the material containing aluminium

Industry

CPC
H01L21/02145

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02145the material containing aluminium

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 12,094,936
- Issue date Sep 17, 2024
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device of dielectric layer
- Patent number 12,034,075
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and its formation method
- Patent number 11,978,624
- Issue date May 7, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jiang Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 11,798,999
- Issue date Oct 24, 2023
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having improved overlay shift tolerance
- Patent number 11,664,237
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of me...
- Patent number 11,501,965
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 11,411,088
- Issue date Aug 9, 2022
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhancement mode III-nitride devices having an Al1-xSixO gate insul...
- Patent number 11,322,599
- Issue date May 3, 2022
- Transphorm Technology, Inc.
- Carl Joseph Neufeld
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a transition metal chalcogenide film on a su...
- Patent number 11,244,825
- Issue date Feb 8, 2022
- ASM IP Holding B.V.
- Miika Mattinen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 11,217,605
- Issue date Jan 4, 2022
- Renesas Electronics Corporation
- Shibun Tsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 11,133,422
- Issue date Sep 28, 2021
- Renesas Electronics Corporation
- Masao Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device of dielectric layer
- Patent number 11,018,258
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal of an etching stop layer for improving overlay sh...
- Patent number 10,867,805
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminated body and semiconductor device
- Patent number 10,847,364
- Issue date Nov 24, 2020
- Kabushiki Kaisha Toshiba
- Hisao Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a transition metal chalcogenide film on a su...
- Patent number 10,847,366
- Issue date Nov 24, 2020
- ASM IP Holding B.V.
- Miika Mattinen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 10,818,758
- Issue date Oct 27, 2020
- ASM IP Holding B.V.
- Fu Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron emission device and method for manufacturing the same
- Patent number 10,692,680
- Issue date Jun 23, 2020
- SHARP KABUSHIKI KAISHA
- Kenichiro Nakamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a memory and manufacturing method thereof
- Patent number 10,672,916
- Issue date Jun 2, 2020
- Renesas Electronics Corporation
- Masao Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor, method for manufacturing same, and wireless communicatio...
- Patent number 10,636,866
- Issue date Apr 28, 2020
- Toray Industries, Inc.
- Hiroji Shimizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device and method of dielectric layer
- Patent number 10,510,895
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnection structures and fabrication methods thereof
- Patent number 10,453,797
- Issue date Oct 22, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Hao Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite dielectric interface layers for interconnect structures
- Patent number 10,418,236
- Issue date Sep 17, 2019
- Lam Research Corporation
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for improved etch stop layer or hard mask laye...
- Patent number 10,304,749
- Issue date May 28, 2019
- Intel Corporation
- Christopher W. Petz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method of dielectric layer
- Patent number 10,290,739
- Issue date May 14, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 10,177,025
- Issue date Jan 8, 2019
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite dielectric interface layers for interconnect structures
- Patent number 10,049,869
- Issue date Aug 14, 2018
- Lam Research Corporation
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus for forming film including at least...
- Patent number 10,026,607
- Issue date Jul 17, 2018
- Hitachi Kokusai Electric, Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming III-V semiconductor structures including aluminu...
- Patent number 9,991,360
- Issue date Jun 5, 2018
- Cornell University
- James R. Shealy
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Semiconductor device
- Patent number 9,991,345
- Issue date Jun 5, 2018
- Toyoda Gosei Co., Ltd.
- Tomoyuki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and glass film forming...
- Patent number 9,978,882
- Issue date May 22, 2018
- SHINDENGEN ELECTRIC MANUFACTURING CO., LTD.
- Shinichi Nagase
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20240332419
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...
- Publication number 20240030296
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20230045328
- Publication date Feb 9, 2023
- GLOBALWAFERS CO., LTD.
- Po Jung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...
- Publication number 20220367647
- Publication date Nov 17, 2022
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SU...
- Publication number 20220115232
- Publication date Apr 14, 2022
- ASM IP HOLDING B.V.
- Miika Mattinen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND ITS FORMATION METHOD
- Publication number 20220084818
- Publication date Mar 17, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Jiang CHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20210280710
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20210111193
- Publication date Apr 15, 2021
- RENESAS ELECTRONICS CORPORATION
- Shibun TSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCEMENT MODE III-NITRIDE DEVICES HAVING AN AL1-XSIXO GATE INSUL...
- Publication number 20210043750
- Publication date Feb 11, 2021
- Transphorm Technology, Inc.
- Carl Joseph Neufeld
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...
- Publication number 20210005723
- Publication date Jan 7, 2021
- ASM IP HOLDING B.V.
- Fu Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SU...
- Publication number 20210005450
- Publication date Jan 7, 2021
- ASM IP HOLDING B.V.
- Miika Mattinen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A MEMORY AND MANUFACTURING METHOD THEREOF
- Publication number 20200251599
- Publication date Aug 6, 2020
- RENESAS ELECTRONICS CORPORATION
- Masao INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SU...
- Publication number 20200161129
- Publication date May 21, 2020
- ASM IP HOLDING B.V.
- Miika Mattinen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...
- Publication number 20200161438
- Publication date May 21, 2020
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20200119184
- Publication date Apr 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal of an Etching Stop Layer for Improving Overlay Sh...
- Publication number 20200006083
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON EMISSION DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20190304732
- Publication date Oct 3, 2019
- Sharp Kabushiki Kaisha
- Kenichiro NAKAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF DIELECTRIC LAYER
- Publication number 20190267485
- Publication date Aug 29, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20190148562
- Publication date May 16, 2019
- RENESAS ELECTRONICS CORPORATION
- Masao INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR IMPROVED ETCH STOP LAYER OR HARD MASK LAYE...
- Publication number 20180366386
- Publication date Dec 20, 2018
- Intel Corporation
- Christopher W. Petz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...
- Publication number 20180350587
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE DIELECTRIC INTERFACE LAYERS FOR INTERCONNECT STRUCTURES
- Publication number 20180342389
- Publication date Nov 29, 2018
- LAM RESEARCH CORPORATION
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERCONNECTION STRUCTURES AND FABRICATION METHODS THEREOF
- Publication number 20180151505
- Publication date May 31, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- HAO DENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20180097071
- Publication date Apr 5, 2018
- TOYODA GOSEI CO.. LTD.
- Tomoyuki SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20170077277
- Publication date Mar 16, 2017
- KABUSHIKI KAISHA TOSHIBA
- Hisashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST...
- Publication number 20160329208
- Publication date Nov 10, 2016
- Hitachi Kokusai Electric Inc.
- Yushin TAKASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20160049347
- Publication date Feb 18, 2016
- Panasonic Intellectual Property Management Co., Ltd.
- NOBORU NEGORO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A DIELECTRIC AND/OR BARRIER LAYER OR MULTILAYE...
- Publication number 20150325418
- Publication date Nov 12, 2015
- Abengoa Solar New Technologies, S.A.
- Jorge GIL ROSTRA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tunable Stressed Polycrystalline Silicon on Dielectrics in an Integ...
- Publication number 20150318394
- Publication date Nov 5, 2015
- INFINEON TECHNOLOGIES AG
- Matthias Hierlemann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...
- Publication number 20150214031
- Publication date Jul 30, 2015
- Hitachi Kokusai Electric Inc.
- Yushin TAKASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the material containing aluminium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for forming a metal silicate film on a substrate in a react...

