the material containing silicon and at least one metal element

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H01L21/02142

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02142the material containing silicon and at least one metal element

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor film composition, method for manufacturing semiconduc...
- Patent number 11,965,109
- Issue date Apr 23, 2024
- Mitsui Chemicals, Inc.
- Yasuhisa Kayaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having improved overlay shift tolerance
- Patent number 11,664,237
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of me...
- Patent number 11,501,965
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having semiconductor alloy layer adjacent a ga...
- Patent number 11,380,762
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors and flowable CVD methods for making low-K films to fill...
- Patent number 11,017,998
- Issue date May 25, 2021
- VERSUM MATERIALS US, LLC
- Jianheng Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Device of dielectric layer
- Patent number 11,018,258
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Residual removal
- Patent number 10,964,527
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal of an etching stop layer for improving overlay sh...
- Patent number 10,867,805
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure stack
- Patent number 10,825,691
- Issue date Nov 3, 2020
- Micron Technology, Inc.
- Che-Chi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with silicided source/drain region
- Patent number 10,818,754
- Issue date Oct 27, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor film composition, method of manufacturing semiconduct...
- Patent number 10,759,964
- Issue date Sep 1, 2020
- Mitsui Chemicals, Inc.
- Yasuhisa Kayaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor film composition, method for manufacturing semiconduc...
- Patent number 10,752,805
- Issue date Aug 25, 2020
- MITSUI CHEMICALS, INC.
- Yasuhisa Kayaba
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acetylide-based silicon precursors and their use as ALD/CVD precursors
- Patent number 10,699,897
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device or display device including the same
- Patent number 10,580,641
- Issue date Mar 3, 2020
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method of dielectric layer
- Patent number 10,510,895
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt silicidation process for substrates comprised with a silicon...
- Patent number 10,446,646
- Issue date Oct 15, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing a thin film
- Patent number 10,381,217
- Issue date Aug 13, 2019
- WONIK IPS CO., LTD.
- Byung Chul Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Field-effect transistor (FET) having oxide insulating layer dispose...
- Patent number 10,312,373
- Issue date Jun 4, 2019
- Ricoh Company, Ltd.
- Sadanori Arae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method of dielectric layer
- Patent number 10,290,739
- Issue date May 14, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors of manganese and manganese-based compounds for copper di...
- Patent number 10,283,352
- Issue date May 7, 2019
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device or display device including the same
- Patent number 10,043,659
- Issue date Aug 7, 2018
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device or display device including the same
- Patent number 10,043,660
- Issue date Aug 7, 2018
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and glass film forming...
- Patent number 9,978,882
- Issue date May 22, 2018
- SHINDENGEN ELECTRIC MANUFACTURING CO., LTD.
- Shinichi Nagase
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Tuning strain in semiconductor devices
- Patent number 9,941,404
- Issue date Apr 10, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jean-Pierre Colinge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET and method for forming the same
- Patent number 9,893,182
- Issue date Feb 13, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Yong Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask structure forming method and film forming apparatus
- Patent number 9,852,907
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of manufacturing semiconductor devices including isolation...
- Patent number 9,721,830
- Issue date Aug 1, 2017
- Samsung Electronics Co., Ltd.
- Seok-han Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt silicidation process for substrates comprised with a silicon...
- Patent number 9,673,280
- Issue date Jun 6, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatus and system for forming a dielectric field for du...
- Patent number 9,530,691
- Issue date Dec 27, 2016
- GLOBALFOUNDRIES Inc.
- Xunyuan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal hardmask composition and processes for forming fine patterns...
- Patent number 9,499,698
- Issue date Nov 22, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG)S.A.R.L.
- Huirong Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230122575
- Publication date Apr 20, 2023
- Mitsubishi Electric Corporation
- Koji TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE P...
- Publication number 20220068639
- Publication date Mar 3, 2022
- ASM IP HOLDING B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION ON METAL OR METALLIC SURFACES RELATIVE TO DIEL...
- Publication number 20220025513
- Publication date Jan 27, 2022
- ASM IP HOLDING B.V.
- Suvi P. Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20210280710
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Precursors and Flowable CVD Methods for Making Low-K Films to Fill...
- Publication number 20210043446
- Publication date Feb 11, 2021
- VERSUM MATERIALS US, LLC
- Jianheng Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUC...
- Publication number 20200347265
- Publication date Nov 5, 2020
- Mitsui Chemicals, Inc.
- Yasuhisa KAYABA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH SELECTIVITY ATOMIC LAYER DEPOSITION PROCESS
- Publication number 20200283898
- Publication date Sep 10, 2020
- Applied Materials, Inc.
- Jong Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20200119184
- Publication date Apr 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES HAVING A SILICON-GERMANIUM LAYER
- Publication number 20200044030
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal of an Etching Stop Layer for Improving Overlay Sh...
- Publication number 20200006083
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIDUAL REMOVAL
- Publication number 20190393024
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF DIELECTRIC LAYER
- Publication number 20190267485
- Publication date Aug 29, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...
- Publication number 20180350587
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE OR DISPLAY DEVICE INCLUDING THE SAME
- Publication number 20180337039
- Publication date Nov 22, 2018
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR FILM COMPOSITION, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20180327547
- Publication date Nov 15, 2018
- Mitsui Chemicals, Inc.
- Yasuhisa KAYABA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Precursors and Flowable CVD Methods for Making Low-K Films to Fill...
- Publication number 20180315598
- Publication date Nov 1, 2018
- VERSUM MATERIALS US, LLC
- Jianheng Li
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DEVICE WITH SILICIDED SOURCE/DRAIN REGION
- Publication number 20180197955
- Publication date Jul 12, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING A THIN FILM
- Publication number 20180166270
- Publication date Jun 14, 2018
- WONIK IPS CO., LTD.
- Byung Chul CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE OR DISPLAY DEVICE INCLUDING THE SAME
- Publication number 20170338107
- Publication date Nov 23, 2017
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE OR DISPLAY DEVICE INCLUDING THE SAME
- Publication number 20170338108
- Publication date Nov 23, 2017
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cobalt Silicidation Process for Substrates Comprised with a Silicon...
- Publication number 20170271449
- Publication date Sep 21, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK STRUCTURE FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20170263455
- Publication date Sep 14, 2017
- TOKYO ELECTRON LIMITED
- Masahisa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, DISPLAY, SYSTEM, AND METH...
- Publication number 20170141237
- Publication date May 18, 2017
- RICOH COMPANY, LTD.
- Sadanori ARAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES AND METHODS OF CREATING ELASTIC RELAXATION OF EPITAXIALLY G...
- Publication number 20170077234
- Publication date Mar 16, 2017
- GLOBALFOUNDRIES INC.
- Neeraj TRIPATHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES INCLUDING ISOLATION...
- Publication number 20170018453
- Publication date Jan 19, 2017
- Samsung Electronics Co., Ltd.
- Seok-han PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cobalt silicidation process for substrates comprised with a silicon...
- Publication number 20160240372
- Publication date Aug 18, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING FILM HAVING LOW RESISTANCE AND SHALLOW JUNCTION...
- Publication number 20160240367
- Publication date Aug 18, 2016
- ASM IP HOLDING B.V.
- Yosuke Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...
- Publication number 20160218067
- Publication date Jul 28, 2016
- Kabushiki Kaisha Toshiba
- Shingo MASUKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET AND METHOD FOR FORMING THE SAME
- Publication number 20160197182
- Publication date Jul 7, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- YONG LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tuning Strain in Semiconductor Devices
- Publication number 20150214333
- Publication date Jul 30, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jean-Pierre Colinge
- H01 - BASIC ELECTRIC ELEMENTS

