the material containing hafnium

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CPC
H01L21/02181

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02181the material containing hafnium

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, gas nozzle and method of manufactur...
- Patent number 12,188,124
- Issue date Jan 7, 2025
- Kokusai Electric Corporation
- Yuji Takebayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Source/drain feature separation structure
- Patent number 12,178,032
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide composite as etch stop layer
- Patent number 12,176,247
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai-Fang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective passivation and selective deposition
- Patent number 12,170,197
- Issue date Dec 17, 2024
- ASM IP Holding B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of oxide thin films
- Patent number 12,154,785
- Issue date Nov 26, 2024
- ASM IP Holding B.V.
- Suvi P. Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of semiconductor device
- Patent number 12,136,663
- Issue date Nov 5, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,125,872
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Han Jin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NMOS and PMOS transistor gates with hafnium oxide layers and lantha...
- Patent number 12,107,015
- Issue date Oct 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device including ferroelectric layer
- Patent number 12,094,971
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Yunseong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with nanofog oxide adhered to inert or weak...
- Patent number 12,080,549
- Issue date Sep 3, 2024
- The Regents of the University of California
- Iljo Kwak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,080,553
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory devices and methods of fabricating the same
- Patent number 12,082,395
- Issue date Sep 3, 2024
- Samsung Electronics Co., Ltd.
- Kyooho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition using hydrophobic precursors
- Patent number 12,080,548
- Issue date Sep 3, 2024
- ASM IP Holding B.V.
- Elina Färm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate cut with integrated etch stop layer
- Patent number 12,074,165
- Issue date Aug 27, 2024
- TESSERA LLC
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 12,062,719
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacture
- Patent number 12,033,853
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor Fin cutting process and structures formed thereby
- Patent number 11,990,375
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cuprous oxide devices and formation methods
- Patent number 11,984,315
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Marcus Johannes Henricus van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure inspection using a high atomic number material
- Patent number 11,984,365
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Hsuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively manufacturing material layer and target pattern
- Patent number 11,976,364
- Issue date May 7, 2024
- Industry-University Cooperation Foundation Hanyang University Erica Campus
- Tae Joo Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursor solution for thin film deposition and thin film forming m...
- Patent number 11,972,941
- Issue date Apr 30, 2024
- SK TRICHEM
- Chang Sung Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negative capacitance transistor with external ferroelectric structure
- Patent number 11,961,897
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 11,942,546
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric thin-film structure and electronic device including the...
- Patent number 11,935,916
- Issue date Mar 19, 2024
- Samsung Electronics Co., Ltd.
- Hyangsook Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage regulator circuit including one or more thin-film transistors
- Patent number 11,923,371
- Issue date Mar 5, 2024
- Intel Corporation
- Abhishek A. Sharma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Modifying ferroelectric properties of hafnium oxide with hafnium ni...
- Patent number 11,923,404
- Issue date Mar 5, 2024
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing an oxide film on a substrate by a cyclical d...
- Patent number 11,923,192
- Issue date Mar 5, 2024
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capping layer for a hafnium oxide-based ferroelectric material
- Patent number 11,923,189
- Issue date Mar 5, 2024
- Lam Research Corporation
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION OF OXIDE THIN FILMS
- Publication number 20250037995
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250019815
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Shimon OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON CARBIDE DEVICE
- Publication number 20250006814
- Publication date Jan 2, 2025
- INFINEON TECHNOLOGIES AG
- Wolfgang LEHNERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250006490
- Publication date Jan 2, 2025
- Kokusai Electric Corporation
- Yoshimasa NAGATOMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K ISOLATION OF FIN STRUCTURES
- Publication number 20240429312
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM
- Publication number 20240420958
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Venkata Surya Naga Raju Chava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240420954
- Publication date Dec 19, 2024
- SK HYNIX INC.
- Se-Hun KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20240412971
- Publication date Dec 12, 2024
- SK HYNIX INC.
- Se-Hun KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERRO...
- Publication number 20240395895
- Publication date Nov 28, 2024
- Entegris, Inc.
- Jun-Fei Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K GATE DIELECTRIC
- Publication number 20240395896
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hao Pao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GAP FILLING FOR SEMICONDUCTOR DEVICE
- Publication number 20240387704
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Te-Yang Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DYNAMICALLY ADJUSTING THIN-FILM DEPOSITION PA...
- Publication number 20240376605
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Liang CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMOS FABRICATION METHODS FOR BACK-GATE TRANSISTOR
- Publication number 20240379832
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240379349
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20240373620
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- KYOOHO JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240363349
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NMOS and PMOS Transistor Gates with Hafnium Oxide Layers and Lantha...
- Publication number 20240363442
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
- Publication number 20240355926
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEGMENTED FORMATION OF GATE INTERFACE
- Publication number 20240339318
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
- Publication number 20240332010
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20240332008
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240304439
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CUPROUS OXIDE DEVICES AND FORMATION METHODS
- Publication number 20240297037
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Marcus Johannes Henricus van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20240295022
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Fin Cutting Process and Structures Formed Thereby
- Publication number 20240282638
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF METAL OXIDE
- Publication number 20240282572
- Publication date Aug 22, 2024
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE INSPECTION USING A HIGH ATOMIC NUMBER MATERIAL
- Publication number 20240266232
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Hsuan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE CAPACITANCE TRANSISTOR WITH EXTERNAL FERROELECTRIC STRUCTURE
- Publication number 20240266417
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME
- Publication number 20240266418
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- Sanghyun JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING MATERIAL, FILM-FORMING COMPOSITION, FILM-FORMING METHO...
- Publication number 20240240318
- Publication date Jul 18, 2024
- Soulbrain Co., LTD
- Jong Moon KIM
- C01 - INORGANIC CHEMISTRY

