the material containing titanium

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CPC
H01L21/02153

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02153the material containing titanium

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Film formation method and film formation device
- Patent number 12,183,572
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Yumiko Kawano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact structure for semiconductor device and method
- Patent number 12,166,078
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yan-Ming Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices and semiconductor dev...
- Patent number 12,142,682
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chandrashekhar Prakash Savant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt fill for gate structures
- Patent number 11,996,328
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for P-FET
- Patent number 11,996,455
- Issue date May 28, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,967,500
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Arito Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having improved overlay shift tolerance
- Patent number 11,664,237
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,658,218
- Issue date May 23, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,562,905
- Issue date Jan 24, 2023
- Kokusai Electric Corporation
- Motomu Degai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt fill for gate structures
- Patent number 11,501,999
- Issue date Nov 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of me...
- Patent number 11,501,965
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact structure for semiconductor device and method
- Patent number 11,335,774
- Issue date May 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yan-Ming Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,289,579
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices using a capping layer...
- Patent number 11,081,584
- Issue date Aug 3, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chandrashekhar Prakash Savant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal of an etching stop layer for improving overlay sh...
- Patent number 10,867,805
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 10,734,218
- Issue date Aug 4, 2020
- Kokusai Electric Corporation
- Arito Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor, method for manufacturing same, and wireless communicatio...
- Patent number 10,636,866
- Issue date Apr 28, 2020
- Toray Industries, Inc.
- Hiroji Shimizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Titanium compound based hard mask films
- Patent number 10,347,488
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Rui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable gapfill using solvents
- Patent number 10,280,507
- Issue date May 7, 2019
- Applied Materials, Inc.
- Ranga Rao Arnepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a semiconductor device comprising titanium silico...
- Patent number 10,032,625
- Issue date Jul 24, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hao Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus for forming film including at least...
- Patent number 10,026,607
- Issue date Jul 17, 2018
- Hitachi Kokusai Electric, Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable gapfill using solvents
- Patent number 10,017,856
- Issue date Jul 10, 2018
- Applied Materials, Inc.
- Ranga Rao Arnepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of growing oxide thin films
- Patent number 9,514,956
- Issue date Dec 6, 2016
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device for forming film inclu...
- Patent number 9,478,417
- Issue date Oct 25, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,971
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of manufacturing a semiconductor device by for...
- Patent number 9,385,013
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device by forming a film on...
- Patent number 9,384,966
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device by forming a film on...
- Patent number 9,384,968
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,969
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device by forming a film on a...
- Patent number 9,384,972
- Issue date Jul 5, 2016
- Hitachi Kokusai Electric Inc.
- Yushin Takasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...
- Publication number 20240387734
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chandrashekhar Prakash SAVANT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT FILL FOR GATE STRUCTURES
- Publication number 20240312837
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER LAYER FOR PREVENTING ALUMINUM DIFFUSION
- Publication number 20230377879
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-TYPE DIPOLE FOR P-FET
- Publication number 20230253466
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NH RADICAL THERMAL NITRIDATION TO FORM METAL SILICON NITRIDE FILMS
- Publication number 20230178365
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cobalt Fill for Gate Structures
- Publication number 20220359283
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Liang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20220278199
- Publication date Sep 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yan-Ming Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION DEVICE
- Publication number 20220181144
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Yumiko KAWANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
P-Type Dipole For P-FET
- Publication number 20220165854
- Publication date May 26, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...
- Publication number 20220059684
- Publication date Feb 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chandrashekhar Prakash SAVANT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20210118994
- Publication date Apr 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yan-Ming Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-Type Dipole For P-FET
- Publication number 20210098581
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20200335328
- Publication date Oct 22, 2020
- Kokusai Electric Corporation
- Arito OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20200219727
- Publication date Jul 9, 2020
- Kokusai Electric Corporation
- Motomu DEGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...
- Publication number 20200135915
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chandrashekhar Prakash SAVANT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cobalt Fill for Gate Structures
- Publication number 20200105594
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chung-Liang CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal of an Etching Stop Layer for Improving Overlay Sh...
- Publication number 20200006083
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hua Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20190019673
- Publication date Jan 17, 2019
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...
- Publication number 20180350587
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWABLE GAPFILL USING SOLVENTS
- Publication number 20180298492
- Publication date Oct 18, 2018
- Applied Materials, Inc.
- Ranga Rao Arnepalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST...
- Publication number 20160329208
- Publication date Nov 10, 2016
- Hitachi Kokusai Electric Inc.
- Yushin TAKASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A SEMICONDUCTOR DEVICE COMPRISING TITANIUM SILICO...
- Publication number 20160027639
- Publication date Jan 28, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hao HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...
- Publication number 20150214031
- Publication date Jul 30, 2015
- Hitachi Kokusai Electric Inc.
- Yushin TAKASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming Metal Oxide Hardmask
- Publication number 20150056540
- Publication date Feb 26, 2015
- ASM JAPAN K.K.
- Hideaki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SEMICONDUCTOR DEVICE
- Publication number 20140363962
- Publication date Dec 11, 2014
- Cheng-Hao HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR RAPID LIQUID PHASE DEPOSITION OF FILMS
- Publication number 20120207932
- Publication date Aug 16, 2012
- Natcore Technology, Inc.
- Oleg A. Kuznetsov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming Metal Oxide Hardmask
- Publication number 20120164846
- Publication date Jun 28, 2012
- ASM JAPAN K.K.
- Jeongseok Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GROWING OXIDE THIN FILMS
- Publication number 20110104906
- Publication date May 5, 2011
- ASM INTERNATIONAL N.V.
- Eva Tois
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS OF FORMING A SEMICONDUCTOR DEVICE INCLUDING A METAL SILICON...
- Publication number 20110003477
- Publication date Jan 6, 2011
- Young-Lim Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...
- Publication number 20100130024
- Publication date May 27, 2010
- Hitachi Kokusai Electric Inc.
- Yushin TAKASAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the material containing titanium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film formation method and film formation device

