the substrate being of crystalline semiconductor material

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/2015the substrate being of crystalline semiconductor material

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Patents Grantslast 30 patents

Information Patent Grant
Methods of cooling semiconductor devices
- Patent number 11,869,804
- Issue date Jan 9, 2024
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compliant silicon substrates for heteroepitaxial growth by hydrogen...
- Patent number 11,710,803
- Issue date Jul 25, 2023
- Raytheon Company
- James Pattison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuitry and methods
- Patent number 11,348,826
- Issue date May 31, 2022
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride crystal substrate, semiconductor laminate, method of manufa...
- Patent number 11,339,500
- Issue date May 24, 2022
- SCIOCS COMPANY LIMITED
- Fumimasa Horikiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure of epitaxy on heterogeneous substrate and method for fabr...
- Patent number 11,232,950
- Issue date Jan 25, 2022
- Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan,...
- Jheng Hao Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices having substrates with selective airgap regions
- Patent number 11,088,244
- Issue date Aug 10, 2021
- Hewlett Packard Enterprise Development LP
- Di Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming electromagnetic radiation emitters and conduits
- Patent number 10,998,222
- Issue date May 4, 2021
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorimetry methods
- Patent number 10,727,109
- Issue date Jul 28, 2020
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 10,580,687
- Issue date Mar 3, 2020
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface-emitting device, vertical external-cavity surface-emitting...
- Patent number 10,541,514
- Issue date Jan 21, 2020
- NGK Insulators, Ltd.
- Yoshitaka Kuraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorimetry systems
- Patent number 10,504,773
- Issue date Dec 10, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and systems containing nanofluidic channels
- Patent number 10,438,840
- Issue date Oct 8, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming electromagnetic radiation conduits
- Patent number 10,438,839
- Issue date Oct 8, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 10,304,724
- Issue date May 28, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 10,163,685
- Issue date Dec 25, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 10,153,197
- Issue date Dec 11, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming nanofluidic channels
- Patent number 10,026,643
- Issue date Jul 17, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 10,014,211
- Issue date Jul 3, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 9,997,398
- Issue date Jun 12, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic radiation emitters and conduit structures
- Patent number 9,922,869
- Issue date Mar 20, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming one or more covered voids in a semiconductor sub...
- Patent number 9,786,548
- Issue date Oct 10, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride integration with CMOS technology
- Patent number 9,660,069
- Issue date May 23, 2017
- International Business Machines Corporation
- Can Bayram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elimination of defects in long aspect ratio trapping trench structures
- Patent number 9,570,297
- Issue date Feb 14, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride integration with CMOS technology
- Patent number 9,564,526
- Issue date Feb 7, 2017
- International Business Machines Corporation
- Can Bayram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride integration with CMOS technology
- Patent number 9,362,281
- Issue date Jun 7, 2016
- International Business Machines Corporation
- Can Bayram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a span comprising silicon dioxide
- Patent number 9,117,744
- Issue date Aug 25, 2015
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Covered void within a semiconductor substrate and method of forming...
- Patent number 9,059,078
- Issue date Jun 16, 2015
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a plurality of covered voids in a semiconductor...
- Patent number 9,023,714
- Issue date May 5, 2015
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled air gap formation
- Patent number 8,921,235
- Issue date Dec 30, 2014
- Applied Materials, Inc.
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a span comprising silicon dioxide
- Patent number 8,617,966
- Issue date Dec 31, 2013
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING HETEROEPITAXIAL WAFER
- Publication number 20240429046
- Publication date Dec 26, 2024
- Shin-Etsu Handotai Co., Ltd.
- Toshiki MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240222125
- Publication date Jul 4, 2024
- Resonac Corporation
- Yoshikazu Umeta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20240087948
- Publication date Mar 14, 2024
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING EPITAXIAL WAFER AND EPITAXIAL WAFER
- Publication number 20230028127
- Publication date Jan 26, 2023
- Shin-Etsu Handotai Co., Ltd.
- Katsuyoshi SUZUKI
- C30 - CRYSTAL GROWTH
Information Patent Application
Methods Of Cooling Semiconductor Devices
- Publication number 20220262670
- Publication date Aug 18, 2022
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
III-N HETEROEPITAXIAL DEVICES ON ROCK SALT SUBSTRATES
- Publication number 20220230882
- Publication date Jul 21, 2022
- ALLIANCE FOR SUSTAINABLE ENERGY, LLC
- Marshall Brooks TELLEKAMP
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRUCTURE OF EPITAXY ON HETEROGENEOUS SUBSTRATE AND METHOD FOR FABR...
- Publication number 20200343093
- Publication date Oct 29, 2020
- Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan,...
- JHENG HAO FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE CRYSTAL SUBSTRATE, SEMICONDUCTOR LAMINATE, METHOD OF MANUFA...
- Publication number 20200208297
- Publication date Jul 2, 2020
- SCIOCS COMPANY LIMITED
- Fumimasa HORIKIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuitry And Methods
- Publication number 20200161168
- Publication date May 21, 2020
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Electromagnetic Radiation Emitters and Conduits
- Publication number 20190371649
- Publication date Dec 5, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorimetry Methods
- Publication number 20190371648
- Publication date Dec 5, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...
- Publication number 20190088532
- Publication date Mar 21, 2019
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES HAVING SUBSTRATES WITH SELECTIVE AIRGAP REGIONS
- Publication number 20190081139
- Publication date Mar 14, 2019
- HEWLETT PACKARD ENTERPRISE DEVELOPMENT LP
- Di Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20180301370
- Publication date Oct 18, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...
- Publication number 20180019157
- Publication date Jan 18, 2018
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...
- Publication number 20170372940
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20170372942
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20170372943
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...
- Publication number 20170372941
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...
- Publication number 20170352577
- Publication date Dec 7, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...
- Publication number 20170352578
- Publication date Dec 7, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20170352579
- Publication date Dec 7, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20170352580
- Publication date Dec 7, 2017
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED AIR GAP FORMATION
- Publication number 20140248754
- Publication date Sep 4, 2014
- Kiran V. Thadani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of Forming a Span Comprising Silicon Dioxide
- Publication number 20130337630
- Publication date Dec 19, 2013
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20110256694
- Publication date Oct 20, 2011
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20110233734
- Publication date Sep 29, 2011
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuitry And Methods Of Forming A Semiconductor-On-Insu...
- Publication number 20100171176
- Publication date Jul 8, 2010
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electromagnetic radiation interaction components, fluorimetry syste...
- Publication number 20080187463
- Publication date Aug 7, 2008
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming a span comprising silicon dioxide
- Publication number 20080188073
- Publication date Aug 7, 2008
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS

