Source emittance characteristics

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H01J2237/065

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/065Source emittance characteristics

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number RE49483
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Charged particle source
- Patent number 11,075,053
- Issue date Jul 27, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and method
- Patent number 10,854,421
- Issue date Dec 1, 2020
- Carl Zeiss Microscopy GmbH
- Daniela Donhauser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source
- Patent number 10,468,227
- Issue date Nov 5, 2019
- Hermes-Microvision, Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gun lens design in a charged particle microscope
- Patent number 10,410,827
- Issue date Sep 10, 2019
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra broad band continuously tunable electron beam pulser
- Patent number 10,319,556
- Issue date Jun 11, 2019
- Euclid Techlabs, LLC
- Chunguang Jing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of operating same
- Patent number 10,224,176
- Issue date Mar 5, 2019
- Jeol Ltd.
- Takashi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun, control method and control program thereof, and three...
- Patent number 10,217,599
- Issue date Feb 26, 2019
- TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING
- Takashi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
System and method for increasing electron density levels in a plasm...
- Patent number 10,147,588
- Issue date Dec 4, 2018
- Lam Research Corporation
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for independent control of radical density, ion...
- Patent number 9,767,991
- Issue date Sep 19, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,673,018
- Issue date Jun 6, 2017
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number 9,653,259
- Issue date May 16, 2017
- Mapper Lithography IP B.V.
- Paul IJmert Scheffers
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrode for use in ion implantation apparatus and ion implantatio...
- Patent number 9,627,170
- Issue date Apr 18, 2017
- BOE Technology Group Co., Ltd.
- Zhiqiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number 9,613,782
- Issue date Apr 4, 2017
- Mapper Lithography IP B.V.
- Paul IJmert Scheffers
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam system and method of operating a charged part...
- Patent number 9,536,699
- Issue date Jan 3, 2017
- Carl Zeiss Microscopy, LLC
- John A. Notte
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Current regulation method of multiple beams
- Patent number 9,455,123
- Issue date Sep 27, 2016
- NuFlare Technology, Inc.
- Kenichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun, method of controlling same, and electron beam additiv...
- Patent number 9,269,520
- Issue date Feb 23, 2016
- Jeol Ltd.
- Takashi Satoh
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle beam system and method of operating a charged part...
- Patent number 9,218,935
- Issue date Dec 22, 2015
- Carl Zeiss Microscopy, LLC
- John A. Notte
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam system and method of operating a charged part...
- Patent number 9,218,934
- Issue date Dec 22, 2015
- Carl Zeiss Microscopy, LLC
- John A. Notte
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Systems and methods for a gas field ionization source
- Patent number 9,159,527
- Issue date Oct 13, 2015
- Carl Zeiss Microscopy, LLC
- Billy W. Ward
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode operating temperature adjusting method, and writing apparatus
- Patent number 9,082,586
- Issue date Jul 14, 2015
- NuFlare Technology, Inc.
- Nobuo Miyamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam apparatus
- Patent number 8,895,922
- Issue date Nov 25, 2014
- Ecole Polytechnique Federale de Lausanne (EPFL)
- Jean Berney
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particles beam apparatus and charged particles beam apparat...
- Patent number 8,809,799
- Issue date Aug 19, 2014
- Mamoru Nakasuji
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Field-emission electron gun and method for controlling same
- Patent number 8,766,542
- Issue date Jul 1, 2014
- Hitachi High-Technologies Corporation
- Boklae Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for emitter flashing
- Patent number 8,674,300
- Issue date Mar 18, 2014
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Pavel Adamec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun
- Patent number 8,669,535
- Issue date Mar 11, 2014
- Hitachi High-Technologies Corporation
- Mikio Ichihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small form factor plasma source for high density wide ribbon ion be...
- Patent number 8,590,485
- Issue date Nov 26, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electron generation and delivery system for contamination sensitive...
- Patent number 8,530,867
- Issue date Sep 10, 2013
- KLA-Tencor Corporation
- Mehran Nasser-Ghodsi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive modulation of focusing voltage in charged beam system
- Patent number 8,507,855
- Issue date Aug 13, 2013
