the material comprising hydrogen silsesquioxane

Industry

CPC
H01L21/02134

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02134the material comprising hydrogen silsesquioxane

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Planarization of spin-on films
- Patent number 11,776,808
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Anthony R. Schepis
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Reproducible and manufacturable nanogaps for embedded transverse el...
- Patent number 11,221,310
- Issue date Jan 11, 2022
- International Business Machines Corporation
- Adam M. Pyzyna
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Self-aligned internal spacer with EUV
- Patent number 10,903,335
- Issue date Jan 26, 2021
- Imec VZW
- Gaspard Hiblot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reproducible and manufacturable nanogaps for embedded transverse el...
- Patent number 10,168,299
- Issue date Jan 1, 2019
- International Business Machines Corporation
- Adam M. Pyzyna
- G01 - MEASURING TESTING
Information Patent Grant
Method for fabricating auto-aligned interconnection elements for a...
- Patent number 10,115,637
- Issue date Oct 30, 2018
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Claire Fenouillet-Beranger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench silicide with self-aligned contact vias
- Patent number 10,068,850
- Issue date Sep 4, 2018
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon nitride fill for PC gap regions to increase cell density
- Patent number 10,056,378
- Issue date Aug 21, 2018
- International Business Machines Corporation
- Dechao Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mixed lithography approach for E-beam and optical exposure using HSQ
- Patent number 9,917,057
- Issue date Mar 13, 2018
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon nitride fill for PC gap regions to increase cell density
- Patent number 9,859,275
- Issue date Jan 2, 2018
- International Business Machines Corporation
- Dechao Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench silicide with self-aligned contact vias
- Patent number 9,721,888
- Issue date Aug 1, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation trenches and methods for NAND memory
- Patent number 9,711,390
- Issue date Jul 18, 2017
- SanDisk Technologies LLC
- Shinjiro Umehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mixed lithography approach for e-beam and optical exposure using HSQ
- Patent number 9,558,930
- Issue date Jan 31, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor
- Patent number 9,263,685
- Issue date Feb 16, 2016
- Tsinghua University
- Qun-Qing Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming interconnect structures
- Patent number 9,245,792
- Issue date Jan 26, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Neng-Kuo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor
- Patent number 9,159,938
- Issue date Oct 13, 2015
- Tsinghua University
- Yuan Zou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for keyhole repair in replacement metal gate integration thr...
- Patent number 9,087,916
- Issue date Jul 21, 2015
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for active energy assist baking
- Patent number 9,004,914
- Issue date Apr 14, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Chi Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for keyhole repair in replacement metal gate integration thr...
- Patent number 8,946,782
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming intermediate semiconductor device structures usi...
- Patent number 8,486,612
- Issue date Jul 16, 2013
- Micron Technology, Inc.
- Weimin Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of and apparatus for active energy assist baking
- Patent number 8,481,412
- Issue date Jul 9, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Chi Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing nanocrystalline silicon in SiO2 and freestandi...
- Patent number 8,323,731
- Issue date Dec 4, 2012
- The Governors of the University of Alberta
- Jonathan Gordon Conn Veinot
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment of low K films with a silylating agent for damage repair
- Patent number 8,034,638
- Issue date Oct 11, 2011
- Novellus Systems, Inc.
- Bart J. Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming intermediate semiconductor device structures usi...
- Patent number 7,855,154
- Issue date Dec 21, 2010
- Micron Technology, Inc.
- Weimin Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Intermediate semiconductor device structures using photopatternable...
- Patent number 7,678,460
- Issue date Mar 16, 2010
- Micron Technology, Inc.
- Weimin Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of cracking in low-k spin-on dielectric films
- Patent number 7,670,961
- Issue date Mar 2, 2010
- NXP B.V.
- Harbans Singh Sachdev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating layer patterning method, insulating layer formed by the...
- Patent number 7,579,283
- Issue date Aug 25, 2009
- Samsung Electronics Co., Ltd.
- Sang-Jun Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment of low k films with a silylating agent for damage repair
- Patent number 7,541,200
- Issue date Jun 2, 2009
- Novellus Systems, Inc.
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with flowable insulation layer formed on capac...
- Patent number 7,538,007
- Issue date May 26, 2009
- Hynix Semiconductor, Inc.
- Sang-Tae Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,148,571
- Issue date Dec 12, 2006
- NEC Electronics Corporation
- Tatsuya Usami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in-situ treatment of low-k films with a silylating agent...
- Patent number 7,083,991
- Issue date Aug 1, 2006
- Novellus Systems, Inc.
- Justin F. Gaynor