the substrate being of crystalline semiconductor material

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of cooling semiconductor devices

Compliant silicon substrates for heteroepitaxial growth by hydrogen...

Integrated circuitry and methods

Nitride crystal substrate, semiconductor laminate, method of manufa...

Structure of epitaxy on heterogeneous substrate and method for fabr...

Devices having substrates with selective airgap regions

Methods of forming electromagnetic radiation emitters and conduits

Fluorimetry methods

Methods of forming one or more covered voids in a semiconductor sub...

Surface-emitting device, vertical external-cavity surface-emitting...

Fluorimetry systems

Semiconductor devices and systems containing nanofluidic channels

Methods of forming electromagnetic radiation conduits

Methods of forming one or more covered voids in a semiconductor sub...

Methods of forming one or more covered voids in a semiconductor sub...

Methods of forming one or more covered voids in a semiconductor sub...

Methods of forming nanofluidic channels

Methods of forming one or more covered voids in a semiconductor sub...

Methods of forming one or more covered voids in a semiconductor sub...

Electromagnetic radiation emitters and conduit structures

Methods of forming one or more covered voids in a semiconductor sub...

Group III nitride integration with CMOS technology

Elimination of defects in long aspect ratio trapping trench structures

Group III nitride integration with CMOS technology

Group III nitride integration with CMOS technology

Methods of forming a span comprising silicon dioxide

Covered void within a semiconductor substrate and method of forming...

Methods of forming a plurality of covered voids in a semiconductor...

Controlled air gap formation

Methods of forming a span comprising silicon dioxide

Patents Applicationslast 30 patents

METHOD FOR PRODUCING HETEROEPITAXIAL WAFER

SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING THE SAME

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

METHOD FOR MANUFACTURING EPITAXIAL WAFER AND EPITAXIAL WAFER

Methods Of Cooling Semiconductor Devices

III-N HETEROEPITAXIAL DEVICES ON ROCK SALT SUBSTRATES

STRUCTURE OF EPITAXY ON HETEROGENEOUS SUBSTRATE AND METHOD FOR FABR...

NITRIDE CRYSTAL SUBSTRATE, SEMICONDUCTOR LAMINATE, METHOD OF MANUFA...

Integrated Circuitry And Methods

Methods of Forming Electromagnetic Radiation Emitters and Conduits

Fluorimetry Methods

Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...

DEVICES HAVING SUBSTRATES WITH SELECTIVE AIRGAP REGIONS

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...

Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...

Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...

Methods Of Forming One Or More Covered Voids In A Semiconductor Sub...

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

CONTROLLED AIR GAP FORMATION

Methods of Forming a Span Comprising Silicon Dioxide

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

Integrated Circuitry And Methods Of Forming A Semiconductor-On-Insu...

Electromagnetic radiation interaction components, fluorimetry syste...

Methods of forming a span comprising silicon dioxide