the processing being a planarization of insulating layers

Industry

CPC
H01L21/02065

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02065the processing being a planarization of insulating layers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device package and method of manufacture
- Patent number 12,183,700
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jiun Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-CMP cleaning and apparatus
- Patent number 12,170,195
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Ming Huang
- B08 - CLEANING
Information Patent Grant
Method of for bonding noble metal structure with a dielectric layer...
- Patent number 12,027,190
- Issue date Jul 2, 2024
- Seagate Technology LLC
- Xiaoyue Huang
- G11 - INFORMATION STORAGE
Information Patent Grant
CMP system and method of use
- Patent number 11,984,323
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Chien Hou
- B24 - GRINDING POLISHING
Information Patent Grant
Interconnects having spacers for improved top via critical dimensio...
- Patent number 11,961,759
- Issue date Apr 16, 2024
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post CMP cleaning compositions
- Patent number 11,905,491
- Issue date Feb 20, 2024
- Entegris, Inc.
- Daniela White
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning compositions and methods of use thereof
- Patent number 11,884,900
- Issue date Jan 30, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Zachary L. Schaefer
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post-CMP cleaning and apparatus
- Patent number 11,728,157
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Ming Huang
- B08 - CLEANING
Information Patent Grant
Chemical mechanical polishing cleaning system with temperature cont...
- Patent number 11,694,889
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssutzu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intermediate raw material, and polishing composition and compositio...
- Patent number 11,692,137
- Issue date Jul 4, 2023
- FUJIMI CORPORATION
- Tsutomu Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing and resin grinding apparatus
- Patent number 11,574,804
- Issue date Feb 7, 2023
- Disco Corporation
- Shinya Watanabe
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Post chemical mechanical planarization (CMP) cleaning
- Patent number 11,560,533
- Issue date Jan 24, 2023
- VERSUM MATERIALS US, LLC
- Dnyanesh C. Tamboli
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Roller for cleaning wafer and cleaning apparatus having the same
- Patent number 11,551,940
- Issue date Jan 10, 2023
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Yong-Seok Ro
- B08 - CLEANING
Information Patent Grant
Semiconductor device package and method of manufacture
- Patent number 11,532,582
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jiun Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment composition, method for producing surface treatme...
- Patent number 11,466,234
- Issue date Oct 11, 2022
- FUJIMI INCORPORATED
- Tsutomu Yoshino
- B08 - CLEANING
Information Patent Grant
System for cleaning wafer in CMP process of semiconductor manufactu...
- Patent number 11,446,712
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ying Tien
- B08 - CLEANING
Information Patent Grant
Substrate processing method
- Patent number 11,437,229
- Issue date Sep 6, 2022
- SCREEN Holdings Co., Ltd.
- Pohling Then
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for adjusting installation location of tempera...
- Patent number 11,359,968
- Issue date Jun 14, 2022
- AJ TECH CO., LTD.
- Jongpal Ahn
- B24 - GRINDING POLISHING
Information Patent Grant
Composition for surface treatment
- Patent number 11,326,049
- Issue date May 10, 2022
- FUJIMI INCORPORATED
- Jingzhi Chen
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post-CMP cleaning and apparatus
- Patent number 11,322,345
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Ming Huang
- B08 - CLEANING
Information Patent Grant
Interconnects having spacers for improved top via critical dimensio...
- Patent number 11,295,978
- Issue date Apr 5, 2022
- International Business Machines Corporation
- Brent Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing wafer level low melting temperature interco...
- Patent number 11,222,813
- Issue date Jan 11, 2022
- Raytheon Company
- Sean P. Kilcoyne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for surface treatment and method of producing the same,...
- Patent number 11,203,731
- Issue date Dec 21, 2021
- FUJIMI INCORPORATED
- Yasuto Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods for removing ceria particles from a surface
- Patent number 11,164,738
- Issue date Nov 2, 2021
- Entegris, Inc.
- Daniela White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for surface treatment, method for producing composition...
- Patent number 11,162,057
- Issue date Nov 2, 2021
- FUJIMI INCORPORATED
- Tsutomu Yoshino
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post chemical mechanical polishing cleaning compositions
- Patent number 11,124,740
- Issue date Sep 21, 2021
- Entegris, Inc.
- Atanu K. Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and method of cleaning...
- Patent number 11,107,672
- Issue date Aug 31, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Chieh Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Post CMP cleaning compositions for ceria particles
- Patent number 11,085,011
- Issue date Aug 10, 2021
- Entegris, Inc.
- Elizabeth Thomas
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Composition for rinsing or cleaning a surface with ceria particles...
- Patent number 11,060,051
