specially adapted for the UV

Industry

CPC
G02B17/0892

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G02Optics G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS G02B17/00Systems with reflecting surfaces, with or without refracting elements

Current Industry

G02B17/0892specially adapted for the UV

Industries

Patents Grantslast 30 patents

Information Patent Grant
Illumination apparatus
- Patent number 12,066,611
- Issue date Aug 20, 2024
- Optovate Limited
- Graham J. Woodgate
- F21 - LIGHTING
Information Patent Grant
Catadioptric lens and optical system comprising such a lens
- Patent number 11,561,381
- Issue date Jan 24, 2023
- Carl Zeiss SMT GmbH
- Konstantin Forcht
- G02 - OPTICS
Information Patent Grant
EUV lithography system with diffraction optics
- Patent number 11,520,235
- Issue date Dec 6, 2022
- Kenneth Carlisle Johnson
- G02 - OPTICS
Information Patent Grant
Catadioptric lens and optical system comprising such a lens
- Patent number 11,520,130
- Issue date Dec 6, 2022
- Carl Zeiss SMT GmbH
- Konstantin Forcht
- G02 - OPTICS
Information Patent Grant
Illumination apparatus
- Patent number 11,422,344
- Issue date Aug 23, 2022
- Optovate Limited
- Graham J. Woodgate
- F21 - LIGHTING
Information Patent Grant
Optical arrangement for EUV lithography
- Patent number 11,372,335
- Issue date Jun 28, 2022
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection lens and method for producing same
- Patent number 11,360,293
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G02 - OPTICS
Information Patent Grant
Magnification compensation and/or beam steering in optical systems
- Patent number 11,209,635
- Issue date Dec 28, 2021
- SUSS MICROTEC PHOTONIC SYSTEMS INC.
- Yanrong Yuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical distortion reduction in projection systems
- Patent number 11,175,487
- Issue date Nov 16, 2021
- SUSS MICROTEC PHOTONIC SYSTEMS INC.
- Paul Ferrari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical lithography system for patterning semiconductor devices and...
- Patent number 11,143,965
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catadioptric medical imaging system for observing the inside wall o...
- Patent number 11,042,014
- Issue date Jun 22, 2021
- Leica Instruments (Singapore) Pte. Ltd.
- George Themelis
- G02 - OPTICS
Information Patent Grant
Plasma source with lamp house correction
- Patent number 10,823,943
- Issue date Nov 3, 2020
- KLA Corporation
- Shiyu Zhang
- G01 - MEASURING TESTING
Information Patent Grant
Wafer defect inspection and review systems
- Patent number 10,656,098
- Issue date May 19, 2020
- KLA-Tencor Corporation
- Shiyu Zhang
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,578,976
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Magnification compensation and/or beam steering in optical systems
- Patent number 10,539,770
- Issue date Jan 21, 2020
- SUSS MICROTEC PHOTONIC SYSTEMS INC.
- Yanrong Yuan
- G02 - OPTICS
Information Patent Grant
Catadioptric imaging systems for digital scanner
- Patent number 10,488,638
- Issue date Nov 26, 2019
- Nikon Corporation
- David M. Williamson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
193nm laser and inspection system
- Patent number 10,439,355
- Issue date Oct 8, 2019
- KLA-Tencor Corporation
- Yung-Ho Chuang
- G01 - MEASURING TESTING
Information Patent Grant
Hollow light integrator for light emitting diode digital micromirro...
- Patent number 10,409,045
- Issue date Sep 10, 2019
- Innovations In Optics, Inc.
- Thomas John Brukilacchio
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Wavefront correction element for use in an optical system
- Patent number 10,151,922
- Issue date Dec 11, 2018
- Carl Zeiss SMT GmbH
- Matus Banyay
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,146,137
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Broadband catadioptric microscope objective with small central obsc...
- Patent number 10,139,610
- Issue date Nov 27, 2018
- Nikon Corporation
- David M. Williamson
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective comprising deflection mirrors and...
- Patent number 10,120,176
- Issue date Nov 6, 2018
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 10,101,668
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective
- Patent number 10,042,146
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Light emitting diode digital micromirror device illuminator
- Patent number 9,971,135
- Issue date May 15, 2018
- Innovations In Optics, Inc.
- Thomas John Brukilacchio
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Illumination system of a microlithographic projection exposure appa...
- Patent number 9,933,706
- Issue date Apr 3, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
193nm laser and inspection system
- Patent number 9,935,421
- Issue date Apr 3, 2018
