Temperature of target

Industry

CPC
H01J37/3497

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3497Temperature of target

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Recipe updating method
- Patent number 12,211,678
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,198,927
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode unit for magnetron sputtering apparatus and magnetron sputt...
- Patent number 12,112,929
- Issue date Oct 8, 2024
- ULVAC, Inc.
- Koji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ventilated semiconductor processing apparatus
- Patent number 12,014,897
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Akira Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tilted PVD source with rotating pedestal
- Patent number 11,948,784
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Harish Penmethsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target structure and film forming apparatus
- Patent number 11,823,880
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and sputtering method
- Patent number 11,705,315
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Shota Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode unit and film forming apparatus
- Patent number 11,581,171
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition processing systems target cooling
- Patent number 11,515,132
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrical transfer in an endblock for a sputter device
- Patent number 11,367,596
- Issue date Jun 21, 2022
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode assembly having a dual position magnetron and centrally fed...
- Patent number 11,189,472
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Irena H. Wysok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MEMS frame heating platform for electron imagable fluid reservoirs...
- Patent number 11,170,968
- Issue date Nov 9, 2021
- PROTOCHIPS, INC.
- Franklin Stampley Walden
- G01 - MEASURING TESTING
Information Patent Grant
Rotatable sputtering target
- Patent number 11,094,514
- Issue date Aug 17, 2021
- OUMEIDA APPLIED MATERIALS TECHNOLOGY CO., LTD.
- I-Sheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition processing systems target cooling
- Patent number 11,037,769
- Issue date Jun 15, 2021
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Magnetron having enhanced target cooling configuration
- Patent number 11,024,490
- Issue date Jun 1, 2021
- Applied Materials, Inc.
- Vanessa Faune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target with backside cooling grooves
- Patent number 11,011,356
- Issue date May 18, 2021
- Applied Materials, Inc.
- Brian T. West
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target and manufacturing method thereof
- Patent number 10,995,401
- Issue date May 4, 2021
- SK Hynix Inc.
- Jun Ku Ahn
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Tubular target having a protective device
- Patent number 10,978,279
- Issue date Apr 13, 2021
- Plansee SE
- Christian Linke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Molten target sputtering (MTS) deposition for enhanced kinetic ener...
- Patent number 10,947,639
- Issue date Mar 16, 2021
- UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NASA.
- Hyun Jung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode assembly, physical vapor deposition system, and method for...
- Patent number 10,804,083
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming unit for sputtering apparatus
- Patent number 10,770,275
- Issue date Sep 8, 2020
- ULVAC, Inc.
- Shuuji Saitou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target with backside cooling grooves
- Patent number 10,714,321
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Brian T. West
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition processing systems target cooling
- Patent number 10,685,821
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target, adapted to an indirect cooling device, having a cooling plate
- Patent number 10,636,635
- Issue date Apr 28, 2020
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Denis Kurapov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and/or coil, and process for producing same
- Patent number 10,557,195
- Issue date Feb 11, 2020
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotary cathode unit for magnetron sputtering apparatus
- Patent number 10,378,102
- Issue date Aug 13, 2019
- ULVAC, Inc.
- Shuuji Saitou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin substrate processing device
- Patent number 10,370,757
- Issue date Aug 6, 2019
- Ulvac, Inc.
- Tetsushi Fujinaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition processing systems target cooling
- Patent number 10,325,763
- Issue date Jun 18, 2019
- Applied Materials, Inc.
- Wei W. Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target cooling through gun drilled holes
- Patent number 10,294,559
- Issue date May 21, 2019
- Applied Materials, Inc.
- Yoshiaki Tanase
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cooling water jet pack for high power rotary cathodes
- Patent number 10,262,843
- Issue date Apr 16, 2019
- Beijing Apollo Ding Rong Solar Technology Co., Ltd.
- Robert Martinson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER