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Planarization of Spin-On Films
- Publication number 20210296121
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Anthony R. Schepis
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Self-Aligned Internal Spacer With EUV
- Publication number 20190348523
- Publication date Nov 14, 2019
- IMEC vzw
- Gaspard Hiblot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...
- Publication number 20190072518
- Publication date Mar 7, 2019
- International Business Machines Corporation
- Adam M. Pyzyna
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR FABRICATING AUTO-ALIGNED INTERCONNECTION ELEMENTS FOR A...
- Publication number 20180158736
- Publication date Jun 7, 2018
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Claire FENOUILLET-BERANGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILL FOR PC GAP REGIONS TO INCREASE CELL DENSITY
- Publication number 20180069002
- Publication date Mar 8, 2018
- International Business Machines Corporation
- Dechao Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...
- Publication number 20180017524
- Publication date Jan 18, 2018
- International Business Machines Corporation
- Adam M. Pyzyna
- G01 - MEASURING TESTING
Information Patent Application
TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS
- Publication number 20170330830
- Publication date Nov 16, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS
- Publication number 20170162496
- Publication date Jun 8, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mixed Lithography Approach for E-Beam and Optical Exposure Using HSQ
- Publication number 20170077036
- Publication date Mar 16, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW TRENCH ISOLATION TRENCHES AND METHODS FOR NAND MEMORY
- Publication number 20160343608
- Publication date Nov 24, 2016
- SANDISK TECHNOLOGIES INC.
- Shinjiro Umehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mixed Lithography Approach for E-Beam and Optical Exposure Using HSQ
- Publication number 20160049294
- Publication date Feb 18, 2016
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Keyhole Repair in Replacement Metal Gate Integration Thr...
- Publication number 20150126004
- Publication date May 7, 2015
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR
- Publication number 20150050786
- Publication date Feb 19, 2015
- TSINGHUA UNIVERSITY
- QUN-QING LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR
- Publication number 20140291614
- Publication date Oct 2, 2014
- HON HAI PRECISION INDUSTRY CO., LTD.
- YUAN ZOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Keyhole Repair in Replacement Metal Gate Integration Thr...
- Publication number 20130277758
- Publication date Oct 24, 2013
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF AND APPARATUS FOR ACTIVE ENERGY ASSIST BAKING
- Publication number 20130273732
- Publication date Oct 17, 2013
- Chung-Chi KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOCRYSTALLINE SILICON IN SIO2 COMPOSITE AND FREESTANDING SILICON...
- Publication number 20130059121
- Publication date Mar 7, 2013
- The Governors of the University of Alberta
- Jonathan Gordon Conn Veinot
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF AND APPARATUS FOR ACTIVE ENERGY ASSIST BAKING
- Publication number 20120077339
- Publication date Mar 29, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Chi KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING INTERMEDIATE SEMICONDUCTOR DEVICE STRUCTURES USI...
- Publication number 20110065050
- Publication date Mar 17, 2011
- Micron Technology, Inc.
- Weimin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming Interconnect Structures
- Publication number 20100022084
- Publication date Jan 28, 2010
- Neng-Kuo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING NANOCRYSTALLINE SILICON IN SIO2 AND FREESTANDI...
- Publication number 20090117392
- Publication date May 7, 2009
- Jonathan Gordon Conn Veinot
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of curing hydrogen silsesquioxane and densification in nano-...
- Publication number 20090032901
- Publication date Feb 5, 2009
- Wei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of Cracking in Low-K Spin-On Dielectric Films
- Publication number 20080026594
- Publication date Jan 31, 2008
- Koninklijke Philips Electronics, N.V.
- Harbans Singh Sachdev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulating layer patterning method, insulating layer formed by the...
- Publication number 20070184667
- Publication date Aug 9, 2007
- Samsung Electronics Co., Ltd.
- Sang-jun Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Intermediate semiconductor device structures using photopatternable...
- Publication number 20060205236
- Publication date Sep 14, 2006
- Weimin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming intermediate semiconductor device structures usi...
- Publication number 20060172079
- Publication date Aug 3, 2006
- Weimin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device with flowable insulation layer formed on capac...
- Publication number 20050266650
- Publication date Dec 1, 2005
- Hynix Semiconductor Inc.
- Sang-Tae Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of In-Situ Treatment of Low-K Films With a Silylating Agent...
- Publication number 20050158884
- Publication date Jul 21, 2005
- Justin F. Gaynor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of spin-on, photopatternable, interlayer dielectric materials a...
- Publication number 20040229050
- Publication date Nov 18, 2004
- Weimin Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silica-based organic film and method of manufacturing the same, and...
- Publication number 20040180223
- Publication date Sep 16, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Tatsuhiko Shibuya
- H01 - BASIC ELECTRIC ELEMENTS