the material containing silicon and at least one metal element

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor film composition, method for manufacturing semiconduc...

Semiconductor device having improved overlay shift tolerance

Plasma enhanced deposition processes for controlled formation of me...

Semiconductor device having semiconductor alloy layer adjacent a ga...

Precursors and flowable CVD methods for making low-K films to fill...

Device of dielectric layer

Residual removal

Selective removal of an etching stop layer for improving overlay sh...

Semiconductor structure stack

Semiconductor device with silicided source/drain region

Semiconductor film composition, method of manufacturing semiconduct...

Semiconductor film composition, method for manufacturing semiconduc...

Acetylide-based silicon precursors and their use as ALD/CVD precursors

Semiconductor device or display device including the same

Device and method of dielectric layer

Cobalt silicidation process for substrates comprised with a silicon...

Method of depositing a thin film

Field-effect transistor (FET) having oxide insulating layer dispose...

Device and method of dielectric layer

Precursors of manganese and manganese-based compounds for copper di...

Semiconductor device or display device including the same

Semiconductor device or display device including the same

Method of manufacturing semiconductor device and glass film forming...

Tuning strain in semiconductor devices

FinFET and method for forming the same

Mask structure forming method and film forming apparatus

Methods of manufacturing semiconductor devices including isolation...

Cobalt silicidation process for substrates comprised with a silicon...

Methods, apparatus and system for forming a dielectric field for du...

Metal hardmask composition and processes for forming fine patterns...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE P...

SELECTIVE DEPOSITION ON METAL OR METALLIC SURFACES RELATIVE TO DIEL...

DEVICE OF DIELECTRIC LAYER

Precursors and Flowable CVD Methods for Making Low-K Films to Fill...

SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUC...

HIGH SELECTIVITY ATOMIC LAYER DEPOSITION PROCESS

DEVICE OF DIELECTRIC LAYER

DEVICES HAVING A SILICON-GERMANIUM LAYER

Selective Removal of an Etching Stop Layer for Improving Overlay Sh...

RESIDUAL REMOVAL

DEVICE AND METHOD OF DIELECTRIC LAYER

PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...

SEMICONDUCTOR DEVICE OR DISPLAY DEVICE INCLUDING THE SAME

SEMICONDUCTOR FILM COMPOSITION, METHOD OF MANUFACTURING SEMICONDUCT...

Precursors and Flowable CVD Methods for Making Low-K Films to Fill...

SEMICONDUCTOR DEVICE WITH SILICIDED SOURCE/DRAIN REGION

METHOD OF DEPOSITING A THIN FILM

SEMICONDUCTOR DEVICE OR DISPLAY DEVICE INCLUDING THE SAME

SEMICONDUCTOR DEVICE OR DISPLAY DEVICE INCLUDING THE SAME

Cobalt Silicidation Process for Substrates Comprised with a Silicon...

MASK STRUCTURE FORMING METHOD AND FILM FORMING APPARATUS

FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, DISPLAY, SYSTEM, AND METH...

DEVICES AND METHODS OF CREATING ELASTIC RELAXATION OF EPITAXIALLY G...

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES INCLUDING ISOLATION...

Cobalt silicidation process for substrates comprised with a silicon...

METHOD FOR FORMING FILM HAVING LOW RESISTANCE AND SHALLOW JUNCTION...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...

FINFET AND METHOD FOR FORMING THE SAME

Tuning Strain in Semiconductor Devices