- Issue date Jul 13, 2021
- FUJIMI INCORPORATED
- Jimmy Erik Grandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method
- Patent number 11,018,017
- Issue date May 25, 2021
- SCREEN Holdings Co., Ltd.
- Ayumi Higuchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT
- Publication number 20240392214
- Publication date Nov 28, 2024
- FUJIFILM CORPORATION
- Naotsugu MURO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESSING TOOL AND METHOD
- Publication number 20240395537
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-hsiang Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND ME...
- Publication number 20240327758
- Publication date Oct 3, 2024
- FUJIMI INCORPORATED
- Takahito NAGANO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID FOR REMOVING CERIUM COMPOUND, CLEANING METHOD, AND...
- Publication number 20240294854
- Publication date Sep 5, 2024
- MITSUBISHI CHEMICAL CORPORATION
- Kenichi KIYONO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CMP System and Method of Use
- Publication number 20240274440
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Te-Chien Hou
- B24 - GRINDING POLISHING
Information Patent Application
CLEANING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20240117270
- Publication date Apr 11, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Zachary L. Schaefer
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
TREATMENT LIQUID, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND M...
- Publication number 20240117278
- Publication date Apr 11, 2024
- FUJIFILM CORPORATION
- Nobuaki SUGIMURA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
- Publication number 20240082881
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Donghoon KWON
- B24 - GRINDING POLISHING
Information Patent Application
CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20240026254
- Publication date Jan 25, 2024
- FUJIFILM CORPORATION
- Shimpei YAMADA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING BRUSH FOR SEMICONDUCTOR FABRICATION PROCESS
- Publication number 20230386868
- Publication date Nov 30, 2023
- Entegris, Inc.
- Aravind Vasanthakumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-CMP Cleaning and Apparatus
- Publication number 20230352295
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Fu-Ming Huang
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20230352326
- Publication date Nov 2, 2023
- EBARA CORPORATION
- Kuniaki YAMAGUCHI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING METHOD AND METHOD FOR FABRICATING SEM...
- Publication number 20230352310
- Publication date Nov 2, 2023
- SAMSUNG ELECTRONICS., LTD.
- Yearin Byun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING CLEANING SYSTEM WITH TEMPERATURE CONT...
- Publication number 20230326736
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssutzu CHEN
- B08 - CLEANING
Information Patent Application
SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD...
- Publication number 20230313069
- Publication date Oct 5, 2023
- Fujimi Incorporated
- HIDEYUKI TOKUSHIMA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
TREATMENT LIQUID AND SUBSTRATE TREATMENT METHOD
- Publication number 20230287304
- Publication date Sep 14, 2023
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Post Chemical Mechanical Planarization (CMP) Cleaning
- Publication number 20230183611
- Publication date Jun 15, 2023
- VERSUM MATERIALS US, LLC
- Dnyanesh C. Tamboli
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOF
- Publication number 20230041544
- Publication date Feb 9, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Peimeng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATME...
- Publication number 20230027432
- Publication date Jan 26, 2023
- FUJIMI INCORPORATED
- Tsutomu YOSHINO
- B08 - CLEANING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220367182
- Publication date Nov 17, 2022
- United Microelectronics Corp.
- Yu Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Package and Method of Manufacture
- Publication number 20220359445
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jiun Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING COMPOSITION
- Publication number 20220336210
- Publication date Oct 20, 2022
- Entegris, Inc.
- Jun Liu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TRE...
- Publication number 20220315865
- Publication date Oct 6, 2022
- FUJIMI INCORPORATED
- Tsutomu Yoshino
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Post-CMP Cleaning and Apparatus
- Publication number 20220262620
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Fu-Ming Huang
- B08 - CLEANING
Information Patent Application
INTERCONNECTS HAVING SPACERS FOR IMPROVED TOP VIA CRITICAL DIMENSIO...
- Publication number 20220157652
- Publication date May 19, 2022
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post CMP Cleaning Compositions
- Publication number 20220106542
- Publication date Apr 7, 2022
- Entegris, Inc.
- Daniela WHITE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20220064577
- Publication date Mar 3, 2022
- Fujifilm Electronic Materials U.S.A., Inc.
- Zachary L. Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION USING A SURFACE CLEANING PROCESS
- Publication number 20210398846
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING CLEANING SYSTEM WITH TEMPERATURE CONT...
- Publication number 20210272798
- Publication date Sep 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ssutzu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME,...
- Publication number 20210130735
- Publication date May 6, 2021
- FUJIMI INCORPORATED
- Yasuto ISHIDA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