- KLA-Tencor Corporation
- Yung-Ho Chuang
- G02 - OPTICS
Information Patent Grant
Optical component
- Patent number 9,915,872
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Johannes Eisenmenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 9,891,539
- Issue date Feb 13, 2018
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMAGING SYSTEM
- Publication number 20240337819
- Publication date Oct 10, 2024
- AAC Optics Solutions Pte. Ltd.
- Jesper Falden Offersgaard
- G02 - OPTICS
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
Illumination apparatus
- Publication number 20230003985
- Publication date Jan 5, 2023
- Optovate Limited
- Graham J. WOODGATE
- F21 - LIGHTING
Information Patent Application
EUV Lithography System with Diffraction Optics
- Publication number 20220107568
- Publication date Apr 7, 2022
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT FOR EUV LITHOGRAPHY
- Publication number 20210003926
- Publication date Jan 7, 2021
- Carl Zeiss SMT GMBH
- Anastasia GONCHAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS
- Publication number 20200355896
- Publication date Nov 12, 2020
- OPTOVATE LIMITED
- Graham J. WOODGATE
- G02 - OPTICS
Information Patent Application
Optical Lithography System for Patterning Semiconductor Devices and...
- Publication number 20200348601
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- G02 - OPTICS
Information Patent Application
OPTICAL DISTORTION REDUCTION IN PROJECTION SYSTEMS
- Publication number 20200225454
- Publication date Jul 16, 2020
- SUSS MicroTec Photonic Systems Inc.
- Paul Ferrari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS
- Publication number 20200150409
- Publication date May 14, 2020
- SUSS MicroTec Photonic Systems Inc.
- Yanrong Yuan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma Source with Lamp House Correction
- Publication number 20200041774
- Publication date Feb 6, 2020
- KLA-Tencor Corporation
- Shiyu Zhang
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC LENS AND OPTICAL SYSTEM COMPRISING SUCH A LENS
- Publication number 20190369374
- Publication date Dec 5, 2019
- Carl Zeiss SMT GMBH
- Konstantin Forcht
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC MEDICAL IMAGING SYSTEM FOR OBSERVING THE INSIDE WALL O...
- Publication number 20190278069
- Publication date Sep 12, 2019
- LEICA INSTRUMENTS (SINGAPORE) PTE. LTD.
- George THEMELIS
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20190101832
- Publication date Apr 4, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...
- Publication number 20190056576
- Publication date Feb 21, 2019
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20180373006
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS
- Publication number 20180364463
- Publication date Dec 20, 2018
- SUSS Micro Tec Photonic Systems Inc.
- Yanrong Yuan
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20180314165
- Publication date Nov 1, 2018
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BROADBAND CATADIOPTRIC MICROSCOPE OBJECTIVE WITH SMALL CENTRAL OBSC...
- Publication number 20180275387
- Publication date Sep 27, 2018
- Nikon Corporation
- David M. Williamson
- G02 - OPTICS
Information Patent Application
HOLLOW LIGHT INTEGRATOR FOR LIGHT EMITTING DIODE DIGITAL MICROMIRRO...
- Publication number 20180239120
- Publication date Aug 23, 2018
- INNOVATIONS IN OPTICS, INC.
- Thomas John Brukilacchio
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...
- Publication number 20180095259
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20180095258
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM
- Publication number 20180059413
- Publication date Mar 1, 2018
- Carl Zeiss SMT GMBH
- Matus BANYAY
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES
- Publication number 20180031815
- Publication date Feb 1, 2018
- Carl Zeiss SMT GMBH
- David Shafer
- G02 - OPTICS
Information Patent Application
Catadioptric Projection Objective With Intermediate Images
- Publication number 20170363963
- Publication date Dec 21, 2017
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC IMAGING SYSTEMS FOR DIGITAL SCANNER
- Publication number 20170307863
- Publication date Oct 26, 2017
- Nikon Corporation
- David M. Williamson
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20170261861
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G02 - OPTICS
Information Patent Application
LIGHT EMITTING DIODE DIGITAL MICROMIRROR DEVICE ILLUMINATOR
- Publication number 20170131531
- Publication date May 11, 2017
- INNOVATIONS IN OPTICS, INC.
- Thomas John Brukilacchio
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...
- Publication number 20170052355
- Publication date Feb 23, 2017
- Carl Zeiss SMT GMBH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20160231546
- Publication date Aug 11, 2016
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS

