the material containing aluminium

Industry

CPC
H01L21/02178

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02178the material containing aluminium

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device and semiconductor devices
- Patent number 12,148,656
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Min Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-deposition treatment for FET technology and devices formed thereby
- Patent number 12,142,531
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Yen Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of semiconductor device
- Patent number 12,136,663
- Issue date Nov 5, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synaptic transistor with long-term and short-term memory
- Patent number 12,132,110
- Issue date Oct 29, 2024
- Kookmin University Industry Academy Cooperation Foundation
- Dae Hwan Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and epitaxial oxide device with impact ionization
- Patent number 12,125,946
- Issue date Oct 22, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for filling a gap feature on a substrate surface and relate...
- Patent number 12,119,220
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- Leo Salmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 12,112,953
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wan Hsuan Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for metal oxide post-treatment
- Patent number 12,110,589
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial oxide device with impact ionization
- Patent number 12,095,006
- Issue date Sep 17, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide materials, structures, and devices
- Patent number 12,087,880
- Issue date Sep 10, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with nanofog oxide adhered to inert or weak...
- Patent number 12,080,549
- Issue date Sep 3, 2024
- The Regents of the University of California
- Iljo Kwak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor memory devices and methods of fabricating the same
- Patent number 12,082,395
- Issue date Sep 3, 2024
- Samsung Electronics Co., Ltd.
- Kyooho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an extra low-k dielectric layer and met...
- Patent number 12,062,613
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices including gate barrier layers
- Patent number 12,051,721
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode formation
- Patent number 12,046,658
- Issue date Jul 23, 2024
- Micron Technology, Inc.
- An-Jen B. Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 12,040,226
- Issue date Jul 16, 2024
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device of dielectric layer
- Patent number 12,034,075
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistors comprising two-dimensional materials and related memory...
- Patent number 12,015,089
- Issue date Jun 18, 2024
- Micron Technology, Inc.
- Witold Kula
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor power device and method for producing same
- Patent number 12,009,213
- Issue date Jun 11, 2024
- Rohm Co., Ltd.
- Yuki Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with metal cap layer and method for manufac...
- Patent number 12,009,403
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor Fin cutting process and structures formed thereby
- Patent number 11,990,375
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,990,333
- Issue date May 21, 2024
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-cost method of making a hard mask for high resolution and low d...
- Patent number 11,990,344
- Issue date May 21, 2024
- Corporation for National Research Initiatives
- Michael A. Huff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cuprous oxide devices and formation methods
- Patent number 11,984,315
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Marcus Johannes Henricus van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method for manufacturing semicon...
- Patent number 11,976,362
- Issue date May 7, 2024
- Kioxia Corporation
- Takashi Asano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous layers for reducing copper diffusion and method forming same
- Patent number 11,967,522
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jyh-Nan Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling stress variation in a material...
- Patent number 11,961,722
- Issue date Apr 16, 2024
- SPTS Technologies Limited
- Anthony Wilby
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Cyclic plasma processing
- Patent number 11,961,735
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Yun Han
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Display substrate and manufacturing method therefor, and display de...
- Patent number 11,961,848
- Issue date Apr 16, 2024
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Jun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative capacitance transistor with external ferroelectric structure
- Patent number 11,961,897
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELF-ALIGNED INTERCONNECTION STRUCTURE AND MANUFACTURING METHOD THE...
- Publication number 20240387250
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Fang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20240373620
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- KYOOHO JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES
- Publication number 20240372035
- Publication date Nov 7, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND MET...
- Publication number 20240371769
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Cheng SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Semiconductor Devices Including Gate Barrier Layers
- Publication number 20240355880
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...
- Publication number 20240347465
- Publication date Oct 17, 2024
- Intel Corporation
- Atul MADHAVAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTA...
- Publication number 20240347336
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Nitin Deepak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND ELECTRONIC DEVICES INCLUDING TRANSISTORS COMPRISING T...
- Publication number 20240339543
- Publication date Oct 10, 2024
- Micron Technology, Inc.
- Witold Kula
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20240332008
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aluminum Nitride Dipole Dopant Film for Tuning Multi-VT Devices
- Publication number 20240332004
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi On Chui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20240332419
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR POWER DEVICE AND METHOD FOR PRODUCING SAME
- Publication number 20240304447
- Publication date Sep 12, 2024
- Rohm Co., Ltd.
- Yuki Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUPROUS OXIDE DEVICES AND FORMATION METHODS
- Publication number 20240297037
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Marcus Johannes Henricus van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20240295022
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITE SUBSTRATE AND PREPARATION METHOD THEREOF, AND SEMICONDUCT...
- Publication number 20240297069
- Publication date Sep 5, 2024
- ENKRIS SEMICONDUCTOR, INC.
- Kai CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIELD-EFFECT TRANSISTORS WITH A GATE DIELECTRIC LAYER FORMED ON A S...
- Publication number 20240290617
- Publication date Aug 29, 2024
- GLOBALFOUNDRIES U.S. Inc.
- James A. Cooper
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fin Cutting Process and Structures Formed Thereby
- Publication number 20240282638
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS
- Publication number 20240282624
- Publication date Aug 22, 2024
- Intel Corporation
- Sean KING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Structure Having High Breakdown Voltage Etch-Stop Layer
- Publication number 20240266292
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Joung-Wei Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE CAPACITANCE TRANSISTOR WITH EXTERNAL FERROELECTRIC STRUCTURE
- Publication number 20240266417
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE TRANSISTOR
- Publication number 20240266469
- Publication date Aug 8, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER HYDROPHOBIC FILM
- Publication number 20240263303
- Publication date Aug 8, 2024
- SPTS Technologies Ltd.
- Michael Grimes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS LAYERS FOR REDUCING COPPER DIFFUSION AND METHOD FORMING SAME
- Publication number 20240258160
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jyh-Nan Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL OXIDE TRANSISTOR
- Publication number 20240258460
- Publication date Aug 1, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM THICK OXIDATION GROWTH IN HIGH ASPECT RATIO FEATURES
- Publication number 20240242962
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- Dimitrios PAVLOPOULOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR FORMING STRUCTURES COMPRISING A THRESHOLD V...
- Publication number 20240234129
- Publication date Jul 11, 2024
- ASM IP HOLDING B.V.
- Charles Dezelah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Display Apparatus
- Publication number 20240222417
- Publication date Jul 4, 2024
- LG Display Co., Ltd.
- Hyoungsun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SU...
- Publication number 20240222111
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING AN INTEGRATED DEVICE COMPISING ANODIC POROU...
- Publication number 20240213018
- Publication date Jun 27, 2024
- Murata Manufacturing Co., Ltd.
- Brigitte SOULIER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING AN OXIDE FILM ON A SUBSTRATE BY A CYCLICAL D...
- Publication number 20240186138
- Publication date Jun 6, 2024
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the material containing aluminium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor device and semiconductor devices

