the reactions being activated by other means than plasma or thermal

Industry

CPC
H01L21/02277

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02277the reactions being activated by other means than plasma or thermal

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Functionalized cyclosilazanes as precursors for high growth rate si...
- Patent number 12,057,310
- Issue date Aug 6, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,040,179
- Issue date Jul 16, 2024
- Kokusai Electric Corporation
- Takaaki Noda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, recording medium, and...
- Patent number 11,848,201
- Issue date Dec 19, 2023
- Kokusai Electric Corporation
- Tsukasa Kamakura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming graphene on a silicon substrate
- Patent number 11,837,635
- Issue date Dec 5, 2023
- Paragraf Limited
- Sebastian Dixon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device gate spacer structures and methods thereof
- Patent number 11,664,442
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Chang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective deposition for forming fully self-aligned vias
- Patent number 11,658,068
- Issue date May 23, 2023
- Tokyo Electron Limited
- Kandabara Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing silicon nitride film
- Patent number 11,495,452
- Issue date Nov 8, 2022
- TOHKU UNIVERSITY
- Akinobu Teramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt precursor and methods for manufacture using the same
- Patent number 11,254,698
- Issue date Feb 22, 2022
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, recording medium, and...
- Patent number 11,251,039
- Issue date Feb 15, 2022
- Kokusai Electric Corporation
- Tsukasa Kamakura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, recording medium, and...
- Patent number 11,251,038
- Issue date Feb 15, 2022
- Kokusai Electric Corporation
- Tsukasa Kamakura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Functionalized cyclosilazanes as precursors for high growth rate si...
- Patent number 11,177,127
- Issue date Nov 16, 2021
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate capping layers of semiconductor devices
- Patent number 11,164,954
- Issue date Nov 2, 2021
- GLOBALFOUNDRIES U.S. INC.
- Sipeng Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, subs...
- Patent number 10,968,517
- Issue date Apr 6, 2021
- Kokusai Electric Corporation
- Shin Sone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective deposition for forming fully self-aligned vias
- Patent number 10,847,363
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device gate spacer structures and methods thereof
- Patent number 10,811,519
- Issue date Oct 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Chang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a low-k spacer
- Patent number 10,804,373
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiu-Yu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing polymer layer for sensor applications via ho...
- Patent number 10,794,853
- Issue date Oct 6, 2020
- Applied Materials, Inc.
- Colin Neikirk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of silicon nitride on silicon oxide using cata...
- Patent number 10,777,407
- Issue date Sep 15, 2020
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 10,720,325
- Issue date Jul 21, 2020
- Kokusai Electric Corporation
- Takafumi Nitta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically polarized photonic device
- Patent number 10,665,745
- Issue date May 26, 2020
- TAE TECHNOLOGIES, INC.
- Daniel Scott Marshall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 10,559,460
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithography patterning with a gas phase resist
- Patent number 10,514,610
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Schemes for selective deposition for patterning applications
- Patent number 10,510,546
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of filling retrograde recessed features with no voids
- Patent number 10,453,737
- Issue date Oct 22, 2019
- Tokyo Electron Limited
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of selective vertical growth of a dielectric material on a d...
- Patent number 10,453,681
- Issue date Oct 22, 2019
- Tokyo Electron Limited
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of filling retrograde recessed features
- Patent number 10,410,861
- Issue date Sep 10, 2019
- Tokyo Electron Limited
- Kandabara N. Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a low-K spacer
- Patent number 10,361,282
- Issue date Jul 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiu-Yu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Schemes for selective deposition for patterning applications
- Patent number 10,347,495
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device gate spacer structures and methods thereof
- Patent number 10,312,348
- Issue date Jun 4, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Chang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused radiation beam induced deposition
- Patent number 10,061,193
- Issue date Aug 28, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsun-Chuan Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...
- Publication number 20240395541
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPORARY CAPPING MATERIAL FOR OXIDE PREVENTION IN LOW TEMPERATURE...
- Publication number 20240312778
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Stephen J. BANIK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAS INJECTOR ASSEMBLY
- Publication number 20240145262
- Publication date May 2, 2024
- ASM IP HOLDING B.V.
- Theodorus G.M. Oosterlaken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING GRAPHENE ON A SILICON SUBSTRATE
- Publication number 20240072118
- Publication date Feb 29, 2024
- Paragraf Limited
- Sebastian Dixon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURES AND METHODS FOR PRODUCING AN OPTOELECTRONIC DEVICE
- Publication number 20230275173
- Publication date Aug 31, 2023
- Antora Energy, Inc.
- Andrew Joseph PONEC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA ULTRAVIOLET ENHANCED DEPOSITION
- Publication number 20220328292
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20220122833
- Publication date Apr 21, 2022
- Kokusai Electric Corporation
- Tsukasa KAMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING GRAPHENE ON A SILICON SUBSTRATE
- Publication number 20220102501
- Publication date Mar 31, 2022
- Paragraf Limited
- Sebastian Dixon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...
- Publication number 20220044929
- Publication date Feb 10, 2022
- VERSUM PATENTS US, LLC
- MANCHAO XIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVE DEPOSITION FOR FORMING FULLY SELF-ALIGNED VIAS
- Publication number 20210074584
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device Gate Spacer Structures and Methods Thereof
- Publication number 20210050431
- Publication date Feb 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Chang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A LOW-K SPACER
- Publication number 20210028294
- Publication date Jan 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiu-Yu KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CAPPING LAYERS OF SEMICONDUCTOR DEVICES
- Publication number 20200388693
- Publication date Dec 10, 2020
- GLOBALFOUNDRIES INC.
- SIPENG GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT PRECURSOR AND METHODS FOR MANUFACTURE USING THE SAME
- Publication number 20200339618
- Publication date Oct 29, 2020
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING SILICON NITRIDE FILM
- Publication number 20200335322
- Publication date Oct 22, 2020
- Tohoku University
- Akinobu TERAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20200243325
- Publication date Jul 30, 2020
- Kokusai Electric Corporation
- Tsukasa KAMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20200243324
- Publication date Jul 30, 2020
- Kokusai Electric Corporation
- Tsukasa KAMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A LOW-K SPACER
- Publication number 20190341466
- Publication date Nov 7, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiu-Yu KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20190311898
- Publication date Oct 10, 2019
- Kokusai Electric Corporation
- Takaaki Noda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device Gate Spacer Structures and Methods Thereof
- Publication number 20190288087
- Publication date Sep 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Chang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Schemes for Selective Deposition for Patterning Applications
- Publication number 20190287807
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE GATE SPACER STRUCTURES AND METHODS THEREOF
- Publication number 20190157419
- Publication date May 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Chang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20190074177
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Akira SHIMIZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DISPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUT...
- Publication number 20190027357
- Publication date Jan 24, 2019
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc Girard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Functionalized Cyclosilazanes as Precursors For High Growth Rate Si...
- Publication number 20180342390
- Publication date Nov 29, 2018
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lithography Patterning with a Gas Phase Resist
- Publication number 20180314167
- Publication date Nov 1, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Shu-Hao Chang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Method of Surface Localized Pore Sealing of Porous Dielectric Material
- Publication number 20180277362
- Publication date Sep 27, 2018
- LAM RESEARCH CORPORATION
- Byung Jin Cho
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Schemes for Selective Deposition for Patterning Applications
- Publication number 20180218914
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED RADIATION BEAM INDUCED DEPOSITION
- Publication number 20180203347
- Publication date Jul 19, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsun-Chuan SHIH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus, Substrate Processing Method and Sto...
- Publication number 20170226639
- Publication date Aug 10, 2017
- TOKYO ELECTRON LIMITED
- Kenichi YAMAGA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the reactions being activated by other means than plasma or thermal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Functionalized cyclosilazanes as precursors for high growth rate si...