Device of dielectric layer

Semiconductor structure and its formation method

Methods for forming a metal silicate film on a substrate in a react...

Semiconductor device having improved overlay shift tolerance

Plasma enhanced deposition processes for controlled formation of me...

Methods for forming a metal silicate film on a substrate in a react...

Enhancement mode III-nitride devices having an Al1-xSixO gate insul...

Methods for depositing a transition metal chalcogenide film on a su...

Semiconductor device and method of manufacturing the same

Method for manufacturing a semiconductor device

Device of dielectric layer

Selective removal of an etching stop layer for improving overlay sh...

Laminated body and semiconductor device

Methods for depositing a transition metal chalcogenide film on a su...

Methods for forming a metal silicate film on a substrate in a react...

Electron emission device and method for manufacturing the same

Semiconductor device having a memory and manufacturing method thereof

Capacitor, method for manufacturing same, and wireless communicatio...

Device and method of dielectric layer

Interconnection structures and fabrication methods thereof

Composite dielectric interface layers for interconnect structures

Method and apparatus for improved etch stop layer or hard mask laye...

Device and method of dielectric layer

Method and apparatus for filling a gap

Composite dielectric interface layers for interconnect structures

Substrate processing apparatus for forming film including at least...

Method for forming III-V semiconductor structures including aluminu...

Semiconductor device

Method of manufacturing semiconductor device and glass film forming...

Patents Applicationslast 30 patents

DEVICE OF DIELECTRIC LAYER

METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...

SEMICONDUCTOR STRUCTURE

METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...

METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SU...

SEMICONDUCTOR STRUCTURE AND ITS FORMATION METHOD

DEVICE OF DIELECTRIC LAYER

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

ENHANCEMENT MODE III-NITRIDE DEVICES HAVING AN AL1-XSIXO GATE INSUL...

METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...

METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SU...

SEMICONDUCTOR DEVICE HAVING A MEMORY AND MANUFACTURING METHOD THEREOF

METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SU...

METHODS FOR FORMING A METAL SILICATE FILM ON A SUBSTRATE IN A REACT...

DEVICE OF DIELECTRIC LAYER

Selective Removal of an Etching Stop Layer for Improving Overlay Sh...

ELECTRON EMISSION DEVICE AND METHOD FOR MANUFACTURING THE SAME

DEVICE AND METHOD OF DIELECTRIC LAYER

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD AND APPARATUS FOR IMPROVED ETCH STOP LAYER OR HARD MASK LAYE...

PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...

COMPOSITE DIELECTRIC INTERFACE LAYERS FOR INTERCONNECT STRUCTURES

INTERCONNECTION STRUCTURES AND FABRICATION METHODS THEREOF

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST...

SEMICONDUCTOR DEVICE

METHOD FOR PRODUCING A DIELECTRIC AND/OR BARRIER LAYER OR MULTILAYE...

Tunable Stressed Polycrystalline Silicon on Dielectrics in an Integ...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...