Spectral analysis

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CPC
H01J37/32972

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32972Spectral analysis

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Window for plasma OES diagnosis, and plasma apparatus using same
- Patent number 12,154,769
- Issue date Nov 26, 2024
- KOREA INSTITUTE OF FUSION ENERGY
- Kang Il Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber for an optical emission spectroscopy instrument
- Patent number 12,148,599
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH ANALYTICAL SCIENCE GMBH
- André Peters
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small gas flow monitoring of dry etcher by OES signal
- Patent number 12,142,494
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Lung Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 12,100,578
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Sho Kumakura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Low open area and coupon endpoint detection
- Patent number 12,080,574
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,074,076
- Issue date Aug 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and hardware for post maintenance vacuum recovery system
- Patent number 12,072,267
- Issue date Aug 27, 2024
- Applied Materials, Inc.
- Martin A. Hilkene
- C30 - CRYSTAL GROWTH
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and vacuum processing method
- Patent number 12,062,530
- Issue date Aug 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen peroxide plasma etch of ashable hard mask
- Patent number 12,057,320
- Issue date Aug 6, 2024
- RASIRO, Inc.
- Jeffrey J. Spiegelman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for cleaning off d...
- Patent number 12,051,572
- Issue date Jul 30, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Wulin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film, in-situ measurement through transparent crystal and tran...
- Patent number 12,009,191
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Grant
Real-time detection of particulate matter during deposition chamber...
- Patent number 12,002,665
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber condition and process state monitoring using opt...
- Patent number 12,000,041
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Grant
Measuring device, measuring method, and vacuum processing apparatus
- Patent number 12,002,666
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 11,961,721
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glow plasma gas measurement signal processing
- Patent number 11,948,774
- Issue date Apr 2, 2024
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting or monitoring for a chemical precursor in a...
- Patent number 11,939,673
- Issue date Mar 26, 2024
- ASM IP Holding B.V.
- John Kevin Shugrue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,887,825
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Mikio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Feedback system
- Patent number 11,875,979
- Issue date Jan 16, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,854,775
- Issue date Dec 26, 2023
- Board of Trustees of Michigan State University
- Timothy A. Grotjohn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for photomask processing
- Patent number 11,803,118
- Issue date Oct 31, 2023
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
Probe for measuring plasma parameters
- Patent number 11,800,627
- Issue date Oct 24, 2023
- Ruhr-Universität Bochum
- Dennis Pohle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma observation system and plasma observation method
- Patent number 11,749,511
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Ryoji Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming plasma processing apparatus, related apparatus, a...
- Patent number 11,715,628
- Issue date Aug 1, 2023
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS ANALYSIS DEVICE AND CONTROL METHOD
- Publication number 20250006476
- Publication date Jan 2, 2025
- ATONARP INC.
- Hirofumi NAGAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW OPEN AREA AND COUPON ENDPOINT DETECTION
- Publication number 20240429077
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW OPEN AREA AND COUPON ENDPOINT DETECTION
- Publication number 20240420975
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Varoujan Chakarian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL
- Publication number 20240379387
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240377256
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Yunsong Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING DEVICE
- Publication number 20240363319
- Publication date Oct 31, 2024
- Dah Young Vacuum Equipment Co., Ltd.
- Tzu-Hou Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANOMALOUS PLASMA EVENT DETECTION AND MITIGATION IN SEMICONDUCTOR PR...
- Publication number 20240355600
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced OES Characterization
- Publication number 20240339309
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA SURFACE TREATMENT
- Publication number 20240331983
- Publication date Oct 3, 2024
- PLASMAPP CO., LTD.
- You Bong LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20240304430
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240297027
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS
- Publication number 20240290591
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- G01 - MEASURING TESTING
Information Patent Application
PLASMA MONITORING SYSTEM
- Publication number 20240290590
- Publication date Aug 29, 2024
- SAMSUNG DISPLAY CO., LTD.
- YOUNGGIL PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...
- Publication number 20240290592
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Patrick Tae
- G01 - MEASURING TESTING
Information Patent Application
PLASMA DENSITY MEASUREMENT SENSOR, APPARATUS FOR MEASURING REAL-TIM...
- Publication number 20240274418
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Sungho Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM AND METHOD OF MONITORING PLASMA
- Publication number 20240274419
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Kwangho LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258129
- Publication date Aug 1, 2024
- Lam Reseach Corporation
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258130
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258131
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
Method for OES Data Collection and Endpoint Detection
- Publication number 20240234111
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT
- Publication number 20240234110
- Publication date Jul 11, 2024
- Hitachi High-Tech Analytical Science GmbH
- André PETERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE ANALYSIS OF PLASMA CONDITIONS
- Publication number 20240234112
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Michal Danek
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20240222100
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Shan HU
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240213004
- Publication date Jun 27, 2024
- Hitachi High-Tech Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST GAS SWITCHING
- Publication number 20240203695
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Toan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA ANALYSIS APPARATUS, AND SEMICONDU...
- Publication number 20240203712
- Publication date Jun 20, 2024
- Hitachi High-Tech Corporation
- Shunta NOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DIAGNOSIS OF PLASMA SYSTEM
- Publication number 20240203713
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM
- Publication number 20240203714
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Yunsong JEONG
- H01 - BASIC ELECTRIC ELEMENTS