- Applied Materials Israel, Ltd.
- Tuvia Biber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of protecting a radiation detector in a charged particle ins...
- Patent number 8,492,715
- Issue date Jul 23, 2013
- FEI Company
- Maximus Theodorus Otten
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND...
- Publication number 20240290570
- Publication date Aug 29, 2024
- Samsung Electronics Co., LTD
- Kyoungchul YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-POLARIZED SCANNING ELECTRON MICROSCOPE
- Publication number 20240249911
- Publication date Jul 25, 2024
- HITACHI HIGH-TECH CORPORATION
- Teruo KOHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...
- Publication number 20240212967
- Publication date Jun 27, 2024
- PHOTO ELECTRON SOUL INC.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20240062986
- Publication date Feb 22, 2024
- Hitachi High-Tech Corporation
- Naho TERAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUD...
- Publication number 20230352272
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Juline SHOEB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJE...
- Publication number 20230230794
- Publication date Jul 20, 2023
- PHOTO ELECTRON SOUL INC.
- Tomohiro Nishitani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE
- Publication number 20220068589
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM GENERATING DEVICE INCLUDING LIQUID METAL ION SOURCE AND ME...
- Publication number 20200152410
- Publication date May 14, 2020
- KOREA BASIC SCIENCE INSTITUTE
- Myoung Choul Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE
- Publication number 20200126753
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Source
- Publication number 20190057833
- Publication date Feb 21, 2019
- HERMES MICROVISION, INC.
- Shuai LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device for the Extraction of Electrical Charge Carriers from a Char...
- Publication number 20180294135
- Publication date Oct 11, 2018
- MEYER BURGER (GERMANY) AG
- Joachim Mai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20180005803
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR INCREASING ELECTRON DENSITY LEVELS IN A PLASM...
- Publication number 20170236694
- Publication date Aug 17, 2017
- LAM RESEARCH CORPORATION
- Kwame Eason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA BROAD BAND CONTINUOUSLY TUNABLE ELECTRON BEAM PULSER
- Publication number 20170162361
- Publication date Jun 8, 2017
- Euclid TechLabs, LLC
- Chunguang Jing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20170125216
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus of Plural Charged-Particle Beams
- Publication number 20160284505
- Publication date Sep 29, 2016
- HERMES MICROVISION INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONANT STRUCTURE FOR A PLASMA PROCESSING SYSTEM
- Publication number 20160071701
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Device
- Publication number 20150170883
- Publication date Jun 18, 2015
- SPP TECHNOLOGIES CO., LTD.
- Takashi Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A BEAMLET POSITION AND METHOD FOR DETERMININ...
- Publication number 20150155136
- Publication date Jun 4, 2015
- MAPPER LITHOGRAPHY IP BV
- Paul IJmert Scheffers
- G01 - MEASURING TESTING
Information Patent Application
Substrate Treating Apparatus and Method
- Publication number 20150136734
- Publication date May 21, 2015
- PSK INC.
- Hee Sun Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING A CHARGED PART...
- Publication number 20150008332
- Publication date Jan 8, 2015
- Carl Zeiss Microscopy, LLC
- John A. Notte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURRENT REGULATION METHOD OF MULTIPLE BEAMS
- Publication number 20140265827
- Publication date Sep 18, 2014
- NuFlare Technology, Inc.
- Kenichi SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, AND WRITING APPARATUS
- Publication number 20140239200
- Publication date Aug 28, 2014
- NuFlare Technology, Inc.
- Nobuo MIYAMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged practicles beam apparatus and charged particles beam appara...
- Publication number 20140097352
- Publication date Apr 10, 2014
- Mamoru Nakasuji
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140065549
- Publication date Mar 6, 2014
- Canon Kabushiki Kaisha
- Takahiro Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM APPARATUS
- Publication number 20130341527
- Publication date Dec 26, 2013
- ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE
- Jean Berney
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME
- Publication number 20130200788
- Publication date Aug 8, 2013
- Hitachi High-Technologies Corporation
- Boklae Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determination of Emission Parameters from Field Emission Sources
- Publication number 20130187058
- Publication date Jul 25, 2013
- FEI Company
- Lynwood W. Swanson
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME
- Publication number 20130063029
- Publication date Mar 14, 2013
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR FAST DISCHARGING OF AN INSPECTED OBJECT
- Publication number 20130026362
- Publication date Jan 31, 2013
- Tuvia Biber
- H01 - BASIC ELECTRIC ELEMENTS