the material comprising hydrogen silsesquioxane

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Planarization of spin-on films

Reproducible and manufacturable nanogaps for embedded transverse el...

Self-aligned internal spacer with EUV

Reproducible and manufacturable nanogaps for embedded transverse el...

Method for fabricating auto-aligned interconnection elements for a...

Trench silicide with self-aligned contact vias

Silicon nitride fill for PC gap regions to increase cell density

Mixed lithography approach for E-beam and optical exposure using HSQ

Silicon nitride fill for PC gap regions to increase cell density

Trench silicide with self-aligned contact vias

Shallow trench isolation trenches and methods for NAND memory

Mixed lithography approach for e-beam and optical exposure using HSQ

Thin film transistor

Method for forming interconnect structures

Thin film transistor

Method for keyhole repair in replacement metal gate integration thr...

Method of and apparatus for active energy assist baking

Method for keyhole repair in replacement metal gate integration thr...

Methods of forming intermediate semiconductor device structures usi...

Method of and apparatus for active energy assist baking

Method for preparing nanocrystalline silicon in SiO2 and freestandi...

Treatment of low K films with a silylating agent for damage repair

Methods of forming intermediate semiconductor device structures usi...

Intermediate semiconductor device structures using photopatternable...

Reduction of cracking in low-k spin-on dielectric films

Insulating layer patterning method, insulating layer formed by the...

Treatment of low k films with a silylating agent for damage repair

Semiconductor device with flowable insulation layer formed on capac...

Semiconductor device and method of manufacturing the same

Method of in-situ treatment of low-k films with a silylating agent...

Patents Applicationslast 30 patents

Planarization of Spin-On Films

Self-Aligned Internal Spacer With EUV

REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...

METHOD FOR FABRICATING AUTO-ALIGNED INTERCONNECTION ELEMENTS FOR A...

SILICON NITRIDE FILL FOR PC GAP REGIONS TO INCREASE CELL DENSITY

REPRODUCIBLE AND MANUFACTURABLE NANOGAPS FOR EMBEDDED TRANSVERSE EL...

TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS

TRENCH SILICIDE WITH SELF-ALIGNED CONTACT VIAS

Mixed Lithography Approach for E-Beam and Optical Exposure Using HSQ

SHALLOW TRENCH ISOLATION TRENCHES AND METHODS FOR NAND MEMORY

Mixed Lithography Approach for E-Beam and Optical Exposure Using HSQ

Method for Keyhole Repair in Replacement Metal Gate Integration Thr...

THIN FILM TRANSISTOR

THIN FILM TRANSISTOR

Method for Keyhole Repair in Replacement Metal Gate Integration Thr...

METHOD OF AND APPARATUS FOR ACTIVE ENERGY ASSIST BAKING

NANOCRYSTALLINE SILICON IN SIO2 COMPOSITE AND FREESTANDING SILICON...

METHOD OF AND APPARATUS FOR ACTIVE ENERGY ASSIST BAKING

METHODS OF FORMING INTERMEDIATE SEMICONDUCTOR DEVICE STRUCTURES USI...

Method for Forming Interconnect Structures

METHOD FOR PREPARING NANOCRYSTALLINE SILICON IN SIO2 AND FREESTANDI...

Method of curing hydrogen silsesquioxane and densification in nano-...

Reduction of Cracking in Low-K Spin-On Dielectric Films

Insulating layer patterning method, insulating layer formed by the...

Intermediate semiconductor device structures using photopatternable...

Methods of forming intermediate semiconductor device structures usi...

Semiconductor device with flowable insulation layer formed on capac...

Method Of In-Situ Treatment of Low-K Films With a Silylating Agent...

Use of spin-on, photopatternable, interlayer dielectric materials a...

Silica-based organic film and method of manufacturing the same, and...