treatment by exposure to corpuscular radiation

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H01L21/02351

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02351treatment by exposure to corpuscular radiation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Techniques and apparatus for anisotropic stress compensation in sub...
- Patent number 11,875,995
- Issue date Jan 16, 2024
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,823,898
- Issue date Nov 21, 2023
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors and flowable CVD methods for making low-k films to fill...
- Patent number 11,735,413
- Issue date Aug 22, 2023
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,658,027
- Issue date May 23, 2023
- Sumitomo Electric Industries, Ltd.
- Takahide Hirasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure with enlarged volu...
- Patent number 11,581,425
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Hsi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and formation method thereof
- Patent number 11,444,183
- Issue date Sep 13, 2022
- Semiconductor Manufacturing International (Shanghai) Corporation
- Nan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and apparatus for anisotropic stress compensation in sub...
- Patent number 11,201,057
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atom implantation for passivation of pillar material
- Patent number 11,164,876
- Issue date Nov 2, 2021
- Micron Technology, Inc.
- Russell A. Benson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon compounds and methods for depositing films using same
- Patent number 11,158,498
- Issue date Oct 26, 2021
- VERSUM MATERIALS US, LLC
- Robert G. Ridgeway
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for doping layer, thin film transistor and method for fabric...
- Patent number 10,886,144
- Issue date Jan 5, 2021
- ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Xuewei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and formation method thereof
- Patent number 10,872,971
- Issue date Dec 22, 2020
- Semiconductor Manufacturing (Shanghai) International Corporation
- Nan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 10,867,790
- Issue date Dec 15, 2020
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam patterning without resist
- Patent number 10,615,036
- Issue date Apr 7, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuen-Yu Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition or treatment of diamond-like carbon in a plasma reactor
- Patent number 10,544,505
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 10,176,986
- Issue date Jan 8, 2019
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods using same for carbon doped silicon contai...
- Patent number 10,145,008
- Issue date Dec 4, 2018
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,134,832
- Issue date Nov 20, 2018
- Fuji Electric Co., Ltd.
- Yasunori Agata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam patterning without resist
- Patent number 9,934,969
- Issue date Apr 3, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed lithography approach for E-beam and optical exposure using HSQ
- Patent number 9,917,057
- Issue date Mar 13, 2018
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature cure modulus enhancement
- Patent number 9,583,332
- Issue date Feb 28, 2017
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed lithography approach for e-beam and optical exposure using HSQ
- Patent number 9,558,930
- Issue date Jan 31, 2017
- International Business Machines Corporation
- Josephine B. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Increasing the doping efficiency during proton irradiation
- Patent number 9,536,740
- Issue date Jan 3, 2017
- Infineon Technologies AG
- Hans-Joachim Schulze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 9,412,618
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Shinya Morikita
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods of forming multi-Vt III-V TFET devices
- Patent number 9,397,199
- Issue date Jul 19, 2016
- GLOBALFOUNDRIES, INC.
- Unoh Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing semiconductor devices that include perform...
- Patent number 9,397,196
- Issue date Jul 19, 2016
- Samsung Electronics Co., Ltd.
- Hyun-Jun Sim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable low-k dielectric gapfill treatment
- Patent number 9,362,107
- Issue date Jun 7, 2016
- Applied Materials, Inc.
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post treatment for dielectric constant reduction with pore generati...
- Patent number 9,324,571
- Issue date Apr 26, 2016
- Applied Materials, Inc.
- Kang Sub Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device structure
- Patent number 9,236,294
- Issue date Jan 12, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low k porous SiCOH dielectric and integration with post film format...
- Patent number 9,219,037
- Issue date Dec 22, 2015
- GLOBALFOUNDRIES INC.
- Stephen M. Gates
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterning of nanostructures
- Patent number 9,070,556
- Issue date Jun 30, 2015
- Massachusetts Institute of Technology
- Joseph M. Jacobson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE FOR SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE...
- Publication number 20240313086