specially adapted for the UV

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Illumination apparatus

Catadioptric lens and optical system comprising such a lens

EUV lithography system with diffraction optics

Catadioptric lens and optical system comprising such a lens

Illumination apparatus

Optical arrangement for EUV lithography

Catadioptric projection lens and method for producing same

Magnification compensation and/or beam steering in optical systems

Optical distortion reduction in projection systems

Optical lithography system for patterning semiconductor devices and...

Catadioptric medical imaging system for observing the inside wall o...

Plasma source with lamp house correction

Wafer defect inspection and review systems

Catadioptric projection objective including a reflective optical co...

Magnification compensation and/or beam steering in optical systems

Catadioptric imaging systems for digital scanner

193nm laser and inspection system

Hollow light integrator for light emitting diode digital micromirro...

Wavefront correction element for use in an optical system

Catadioptric projection objective including a reflective optical co...

Broadband catadioptric microscope objective with small central obsc...

Catadioptric projection objective comprising deflection mirrors and...

Chromatically corrected objective with specifically structured and...

Catadioptric projection objective

Projection lens for EUV microlithography, film element and method f...

Light emitting diode digital micromirror device illuminator

Illumination system of a microlithographic projection exposure appa...

193nm laser and inspection system

Optical component

Projection optical system, exposure apparatus, and exposure method

Patents Applicationslast 30 patents

IMAGING SYSTEM

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

Illumination apparatus

EUV Lithography System with Diffraction Optics

OPTICAL ARRANGEMENT FOR EUV LITHOGRAPHY

ILLUMINATION APPARATUS

Optical Lithography System for Patterning Semiconductor Devices and...

OPTICAL DISTORTION REDUCTION IN PROJECTION SYSTEMS

MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS

Plasma Source with Lamp House Correction

CATADIOPTRIC LENS AND OPTICAL SYSTEM COMPRISING SUCH A LENS

CATADIOPTRIC MEDICAL IMAGING SYSTEM FOR OBSERVING THE INSIDE WALL O...

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...

CATADIOPTRIC PROJECTION OBJECTIVE

MAGNIFICATION COMPENSATION AND/OR BEAM STEERING IN OPTICAL SYSTEMS

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

BROADBAND CATADIOPTRIC MICROSCOPE OBJECTIVE WITH SMALL CENTRAL OBSC...

HOLLOW LIGHT INTEGRATOR FOR LIGHT EMITTING DIODE DIGITAL MICROMIRRO...

CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...

CATADIOPTRIC PROJECTION OBJECTIVE

WAVEFRONT CORRECTION ELEMENT FOR USE IN AN OPTICAL SYSTEM

CATADIOPTRIC PROJECTION OBJECTIVE WITH PARALLEL, OFFSET OPTICAL AXES

Catadioptric Projection Objective With Intermediate Images

CATADIOPTRIC IMAGING SYSTEMS FOR DIGITAL SCANNER

Projection Lens for EUV Microlithography, Film Element and Method f...

ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

LIGHT EMITTING DIODE DIGITAL MICROMIRROR DEVICE ILLUMINATOR

CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND...

CATADIOPTRIC PROJECTION OBJECTIVE