- Publication number 20230073011
- Publication date Mar 9, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING MATERIAL LAYER
- Publication number 20220254643
- Publication date Aug 11, 2022
- Samsung Electronics Co., Ltd.
- Kyung-Eun BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND SPUTTERING METHOD
- Publication number 20220148863
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Processing Apparatus
- Publication number 20220076918
- Publication date Mar 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Akira NISHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Physical Vapor Deposition Processing Systems Target Cooling
- Publication number 20210272785
- Publication date Sep 2, 2021
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CATHODE UNIT AND FILM FORMING APPARATUS
- Publication number 20210257198
- Publication date Aug 19, 2021
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...
- Publication number 20210066046
- Publication date Mar 4, 2021
- New Power Plasma Co., Ltd.
- Junyoung Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET STRUCTURE AND FILM FORMING APPARATUS
- Publication number 20210020419
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES
- Publication number 20200294778
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Brian T. WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Physical Vapor Deposition Processing Systems Target Cooling
- Publication number 20200266039
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ROTATABLE SPUTTERING TARGET
- Publication number 20200203134
- Publication date Jun 25, 2020
- OUMEIDA APPLIED MATERIALS TECHNOLOGY CO., LTD.
- I-SHENG WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF
- Publication number 20200181761
- Publication date Jun 11, 2020
- SK HYNIX INC.
- Jun Ku AHN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
FLOW RATE CONTROL METHOD, TEMPERATURE CONTROL METHOD, AND PROCESSIN...
- Publication number 20190310034
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Kei KOBAYASHI
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
ELECTRICAL TRANSFER IN AN ENDBLOCK FOR A SPUTTER DEVICE
- Publication number 20190237306
- Publication date Aug 1, 2019
- Soleras Advanced Coatings bvba
- Ivan VAN DE PUTTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING UNIT FOR SPUTTERING APPARATUS
- Publication number 20190206662
- Publication date Jul 4, 2019
- Ulvac, Inc.
- Shuuji SAITOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON HAVING ENHANCED TARGET COOLING CONFIGURATION
- Publication number 20190180992
- Publication date Jun 13, 2019
- Applied Materials, Inc.
- VANESSA FAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING CARRIER DEVICE FOR USE ON SPUTTERING CATHODE ASSEMBLY
- Publication number 20190172691
- Publication date Jun 6, 2019
- NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
- CHOU-YU LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Physical Vapor Deposition Processing Systems Target Cooling
- Publication number 20190057851
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SPUTTERING TARGET WITH MICRO CHANNELS
- Publication number 20190035612
- Publication date Jan 31, 2019
- SURANJAN DABARE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CATHODE ASSEMBLY HAVING A DUAL POSITION MAGNETRON AND CENTRALLY FED...
- Publication number 20190019658
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Irena H. Wysok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES
- Publication number 20180342378
- Publication date Nov 29, 2018
- Applied Materials, Inc.
- Brian T. WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Physical Vapor Deposition Processing Systems Target Cooling
- Publication number 20180211826
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Wei W. Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLING AND UTILIZATION OPTIMIZATION OF HEAT SENSITIVE BONDED METAL...
- Publication number 20180195163
- Publication date Jul 12, 2018
- Applied Materials, Inc.
- Helmut GRIMM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN CO...
- Publication number 20180037984
- Publication date Feb 8, 2018
- Guardian Europe S.a.r.l.
- Gilbert GALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES
- Publication number 20180019108
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- Brian T. WEST
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET AND/OR COIL, AND PROCESS FOR PRODUCING SAME
- Publication number 20180010241
- Publication date Jan 11, 2018
- JX NIPPON MINING & METALS CORPORATION
- Kenichi Nagata
- C21 - METALLURGY OF IRON
Information Patent Application
TARGET ASSEMBLY
- Publication number 20170229296
- Publication date Aug 10, 2017
- Ulvac, Inc.
- Shinya Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING SOURCE ARRANGEMENT, SPUTTERING SYSTEM AND METHOD OF MANU...
- Publication number 20170175247
- Publication date Jun 22, 2017
- Evatec AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN SUBSTRATE PROCESSING DEVICE
- Publication number 20160376697
- Publication date Dec 29, 2016
- ULVAC, Inc.
- Tetsushi Fujinaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hermetically Sealed Magnetic Keeper Cathode
- Publication number 20160358763
- Publication date Dec 8, 2016
- KURT J. LESKER COMPANY
- Matthew Jaszcar
- H01 - BASIC ELECTRIC ELEMENTS