- Publication date Sep 19, 2024
- Shin-Etsu Handotai Co., Ltd.
- Kazunori HAGIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE SUBSTRATE AND PREPARATION METHOD THEREOF, AND SEMICONDUCT...
- Publication number 20240297069
- Publication date Sep 5, 2024
- ENKRIS SEMICONDUCTOR, INC.
- Kai CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INFLUENCE FUNCTION-BASED MITIGATION OF SUBSTRATE DEFORMATION WITH F...
- Publication number 20240266233
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Wonjae Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALTERING OPERATIONAL CHARACTERISTICS OF A SEMICONDUCTOR DEVICE USIN...
- Publication number 20240105419
- Publication date Mar 28, 2024
- Intel Corporation
- Shida TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240047200
- Publication date Feb 8, 2024
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOSE MAPPING USING SUBSTRATE CURVATURE TO COMPENSATE FOR OUT-OF-PLA...
- Publication number 20230367941
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Pradeep Subrahmanyan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR CURING DIELECTRIC MATERIAL
- Publication number 20220351969
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Bhargav Sridhar CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES AND APPARATUS FOR ANISOTROPIC STRESS COMPENSATION IN SUB...
- Publication number 20220068648
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Scott Falk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME
- Publication number 20220044928
- Publication date Feb 10, 2022
- VERSUM MATERIALS US, LLC
- Robert G. Ridgeway
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20210398806
- Publication date Dec 23, 2021
- Sumitomo Electric Industries, Ltd.
- Takahide HIRASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210098252
- Publication date Apr 1, 2021
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FORMATION METHOD THEREOF
- Publication number 20210057542
- Publication date Feb 25, 2021
- Semiconductor Manufacturing International (Shanghai) Corporation
- Nan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOM IMPLANTATION FOR PASSIVATION OF PILLAR MATERIAL
- Publication number 20200258886
- Publication date Aug 13, 2020
- Micron Technology, Inc.
- Russell A. Benson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOPING LAYER, THIN FILM TRANSISTOR AND METHOD FOR FABRIC...
- Publication number 20200027720
- Publication date Jan 23, 2020
- Ordos Yuansheng Optoelectronics Co., Ltd.
- Xuewei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Compounds and Methods for Depositing Films Using Same
- Publication number 20190385840
- Publication date Dec 19, 2019
- VERSUM MATERIALS US, LLC
- Robert G. Ridgeway
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20190115211
- Publication date Apr 18, 2019
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON
- Publication number 20180274100
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle-Beam Patterning Without Resist
- Publication number 20180218903
- Publication date Aug 2, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Precursors and Flowable CVD Methods for Making Low-K Films to Fill...
- Publication number 20180122631
- Publication date May 3, 2018
- VERSUM MATERIALS US, LLC
- Manchao XIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAI...
- Publication number 20180023192
- Publication date Jan 25, 2018
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOWABLE LOW-K DIELECTRIC GAPFILL TREATMENT
- Publication number 20160093488
- Publication date Mar 31, 2016
- Applied Materials, Inc.
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20160042970
- Publication date Feb 11, 2016
- TOKYO ELECTRON LIMITED
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST TREATMENT FOR DIELECTRIC CONSTANT REDUCTION WITH PORE GENERATI...
- Publication number 20150380265
- Publication date Dec 31, 2015
- Applied Materials, Inc.
- Kang Sub YIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alkyl-Alkoxysilacyclic Compounds and Methods for Depositing Films U...
- Publication number 20150364321
- Publication date Dec 17, 2015
- Air Products and Chemicals, Inc.
- Raymond Nicholas Vrtis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MILLISECOND ANNEALING IN AMMONIA AMBIENT FOR PRECISE PLACEMENT OF N...
- Publication number 20150311067
- Publication date Oct 29, 2015
- Applied Materials, Inc.
- Shashank SHARMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE
- Publication number 20150200133
- Publication date Jul 16, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Chia-Cheng CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20150179441
- Publication date Jun 25, 2015
- Fuji Electric Co., Ltd.
- Yuichi Onozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNED MASK USING CURED SPIN-ON-GLASS COMPOSITION
- Publication number 20150155164
- Publication date Jun 4, 2015
- SEAGATE TECHNOLOGY LLC
- Zhaoning Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning of Nanostructures
- Publication number 20150132928
- Publication date May 14, 2015
- Massachusetts Institute of Technology
- Joseph M. Jacobson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION AND TRANSFER DIRECTLY ON SILICON BASED FILMS
- Publication number 20150132959
- Publication date May 14, 2015
- Leonard TEDESCHI
- H01 - BASIC ELECTRIC ELEMENTS