the processing being a planarization of insulating layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device package and method of manufacture

Post-CMP cleaning and apparatus

Method of for bonding noble metal structure with a dielectric layer...

CMP system and method of use

Interconnects having spacers for improved top via critical dimensio...

Post CMP cleaning compositions

Cleaning compositions and methods of use thereof

Post-CMP cleaning and apparatus

Chemical mechanical polishing cleaning system with temperature cont...

Intermediate raw material, and polishing composition and compositio...

Workpiece processing and resin grinding apparatus

Post chemical mechanical planarization (CMP) cleaning

Roller for cleaning wafer and cleaning apparatus having the same

Semiconductor device package and method of manufacture

Surface treatment composition, method for producing surface treatme...

System for cleaning wafer in CMP process of semiconductor manufactu...

Substrate processing method

Apparatus and method for adjusting installation location of tempera...

Composition for surface treatment

Post-CMP cleaning and apparatus

Interconnects having spacers for improved top via critical dimensio...

Method of manufacturing wafer level low melting temperature interco...

Composition for surface treatment and method of producing the same,...

Compositions and methods for removing ceria particles from a surface

Composition for surface treatment, method for producing composition...

Post chemical mechanical polishing cleaning compositions

Method of manufacturing semiconductor device and method of cleaning...

Post CMP cleaning compositions for ceria particles

Composition for rinsing or cleaning a surface with ceria particles...

Substrate treatment method

Patents Applicationslast 30 patents

COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

PROCESSING TOOL AND METHOD

COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND ME...

CLEANING LIQUID FOR REMOVING CERIUM COMPOUND, CLEANING METHOD, AND...

CMP System and Method of Use

CLEANING COMPOSITIONS AND METHODS OF USE THEREOF

TREATMENT LIQUID, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND M...

SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE

CLEANING BRUSH FOR SEMICONDUCTOR FABRICATION PROCESS

Post-CMP Cleaning and Apparatus

SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD

CHEMICAL MECHANICAL POLISHING METHOD AND METHOD FOR FABRICATING SEM...

CHEMICAL MECHANICAL POLISHING CLEANING SYSTEM WITH TEMPERATURE CONT...

SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD...

TREATMENT LIQUID AND SUBSTRATE TREATMENT METHOD

Post Chemical Mechanical Planarization (CMP) Cleaning

SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOF

SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATME...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Semiconductor Device Package and Method of Manufacture

CLEANING COMPOSITION

SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TRE...

Post-CMP Cleaning and Apparatus

INTERCONNECTS HAVING SPACERS FOR IMPROVED TOP VIA CRITICAL DIMENSIO...

Post CMP Cleaning Compositions

CLEANING COMPOSITIONS AND METHODS OF USE THEREOF

METHOD FOR AREA SELECTIVE DEPOSITION USING A SURFACE CLEANING PROCESS

CHEMICAL MECHANICAL POLISHING CLEANING SYSTEM WITH TEMPERATURE CONT...

COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME,...