Spectral analysis

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cover with a sensor system for a configurable measuring system for...

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Window for plasma OES diagnosis, and plasma apparatus using same

Plasma chamber for an optical emission spectroscopy instrument

Small gas flow monitoring of dry etcher by OES signal

Substrate processing method

Low open area and coupon endpoint detection

Plasma processing apparatus and prediction method of the condition...

Plasma processing apparatus and plasma processing method

Method and hardware for post maintenance vacuum recovery system

Plasma processing apparatus and control method

Vacuum processing apparatus and vacuum processing method

Hydrogen peroxide plasma etch of ashable hard mask

Semiconductor manufacturing apparatus and method for cleaning off d...

Optical system for monitoring plasma reactions and reactors

Thin film, in-situ measurement through transparent crystal and tran...

Real-time detection of particulate matter during deposition chamber...

Processing chamber condition and process state monitoring using opt...

Measuring device, measuring method, and vacuum processing apparatus

Normal-incidence in-situ process monitor sensor

Glow plasma gas measurement signal processing

Apparatus for detecting or monitoring for a chemical precursor in a...

Plasma processing method

Control method and plasma processing apparatus

Feedback system

Methods and apparatus for microwave plasma assisted chemical vapor...

Methods and apparatus for photomask processing

Probe for measuring plasma parameters

Plasma observation system and plasma observation method

Method of forming plasma processing apparatus, related apparatus, a...

Patents Applicationslast 30 patents

GAS ANALYSIS DEVICE AND CONTROL METHOD

LOW OPEN AREA AND COUPON ENDPOINT DETECTION

LOW OPEN AREA AND COUPON ENDPOINT DETECTION

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

Metrology Enclosure Including Spectral Reflectometry System for Pla...

SMALL GAS FLOW MONITORING OF DRY ETCHER BY OES SIGNAL

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

PLASMA MONITORING DEVICE

ANOMALOUS PLASMA EVENT DETECTION AND MITIGATION IN SEMICONDUCTOR PR...

Advanced OES Characterization

APPARATUS FOR PLASMA SURFACE TREATMENT

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS

PLASMA MONITORING SYSTEM

THIN FILM, IN-SITU MEASUREMENT THROUGH TRANSPARENT CRYSTAL AND TRAN...

PLASMA DENSITY MEASUREMENT SENSOR, APPARATUS FOR MEASURING REAL-TIM...

PLASMA MONITORING SYSTEM AND METHOD OF MONITORING PLASMA

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

Method for OES Data Collection and Endpoint Detection

PLASMA CHAMBER FOR AN OPTICAL EMISSION SPECTROSCOPY INSTRUMENT

IMAGE ANALYSIS OF PLASMA CONDITIONS

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

FAST GAS SWITCHING

PLASMA PROCESSING APPARATUS, DATA ANALYSIS APPARATUS, AND SEMICONDU...

IN-SITU DIAGNOSIS OF PLASMA SYSTEM

PLASMA MONITORING SYSTEM