Source emittance characteristics

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for determining a beamlet position and method for determinin...

Charged particle source

Charged particle beam system and method

Charged particle source

Gun lens design in a charged particle microscope

Ultra broad band continuously tunable electron beam pulser

Electron microscope and method of operating same

Electron gun, control method and control program thereof, and three...

System and method for increasing electron density levels in a plasm...

Methods and systems for independent control of radical density, ion...

Charged particle beam writing apparatus and charged particle beam w...

Method for determining a beamlet position and method for determinin...

Electrode for use in ion implantation apparatus and ion implantatio...

Method for determining a beamlet position and method for determinin...

Charged particle beam system and method of operating a charged part...

Current regulation method of multiple beams

Electron gun, method of controlling same, and electron beam additiv...

Charged particle beam system and method of operating a charged part...

Charged particle beam system and method of operating a charged part...

Systems and methods for a gas field ionization source

Cathode operating temperature adjusting method, and writing apparatus

Electron beam apparatus

Charged particles beam apparatus and charged particles beam apparat...

Field-emission electron gun and method for controlling same

Feedback loop for emitter flashing

Electron gun

Small form factor plasma source for high density wide ribbon ion be...

Electron generation and delivery system for contamination sensitive...

Inductive modulation of focusing voltage in charged beam system

Method of protecting a radiation detector in a charged particle ins...

Patents Applicationslast 30 patents

REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND...

SPIN-POLARIZED SCANNING ELECTRON MICROSCOPE

ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELEC...

Charged Particle Beam Device

SYSTEMS FOR CONTROLLING PLASMA DENSITY DISTRIBUTION PROFILES INCLUD...

ELECTRON GUN, ELECTRON RAY APPLYING DEVICE, AND ELECTRON BEAM PROJE...

CHARGED PARTICLE SOURCE

ION BEAM GENERATING DEVICE INCLUDING LIQUID METAL ION SOURCE AND ME...

CHARGED PARTICLE SOURCE

Charged Particle Source

Device for the Extraction of Electrical Charge Carriers from a Char...

Methods and Systems for Independent Control of Radical Density, Ion...

SYSTEM AND METHOD FOR INCREASING ELECTRON DENSITY LEVELS IN A PLASM...

ULTRA BROAD BAND CONTINUOUSLY TUNABLE ELECTRON BEAM PULSER

Methods and Systems for Independent Control of Radical Density, Ion...

Apparatus of Plural Charged-Particle Beams

RESONANT STRUCTURE FOR A PLASMA PROCESSING SYSTEM

Plasma Etching Device

METHOD FOR DETERMINING A BEAMLET POSITION AND METHOD FOR DETERMININ...

Substrate Treating Apparatus and Method

CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING A CHARGED PART...

CURRENT REGULATION METHOD OF MULTIPLE BEAMS

CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, AND WRITING APPARATUS

Charged practicles beam apparatus and charged particles beam appara...

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

ELECTRON BEAM APPARATUS

FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME

Determination of Emission Parameters from Field Emission Sources

CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME

SYSTEM AND METHOD FOR FAST DISCHARGING OF AN INSPECTED OBJECT