Shaped beam

Industry

CPC
H01J2237/31776

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31776Shaped beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device, multi-charged-particle beam writing apparatus...
- Patent number 11,721,520
- Issue date Aug 8, 2023
- NuFlare Technology, Inc.
- Kei Obara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatus and method of operating the same
- Patent number 11,467,488
- Issue date Oct 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and control method thereof
- Patent number 11,352,694
- Issue date Jun 7, 2022
- NuFlare Technology, Inc.
- Satoshi Nakahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam writing apparatus, method of adjusting beam i...
- Patent number 11,145,483
- Issue date Oct 12, 2021
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 11,127,566
- Issue date Sep 21, 2021
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of pattern data preparation and method of forming pattern in...
- Patent number 10,861,673
- Issue date Dec 8, 2020
- United Microelectronics Corp.
- Chien-Ying Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, charged particle beam writing apparatus, an...
- Patent number 10,714,312
- Issue date Jul 14, 2020
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement and inspection device
- Patent number 10,692,687
- Issue date Jun 23, 2020
- Hitachi High-Technologies Corporation
- Wen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing data generating method
- Patent number 10,685,435
- Issue date Jun 16, 2020
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Micro-electro-mechanical-systems processing method, and micro-elect...
- Patent number 10,662,059
- Issue date May 26, 2020
- Hitachi, Ltd.
- Keiji Watanabe
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number RE47922
- Issue date Mar 31, 2020
- NuFlare Technology, Inc.
- Hideo Inoue
Information Patent Grant
Method of obtaining beam deflection shape and method of obtaining a...
- Patent number 10,586,682
- Issue date Mar 10, 2020
- NuFlare Technology, Inc.
- Shunsuke Isaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration of elementary small patterns in variable-shaped-beam el...
- Patent number 10,573,492
- Issue date Feb 25, 2020
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Aurélien Fay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,504,686
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number RE47707
- Issue date Nov 5, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,468,232
- Issue date Nov 5, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,460,908
- Issue date Oct 29, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 10,431,422
- Issue date Oct 1, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and positional displacement correct...
- Patent number 10,410,830
- Issue date Sep 10, 2019
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,381,194
- Issue date Aug 13, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,325,755
- Issue date Jun 18, 2019
- NuFlare Technology, Inc.
- Seiji Wake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus, and multi charged pa...
- Patent number 10,319,564
- Issue date Jun 11, 2019
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and positional displacement correcting meth...
- Patent number 10,236,160
- Issue date Mar 19, 2019
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, systems and computer program products configured to adjust...
- Patent number 10,224,178
- Issue date Mar 5, 2019
- Samsung Electronics Co., Ltd.
- Yongseok Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for rapidly fabricating nanopatterns in a paral...
- Patent number 10,207,469
- Issue date Feb 19, 2019
- University of Houston System
- Vincent M. Donnelly
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-REA...
- Publication number 20240105420
- Publication date Mar 28, 2024
- KIOXIA Corporation
- Katsuyoshi KODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
- Publication number 20240087845
- Publication date Mar 14, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...
- Publication number 20230238209
- Publication date Jul 27, 2023
- Carl Zeiss SMT GMBH
- Nicole Auth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20220382145
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE, MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS...
- Publication number 20220270850
- Publication date Aug 25, 2022
- NuFlare Technology, Inc.
- Kei OBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adapting the Duration of Exposure Slots in Multi-Beam Writers
- Publication number 20200348597
- Publication date Nov 5, 2020
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200328060
- Publication date Oct 15, 2020
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT AND INSPECTION DEVICE
- Publication number 20190318906
- Publication date Oct 17, 2019
- Hitachi High-Technologies Corporation
- Wen LI
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...
- Publication number 20190304747
- Publication date Oct 3, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Christophe CONSTANCIAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...
- Publication number 20190172678
- Publication date Jun 6, 2019
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122857
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...
- Publication number 20190115185
- Publication date Apr 18, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING...
- Publication number 20190096632
- Publication date Mar 28, 2019
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO-ELECTRO-MECHANICAL-SYSTEMS PROCESSING METHOD, AND MICRO-ELECT...
- Publication number 20190062157
- Publication date Feb 28, 2019
- Hitachi, Ltd
- Keiji WATANABE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20190066975
- Publication date Feb 28, 2019
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20190027340
- Publication date Jan 24, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
DATA PROCESSING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...
- Publication number 20180366297
- Publication date Dec 20, 2018
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20180197717
- Publication date Jul 12, 2018
- NuFlare Technology, Inc.
- Seiji WAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PA...
- Publication number 20180114673
- Publication date Apr 26, 2018
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20180108513
- Publication date Apr 19, 2018
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods, Systems, and Computer Program Products Configured to Adjus...
- Publication number 20180082820
- Publication date Mar 22, 2018
- Yongseok JUNG
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...
- Publication number 20180076002
- Publication date Mar 15, 2018
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20180061614
- Publication date Mar 1, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS

Shaped beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and system for determining a charged particle beam exposure...

Semiconductor device, multi-charged-particle beam writing apparatus...

Semiconductor apparatus and method of operating the same

Drawing apparatus and control method thereof

Charged particle beam writing apparatus, method of adjusting beam i...

Multi charged particle beam writing apparatus and multi charged par...

Adapting the duration of exposure slots in multi-beam writers

Method and system for determining a charged particle beam exposure...

Method for projecting a beam of particles onto a substrate with cor...

Method of pattern data preparation and method of forming pattern in...

Method and system for determining a charged particle beam exposure...

Data processing method, charged particle beam writing apparatus, an...

Measurement and inspection device

Drawing data generating method

Micro-electro-mechanical-systems processing method, and micro-elect...

Charged particle beam writing apparatus and charged particle beam w...

Method of obtaining beam deflection shape and method of obtaining a...

Calibration of elementary small patterns in variable-shaped-beam el...

Charged particle beam writing method and charged particle beam writ...

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam writing apparatus and charged particle beam w...

Multi charged particle beam writing apparatus and multi charged par...

Method and system for dimensional uniformity using charged particle...

Charged particle beam apparatus and positional displacement correct...

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam lithography apparatus and charged particle be...

Multi charged particle beam writing apparatus, and multi charged pa...

Electron beam apparatus and positional displacement correcting meth...

Methods, systems and computer program products configured to adjust...

Systems and methods for rapidly fabricating nanopatterns in a paral...

Patents Applicationslast 30 patents

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-REA...

ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME

SEMICONDUCTOR DEVICE, MULTI-CHARGED-PARTICLE BEAM WRITING APPARATUS...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

Adapting the Duration of Exposure Slots in Multi-Beam Writers

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

MEASUREMENT AND INSPECTION DEVICE

METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...

METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...

CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING...

MICRO-ELECTRO-MECHANICAL-SYSTEMS PROCESSING METHOD, AND MICRO-ELECT...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

DATA PROCESSING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PA...

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

Methods, Systems, and Computer Program Products Configured to Adjus...

CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM I...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...