the material containing hafnium

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CPC
H01L21/02181

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02181the material containing hafnium

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Film formation method and film formation apparatus
- Patent number 12,341,004
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yumiko Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with fin structures
- Patent number 12,342,605
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kun-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric semiconductor device and method
- Patent number 12,336,216
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Cheng Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices devices including crystallized layer having m...
- Patent number 12,322,595
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,315,864
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resistivity silicon-on-insulator substrate comprising an isola...
- Patent number 12,300,535
- Issue date May 13, 2025
- GlobalWafers Co., Ltd.
- Igor Peidous
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric thin-film structure and electronic device including t...
- Patent number 12,283,629
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Yunseong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High bandwidth package structure
- Patent number 12,278,166
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Harry-Haklay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling in a direct-bonded interface for microelectroni...
- Patent number 12,272,673
- Issue date Apr 8, 2025
- ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
- Belgacem Haba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunability of dopant concentration in thin hafnium oxide films
- Patent number 12,261,037
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Golnaz Karbasian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to improve device performance
- Patent number 12,249,511
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor devices
- Patent number 12,237,265
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Sangoh Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device
- Patent number 12,237,324
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Jangeun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Long-term implantable electronic devices
- Patent number 12,220,239
- Issue date Feb 11, 2025
- Northwestern University
- John A. Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a field effect transistor using carbon nano...
- Patent number 12,218,198
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, gas nozzle and method of manufactur...
- Patent number 12,188,124
- Issue date Jan 7, 2025
- Kokusai Electric Corporation
- Yuji Takebayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Source/drain feature separation structure
- Patent number 12,178,032
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide composite as etch stop layer
- Patent number 12,176,247
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai-Fang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective passivation and selective deposition
- Patent number 12,170,197
- Issue date Dec 17, 2024
- ASM IP Holding B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of oxide thin films
- Patent number 12,154,785
- Issue date Nov 26, 2024
- ASM IP Holding B.V.
- Suvi P. Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of semiconductor device
- Patent number 12,136,663
- Issue date Nov 5, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,125,872
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Han Jin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NMOS and PMOS transistor gates with hafnium oxide layers and lantha...
- Patent number 12,107,015
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device including ferroelectric layer
- Patent number 12,094,971
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Yunseong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with nanofog oxide adhered to inert or weak...
- Patent number 12,080,549
- Issue date Sep 3, 2024
- The Regents of the University of California
- Iljo Kwak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,080,553
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory devices and methods of fabricating the same
- Patent number 12,082,395
- Issue date Sep 3, 2024
- Samsung Electronics Co., Ltd.
- Kyooho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition using hydrophobic precursors
- Patent number 12,080,548
- Issue date Sep 3, 2024
- ASM IP Holding B.V.
- Elina Färm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIEL...
- Publication number 20250201572
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kate Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABILITY OF DOPANT CONCENTRATION IN THIN HAFNIUM OXIDE FILMS
- Publication number 20250191908
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Golnaz Karbasian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING THIN FILM
- Publication number 20250188607
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Jungmin Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Dielectric Capping for Hybrid Bonding
- Publication number 20250149474
- Publication date May 8, 2025
- Applied Materials, Inc.
- Prayudi LIANTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A FIELD EFFECT TRANSISTOR USING CARBON NANO...
- Publication number 20250151347
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matthias PASSLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT WITH INTEGRATED ETCH STOP LAYER
- Publication number 20250142949
- Publication date May 1, 2025
- TESSERA LLC
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE COMPOSITE AS ETCH STOP LAYER
- Publication number 20250132197
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Feng Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE/DRAIN FEATURE SEPARATION STRUCTURE
- Publication number 20250133716
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITING COMPOSITION INCLUDING GROUP 4 METAL ELEMENT-CONTAIN...
- Publication number 20250109496
- Publication date Apr 3, 2025
- UP CHEMICAL CO., LTD.
- Byung Kwan KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-INSULATOR-METAL (MIM) CAPACITORS WITH IMPROVED RELIABILITY
- Publication number 20250089277
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Yueh Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20250079176
- Publication date Mar 6, 2025
- Sumitomo Electric Industries, Ltd.
- Akihiro HAYASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HAFNIUM-CONTAINING STRUCTURES AND RELATED METHODS AND SYSTEMS
- Publication number 20250079155
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Fatemeh Davodi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250079158
- Publication date Mar 6, 2025
- Sumitomo Electric Industries, Ltd.
- Takahide HIRASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...
- Publication number 20250079157
- Publication date Mar 6, 2025
- Entegris, Inc.
- Rong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM MANUFACTURING METHOD AND THIN FILM
- Publication number 20250069886
- Publication date Feb 27, 2025
- Jusung Engineering Co., Ltd.
- Duck Ho KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20250069885
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-INSULATOR-METAL DEVICE WITH HIGH-K LAYER CAPPING STRUCTURE
- Publication number 20250056820
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Liang-Shiuan Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF OXIDE THIN FILMS
- Publication number 20250037995
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250019815
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Shimon OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON CARBIDE DEVICE
- Publication number 20250006814
- Publication date Jan 2, 2025
- INFINEON TECHNOLOGIES AG
- Wolfgang LEHNERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250006490
- Publication date Jan 2, 2025
- Kokusai Electric Corporation
- Yoshimasa NAGATOMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K ISOLATION OF FIN STRUCTURES
- Publication number 20240429312
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM
- Publication number 20240420958
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Venkata Surya Naga Raju Chava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240420954
- Publication date Dec 19, 2024
- SK HYNIX INC.
- Se-Hun KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240412971
- Publication date Dec 12, 2024
- SK HYNIX INC.
- Se-Hun KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERRO...
- Publication number 20240395895
- Publication date Nov 28, 2024
- Entegris, Inc.
- Jun-Fei Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K GATE DIELECTRIC
- Publication number 20240395896
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hao Pao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GAP FILLING FOR SEMICONDUCTOR DEVICE
- Publication number 20240387704
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Te-Yang Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DYNAMICALLY ADJUSTING THIN-FILM DEPOSITION PA...
- Publication number 20240376605
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Liang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the material containing hafnium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film formation method and film formation apparatus

