Testing and control

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CPC
H01J2237/31725

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31725Testing and control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Adjustment method for charged particle beam drawing apparatus and c...
- Patent number 9,659,746
- Issue date May 23, 2017
- NuFlare Technology, Inc.
- Takashi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, and charged particle beam...
- Patent number 9,548,183
- Issue date Jan 17, 2017
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of imaging deviations in a particle-beam writer using...
- Patent number 9,520,268
- Issue date Dec 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam writing apparatus and output control method
- Patent number 9,384,939
- Issue date Jul 5, 2016
- NuFlare Technology, Inc.
- Kennosuke Itagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Customizing a particle-beam writer using a convolution kernel
- Patent number 9,373,482
- Issue date Jun 21, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Endpoint detection for photolithography mask repair
- Patent number 9,312,101
- Issue date Apr 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 9,305,799
- Issue date Apr 5, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,159,535
- Issue date Oct 13, 2015
- NuFlare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring settling time
- Patent number 9,147,553
- Issue date Sep 29, 2015
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for E-beam lithography with multi-exposure
- Patent number 8,835,082
- Issue date Sep 16, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SCANNING PROBE LITHOGRAPHY METHODS
- Publication number 20170047199
- Publication date Feb 16, 2017
- The Trustees of Princeton University, Office of Technology and Trademark Lice...
- Nan Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND C...
- Publication number 20170011884
- Publication date Jan 12, 2017
- NuFlare Technology, Inc.
- Takashi NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20160300687
- Publication date Oct 13, 2016
- NuFlare Technology, Inc.
- Saori GOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming a Pattern on a Reticle Using Charged...
- Publication number 20160259238
- Publication date Sep 8, 2016
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF GENERATING WRITE DATA FOR ENERGY BEAM WRITING APPARATUS,...
- Publication number 20160211118
- Publication date Jul 21, 2016
- NuFlare Technology, Inc.
- Jun Yashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS
- Publication number 20160203949
- Publication date Jul 14, 2016
- NuFlare Technology, Inc.
- Hiroyasu SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND OUTPUT CONTROL METHOD
- Publication number 20160141143
- Publication date May 19, 2016
- NuFlare Technology, Inc.
- Kennosuke ITAGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compensation of Imaging Deviations in a Particle-Beam Writer Using...
- Publication number 20160013019
- Publication date Jan 14, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...
- Publication number 20150286147
- Publication date Oct 8, 2015
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS, INFORMATION PROCESSING APP...
- Publication number 20150279617
- Publication date Oct 1, 2015
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACQUIRING SETTLING TIME
- Publication number 20150228453
- Publication date Aug 13, 2015
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint Detection for Photolithography Mask Repair
- Publication number 20150214006
- Publication date Jul 30, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Lin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE
- Publication number 20150069260
- Publication date Mar 12, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...
- Publication number 20150060690
- Publication date Mar 5, 2015
- NuFlare Technology, Inc.
- Jun YASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20150041684
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20150041672
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for E-Beam Lithography with Multi-Exposure
- Publication number 20140367588
- Publication date Dec 18, 2014
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM
- Publication number 20140264086
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR EXPOSING A WAFER
- Publication number 20140264085
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE
- Publication number 20140264066
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
Endpoint Detection for Photolithography Mask Repair
- Publication number 20140255826
- Publication date Sep 11, 2014
- Chien-Lin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTUR...
- Publication number 20140057212
- Publication date Feb 27, 2014
- Canon Kabushiki Kaisha
- Shinji OHISHI
- G02 - OPTICS
Information Patent Application
Method and System for E-Beam Lithography with Multi-Exposure
- Publication number 20140038107
- Publication date Feb 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- B82 - NANO-TECHNOLOGY
Information Patent Application
DUAL PASS SCANNING
- Publication number 20120286170
- Publication date Nov 15, 2012
- MAPPER LITHOGRAPHY IP BV
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY

Testing and control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Adjustment method for charged particle beam drawing apparatus and c...

Charged particle beam writing apparatus, and charged particle beam...

Compensation of imaging deviations in a particle-beam writer using...

Electron beam writing apparatus and output control method

Customizing a particle-beam writer using a convolution kernel

Endpoint detection for photolithography mask repair

Method and system for E-beam lithography with multi-exposure

Multi charged particle beam writing method, and multi charged parti...

Method for acquiring settling time

Method and system for E-beam lithography with multi-exposure

Patents Applicationslast 30 patents

SCANNING PROBE LITHOGRAPHY METHODS

ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND C...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Method and System for Forming a Pattern on a Reticle Using Charged...

METHOD OF GENERATING WRITE DATA FOR ENERGY BEAM WRITING APPARATUS,...

CHARGED PARTICLE BEAM DRAWING APPARATUS

ELECTRON BEAM WRITING APPARATUS AND OUTPUT CONTROL METHOD

Compensation of Imaging Deviations in a Particle-Beam Writer Using...

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING ME...

CHARGED PARTICLE BEAM DRAWING APPARATUS, INFORMATION PROCESSING APP...

METHOD FOR ACQUIRING SETTLING TIME

Endpoint Detection for Photolithography Mask Repair

CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE

CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

Method and System for E-Beam Lithography with Multi-Exposure

CHARGED PARTICLE LITHOGRAPHY SYSTEM

METHOD FOR EXPOSING A WAFER

DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE

Endpoint Detection for Photolithography Mask Repair

TRANSMISSION APPARATUS, DRAWING APPARATUS, AND METHOD OF MANUFACTUR...

Method and System for E-Beam Lithography with Multi-Exposure

DUAL PASS SCANNING