the processing being a delineation

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H01L21/02071

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02071the processing being a delineation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Treatment liquid and method for treating object to be treated
- Patent number 12,139,693
- Issue date Nov 12, 2024
- FUJIFILM Corporation
- Yasuo Sugishima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement and strip process chamber in a load lock configuration
- Patent number 12,094,715
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Martin Jeffrey Salinas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of detecting photoresist scum, method of forming semiconduct...
- Patent number 12,080,609
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective metal residue and liner cleanse for post-subtractive etch
- Patent number 12,046,511
- Issue date Jul 23, 2024
- International Business Machines Corporation
- Devika Sarkar Grant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment equipment
- Patent number 11,901,174
- Issue date Feb 13, 2024
- Organo Corporation
- Daisaku Yano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical liquid and method for treating object to be treated
- Patent number 11,859,119
- Issue date Jan 2, 2024
- FUJIFILM Corporation
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-layer line structure and method for manufacturing thereof
- Patent number 11,862,564
- Issue date Jan 2, 2024
- Dai Nippon Printing Co., Ltd.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser scribing trench opening control in wafer dicing using hybrid...
- Patent number 11,854,888
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Jungrae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,742,214
- Issue date Aug 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Junya Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical solution, method for manufacturing chemical solution, and...
- Patent number 11,732,190
- Issue date Aug 22, 2023
- FUJIFILM Corporation
- Nobuaki Sugimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor device and method for manufacture
- Patent number 11,710,777
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Ao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of workpieces using fluorocarbon plasma
- Patent number 11,651,977
- Issue date May 16, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,639,487
- Issue date May 2, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,618,867
- Issue date Apr 4, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Substrate processing apparatus, signal source device, method of pro...
- Patent number 11,569,065
- Issue date Jan 31, 2023
- Samsung Electronics Co., Ltd.
- Sung-gil Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning agent and preparation method and use thereof
- Patent number 11,549,086
- Issue date Jan 10, 2023
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Su Wang
- B08 - CLEANING
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,552,181
- Issue date Jan 10, 2023
- United Microelectronics Corp.
- Chun-Hsien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution for removing dry etching residue and method for m...
- Patent number 11,441,109
- Issue date Sep 13, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takahiro Kikunaga
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Metal gate with silicon sidewall spacers
- Patent number 11,437,518
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Han Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,424,185
- Issue date Aug 23, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,401,487
- Issue date Aug 2, 2022
- Fujifilm Electronics Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Silicon mandrel etch after native oxide punch-through
- Patent number 11,387,115
- Issue date Jul 12, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Chun Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal atomic layer etch with rapid temperature cycling
- Patent number 11,380,556
- Issue date Jul 5, 2022
- Lam Research Corporation
- Theodoros Panagopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,359,169
- Issue date Jun 14, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning formulation for removing residues on surfaces
- Patent number 11,286,444
- Issue date Mar 29, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for chemical mechanical polish cleaning
- Patent number 11,264,232
- Issue date Mar 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Ping Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Line structure and a method for producing the same
- Patent number 11,217,530
- Issue date Jan 4, 2022
- Dai Nippon Printing Co., Ltd.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement and strip process chamber in a dual loadlock configuration
- Patent number 11,177,136
- Issue date Nov 16, 2021
- APPLIED MATERIALS, INC.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with an interconnect structure and method for...
- Patent number 11,177,173
- Issue date Nov 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guo-Chiang Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stripper solutions and methods of using stripper solutions
- Patent number 11,175,587
- Issue date Nov 16, 2021
- VERSUM MATERIALS US, LLC
- Jhih Kuei Ge
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCT...
- Publication number 20240363450
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRIPPER COMPOSITION
- Publication number 20240309298
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Minhyung CHO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
ETCHING COMPOSITIONS
- Publication number 20240287384
- Publication date Aug 29, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Joshua Guske
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTI-LAYER LINE STRUCTURE
- Publication number 20240088040
- Publication date Mar 14, 2024
- DAI NIPPON PRINTING CO., LTD.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SCRIBING TRENCH OPENING CONTROL IN WAFER DICING USING HYBRID...
- Publication number 20240079273
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Jungrae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20230378281
- Publication date Nov 23, 2023
- RENESAS ELECTRONICS CORPORATION
- Kouichi KONISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL SOLUTION, METHOD FOR MANUFACTURING CHEMICAL SOLUTION, AND...
- Publication number 20230340326
- Publication date Oct 26, 2023
- FUJIFILM CORPORATION
- Nobuaki SUGIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230326758
- Publication date Oct 12, 2023
- Mitsubishi Electric Corporation
- Koichiro NISHIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE
- Publication number 20230203408
- Publication date Jun 29, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yukihisa WADA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SELECTIVE METAL RESIDUE AND LINER CLEANSE FOR POST-SUBTRACTIVE ETCH
- Publication number 20230163029
- Publication date May 25, 2023
- International Business Machines Corporation
- Devika Sarkar Grant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABATEMENT AND STRIP PROCESS CHAMBER IN A LOAD LOCK CONFIGURATION
- Publication number 20230162984
- Publication date May 25, 2023
- Applied Materials, Inc.
- Martin Jeffrey SALINAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED
- Publication number 20230159864
- Publication date May 25, 2023
- FUJIFILM CORPORATION
- Yasuo SUGISHIMA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SIGNAL SOURCE DEVICE, METHOD OF PRO...
- Publication number 20230147992
- Publication date May 11, 2023
- Samsung Electronics Co., Ltd.
- Sung-gil KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- Publication number 20230100080
- Publication date Mar 30, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20230100606
- Publication date Mar 30, 2023
- UNITED MICROELECTRONICS CORP.
- Chun-Hsien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- Publication number 20230066300
- Publication date Mar 2, 2023
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PREPARATION METHOD OF METAL CONNECTING LINE
- Publication number 20230055179
- Publication date Feb 23, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Ning XI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE FILM FORMATION USING A SELF-ASSEMBLED MONOLAYER
- Publication number 20230009688
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Dina H. Triyoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate with Silicon Sidewall Spacers
- Publication number 20220344509
- Publication date Oct 27, 2022
- Taiwan Semicondutor Manufacturing Co., Ltd.
- Wen-Han Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHOD FOR TREATING SUBSTRATE
- Publication number 20220282156
- Publication date Sep 8, 2022
- FUJIFILM CORPORATION
- Moe NARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- Publication number 20220275313
- Publication date Sep 1, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
- Publication number 20220145222
- Publication date May 12, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method for Manufacture
- Publication number 20220130979
- Publication date Apr 28, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20220115517
- Publication date Apr 14, 2022
- UNITED MICROELECTRONICS CORP.
- Chun-Hsien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED
- Publication number 20220002622
- Publication date Jan 6, 2022
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- B08 - CLEANING
Information Patent Application
ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210343759
- Publication date Nov 4, 2021
- Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Chao Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER SOLUBLE POLYMERS FOR PATTERN COLLAPSE MITIGATION
- Publication number 20210320002
- Publication date Oct 14, 2021
- HONEYWELL INTERNATIONAL INC.
- Desaraju VARAPRASAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER LINE STRUCTURE AND METHOD FOR MANUFACTURING THEREOF
- Publication number 20210313277
- Publication date Oct 7, 2021
- DAI NIPPON PRINTING CO., LTD.
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing of Workpieces Using Flourocarbon Plasma
- Publication number 20210305071
- Publication date Sep 30, 2021
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT EQUIPMENT
- Publication number 20210249259
- Publication date Aug 12, 2021
- ORGANO CORPORATION
- Daisaku YANO
- H01 - BASIC ELECTRIC ELEMENTS

