Supports

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CPC
H01J2237/0456

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/0456Supports

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-leaf collimator and driving system
- Patent number 11,342,093
- Issue date May 24, 2022
- SHANGHAI UNITED IMAGING HEALTHACRE CO., LTD.
- Jian Zhang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and device for implanting ions in wafers
- Patent number 11,056,309
- Issue date Jul 6, 2021
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Imaging beam positioning apparatus and method of use thereof
- Patent number 10,561,860
- Issue date Feb 18, 2020
- Jennifer Hertzoff
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Multi-leaf collimator and driving system
- Patent number 10,510,456
- Issue date Dec 17, 2019
- Shanghai United Imaging Healthcare Co., Ltd.
- Jian Zhang
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Ion source
- Patent number 7,767,977
- Issue date Aug 3, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable shaped electron beam lithography system and method for man...
- Patent number 7,714,308
- Issue date May 11, 2010
- Elpida Memory, Inc.
- Masahito Hiroshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apertured plate support mechanism and charged-particle beam instrum...
- Patent number 7,253,419
- Issue date Aug 7, 2007
- Jeol Ltd.
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask holder for supporting transfer mask
- Patent number 6,162,566
- Issue date Dec 19, 2000
- Hoya Corporation
- Isao Amemiya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure device
- Patent number 6,008,495
- Issue date Dec 28, 1999
- Fujitsu Limited
- Hitoshi Tanaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Holding mechanism, and exposure apparatus using the mechanism
- Patent number 6,005,910
- Issue date Dec 21, 1999
- Canon Kabushiki Kaisha
- Yuji Chiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LEAF COLLIMATOR AND DRIVING SYSTEM
- Publication number 20200118701
- Publication date Apr 16, 2020
- Shanghai United Imaging Healthcare Co., Ltd.
- Jian ZHANG
- G01 - MEASURING TESTING
Information Patent Application
Variable shaped electron beam lithography system and method for man...
- Publication number 20080054196
- Publication date Mar 6, 2008
- Elpida Memory, Inc.
- Masahito Hiroshima
- B82 - NANO-TECHNOLOGY
Information Patent Application
Particle optical apparatus
- Publication number 20070138403
- Publication date Jun 21, 2007
- Dane Cubric
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apertured plate support mechanism and charged-particle beam instrum...
- Publication number 20050242295
- Publication date Nov 3, 2005
- JEOL Ltd.
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-leaf collimator and driving system

Method and device for implanting ions in wafers

Imaging beam positioning apparatus and method of use thereof

Multi-leaf collimator and driving system

Ion source

Variable shaped electron beam lithography system and method for man...

Apertured plate support mechanism and charged-particle beam instrum...

Mask holder for supporting transfer mask

Electron beam exposure device

Holding mechanism, and exposure apparatus using the mechanism

Patents Applicationslast 30 patents

MULTI-LEAF COLLIMATOR AND DRIVING SYSTEM

Variable shaped electron beam lithography system and method for man...

Particle optical apparatus

Apertured plate support mechanism and charged-particle beam instrum...