Sulfur compound containing

Industry

CPC
Y10S430/122

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

Current Industry

Y10S430/122Sulfur compound containing

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 10,310,375
- Issue date Jun 4, 2019
- Kenneth E Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 9,606,435
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sulfonium salt-containing polymer, resist composition, patterning p...
- Patent number 9,233,919
- Issue date Jan 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions
- Patent number 9,146,467
- Issue date Sep 29, 2015
- Merck Patent GmbH
- Francis Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium derivatives and the use therof as latent acids
- Patent number 9,005,871
- Issue date Apr 14, 2015
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymeric compound, acid generator, resist composition, a...
- Patent number 9,005,874
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,005,872
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,993,210
- Issue date Mar 31, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing sulfonic acid salts, photo-acid generator and r...
- Patent number 8,993,212
- Issue date Mar 31, 2015
- Central Glass Company, Limited
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming process and resist compostion
- Patent number 8,980,527
- Issue date Mar 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 8,975,002
- Issue date Mar 10, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,968,980
- Issue date Mar 3, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 8,940,471
- Issue date Jan 27, 2015
- FUJIFILM Corporation
- Takeshi Kawabata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,940,473
- Issue date Jan 27, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoacid generators
- Patent number 8,932,797
- Issue date Jan 13, 2015
- Dow Global Technologies LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,921,027
- Issue date Dec 30, 2014
- JSR Corporation
- Ryuichi Serizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,921,029
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,916,333
- Issue date Dec 23, 2014
- JSR Corporation
- Hiroshi Tomioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,906,589
- Issue date Dec 9, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,906,591
- Issue date Dec 9, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable photoacid generators
- Patent number 8,900,792
- Issue date Dec 2, 2014
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,900,791
- Issue date Dec 2, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,895,222
- Issue date Nov 25, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, photoresist composition, and method for producing photoresist...
- Patent number 8,889,333
- Issue date Nov 18, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and radiation-sensitive acid...
- Patent number 8,889,336
- Issue date Nov 18, 2014
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20140356790
- Publication date Dec 4, 2014
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Photoacid Generators And Lithographic Resists Comprising The Same
- Publication number 20140315130
- Publication date Oct 23, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...
- Publication number 20140296561
- Publication date Oct 2, 2014
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...
- Publication number 20130337384
- Publication date Dec 19, 2013
- FUJIFILM CORPORATION
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...
- Publication number 20130260316
- Publication date Oct 3, 2013
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COATING COMPOSITIONS
- Publication number 20130236833
- Publication date Sep 12, 2013
- AZ Electronic Materials USA Corp.
- Francis HOULIHAN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...
- Publication number 20130209938
- Publication date Aug 15, 2013
- CENTRAL GLASS COMPANY, LTD
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING PROCESS AND RESIST COMPOSTION
- Publication number 20130183621
- Publication date Jul 18, 2013
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photosensitive Resin Composition And Cured Product Thereof
- Publication number 20130108961
- Publication date May 2, 2013
- NIPPON KAYAKU KABUSHIKI KAISHA
- Misato Oonishi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130022926
- Publication date Jan 24, 2013
- JSR Corporation
- Hiroshi Tomioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017489
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017490
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017491
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011788
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011790
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011792
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011793
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011786
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011794
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011787
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011789
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011795
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION US...
- Publication number 20120308920
- Publication date Dec 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Daisuke DOMON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20120292286
- Publication date Nov 22, 2012
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, A...
- Publication number 20120270155
- Publication date Oct 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120264061
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY

Sulfur compound containing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generators and lithographic resists comprising the same

Method for manufacturing micro-structure and optically patternable...

Sulfonium salt-containing polymer, resist composition, patterning p...

Coating compositions

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, novel compoun...

Sulfonium derivatives and the use therof as latent acids

Compound, polymeric compound, acid generator, resist composition, a...

Resist composition and method of forming resist pattern

Salt and photoresist composition containing the same

Fluorine-containing sulfonic acid salts, photo-acid generator and r...

Pattern forming process and resist compostion

Positive resist composition and method of forming resist pattern

Positive resist composition for immersion exposure and pattern form...

Radiation-sensitive resin composition and compound

Actinic-ray- or radiation-sensitive resin composition and method of...

Resist composition and method for producing resist pattern

Photoacid generators

Radiation-sensitive resin composition

Resist composition and method for producing resist pattern

Radiation-sensitive resin composition

Salt and photoresist composition comprising the same

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Polymerizable photoacid generators

Actinic ray-sensitive or radiation-sensitive resin composition and...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Salt, photoresist composition, and method for producing photoresist...

Radiation-sensitive resin composition and radiation-sensitive acid...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

Photoacid Generators And Lithographic Resists Comprising The Same

SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING P...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORM...

RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID...

COATING COMPOSITIONS

Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...

PATTERN FORMING PROCESS AND RESIST COMPOSTION

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Photosensitive Resin Composition And Cured Product Thereof

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION US...

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, A...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...