Method of manufacturing semiconductor device, substrate processing...

Method of manufacturing semiconductor device, recording medium, and...

Method of forming graphene on a silicon substrate

Semiconductor device gate spacer structures and methods thereof

Method of selective deposition for forming fully self-aligned vias

Method for producing silicon nitride film

Cobalt precursor and methods for manufacture using the same

Method of manufacturing semiconductor device, recording medium, and...

Method of manufacturing semiconductor device, recording medium, and...

Functionalized cyclosilazanes as precursors for high growth rate si...

Gate capping layers of semiconductor devices

Cleaning method, method of manufacturing semiconductor device, subs...

Method of selective deposition for forming fully self-aligned vias

Semiconductor device gate spacer structures and methods thereof

Method for forming a low-k spacer

Methods for depositing polymer layer for sensor applications via ho...

Selective deposition of silicon nitride on silicon oxide using cata...

Method of manufacturing semiconductor device, substrate processing...

Magnetically polarized photonic device

Film forming apparatus and film forming method

Lithography patterning with a gas phase resist

Schemes for selective deposition for patterning applications

Method of filling retrograde recessed features with no voids

Method of selective vertical growth of a dielectric material on a d...

Method of filling retrograde recessed features

Method for forming a low-K spacer

Schemes for selective deposition for patterning applications

Semiconductor device gate spacer structures and methods thereof

Focused radiation beam induced deposition

Patents Applicationslast 30 patents

FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...

TEMPORARY CAPPING MATERIAL FOR OXIDE PREVENTION IN LOW TEMPERATURE...

GAS INJECTOR ASSEMBLY

METHOD OF FORMING GRAPHENE ON A SILICON SUBSTRATE

STRUCTURES AND METHODS FOR PRODUCING AN OPTOELECTRONIC DEVICE

REMOTE PLASMA ULTRAVIOLET ENHANCED DEPOSITION

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHOD OF FORMING GRAPHENE ON A SILICON SUBSTRATE

FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...

METHOD OF SELECTIVE DEPOSITION FOR FORMING FULLY SELF-ALIGNED VIAS

Semiconductor Device Gate Spacer Structures and Methods Thereof

METHOD FOR FORMING A LOW-K SPACER

GATE CAPPING LAYERS OF SEMICONDUCTOR DEVICES

COBALT PRECURSOR AND METHODS FOR MANUFACTURE USING THE SAME

METHOD FOR PRODUCING SILICON NITRIDE FILM

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHOD FOR FORMING A LOW-K SPACER

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

Semiconductor Device Gate Spacer Structures and Methods Thereof

Schemes for Selective Deposition for Patterning Applications

SEMICONDUCTOR DEVICE GATE SPACER STRUCTURES AND METHODS THEREOF

FILM FORMING APPARATUS AND FILM FORMING METHOD

VAPOR DISPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUT...

Functionalized Cyclosilazanes as Precursors For High Growth Rate Si...

Lithography Patterning with a Gas Phase Resist

Method of Surface Localized Pore Sealing of Porous Dielectric Material

Schemes for Selective Deposition for Patterning Applications

FOCUSED RADIATION BEAM INDUCED DEPOSITION

Substrate Processing Apparatus, Substrate Processing Method and Sto...