treatment by exposure to corpuscular radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Techniques and apparatus for anisotropic stress compensation in sub...

Semiconductor device and method for manufacturing the same

Precursors and flowable CVD methods for making low-k films to fill...

Method of manufacturing semiconductor device

Method for manufacturing semiconductor structure with enlarged volu...

Semiconductor structure and formation method thereof

Techniques and apparatus for anisotropic stress compensation in sub...

Atom implantation for passivation of pillar material

Silicon compounds and methods for depositing films using same

Method for doping layer, thin film transistor and method for fabric...

Semiconductor structure and formation method thereof

Semiconductor device and method for manufacturing the same

Charged-particle-beam patterning without resist

Deposition or treatment of diamond-like carbon in a plasma reactor

Semiconductor device and method for manufacturing the same

Compositions and methods using same for carbon doped silicon contai...

Semiconductor device and method of manufacturing the same

Charged-particle-beam patterning without resist

Mixed lithography approach for E-beam and optical exposure using HSQ

Low temperature cure modulus enhancement

Mixed lithography approach for e-beam and optical exposure using HSQ

Increasing the doping efficiency during proton irradiation

Pattern forming method

Methods of forming multi-Vt III-V TFET devices

Methods of manufacturing semiconductor devices that include perform...

Flowable low-k dielectric gapfill treatment

Post treatment for dielectric constant reduction with pore generati...

Method for forming semiconductor device structure

Low k porous SiCOH dielectric and integration with post film format...

Patterning of nanostructures

Patents Applicationslast 30 patents

SUBSTRATE FOR SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE...

COMPOSITE SUBSTRATE AND PREPARATION METHOD THEREOF, AND SEMICONDUCT...

INFLUENCE FUNCTION-BASED MITIGATION OF SUBSTRATE DEFORMATION WITH F...

ALTERING OPERATIONAL CHARACTERISTICS OF A SEMICONDUCTOR DEVICE USIN...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

DOSE MAPPING USING SUBSTRATE CURVATURE TO COMPENSATE FOR OUT-OF-PLA...

METHODS AND APPARATUS FOR CURING DIELECTRIC MATERIAL

TECHNIQUES AND APPARATUS FOR ANISOTROPIC STRESS COMPENSATION IN SUB...

SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR STRUCTURE AND FORMATION METHOD THEREOF

ATOM IMPLANTATION FOR PASSIVATION OF PILLAR MATERIAL

METHOD FOR DOPING LAYER, THIN FILM TRANSISTOR AND METHOD FOR FABRIC...

Silicon Compounds and Methods for Depositing Films Using Same

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON

Charged-Particle-Beam Patterning Without Resist

Precursors and Flowable CVD Methods for Making Low-K Films to Fill...

COMPOSITIONS AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAI...

FLOWABLE LOW-K DIELECTRIC GAPFILL TREATMENT

PATTERN FORMING METHOD

POST TREATMENT FOR DIELECTRIC CONSTANT REDUCTION WITH PORE GENERATI...

Alkyl-Alkoxysilacyclic Compounds and Methods for Depositing Films U...

MILLISECOND ANNEALING IN AMMONIA AMBIENT FOR PRECISE PLACEMENT OF N...

METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

PATTERNED MASK USING CURED SPIN-ON-GLASS COMPOSITION

Patterning of Nanostructures

PATTERN FORMATION AND TRANSFER DIRECTLY ON SILICON BASED FILMS