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CPC
C08F212/14

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CCHEMISTRY METALLURGY C08Organic compounds C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring

Current Industry

C08F212/14substituted by heteroatoms or groups containing heteroatoms

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mixtures of aminosilyl-functionalized styrenes, their preparation a...
- Patent number 12,110,303
- Issue date Oct 8, 2024
- SYNTHOS S.A.
- Maria Siolek-Komorek
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Antireflective film including a photoresist material containing a p...
- Patent number 11,762,127
- Issue date Sep 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition
- Patent number 11,739,215
- Issue date Aug 29, 2023
- Zeon Corporation
- Takaaki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,681,224
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Random copolymer, laminate, and method for forming pattern
- Patent number 11,643,488
- Issue date May 9, 2023
- SK Innovation Co., Ltd.
- Nam Kyu Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Molded product comprising polarized olefin-based polymer and proper...
- Patent number 11,535,688
- Issue date Dec 27, 2022
- Riken
- Haobing Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,500,289
- Issue date Nov 15, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 11,385,542
- Issue date Jul 12, 2022
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,372,329
- Issue date Jun 28, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilizing styrenic polymer for quantum dots
- Patent number 11,345,849
- Issue date May 31, 2022
- 3M Innovative Properties Company
- Carl A. Laskowski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Imidazoles and imidazolium cations with exceptional alkaline stability
- Patent number 11,242,432
- Issue date Feb 8, 2022
- Cornell University
- Geoffrey W. Coates
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 11,231,650
- Issue date Jan 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photo-imprinting curable composition and pattern transferring metho...
- Patent number 11,226,553
- Issue date Jan 18, 2022
- DIC Corporation
- Takeshi Ibe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer compound for conductive polymer and method for producing same
- Patent number 11,208,509
- Issue date Dec 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 11,204,551
- Issue date Dec 21, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,198,748
- Issue date Dec 14, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,181,823
- Issue date Nov 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Conductive polymer capacitor for improved reliability
- Patent number 11,177,076
- Issue date Nov 16, 2021
- KEMET Electronics Corporation
- Ajaykumar Bunha
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Block copolymer
- Patent number 11,155,666
- Issue date Oct 26, 2021
- LG Chem, Ltd.
- No Jin Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilizing styrenic polymer for quantum dots
- Patent number 11,149,194
- Issue date Oct 19, 2021
- 3M Innovative Properties Company
- Carl A. Laskowski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hydroxyaryl functionalized polymers
- Patent number 11,117,987
- Issue date Sep 14, 2021
- Bridgestone Corporation
- Xiao-Dong Pan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Conductive polymer dispersion for improved reliability
- Patent number 11,101,077
- Issue date Aug 24, 2021
- KEMET Electronics Corporation
- Ajaykumar Bunha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the synthesis of a copolymer, copolymer, rubber mixture,...
- Patent number 11,098,145
- Issue date Aug 24, 2021
- Continental Reifen Deutschland GmbH
- Katharina Herzog
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Pattern forming method, under coating agent, and laminate
- Patent number 11,066,571
- Issue date Jul 20, 2021
- Oji Holdings Corporation
- Kazuyo Morita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Random copolymer, laminate, and method for forming pattern
- Patent number 11,054,747
- Issue date Jul 6, 2021
- SK Innovation Co., Ltd.
- Nam Kyu Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hydroxyaryl functionalized polymers
- Patent number 11,028,195
- Issue date Jun 8, 2021
- Bridgestone Corporation
- Xiao-Dong Pan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Impact resistant flame retardant polyhexahydrotriazine polymers via...
- Patent number 11,008,422
- Issue date May 18, 2021
- International Business Machines Corporation
- Brandon M. Kobilka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,003,074
- Issue date May 11, 2021
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition, method of forming resist pattern, and polymer c...
- Patent number 10,976,661
- Issue date Apr 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...
- Publication number 20230348351
- Publication date Nov 2, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MOLDED PRODUCT COMPRISING POLARIZED OLEFIN-BASED POLYMER AND PROPER...
- Publication number 20230110760
- Publication date Apr 13, 2023
- Riken
- Haobing WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Random Copolymer, Laminate, and Method for Forming Pattern
- Publication number 20210389673
- Publication date Dec 16, 2021
- SK INNOVATION CO., LTD.
- Nam Kyu Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...
- Publication number 20210232047
- Publication date Jul 29, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CROSSLINKED SYNTHETIC POLYMER-BASED RESERVOIR DRILLING FLUID
- Publication number 20210222048
- Publication date Jul 22, 2021
- SCHLUMBERGER TECHNOLOGY CORPORATION
- Balakrishnan Panamarathupalayam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ANTIREFLECTIVE FILM INCLUDING A PHOTORESIST MATERIAL CONTAINING A P...
- Publication number 20210096285
- Publication date Apr 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Random Copolymer for Forming Neutral Layer, Laminate for Forming Pa...
- Publication number 20210018843
- Publication date Jan 21, 2021
- SK INNOVATION CO., LTD.
- Nam Kyu Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Conductive Polymer Dispersion for Improved Reliability
- Publication number 20210005396
- Publication date Jan 7, 2021
- Kemet Electronics Corporation
- Ajaykumar Bunha
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION COMPRISING THERMOASSOCIATIVE AND EXCHANGEABLE COPOLYMERS
- Publication number 20200399415
- Publication date Dec 24, 2020
- TOTAL MARKETING SERVICES
- Gregory DESCROIX
- C10 - PETROLEUM, GAS OR COKE INDUSTRIES TECHNICAL GASES CONTAINING CARBON MON...
Information Patent Application
METHOD AND APPARATUS FOR PRODUCING CHELATE RESIN, AND METHOD FOR PU...
- Publication number 20200369795
- Publication date Nov 26, 2020
- ORGANO CORPORATION
- Yasuhiro YOSHIMURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Conductive Polymer Dispersion for Improved Reliability
- Publication number 20200357577
- Publication date Nov 12, 2020
- Kemet Electronics Corporation
- Ajaykumar Bunha
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME
- Publication number 20200291145
- Publication date Sep 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20200192221
- Publication date Jun 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20200159116
- Publication date May 21, 2020
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200142303
- Publication date May 7, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIFUNCTIONAL POLY(ALKYLENEOXIDES) WITH AMINOALKYL AND UNSATURATED T...
- Publication number 20200115498
- Publication date Apr 16, 2020
- Gelest Technologies, Inc.
- Barry C. ARKLES
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200089112
- Publication date Mar 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20200081341
- Publication date Mar 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200064735
- Publication date Feb 27, 2020
- Sumitomo Chemical Company, Limited
- Mutsuko HIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, UNDER COATING AGENT, AND LAMINATE
- Publication number 20200048491
- Publication date Feb 13, 2020
- OJI HOLDINGS CORPORATION
- Kazuyo MORITA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BLOCK COPOLYMER AND PREPARATION METHOD AND APPLICATION THEREOF
- Publication number 20200040119
- Publication date Feb 6, 2020
- Fudan University
- Hai DENG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200019058
- Publication date Jan 16, 2020
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190384174
- Publication date Dec 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190384175
- Publication date Dec 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20190361348
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...
- Publication number 20190361347
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
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METHODS FOR MODULATING SIGNAL INTENSITY IN INTERACTION ASSAYS
- Publication number 20190346439
- Publication date Nov 14, 2019
- Roche Diagnostics Operations, Inc.
- Georg Kurz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Hydroxyaryl Functionalized Polymers
- Publication number 20190322777
- Publication date Oct 24, 2019
- Bridgestone Corporation
- Xiao-Dong Pan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Conductive Polymer Dispersion for Improved Reliability
- Publication number 20190311857
- Publication date Oct 10, 2019
- Kemet Electronics Corporation
- Ajaykumar Bunha
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMOPLASTIC MODACRYLIC RESIN COMPOSITION, METHOD FOR MANUFACTURIN...
- Publication number 20190300675
- Publication date Oct 3, 2019
- Kaneka Corporation
- Masato Fujita
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING

substituted by heteroatoms or groups containing heteroatoms

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mixtures of aminosilyl-functionalized styrenes, their preparation a...

Antireflective film including a photoresist material containing a p...

Photosensitive resin composition

Resin, resist composition and method for producing resist pattern

Random copolymer, laminate, and method for forming pattern

Molded product comprising polarized olefin-based polymer and proper...

Positive resist composition and pattern forming process

Iodonium salt, resist composition, and pattern forming process

Salt, quencher, resist composition and method for producing resist...

Resist composition and method of forming resist pattern

Stabilizing styrenic polymer for quantum dots

Imidazoles and imidazolium cations with exceptional alkaline stability

Chemically amplified negative resist composition and resist pattern...

Photo-imprinting curable composition and pattern transferring metho...

Polymer compound for conductive polymer and method for producing same

Resist composition and method for forming resist pattern

Resin, resist composition and method for producing resist pattern

Resist composition and patterning process

Conductive polymer capacitor for improved reliability

Block copolymer

Stabilizing styrenic polymer for quantum dots

Hydroxyaryl functionalized polymers

Conductive polymer dispersion for improved reliability

Method for the synthesis of a copolymer, copolymer, rubber mixture,...

Pattern forming method, under coating agent, and laminate

Random copolymer, laminate, and method for forming pattern

Hydroxyaryl functionalized polymers

Impact resistant flame retardant polyhexahydrotriazine polymers via...

Pattern formation methods and photoresist pattern overcoat composit...

Resist composition, method of forming resist pattern, and polymer c...

Patents Applicationslast 30 patents

COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...

MOLDED PRODUCT COMPRISING POLARIZED OLEFIN-BASED POLYMER AND PROPER...

Random Copolymer, Laminate, and Method for Forming Pattern

PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...

CROSSLINKED SYNTHETIC POLYMER-BASED RESERVOIR DRILLING FLUID

ANTIREFLECTIVE FILM INCLUDING A PHOTORESIST MATERIAL CONTAINING A P...

Random Copolymer for Forming Neutral Layer, Laminate for Forming Pa...

Conductive Polymer Dispersion for Improved Reliability

COMPOSITION COMPRISING THERMOASSOCIATIVE AND EXCHANGEABLE COPOLYMERS

METHOD AND APPARATUS FOR PRODUCING CHELATE RESIN, AND METHOD FOR PU...

Conductive Polymer Dispersion for Improved Reliability

POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

BIFUNCTIONAL POLY(ALKYLENEOXIDES) WITH AMINOALKYL AND UNSATURATED T...

RESIST COMPOSITION AND PATTERNING PROCESS

IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PATTERN FORMING METHOD, UNDER COATING AGENT, AND LAMINATE

BLOCK COPOLYMER AND PREPARATION METHOD AND APPLICATION THEREOF

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...

METHODS FOR MODULATING SIGNAL INTENSITY IN INTERACTION ASSAYS

Hydroxyaryl Functionalized Polymers

Conductive Polymer Dispersion for Improved Reliability

THERMOPLASTIC MODACRYLIC RESIN COMPOSITION, METHOD FOR MANUFACTURIN...