the processing being a delineation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Treatment liquid and method for treating object to be treated

Abatement and strip process chamber in a load lock configuration

Method of detecting photoresist scum, method of forming semiconduct...

Selective metal residue and liner cleanse for post-subtractive etch

Substrate treatment method and substrate treatment equipment

Chemical liquid and method for treating object to be treated

Multi-layer line structure and method for manufacturing thereof

Laser scribing trench opening control in wafer dicing using hybrid...

Plasma processing method

Chemical solution, method for manufacturing chemical solution, and...

Semiconductor device and method for manufacture

Processing of workpieces using fluorocarbon plasma

Cleaning formulation for removing residues on surfaces

Cleaning formulation for removing residues on surfaces

Substrate processing apparatus, signal source device, method of pro...

Cleaning agent and preparation method and use thereof

Semiconductor device and method for fabricating the same

Cleaning solution for removing dry etching residue and method for m...

Metal gate with silicon sidewall spacers

Semiconductor device and manufacturing method thereof

Cleaning formulation for removing residues on surfaces

Silicon mandrel etch after native oxide punch-through

Thermal atomic layer etch with rapid temperature cycling

Cleaning formulation for removing residues on surfaces

Cleaning formulation for removing residues on surfaces

Methods and systems for chemical mechanical polish cleaning

Line structure and a method for producing the same

Abatement and strip process chamber in a dual loadlock configuration

Semiconductor device with an interconnect structure and method for...

Stripper solutions and methods of using stripper solutions

Patents Applicationslast 30 patents

METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCT...

STRIPPER COMPOSITION

ETCHING COMPOSITIONS

MULTI-LAYER LINE STRUCTURE

LASER SCRIBING TRENCH OPENING CONTROL IN WAFER DICING USING HYBRID...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

CHEMICAL SOLUTION, METHOD FOR MANUFACTURING CHEMICAL SOLUTION, AND...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

SELECTIVE METAL RESIDUE AND LINER CLEANSE FOR POST-SUBTRACTIVE ETCH

ABATEMENT AND STRIP PROCESS CHAMBER IN A LOAD LOCK CONFIGURATION

TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED

SUBSTRATE PROCESSING APPARATUS, SIGNAL SOURCE DEVICE, METHOD OF PRO...

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

PREPARATION METHOD OF METAL CONNECTING LINE

SELECTIVE FILM FORMATION USING A SELF-ASSEMBLED MONOLAYER

Metal Gate with Silicon Sidewall Spacers

COMPOSITION AND METHOD FOR TREATING SUBSTRATE

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

Semiconductor Device and Method for Manufacture

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

CHEMICAL LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED

ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

WATER SOLUBLE POLYMERS FOR PATTERN COLLAPSE MITIGATION

MULTI-LAYER LINE STRUCTURE AND METHOD FOR MANUFACTURING THEREOF

Processing of Workpieces Using Flourocarbon Plasma

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT EQUIPMENT