beam writing apparat...

Charged particle beam lithography apparatus and charged particle be...

Charged particle beam lithography apparatus and charged particle be...

Aperture set for multi-beam

Ion implant system having grid assembly

Device, manufacturing method, and exposure apparatus

Ebeam staggered beam aperture array

Multi charged particle beam exposure method, and multi charged part...

Stage mechanism

Systems including a beam projection device providing variable expos...

Diagnosis method, charged particle beam lithography apparatus, and...

Multi charged particle beam exposure method, and multi charged part...

Patents Applicationslast 30 patents

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...

BEAM DETECTOR, MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, A...

MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...

Multi-Beam Pattern Definition Device

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

Processing System and Charged Particle Beam Apparatus

MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITI...

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM AP...

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...

BLANKING APERTURE ARRAY UNIT

SEMICONDUCTOR PROCESS SURFACE MONITORING

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TR...

SEMICONDUCTOR DEVICE, MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS...

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

PLASMA BLOCK WITH INTEGRATED COOLING

PLASMA PROCESSING APPARATUS AND OPERATING METHOD OF PLASMA PROCESSI...

CHARGED PARTICLE BEAM DEFLECTION DEVICE

ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

SURFACE PROCESSING APPARATUS

SET OF APERTURE SUBSTRATES FOR MULTIPLE BEAMS AND MULTI CHARGED PAR...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

MULTIPLE ELECTRON BEAMS IRRADIATION APPARATUS

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SU...

SEMICONDUCTOR DEVICE

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...