Systems for imaging mask onto workpiece

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CPC
H01J2237/3172

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3172Systems for imaging mask onto workpiece

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Adjustment method for charged particle beam drawing apparatus and c...
- Patent number 9,659,746
- Issue date May 23, 2017
- NuFlare Technology, Inc.
- Takashi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,595,421
- Issue date Mar 14, 2017
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 9,552,964
- Issue date Jan 24, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, and charged particle beam...
- Patent number 9,548,183
- Issue date Jan 17, 2017
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned dynamic pattern generator device and method of fabrica...
- Patent number 9,536,706
- Issue date Jan 3, 2017
- Corporation for National Research Initiatives
- Michael A. Huff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensation of imaging deviations in a particle-beam writer using...
- Patent number 9,520,268
- Issue date Dec 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,513,565
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shot data generation method and multi charged particle beam writing...
- Patent number 9,514,914
- Issue date Dec 6, 2016
- NuFlare Technology, Inc.
- Hideo Inoue
- G11 - INFORMATION STORAGE
Information Patent Grant
Electron beam writing apparatus and output control method
- Patent number 9,384,939
- Issue date Jul 5, 2016
- NuFlare Technology, Inc.
- Kennosuke Itagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Customizing a particle-beam writer using a convolution kernel
- Patent number 9,373,482
- Issue date Jun 21, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Endpoint detection for photolithography mask repair
- Patent number 9,312,101
- Issue date Apr 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 9,305,799
- Issue date Apr 5, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,159,535
- Issue date Oct 13, 2015
- NuFlare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring settling time
- Patent number 9,147,553
- Issue date Sep 29, 2015
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system and target positioning device
- Patent number 9,082,584
- Issue date Jul 14, 2015
- Mapper Lithography IP B.V.
- Jerry Peijster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for charged-particle multi-beam exposure
- Patent number 9,053,906
- Issue date Jun 9, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle multi-beamlet lithography system, modulation devic...
- Patent number 8,987,677
- Issue date Mar 24, 2015
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 8,878,141
- Issue date Nov 4, 2014
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Modulation device and charged particle multi-beamlet lithography sy...
- Patent number 8,841,636
- Issue date Sep 23, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 8,835,082
- Issue date Sep 16, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,759,787
- Issue date Jun 24, 2014
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle multi-beamlet lithography system with modulation d...
- Patent number 8,492,731
- Issue date Jul 23, 2013
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SCANNING PROBE LITHOGRAPHY METHODS
- Publication number 20170047199
- Publication date Feb 16, 2017
- The Trustees of Princeton University, Office of Technology and Trademark Lice...
- Nan Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND C...
- Publication number 20170011884
- Publication date Jan 12, 2017
- NuFlare Technology, Inc.
- Takashi NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Writing Using Inclined Exposure Stripes
- Publication number 20160336147
- Publication date Nov 17, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20160300687
- Publication date Oct 13, 2016
- NuFlare Technology, Inc.
- Saori GOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Alignment Through Detection of Rotating Timing Pattern
- Publication number 20160284508
- Publication date Sep 29, 2016
- Doug Carson & Associates, Inc.
- Douglas M. Carson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method and System for Forming a Pattern on a Reticle Using Charged...
- Publication number 20160259238
- Publication date Sep 8, 2016
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...
- Publication number 20160233054
- Publication date Aug 11, 2016
- Corporation for National Research Initiatives
- Michael A. Huff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Maskless Direct Write Lithography
- Publication number 20160211117
- Publication date Jul 21, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING WRITE DATA FOR ENERGY BEAM WRITING APPARATUS,...
- Publication number 20160211118
- Publication date Jul 21, 2016
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS
- Publication number 20160203949
- Publication date Jul 14, 2016
- NuFlare Technology, Inc.
- Hiroyasu SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ABERRATION CORRECTION IN ELECTRON BEAM BA...
- Publication number 20160172151
- Publication date Jun 16, 2016
- KLA-Tencor Corporation
- Christopher F. BEVIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND OUTPUT CONTROL METHOD
- Publication number 20160141143
- Publication date May 19, 2016
- NuFlare Technology, Inc.
- Kennosuke ITAGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING WRITE DATA, MULTI CHARGED PARTICLE BEAM WRITIN...
- Publication number 20160103945
- Publication date Apr 14, 2016
- NuFlare Technology, Inc.
- Kenichi YASUI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Compensation of Imaging Deviations in a Particle-Beam Writer Using...
- Publication number 20160013019
- Publication date Jan 14, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Fabricating an Integrated Circuit with a Pattern Density-...
- Publication number 20150371821
- Publication date Dec 24, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLES MANUFACTURING...
- Publication number 20150364292
- Publication date Dec 17, 2015
- Canon Kabushiki Kaisha
- Tomonori Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150364291
- Publication date Dec 17, 2015
- Canon Kabushiki Kaisha
- Shigeki Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN AR...
- Publication number 20150325404
- Publication date Nov 12, 2015
- Canon Kabushiki Kaisha
- Yusuke Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20150286147
- Publication date Oct 8, 2015
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS, INFORMATION PROCESSING APP...
- Publication number 20150279617
- Publication date Oct 1, 2015
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20150243480
- Publication date Aug 27, 2015
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACQUIRING SETTLING TIME
- Publication number 20150228453
- Publication date Aug 13, 2015
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint Detection for Photolithography Mask Repair
- Publication number 20150214006
- Publication date Jul 30, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20150212429
- Publication date Jul 30, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS
- Publication number 20150200074
- Publication date Jul 16, 2015
- Advantest Corporation
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE
- Publication number 20150162165
- Publication date Jun 11, 2015
- MAPPER LITHOGRAPHY IP BV
- Jerry PEIJSTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE
- Publication number 20150069260
- Publication date Mar 12, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...
- Publication number 20150060690
- Publication date Mar 5, 2015
- NuFlare Technology, Inc.
- Jun YASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20150041684
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20150041672
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- H01 - BASIC ELECTRIC ELEMENTS

