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H01J37/3423

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3423Shape

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Film forming apparatus and film forming method
- Patent number 12,163,215
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Koji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target, film forming apparatus, and method of manufacturing film fo...
- Patent number 12,125,690
- Issue date Oct 22, 2024
- JSW AFTY CORPORATION
- Hironori Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 12,077,849
- Issue date Sep 3, 2024
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target product and method for producing recycled sputter...
- Patent number 12,054,822
- Issue date Aug 6, 2024
- JX Advanced Metals Corporation
- Kengo Kaminaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tilted PVD source with rotating pedestal
- Patent number 11,948,784
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Harish Penmethsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 11,862,443
- Issue date Jan 2, 2024
- Sumitomo Chemical Company, Limited
- Toshiaki Kuroda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device, method and use for the coating of lenses
- Patent number 11,842,889
- Issue date Dec 12, 2023
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus, deposition target structure, and method
- Patent number 11,823,878
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method of producing the same
- Patent number 11,629,400
- Issue date Apr 18, 2023
- Ulvac, Inc.
- Akira Nakamura
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Magnetron sputtering source and coating system arrangement
- Patent number 11,594,402
- Issue date Feb 28, 2023
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Othmar Züger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrochromic devices
- Patent number 11,592,722
- Issue date Feb 28, 2023
- View, Inc.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 11,551,918
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Kenichi Imakita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 11,532,468
- Issue date Dec 20, 2022
- Sumitomo Chemical Company, Limited
- Mikio Takigawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 11,482,404
- Issue date Oct 25, 2022
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Large-grain tin sputtering target
- Patent number 11,450,516
- Issue date Sep 20, 2022
- Honeywell International Inc.
- Marc D. Ruggiero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrically and magnetically enhanced ionized physical vapor depos...
- Patent number 11,359,274
- Issue date Jun 14, 2022
- IonQuestCorp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High throughput vacuum deposition sources and system
- Patent number 11,359,284
- Issue date Jun 14, 2022
- Ascentool, Inc.
- George Xinsheng Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,348,770
- Issue date May 31, 2022
- Keihin Ramtech Co., Ltd.
- Hiroshi Iwata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target packaging structure and method of packaging sputt...
- Patent number 11,345,533
- Issue date May 31, 2022
- Sumitomo Chemical Company, Limited
- Koji Nishioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Profiled sputtering target and method of making the same
- Patent number 11,244,815
- Issue date Feb 8, 2022
- Honeywell International Inc.
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target capable of stabilizing ignition
- Patent number 11,193,199
- Issue date Dec 7, 2021
- JX Nippon Mining & Metals Corporation
- Shuhei Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target assembly for safe and economic evaporation of brittle materials
- Patent number 11,158,491
- Issue date Oct 26, 2021
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Joerg Kerschbaumer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotatable sputtering target
- Patent number 11,094,514
- Issue date Aug 17, 2021
- OUMEIDA APPLIED MATERIALS TECHNOLOGY CO., LTD.
- I-Sheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,081,324
- Issue date Aug 3, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering cathode, sputtering cathode assembly, and sputtering app...
- Patent number 11,081,323
- Issue date Aug 3, 2021
- Keihin Ramtech Co., Ltd.
- Hiroshi Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of production of uniform metal plates and sputtering targets...
- Patent number 11,062,889
- Issue date Jul 13, 2021
- Tosoh SMD, Inc.
- Eugene Y. Ivanov
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target with backside cooling grooves
- Patent number 11,011,356
- Issue date May 18, 2021
- Applied Materials, Inc.
- Brian T. West
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processes for low pressure, cold bonding of solid lithium to metal...
- Patent number 11,001,921
- Issue date May 11, 2021
- ALBEMARLE CORPORATION
- Mark J. Hintze
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 10,984,992
- Issue date Apr 20, 2021
- JX Nippon Mining & Metals Corporation
- Shuhei Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter trap having multimodal particle size distribution
- Patent number 10,968,510
- Issue date Apr 6, 2021
- Honeywell International Inc.
- Jaeyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240263296
- Publication date Aug 8, 2024
- Chao Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING
- Publication number 20240258087
- Publication date Aug 1, 2024
- INTEVAC, INC.
- Samuel D. Harkness
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD
- Publication number 20240014019
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET AND FILM FORMING APPARATUS
- Publication number 20230369034
- Publication date Nov 16, 2023
- JSW AFTY CORPORATION
- Hironori TORII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROCHROMIC DEVICES
- Publication number 20230144179
- Publication date May 11, 2023
- VIEW, INC.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TILTED PVD SOURCE WITH ROTATING PEDESTAL
- Publication number 20230130947
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Harish PENMETHSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD
- Publication number 20230069264
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING
- Publication number 20230052340
- Publication date Feb 16, 2023
- INTELLIVATION LLC
- Michael G. Simmons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...
- Publication number 20230005724
- Publication date Jan 5, 2023
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER CO...
- Publication number 20230005725
- Publication date Jan 5, 2023
- Evatec AG
- Romeo Good
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL FILM, SPUTTERING TARGET, AND METHOD OF PRODUCING OPTICAL FILM
- Publication number 20220316049
- Publication date Oct 6, 2022
- Sumitomo Metal Mining Co., Ltd.
- Hideharu OKAMI
- G02 - OPTICS
Information Patent Application
RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME
- Publication number 20220319824
- Publication date Oct 6, 2022
- FURUYA METAL CO., LTD.
- Tomohiro MARUKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOS...
- Publication number 20220259719
- Publication date Aug 18, 2022
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMMON VACUUM SHUTTER AND PASTING MECHANISM FOR A MULTISTATION CLUS...
- Publication number 20220235453
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Kirankumar Neelasandra SAVANDAIAH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON PLASMA APPARATUS
- Publication number 20220181129
- Publication date Jun 9, 2022
- BB PLASMA DESIGN AB
- Ladislav BARDOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20220178014
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Koji MAEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME
- Publication number 20220139685
- Publication date May 5, 2022
- Honeywell International Inc.
- Shih-Yao Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TARGET, FILM FORMING APPARATUS, AND METHOD OF MANUFACTURING FILM FO...
- Publication number 20220102124
- Publication date Mar 31, 2022
- JSW AFTY Corporation
- Hironori Torii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON SPUTTERING SOURCE AND COATING SYSTEM ARRANGEMENT
- Publication number 20210375603
- Publication date Dec 2, 2021
- OERLINON SURFACCE SOLUTIONS AG, Pfaffikon
- Othmar ZÜGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210351022
- Publication date Nov 11, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High throughput Vacuum Deposition Sources and System
- Publication number 20210164099
- Publication date Jun 3, 2021
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING TARGET AND METHOD OF PRODUCING THE SAME
- Publication number 20210087672
- Publication date Mar 25, 2021
- ULVAC, Inc.
- Akira NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210082674
- Publication date Mar 18, 2021
- Keihin Ramtech Co., Ltd.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING TARGET
- Publication number 20210057196
- Publication date Feb 25, 2021
- Sumitomo Chemical Company, Limited
- Toshiaki KURODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LARGE-GRAIN TIN SPUTTERING TARGET
- Publication number 20210050194
- Publication date Feb 18, 2021
- HONEYWELL INTERNATIONAL INC.
- Marc D. Ruggiero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat-Transfer Roller for Sputtering and Method of Making the Same
- Publication number 20210050196
- Publication date Feb 18, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...
- Publication number 20210005438
- Publication date Jan 7, 2021
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20200381226
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Kenichi IMAKITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME
- Publication number 20200303173
- Publication date Sep 24, 2020
- KEIHIN RAMTECH CO., LTD.
- Hiroshi IWATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES
- Publication number 20200294778
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Brian T. WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film forming apparatus and film forming method