the material containing hafnium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Flowable chemical vapor deposition of metal oxides

Substrate processing apparatus, gas nozzle and method of manufactur...

Source/drain feature separation structure

Metal oxide composite as etch stop layer

Selective passivation and selective deposition

Deposition of oxide thin films

Semiconductor device and manufacturing method of semiconductor device

Semiconductor device

NMOS and PMOS transistor gates with hafnium oxide layers and lantha...

Electronic device including ferroelectric layer

Semiconductor structure with nanofog oxide adhered to inert or weak...

Semiconductor device and method of manufacture

Selective in-situ cleaning of high-k films from processing chamber...

Semiconductor memory devices and methods of fabricating the same

Selective deposition using hydrophobic precursors

Gate cut with integrated etch stop layer

Semiconductor device and method for forming the same

Semiconductor devices and methods of manufacture

Semiconductor Fin cutting process and structures formed thereby

Cuprous oxide devices and formation methods

Semiconductor structure inspection using a high atomic number material

Method for selectively manufacturing material layer and target pattern

Precursor solution for thin film deposition and thin film forming m...

Negative capacitance transistor with external ferroelectric structure

Semiconductor device and method for forming the same

Dielectric thin-film structure and electronic device including the...

Voltage regulator circuit including one or more thin-film transistors

Modifying ferroelectric properties of hafnium oxide with hafnium ni...

Methods for depositing an oxide film on a substrate by a cyclical d...

Capping layer for a hafnium oxide-based ferroelectric material

Patents Applicationslast 30 patents

DEPOSITION OF OXIDE THIN FILMS

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SILICON CARBIDE DEVICE

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

HIGH-K ISOLATION OF FIN STRUCTURES

METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERRO...

HIGH-K GATE DIELECTRIC

METHOD OF GAP FILLING FOR SEMICONDUCTOR DEVICE

SYSTEM AND METHOD FOR DYNAMICALLY ADJUSTING THIN-FILM DEPOSITION PA...

CMOS FABRICATION METHODS FOR BACK-GATE TRANSISTOR

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

NMOS and PMOS Transistor Gates with Hafnium Oxide Layers and Lantha...

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

SEGMENTED FORMATION OF GATE INTERFACE

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE

INTEGRATED DIPOLE REGION FOR TRANSISTOR

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

CUPROUS OXIDE DEVICES AND FORMATION METHODS

PROCESSING METHOD AND PROCESSING APPARATUS

Semiconductor Fin Cutting Process and Structures Formed Thereby

SELECTIVE DEPOSITION OF METAL OXIDE

SEMICONDUCTOR STRUCTURE INSPECTION USING A HIGH ATOMIC NUMBER MATERIAL

NEGATIVE CAPACITANCE TRANSISTOR WITH EXTERNAL FERROELECTRIC STRUCTURE

THIN FILM STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME

FILM-FORMING MATERIAL, FILM-FORMING COMPOSITION, FILM-FORMING METHO...