Pre-deposition treatment for FET technology and devices formed thereby

Semiconductor device and manufacturing method of semiconductor device

Synaptic transistor with long-term and short-term memory

Method and epitaxial oxide device with impact ionization

Methods for filling a gap feature on a substrate surface and relate...

Semiconductor devices and methods of manufacturing

Methods for metal oxide post-treatment

Epitaxial oxide device with impact ionization

Epitaxial oxide materials, structures, and devices

Semiconductor structure with nanofog oxide adhered to inert or weak...

Semiconductor memory devices and methods of fabricating the same

Semiconductor device having an extra low-k dielectric layer and met...

Methods of forming semiconductor devices including gate barrier layers

Electrode formation

Conformal low temperature hermetic dielectric diffusion barriers

Device of dielectric layer

Transistors comprising two-dimensional materials and related memory...

Semiconductor power device and method for producing same

Semiconductor structure with metal cap layer and method for manufac...

Semiconductor Fin cutting process and structures formed thereby

Method and apparatus for filling a gap

Low-cost method of making a hard mask for high resolution and low d...

Cuprous oxide devices and formation methods

Substrate processing apparatus and method for manufacturing semicon...

Amorphous layers for reducing copper diffusion and method forming same

Method and apparatus for controlling stress variation in a material...

Cyclic plasma processing

Display substrate and manufacturing method therefor, and display de...

Negative capacitance transistor with external ferroelectric structure

Patents Applicationslast 30 patents

SELF-ALIGNED INTERCONNECTION STRUCTURE AND MANUFACTURING METHOD THE...

SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME

EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES

SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND MET...

Methods of Forming Semiconductor Devices Including Gate Barrier Layers

CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...

COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTA...

APPARATUS AND ELECTRONIC DEVICES INCLUDING TRANSISTORS COMPRISING T...

INTEGRATED DIPOLE REGION FOR TRANSISTOR

Aluminum Nitride Dipole Dopant Film for Tuning Multi-VT Devices

DEVICE OF DIELECTRIC LAYER

SEMICONDUCTOR POWER DEVICE AND METHOD FOR PRODUCING SAME

CUPROUS OXIDE DEVICES AND FORMATION METHODS

PROCESSING METHOD AND PROCESSING APPARATUS

COMPOSITE SUBSTRATE AND PREPARATION METHOD THEREOF, AND SEMICONDUCT...

FIELD-EFFECT TRANSISTORS WITH A GATE DIELECTRIC LAYER FORMED ON A S...

Semiconductor Fin Cutting Process and Structures Formed Thereby

CONFORMAL LOW TEMPERATURE HERMETIC DIELECTRIC DIFFUSION BARRIERS

Semiconductor Structure Having High Breakdown Voltage Etch-Stop Layer

NEGATIVE CAPACITANCE TRANSISTOR WITH EXTERNAL FERROELECTRIC STRUCTURE

EPITAXIAL OXIDE TRANSISTOR

MULTILAYER HYDROPHOBIC FILM

AMORPHOUS LAYERS FOR REDUCING COPPER DIFFUSION AND METHOD FORMING SAME

EPITAXIAL OXIDE TRANSISTOR

BOTTOM THICK OXIDATION GROWTH IN HIGH ASPECT RATIO FEATURES

METHODS AND SYSTEMS FOR FORMING STRUCTURES COMPRISING A THRESHOLD V...

Display Apparatus

METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SU...

METHOD OF MANUFACTURING AN INTEGRATED DEVICE COMPISING ANODIC POROU...

METHODS FOR DEPOSITING AN OXIDE FILM ON A SUBSTRATE BY A CYCLICAL D...