Target, film forming apparatus, and method of manufacturing film fo...

Electrically and magnetically enhanced ionized physical vapor depos...

Sputtering target product and method for producing recycled sputter...

Tilted PVD source with rotating pedestal

Sputtering target

Device, method and use for the coating of lenses

Deposition apparatus, deposition target structure, and method

Sputtering target and method of producing the same

Magnetron sputtering source and coating system arrangement

Electrochromic devices

Film forming apparatus

Sputtering target

Electrically and magnetically enhanced ionized physical vapor depos...

Large-grain tin sputtering target

Electrically and magnetically enhanced ionized physical vapor depos...

High throughput vacuum deposition sources and system

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Sputtering target packaging structure and method of packaging sputt...

Profiled sputtering target and method of making the same

Sputtering target capable of stabilizing ignition

Target assembly for safe and economic evaporation of brittle materials

Rotatable sputtering target

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Sputtering cathode, sputtering cathode assembly, and sputtering app...

Method of production of uniform metal plates and sputtering targets...

Sputtering target with backside cooling grooves

Processes for low pressure, cold bonding of solid lithium to metal...

Sputtering target

Sputter trap having multimodal particle size distribution

Patents Applicationslast 30 patents

SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME

CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING

DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD

TARGET AND FILM FORMING APPARATUS

ELECTROCHROMIC DEVICES

TILTED PVD SOURCE WITH ROTATING PEDESTAL

DEPOSITION APPARATUS, DEPOSITION TARGET STRUCTURE, AND METHOD

MOVABLE MAGNET ARRAY FOR MAGNETRON SPUTTERING

Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...

METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER CO...

OPTICAL FILM, SPUTTERING TARGET, AND METHOD OF PRODUCING OPTICAL FILM

RUTHENIUM-BASED SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME

ELECTRICALLY AND MAGNETICALLY ENHANCED IONIZED PHYSICAL VAPOR DEPOS...

COMMON VACUUM SHUTTER AND PASTING MECHANISM FOR A MULTISTATION CLUS...

MAGNETRON PLASMA APPARATUS

FILM FORMING APPARATUS AND FILM FORMING METHOD

PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME

TARGET, FILM FORMING APPARATUS, AND METHOD OF MANUFACTURING FILM FO...

MAGNETRON SPUTTERING SOURCE AND COATING SYSTEM ARRANGEMENT

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

High throughput Vacuum Deposition Sources and System

SPUTTERING TARGET AND METHOD OF PRODUCING THE SAME

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

SPUTTERING TARGET

LARGE-GRAIN TIN SPUTTERING TARGET

Heat-Transfer Roller for Sputtering and Method of Making the Same

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering App...

FILM FORMING APPARATUS

HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME

SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES