Sputtering

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CPC
Y10S148/158

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

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Y10S148/158Sputtering

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Patents Grantslast 30 patents

Information Patent Grant
Hafnium alloy target
- Patent number 8,262,816
- Issue date Sep 11, 2012
- JX Nippon Mining & Metals Corporation
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Hafnium alloy target
- Patent number 8,241,438
- Issue date Aug 14, 2012
- JX Nippon Mining & Metals Corporation
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Hafnium alloy target and process for producing the same
- Patent number 8,062,440
- Issue date Nov 22, 2011
- JX Nippon Mining & Metals Corporation
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
High purity tantalum, products containing the same, and methods of...
- Patent number 7,585,380
- Issue date Sep 8, 2009
- Cabot Corporation
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Hafnium alloy target and process for producing the same
- Patent number 7,459,036
- Issue date Dec 2, 2008
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
High purity tantalum, products containing the same, and methods of...
- Patent number 7,431,782
- Issue date Oct 7, 2008
- Cabot Corporation
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
High purity tantalum, products containing the same, and methods of...
- Patent number 6,893,513
- Issue date May 17, 2005
- Cabot Corporation
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Silicide target for depositing less embrittling gate oxide and meth...
- Patent number 6,723,183
- Issue date Apr 20, 2004
- Nikko Materials Company, Limited
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High purity tantalum, products containing the same, and methods of...
- Patent number 6,348,113
- Issue date Feb 19, 2002
- Cabot Corporation
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Fine grain tantalum sputtering target and fabrication process
- Patent number 6,193,821
- Issue date Feb 27, 2001
- Tosoh SMD, Inc.
- Hao Zhang
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Method of making low magnetic permeability cobalt sputter targets
- Patent number 6,176,944
- Issue date Jan 23, 2001
- Praxair S.T. Technology, Inc.
- Alfred Snowman
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Method for fabricating monolithic and monocrystalline all-semicondu...
- Patent number 5,840,589
- Issue date Nov 24, 1998
- Raymond M. Warner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication method
- Patent number 5,441,616
- Issue date Aug 15, 1995
- AT&T Corp.
- Arun K. Nanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making reliable selective via fills
- Patent number 5,366,929
- Issue date Nov 22, 1994
- Cypress Semiconductor Corp.
- James M. Cleeves
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a monocrystalline film having a closed loop step...
- Patent number 5,362,672
- Issue date Nov 8, 1994
- OHMI Tadahiro
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication method
- Patent number 5,312,780
- Issue date May 17, 1994
- AT&T Bell Laboratories
- Arun K. Nanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device and method for manufacturing the same
- Patent number 5,306,669
- Issue date Apr 26, 1994
- Sumitomo Electric Industries, Ltd.
- Mitsuaki Fujihira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a semiconductor device having a tantalum thin...
- Patent number 5,281,554
- Issue date Jan 25, 1994
- Sharp Kabushiki Kaisha
- Yasunori Shimada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for filling submicron spaces with dielectric
- Patent number 5,270,264
- Issue date Dec 14, 1993
- Intel Corporation
- Ebrahim Andideh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device whereby a layer cont...
- Patent number 5,266,524
- Issue date Nov 30, 1993
- U.S. Philips Corp.
- Robertus A. M. Wolters
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor film and a semiconductor de...
- Patent number 5,236,850
- Issue date Aug 17, 1993
- Semiconductor Energy Laboratory Co., Ltd.
- Hongyong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device and method for manufacturing the same
- Patent number 5,196,918
- Issue date Mar 23, 1993
- Sumitomo Electric Industries, Ltd.
- Mitsuaki Fujihira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of sputtering a mixture of hexagonal boron nitride and stain...
- Patent number 5,192,409
- Issue date Mar 9, 1993
- National Research Institute For Metals
- Masahiro Tosa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating semiconductor device including an Al/TiN/Ti c...
- Patent number 5,155,063
- Issue date Oct 13, 1992
- NEC Corporation
- Nobukazu Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implantation profile control with surface sputtering
- Patent number 5,080,730
- Issue date Jan 14, 1992
- Ibis Technology Corporation
- Andrew B. Wittkower
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming electrodes for semiconductor devices by focused...
- Patent number 5,043,290
- Issue date Aug 27, 1991
- Mitsubishi Denki Kabushiki Kaisha
- Tadashi Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming electrodes for semiconductor devices using focu...
- Patent number 4,962,059
- Issue date Oct 9, 1990
- Mitsubishi Denki Kabushiki Kaisha
- Tadashi Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing the surface reflectance of a metal layer during...
- Patent number 4,933,304
- Issue date Jun 12, 1990
- SGS-Thomson Microelectronics, Inc.
- Fusen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming electrodes for semiconductor devices using focu...
- Patent number 4,853,341
- Issue date Aug 1, 1989
- Mitsubishi Denki Kabushiki Kaisha
- Tadashi Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a trench filled with an insulating material...
- Patent number 4,839,306
- Issue date Jun 13, 1989
- Oki Electric Industry Co., Ltd.
- Hidetoshi Wakamatsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Hafnium Alloy Target and Process for Producing the Same
- Publication number 20090057142
- Publication date Mar 5, 2009
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Hafnium Alloy Target and Process for Producing the Same
- Publication number 20090050475
- Publication date Feb 26, 2009
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Hafnium Alloy Target and Process for Producing the Same
- Publication number 20090000704
- Publication date Jan 1, 2009
- Nippon Mining & Metals Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Hafnium alloy target and process for producing the same
- Publication number 20060189164
- Publication date Aug 24, 2006
- Nikko Materials Co., Ltd.
- Takeo Okabe
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
High purity tantalum, products containing the same, and methods of...
- Publication number 20030168131
- Publication date Sep 11, 2003
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
High purity tantalum, products containing the same, and methods of...
- Publication number 20030037847
- Publication date Feb 27, 2003
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Silicide target for depositing less embrittling gate oxide and meth...
- Publication number 20020179195
- Publication date Dec 5, 2002
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High purity tantalum, products containing the same, and methods of...
- Publication number 20020026965
- Publication date Mar 7, 2002
- Christopher A. Michaluk
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Hafnium alloy target

Hafnium alloy target

Hafnium alloy target and process for producing the same

High purity tantalum, products containing the same, and methods of...

Hafnium alloy target and process for producing the same

High purity tantalum, products containing the same, and methods of...

High purity tantalum, products containing the same, and methods of...

Silicide target for depositing less embrittling gate oxide and meth...

High purity tantalum, products containing the same, and methods of...

Fine grain tantalum sputtering target and fabrication process

Method of making low magnetic permeability cobalt sputter targets

Method for fabricating monolithic and monocrystalline all-semicondu...

Integrated circuit fabrication method

Method for making reliable selective via fills

Method of forming a monocrystalline film having a closed loop step...

Integrated circuit fabrication method

Integrated circuit device and method for manufacturing the same

Method for producing a semiconductor device having a tantalum thin...

Process for filling submicron spaces with dielectric

Method of manufacturing a semiconductor device whereby a layer cont...

Method of manufacturing a semiconductor film and a semiconductor de...

Integrated circuit device and method for manufacturing the same

Method of sputtering a mixture of hexagonal boron nitride and stain...

Method of fabricating semiconductor device including an Al/TiN/Ti c...

Implantation profile control with surface sputtering

Process for forming electrodes for semiconductor devices by focused...

Process for forming electrodes for semiconductor devices using focu...

Method for reducing the surface reflectance of a metal layer during...

Process for forming electrodes for semiconductor devices using focu...

Method of manufacturing a trench filled with an insulating material...

Patents Applicationslast 30 patents

Hafnium Alloy Target and Process for Producing the Same

Hafnium Alloy Target and Process for Producing the Same

Hafnium Alloy Target and Process for Producing the Same

Hafnium alloy target and process for producing the same

High purity tantalum, products containing the same, and methods of...

High purity tantalum, products containing the same, and methods of...

Silicide target for depositing less embrittling gate oxide and meth...

High purity tantalum, products containing the same, and methods of...