Space charge (Boersch) effect compensation

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CPC
H01J2237/1538

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/1538Space charge (Boersch) effect compensation

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Patents Grantslast 30 patents

Information Patent Grant
Fill pattern to enhance ebeam process margin
- Patent number 11,581,162
- Issue date Feb 14, 2023
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam inspection of ungrounded samples
- Patent number 11,448,607
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Chiyan Kuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and devices for examining an electrically charged specimen...
- Patent number 11,170,970
- Issue date Nov 9, 2021
- Carl Zeiss SMT GmbH
- Michael Budach
- G01 - MEASURING TESTING
Information Patent Grant
Fill pattern to enhance e-beam process margin
- Patent number 11,107,658
- Issue date Aug 31, 2021
- Intel Corporation
- Shakul Tandon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for use in electron microscopy
- Patent number 10,170,272
- Issue date Jan 1, 2019
- Technion Research & Development Foundation Limited
- Ido Kaminer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,618,480
- Issue date Dec 31, 2013
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam irradiation device and method for suppressing ion beam div...
- Patent number 8,461,548
- Issue date Jun 11, 2013
- Nissin ION Equipment Co., Ltd.
- Dan Nicolaescu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and method of correcting deviation angle...
- Patent number 8,008,630
- Issue date Aug 30, 2011
- Nissin Ion Equipment Co., Ltd.
- Takatoshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation with diminished scanning field effects
- Patent number 8,008,636
- Issue date Aug 30, 2011
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam lithography apparatus and device manufacturin...
- Patent number 7,960,703
- Issue date Jun 14, 2011
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion implantation apparatus
- Patent number 7,888,652
- Issue date Feb 15, 2011
- Nissin Ion Equipment Co., Ltd.
- Hideki Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection electronic microscope for reducing geometric aberration...
- Patent number 7,855,364
- Issue date Dec 21, 2010
- Ebara Corporation
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monochromator and radiation source with monochromator
- Patent number 7,745,783
- Issue date Jun 29, 2010
- CEOS Corrected Electron Optical Systems GmbH
- Stephan Uhlemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double stage charged particle beam energy width reduction system fo...
- Patent number 7,679,054
- Issue date Mar 16, 2010
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Jürgen Frosien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection method, method of manufacturing semiconductor...
- Patent number 7,645,988
- Issue date Jan 12, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection electron microscope, electron microscope, specimen surfa...
- Patent number 7,456,401
- Issue date Nov 25, 2008
- Nikon Corporation
- Erika Kanematsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron imaging beam with reduced space charge defocusing
- Patent number 7,391,034
- Issue date Jun 24, 2008
- KLA-Tencor Technologies Corporation
- Kirk J. Bertsche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system
- Patent number 6,815,698
- Issue date Nov 9, 2004
- Kabushiki Kaisha Toshiba
- Osamu Nagano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam microlithography apparatus and methods includ...
- Patent number 6,630,681
- Issue date Oct 7, 2003
- Nikon Corporation
- Shinichi Kojima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN
- Publication number 20210358713
- Publication date Nov 18, 2021
- Intel Corporation
- Shakul TANDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS AND METHOD
- Publication number 20140131589
- Publication date May 15, 2014
- Advantest Corporation
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20130277554
- Publication date Oct 24, 2013
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM IRRADIATION DEVICE AND METHOD FOR SUPPRESSING ION BEAM DIV...
- Publication number 20120085918
- Publication date Apr 12, 2012
- KYOTO UNIVERSITY
- Dan Nicolaescu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION WITH DIMINISHED SCANNING FIELD EFFECTS
- Publication number 20100155623
- Publication date Jun 24, 2010
- Axcelis Technologies, Inc.
- Edward C. Eisner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTING APPARATUS AND ION BEAM DEFLECTION ANGLE CORRECTING M...
- Publication number 20090289193
- Publication date Nov 26, 2009
- NISSIN ION EQUIPMENT CO., LTD.
- Takatoshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURIN...
- Publication number 20090057571
- Publication date Mar 5, 2009
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Monochromator and radiation source with monochromator
- Publication number 20080290273
- Publication date Nov 27, 2008
- CEOS Corrected Electron Optical Systems GmbH
- Stephan Uhlemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROJECTION ELECTRONIC MICROSCOPE FOR REDUCING GEOMETRIC ABERRATION...
- Publication number 20080121820
- Publication date May 29, 2008
- EBARA CORPORATION
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS
- Publication number 20080121822
- Publication date May 29, 2008
- NISSIN ION EQUIPMENT CO., LTD.
- Hideki Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double Stage Charged Particle Beam Energy Width Reduction System Fo...
- Publication number 20070200069
- Publication date Aug 30, 2007
- Jürgen Frosien
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection electron microscope, electron microscope, specimen surfa...
- Publication number 20070164217
- Publication date Jul 19, 2007
- Erika Kanematsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection method, method of manufacturing semiconductor...
- Publication number 20050263701
- Publication date Dec 1, 2005
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam exposure system
- Publication number 20020033458
- Publication date Mar 21, 2002
- Osamu Nagano
- B82 - NANO-TECHNOLOGY

Space charge (Boersch) effect compensation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Fill pattern to enhance ebeam process margin

Charged particle beam inspection of ungrounded samples

Methods and devices for examining an electrically charged specimen...

Fill pattern to enhance e-beam process margin

System and method for use in electron microscopy

Charged particle beam apparatus

Ion beam irradiation device and method for suppressing ion beam div...

Ion implantation apparatus and method of correcting deviation angle...

Ion implantation with diminished scanning field effects

Charged-particle beam lithography apparatus and device manufacturin...

Ion implantation apparatus

Projection electronic microscope for reducing geometric aberration...

Monochromator and radiation source with monochromator

Double stage charged particle beam energy width reduction system fo...

Substrate inspection method, method of manufacturing semiconductor...

Projection electron microscope, electron microscope, specimen surfa...

Electron imaging beam with reduced space charge defocusing

Charged particle beam exposure system

Charged-particle-beam microlithography apparatus and methods includ...

Patents Applicationslast 30 patents

FILL PATTERN TO ENHANCE EBEAM PROCESS MARGIN

ELECTRON BEAM EXPOSURE APPARATUS AND METHOD

Charged Particle Beam Apparatus

ION BEAM IRRADIATION DEVICE AND METHOD FOR SUPPRESSING ION BEAM DIV...

ION IMPLANTATION WITH DIMINISHED SCANNING FIELD EFFECTS

ION IMPLANTING APPARATUS AND ION BEAM DEFLECTION ANGLE CORRECTING M...

CHARGED-PARTICLE BEAM LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURIN...

Monochromator and radiation source with monochromator

PROJECTION ELECTRONIC MICROSCOPE FOR REDUCING GEOMETRIC ABERRATION...

ION IMPLANTATION APPARATUS

Double Stage Charged Particle Beam Energy Width Reduction System Fo...

Projection electron microscope, electron microscope, specimen surfa...

Substrate inspection method, method of manufacturing semiconductor...

Charged particle beam exposure system