Treating the edge of the workpieces

Industry

CPC
H01J37/32385

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32385Treating the edge of the workpieces

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor substrate bevel cleaning
- Patent number 12,068,152
- Issue date Aug 20, 2024
- Lam Research Corporation
- Saravanapriyan Sriraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,935,727
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion generator and ion implanter
- Patent number 11,848,170
- Issue date Dec 19, 2023
- SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO, LTD.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of wafer bow in multiple stations
- Patent number 11,823,928
- Issue date Nov 21, 2023
- Lam Research Corporation
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,776,791
- Issue date Oct 3, 2023
- PSK Inc.
- Jong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable upper plasma-exclusion-zone ring for a bevel etcher
- Patent number 11,756,771
- Issue date Sep 12, 2023
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source and method of operating the same
- Patent number 11,610,764
- Issue date Mar 21, 2023
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Yves Lodewijk Maria Creyghton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,587,770
- Issue date Feb 21, 2023
- Semes Co., Ltd.
- Jamyung Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-localized and plasma uniformity control in a plasma processin...
- Patent number 11,551,909
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma density control on substrate edge
- Patent number 11,495,440
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 11,380,512
- Issue date Jul 5, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus
- Patent number 11,195,700
- Issue date Dec 7, 2021
- Canon Anelva Corporation
- Hidekazu Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 11,195,706
- Issue date Dec 7, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of wafer bow in multiple stations
- Patent number 11,183,406
- Issue date Nov 23, 2021
- Lam Research Corporation
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometrically selective deposition of dielectric films utilizing lo...
- Patent number 11,081,318
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Kenichi Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate side-deposition apparatus
- Patent number 10,964,509
- Issue date Mar 30, 2021
- TETOS Co., Ltd.
- Kun Ho Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tunable upper plasma-exclusion-zone ring for a bevel etcher
- Patent number 10,937,634
- Issue date Mar 2, 2021
- Lam Research Corporation
- Jack Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring assembly for a substrate support in a plasma processing c...
- Patent number 10,847,347
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Hamid Noorbakhsh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma density control on substrate edge
- Patent number 10,790,121
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Bhaskar Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 10,748,747
- Issue date Aug 18, 2020
- Lam Research Corporation
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method
- Patent number 10,665,431
- Issue date May 26, 2020
- Tokyo Electron Limited
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of water bow in multiple stations
- Patent number 10,553,465
- Issue date Feb 4, 2020
- Lam Research Corporation
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,431,433
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 10,283,330
- Issue date May 7, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective processing of a workpiece
- Patent number 10,081,861
- Issue date Sep 25, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 9,799,496
- Issue date Oct 24, 2017
- Lam Research Corporation
- Keechan Kim
- B08 - CLEANING
Information Patent Grant
Apparatus for manufacturing display device and method of manufactur...
- Patent number 9,725,798
- Issue date Aug 8, 2017
- Samsung Display Co., Ltd.
- Suhwan Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hybrid feature etching and bevel etching systems
- Patent number 9,564,285
- Issue date Feb 7, 2017
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chamber for bevel edge processing
- Patent number 9,281,166
- Issue date Mar 8, 2016
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 9,184,030
- Issue date Nov 10, 2015
- Lam Research Corporation
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE BEVEL CLEANING
- Publication number 20240404821
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Saravanapriyan SRIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240186122
- Publication date Jun 6, 2024
- TOKYO ELECTRON LIMITED
- Jun Yamawaku
- B08 - CLEANING
Information Patent Application
PLASMA GENERATOR FOR EDGE UNIFORMITY
- Publication number 20240170261
- Publication date May 23, 2024
- Applied Materials, Inc.
- Vladimir NAGORNY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION IMPLANTER
- Publication number 20240079199
- Publication date Mar 7, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF WAFER BOW IN MULTIPLE STATIONS
- Publication number 20240055285
- Publication date Feb 15, 2024
- LAM RESEARCH CORPORATION
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER
- Publication number 20230402257
- Publication date Dec 14, 2023
- Jack CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Edge Control During Plasma Processing
- Publication number 20230360889
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE BEVEL CLEANING
- Publication number 20220375746
- Publication date Nov 24, 2022
- LAM RESEARCH CORPORATION
- Saravanapriyan SRIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVEABLE EDGE RINGS FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20220328290
- Publication date Oct 13, 2022
- LAM RESEARCH COPORATION
- Rohini MISHRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION IMPLANTER
- Publication number 20220301808
- Publication date Sep 22, 2022
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD FOR TREA...
- Publication number 20220181122
- Publication date Jun 9, 2022
- PSK INC.
- Ho Jae SIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF WAFER BOW IN MULTIPLE STATIONS
- Publication number 20220051919
- Publication date Feb 17, 2022
- LAM RESEARCH CORPORATION
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT STAGE, PLASMA PROCESSING SYSTEM, AND METHOD OF MO...
- Publication number 20210319988
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE AND METHOD OF OPERATING THE SAME
- Publication number 20210296094
- Publication date Sep 23, 2021
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
- Yves Lodewijk Maria CREYGHTON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210241997
- Publication date Aug 5, 2021
- PSK INC.
- Jong Chan LEE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER
- Publication number 20210151297
- Publication date May 20, 2021
- LAM RESEARCH CORPORATION
- Jack CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...
- Publication number 20210043428
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Hamid NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20200411292
- Publication date Dec 31, 2020
- SEMES CO., LTD.
- Jamyung GU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DENSITY CONTROL ON SUBSTRATE EDGE
- Publication number 20200381222
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Bhaskar KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION IMPLANTER
- Publication number 20200303153
- Publication date Sep 24, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF WAFER BOW IN MULTIPLE STATIONS
- Publication number 20200118856
- Publication date Apr 16, 2020
- LAM RESEARCH CORPORATION
- Edward Augustyniak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...
- Publication number 20200066495
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Hamid NOORBAKHSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...
- Publication number 20190244788
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Geometrically Selective Deposition Of Dielectric Films Utilizing Lo...
- Publication number 20190189400
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Kenichi Ohno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRA-LOCALIZED AND PLASMA UNIFORMITY CONTROL IN A FABRICATION PROCESS
- Publication number 20190103254
- Publication date Apr 4, 2019
- TOKYO ELECTRON LIMITED
- Barton G. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180366305
- Publication date Dec 20, 2018
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD
- Publication number 20180294145
- Publication date Oct 11, 2018
- TOKYO ELECTRON LIMITED
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DENSITY CONTROL ON SUBSTRATE EDGE
- Publication number 20180294146
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Bhaskar KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Edge Exclusion Control With Adjustable Plasma Exclusion Zone Ring
- Publication number 20180025893
- Publication date Jan 25, 2018
- LAM RESEARCH CORPORATION
- Keechan Kim
- B08 - CLEANING
Information Patent Application
Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...
- Publication number 20170256393
- Publication date Sep 7, 2017
- LAM RESEARCH CORPORATION
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS

Treating the edge of the workpieces

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor substrate bevel cleaning

Substrate processing method

Ion generator and ion implanter

Control of wafer bow in multiple stations

Substrate processing apparatus and substrate processing method

Tunable upper plasma-exclusion-zone ring for a bevel etcher

Plasma source and method of operating the same

Apparatus and method for treating substrate

Ultra-localized and plasma uniformity control in a plasma processin...

Plasma density control on substrate edge

Ion generator and ion implanter

Etching apparatus

Systems and methods for achieving a pre-determined factor associate...

Control of wafer bow in multiple stations

Geometrically selective deposition of dielectric films utilizing lo...

Substrate side-deposition apparatus

Tunable upper plasma-exclusion-zone ring for a bevel etcher

Edge ring assembly for a substrate support in a plasma processing c...

Plasma density control on substrate edge

Edge exclusion control with adjustable plasma exclusion zone ring

Processing method

Control of water bow in multiple stations

Plasma processing apparatus and plasma processing method

Systems and methods for achieving a pre-determined factor associate...

Selective processing of a workpiece

Edge exclusion control with adjustable plasma exclusion zone ring

Apparatus for manufacturing display device and method of manufactur...

Hybrid feature etching and bevel etching systems

Plasma processing chamber for bevel edge processing

Edge exclusion control with adjustable plasma exclusion zone ring

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE BEVEL CLEANING

SUBSTRATE PROCESSING APPARATUS

PLASMA GENERATOR FOR EDGE UNIFORMITY

ION GENERATOR AND ION IMPLANTER

CONTROL OF WAFER BOW IN MULTIPLE STATIONS

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

Apparatus for Edge Control During Plasma Processing

SEMICONDUCTOR SUBSTRATE BEVEL CLEANING

MOVEABLE EDGE RINGS FOR SUBSTRATE PROCESSING SYSTEMS

ION GENERATOR AND ION IMPLANTER

SUPPORT UNIT, APPARATUS FOR TREATING SUBSTRATE, AND METHOD FOR TREA...

CONTROL OF WAFER BOW IN MULTIPLE STATIONS

SUBSTRATE SUPPORT STAGE, PLASMA PROCESSING SYSTEM, AND METHOD OF MO...

PLASMA SOURCE AND METHOD OF OPERATING THE SAME

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER

EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...

APPARATUS AND METHOD FOR TREATING SUBSTRATE

PLASMA DENSITY CONTROL ON SUBSTRATE EDGE

ION GENERATOR AND ION IMPLANTER

CONTROL OF WAFER BOW IN MULTIPLE STATIONS

EDGE RING ASSEMBLY FOR A SUBSTRATE SUPPORT IN A PLASMA PROCESSING C...

SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...

Geometrically Selective Deposition Of Dielectric Films Utilizing Lo...

ULTRA-LOCALIZED AND PLASMA UNIFORMITY CONTROL IN A FABRICATION PROCESS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESSING METHOD

PLASMA DENSITY CONTROL ON SUBSTRATE EDGE

Edge Exclusion Control With Adjustable Plasma Exclusion Zone Ring

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...