Sulfur in heterocyclic ring

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CPC
Y10S430/123

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S430/00Radiation imagery chemistry: process, composition, or product thereof

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Y10S430/123Sulfur in heterocyclic ring

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Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 10,310,375
- Issue date Jun 4, 2019
- Kenneth E Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 9,606,435
- Issue date Mar 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium derivatives and the use therof as latent acids
- Patent number 9,005,871
- Issue date Apr 14, 2015
- BASF SE
- Hitoshi Yamato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,005,872
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,993,210
- Issue date Mar 31, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-containing sulfonic acid salts, photo-acid generator and r...
- Patent number 8,993,212
- Issue date Mar 31, 2015
- Central Glass Company, Limited
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators
- Patent number 8,932,797
- Issue date Jan 13, 2015
- Dow Global Technologies LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, resist composition and method for producing resist pattern
- Patent number 8,921,028
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,921,029
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,906,591
- Issue date Dec 9, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable photoacid generators
- Patent number 8,900,792
- Issue date Dec 2, 2014
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, photoresist composition, and method for producing photoresist...
- Patent number 8,889,333
- Issue date Nov 18, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition for fabricating probe array, method of fabr...
- Patent number 8,871,423
- Issue date Oct 28, 2014
- Samsung Electronics Co., Ltd.
- Hyo-Jin Yun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,871,429
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,852,846
- Issue date Oct 7, 2014
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,852,845
- Issue date Oct 7, 2014
- FUJIFILM Corporation
- Hidenori Takahashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,846,293
- Issue date Sep 30, 2014
- FUJIFILM Corporation
- Yusuke Iizuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, and new compound
- Patent number 8,846,291
- Issue date Sep 30, 2014
- Tokyo Ohka Kogyo Co. Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for manufacturing micro-structure and optically patternable...
- Patent number 8,835,091
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sulfonium salt, polymer, chemically amplified resist composition us...
- Patent number 8,835,097
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,735,044
- Issue date May 27, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 8,685,616
- Issue date Apr 1, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,663,901
- Issue date Mar 4, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,658,345
- Issue date Feb 25, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for negative tone development and pattern formin...
- Patent number 8,642,253
- Issue date Feb 4, 2014
- FUJIFILM Incorporated
- Hideaki Tsubaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, chemically amplified positive resist composition and patte...
- Patent number 8,632,939
- Issue date Jan 21, 2014
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-free fused ring heteroaromatic photoacid generators and re...
- Patent number 8,628,910
- Issue date Jan 14, 2014
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20140356790
- Publication date Dec 4, 2014
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Photoacid Generators And Lithographic Resists Comprising The Same
- Publication number 20140315130
- Publication date Oct 23, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...
- Publication number 20130209938
- Publication date Aug 15, 2013
- CENTRAL GLASS COMPANY, LTD
- Ryozo Takihana
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017489
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017490
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130017491
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011788
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011790
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011792
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011793
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011786
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011794
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011787
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011789
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...
- Publication number 20130011795
- Publication date Jan 10, 2013
- International Business Machines Corporation
- Sen Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION US...
- Publication number 20120308920
- Publication date Dec 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Daisuke DOMON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...
- Publication number 20120292286
- Publication date Nov 22, 2012
- Yoshinori HIRANO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20120264060
- Publication date Oct 18, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120258403
- Publication date Oct 11, 2012
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120251948
- Publication date Oct 4, 2012
- FUJIFILM CORPORATION
- Yusuke IIZUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120231392
- Publication date Sep 13, 2012
- Sumitomo Chemical Company, Limited
- Satoshi YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219906
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219912
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120214101
- Publication date Aug 23, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIZABLE PHOTOACID GENERATORS
- Publication number 20120171616
- Publication date Jul 5, 2012
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20120164580
- Publication date Jun 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND
- Publication number 20120148955
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATORS
- Publication number 20120141939
- Publication date Jun 7, 2012
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY

Sulfur in heterocyclic ring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoacid generators and lithographic resists comprising the same

Method for manufacturing micro-structure and optically patternable...

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition and method of forming resist pattern

Sulfonium derivatives and the use therof as latent acids

Resist composition and method of forming resist pattern

Salt and photoresist composition containing the same

Fluorine-containing sulfonic acid salts, photo-acid generator and r...

Photoacid generators

Salt, resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Polymerizable photoacid generators

Salt, photoresist composition, and method for producing photoresist...

Photoresist composition for fabricating probe array, method of fabr...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Salt and photoresist composition comprising the same

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Resist composition, method of forming resist pattern, and new compound

Method for manufacturing micro-structure and optically patternable...

Sulfonium salt, polymer, chemically amplified resist composition us...

Salt and photoresist composition containing the same

Photoacid generators and lithographic resists comprising the same

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Resist composition for negative tone development and pattern formin...

Polymer, chemically amplified positive resist composition and patte...

Fluorine-free fused ring heteroaromatic photoacid generators and re...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

Photoacid Generators And Lithographic Resists Comprising The Same

Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And R...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RE...

SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION US...

METHOD FOR MANUFACTURING MICRO-STRUCTURE AND OPTICALLY PATTERNABLE...

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST...

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POLYMERIZABLE PHOTOACID GENERATORS

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND

PHOTOACID GENERATORS