Semiconductor device with fin structures

Ferroelectric semiconductor device and method

Semiconductor devices devices including crystallized layer having m...

Method of manufacturing a semiconductor device and a semiconductor...

High resistivity silicon-on-insulator substrate comprising an isola...

Ferroelectric thin-film structure and electronic device including t...

High bandwidth package structure

Capacitive coupling in a direct-bonded interface for microelectroni...

Tunability of dopant concentration in thin hafnium oxide films

Treatments to improve device performance

Methods of manufacturing semiconductor devices

Integrated circuit device

Long-term implantable electronic devices

Method of manufacturing a field effect transistor using carbon nano...

Flowable chemical vapor deposition of metal oxides

Substrate processing apparatus, gas nozzle and method of manufactur...

Source/drain feature separation structure

Metal oxide composite as etch stop layer

Selective passivation and selective deposition

Deposition of oxide thin films

Semiconductor device and manufacturing method of semiconductor device

Semiconductor device

NMOS and PMOS transistor gates with hafnium oxide layers and lantha...

Electronic device including ferroelectric layer

Semiconductor structure with nanofog oxide adhered to inert or weak...

Semiconductor device and method of manufacture

Selective in-situ cleaning of high-k films from processing chamber...

Semiconductor memory devices and methods of fabricating the same

Selective deposition using hydrophobic precursors

Patents Applicationslast 30 patents

METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIEL...

TUNABILITY OF DOPANT CONCENTRATION IN THIN HAFNIUM OXIDE FILMS

METHOD OF MANUFACTURING THIN FILM

Selective Dielectric Capping for Hybrid Bonding

METHOD OF MANUFACTURING A FIELD EFFECT TRANSISTOR USING CARBON NANO...

GATE CUT WITH INTEGRATED ETCH STOP LAYER

METAL OXIDE COMPOSITE AS ETCH STOP LAYER

SOURCE/DRAIN FEATURE SEPARATION STRUCTURE

FILM DEPOSITING COMPOSITION INCLUDING GROUP 4 METAL ELEMENT-CONTAIN...

METAL-INSULATOR-METAL (MIM) CAPACITORS WITH IMPROVED RELIABILITY

SEMICONDUCTOR DEVICE AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE

HAFNIUM-CONTAINING STRUCTURES AND RELATED METHODS AND SYSTEMS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...

THIN FILM MANUFACTURING METHOD AND THIN FILM

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

METAL-INSULATOR-METAL DEVICE WITH HIGH-K LAYER CAPPING STRUCTURE

DEPOSITION OF OXIDE THIN FILMS

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SILICON CARBIDE DEVICE

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

HIGH-K ISOLATION OF FIN STRUCTURES

METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERRO...

HIGH-K GATE DIELECTRIC

METHOD OF GAP FILLING FOR SEMICONDUCTOR DEVICE

SYSTEM AND METHOD FOR DYNAMICALLY ADJUSTING THIN-FILM DEPOSITION PA...