Temperature of target

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Recipe updating method

Deposition system and method

Cathode unit for magnetron sputtering apparatus and magnetron sputt...

Ventilated semiconductor processing apparatus

Tilted PVD source with rotating pedestal

Target structure and film forming apparatus

Sputtering apparatus and sputtering method

Cathode unit and film forming apparatus

Physical vapor deposition processing systems target cooling

Electrical transfer in an endblock for a sputter device

Cathode assembly having a dual position magnetron and centrally fed...

MEMS frame heating platform for electron imagable fluid reservoirs...

Rotatable sputtering target

Physical vapor deposition processing systems target cooling

Magnetron having enhanced target cooling configuration

Sputtering target with backside cooling grooves

Sputtering target and manufacturing method thereof

Tubular target having a protective device

Molten target sputtering (MTS) deposition for enhanced kinetic ener...

Cathode assembly, physical vapor deposition system, and method for...

Film forming unit for sputtering apparatus

Sputtering target with backside cooling grooves

Physical vapor deposition processing systems target cooling

Target, adapted to an indirect cooling device, having a cooling plate

Sputtering target and/or coil, and process for producing same

Rotary cathode unit for magnetron sputtering apparatus

Thin substrate processing device

Physical vapor deposition processing systems target cooling

Target cooling through gun drilled holes

Cooling water jet pack for high power rotary cathodes

Patents Applicationslast 30 patents

SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER

METHOD OF FORMING MATERIAL LAYER

SPUTTERING APPARATUS AND SPUTTERING METHOD

Semiconductor Processing Apparatus

Physical Vapor Deposition Processing Systems Target Cooling

CATHODE UNIT AND FILM FORMING APPARATUS

APPARATUS FOR CONDUCTING PLASMA SURFACE TREATMENT, BOARD TREATMENT...

TARGET STRUCTURE AND FILM FORMING APPARATUS

SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES

Physical Vapor Deposition Processing Systems Target Cooling

ROTATABLE SPUTTERING TARGET

SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF

FLOW RATE CONTROL METHOD, TEMPERATURE CONTROL METHOD, AND PROCESSIN...

ELECTRICAL TRANSFER IN AN ENDBLOCK FOR A SPUTTER DEVICE

FILM FORMING UNIT FOR SPUTTERING APPARATUS

MAGNETRON HAVING ENHANCED TARGET COOLING CONFIGURATION

HEATING CARRIER DEVICE FOR USE ON SPUTTERING CATHODE ASSEMBLY

Physical Vapor Deposition Processing Systems Target Cooling

SPUTTERING TARGET WITH MICRO CHANNELS

CATHODE ASSEMBLY HAVING A DUAL POSITION MAGNETRON AND CENTRALLY FED...

SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES

Physical Vapor Deposition Processing Systems Target Cooling

COOLING AND UTILIZATION OPTIMIZATION OF HEAT SENSITIVE BONDED METAL...

ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN CO...

SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES

SPUTTERING TARGET AND/OR COIL, AND PROCESS FOR PRODUCING SAME

TARGET ASSEMBLY

SPUTTERING SOURCE ARRANGEMENT, SPUTTERING SYSTEM AND METHOD OF MANU...

THIN SUBSTRATE PROCESSING DEVICE

Hermetically Sealed Magnetic Keeper Cathode