Contact structure for semiconductor device and method

Method of manufacturing semiconductor devices and semiconductor dev...

Cobalt fill for gate structures

P-type dipole for P-FET

Method of manufacturing semiconductor device, substrate processing...

Semiconductor device having improved overlay shift tolerance

P-type dipole for p-FET

Method of manufacturing semiconductor device, substrate processing...

Cobalt fill for gate structures

Plasma enhanced deposition processes for controlled formation of me...

Contact structure for semiconductor device and method

P-type dipole for p-FET

Method of manufacturing semiconductor devices using a capping layer...

Selective removal of an etching stop layer for improving overlay sh...

Method of manufacturing semiconductor device, substrate processing...

Capacitor, method for manufacturing same, and wireless communicatio...

Titanium compound based hard mask films

Flowable gapfill using solvents

Method of forming a semiconductor device comprising titanium silico...

Substrate processing apparatus for forming film including at least...

Flowable gapfill using solvents

Method of growing oxide thin films

Method of manufacturing semiconductor device for forming film inclu...

Method of manufacturing semiconductor device by forming a film on a...

Method and apparatus of manufacturing a semiconductor device by for...

Method of manufacturing a semiconductor device by forming a film on...

Method of manufacturing a semiconductor device by forming a film on...

Method of manufacturing semiconductor device by forming a film on a...

Method of manufacturing semiconductor device by forming a film on a...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...

COBALT FILL FOR GATE STRUCTURES

BARRIER LAYER FOR PREVENTING ALUMINUM DIFFUSION

P-TYPE DIPOLE FOR P-FET

NH RADICAL THERMAL NITRIDATION TO FORM METAL SILICON NITRIDE FILMS

Cobalt Fill for Gate Structures

CONTACT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHOD

FILM FORMATION METHOD AND FILM FORMATION DEVICE

P-Type Dipole For P-FET

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...

CONTACT STRUCTURE FOR SEMICONDUCTOR DEVICE AND METHOD

P-Type Dipole For P-FET

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEV...

Cobalt Fill for Gate Structures

Selective Removal of an Etching Stop Layer for Improving Overlay Sh...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...

FLOWABLE GAPFILL USING SOLVENTS

SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST...

METHOD OF FORMING A SEMICONDUCTOR DEVICE COMPRISING TITANIUM SILICO...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...

Method of Forming Metal Oxide Hardmask

METHOD OF FORMING A SEMICONDUCTOR DEVICE

SYSTEMS AND METHODS FOR RAPID LIQUID PHASE DEPOSITION OF FILMS

Method of Forming Metal Oxide Hardmask

METHOD OF GROWING OXIDE THIN FILMS

METHODS OF FORMING A SEMICONDUCTOR DEVICE INCLUDING A METAL SILICON...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...