Systems for imaging mask onto workpiece

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Adjustment method for charged particle beam drawing apparatus and c...

Multi charged particle beam writing method, and multi charged parti...

Method of fabricating an integrated circuit with a pattern density-...

Charged particle beam writing apparatus, and charged particle beam...

Self-aligned dynamic pattern generator device and method of fabrica...

Compensation of imaging deviations in a particle-beam writer using...

Using wafer geometry to improve scanner correction effectiveness fo...

Shot data generation method and multi charged particle beam writing...

Electron beam writing apparatus and output control method

Customizing a particle-beam writer using a convolution kernel

Endpoint detection for photolithography mask repair

Method and system for E-beam lithography with multi-exposure

Multi charged particle beam writing method, and multi charged parti...

Method for acquiring settling time

Charged particle beam lithography system and target positioning device

Method for charged-particle multi-beam exposure

Charged particle multi-beamlet lithography system, modulation devic...

Drawing apparatus, and method of manufacturing article

Modulation device and charged particle multi-beamlet lithography sy...

Method and system for E-beam lithography with multi-exposure

Charged particle multi-beamlet lithography system with modulation d...

Charged particle multi-beamlet lithography system with modulation d...

Patents Applicationslast 30 patents

SCANNING PROBE LITHOGRAPHY METHODS

ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND C...

Multi-Beam Writing Using Inclined Exposure Stripes

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Substrate Alignment Through Detection of Rotating Timing Pattern

Method and System for Forming a Pattern on a Reticle Using Charged...

SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...

System and Method for Maskless Direct Write Lithography

METHOD OF GENERATING WRITE DATA FOR ENERGY BEAM WRITING APPARATUS,...

CHARGED PARTICLE BEAM DRAWING APPARATUS

APPARATUS AND METHODS FOR ABERRATION CORRECTION IN ELECTRON BEAM BA...

ELECTRON BEAM WRITING APPARATUS AND OUTPUT CONTROL METHOD

METHOD OF GENERATING WRITE DATA, MULTI CHARGED PARTICLE BEAM WRITIN...

Compensation of Imaging Deviations in a Particle-Beam Writer Using...

Method of Fabricating an Integrated Circuit with a Pattern Density-...

STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLES MANUFACTURING...

LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN AR...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

CHARGED PARTICLE BEAM DRAWING APPARATUS, INFORMATION PROCESSING APP...

CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

METHOD FOR ACQUIRING SETTLING TIME

Endpoint Detection for Photolithography Mask Repair

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

CHARGED PARTICLE BEAM EXPOSURE APPARATUS

CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE

CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE

CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...