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Treatment of water, waste water, or sewage
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Industry
CPC
C02F1/00
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
C
CHEMISTRY METALLURGY
C02
Water treatment
C02F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Current Industry
C02F1/00
Treatment of water, waste water, or sewage
Sub Industries
C02F1/001
Processes for the treatment of water whereby the filtration technique is of importance
C02F1/002
using small portable filters for producing potable water
C02F1/003
using household-type filters for producing potable water
C02F1/004
using large scale industrial sized filters
C02F1/005
Systems or processes based on supernatural or anthroposophic principles, cosmic or terrestrial radiation, geomancy or rhabdomancy
C02F1/006
Water distributors either inside a treatment tank or directing the water to several treatment tanks; Water treatment plants incorporating these distributors, with or without chemical or biological tanks
C02F1/008
Control or steering systems not provided for elsewhere in subclass C02F
C02F1/02
by heating
C02F1/025
Thermal hydrolysis
C02F1/04
by distillation or evaporation
C02F1/041
by means of vapour compression
C02F1/042
Prevention of deposits
C02F1/043
Details
C02F1/045
for obtaining ultra-pure water
C02F1/046
under vacuum produced by a barometric column
C02F1/047
using eolic energy
C02F1/048
Purification of waste water by evaporation
C02F1/06
Flash evaporation
C02F1/08
Thin film evaporation
C02F1/10
by direct contact with a particulate solid or with a fluid, as a heat transfer medium
C02F1/12
Spray evaporation
C02F1/14
using solar energy
C02F1/16
using waste heat from other processes
C02F1/18
Transportable devices to obtain potable water
C02F1/20
by degassing
C02F1/22
by freezing
C02F1/24
by flotation
C02F1/26
by extraction
C02F1/265
Desalination
C02F1/28
by sorption
C02F1/281
using inorganic sorbents
C02F1/283
using coal, charred products, or inorganic mixtures containing them
C02F1/285
using synthetic organic sorbents
C02F1/286
using natural organic sorbents or derivatives thereof
C02F1/288
using composite sorbents
C02F1/30
by irradiation
C02F1/302
with microwaves
C02F1/305
with electrons
C02F1/307
with X-rays or gamma radiation
C02F1/32
with ultra-violet light
C02F1/325
Irradiation devices or lamp constructions
C02F1/34
with mechanical oscillations
C02F1/36
ultrasonic vibrations
C02F1/38
by centrifugal separation
C02F1/385
by centrifuging suspensions
C02F1/40
Devices for separating or removing fatty or oily substances or similar floating material
C02F1/42
by ion-exchange
C02F1/44
by dialysis, osmosis or reverse osmosis
C02F1/441
by reverse osmosis
C02F1/442
by nanofiltration
C02F1/444
by ultrafiltration or microfiltration
C02F1/445
by forward osmosis
C02F1/447
by membrane distillation
C02F1/448
by pervaporation
C02F1/46
by electrochemical methods
C02F1/4602
for prevention or elimination of deposits
C02F1/4604
for desalination of seawater or brackish water
C02F1/4606
for producing oligodynamic substances to desinfect the water
C02F1/4608
using electrical discharges
C02F1/461
by electrolysis
C02F1/46104
Devices therefor; Their operating or servicing
C02F1/46109
Electrodes
C02F1/46114
Electrodes in particulate form or with conductive and/or non conductive particules between them
C02F1/46176
Galvanic cells
C02F1/4618
for producing "ionised" acidic or basic water
C02F1/463
by electrocoagulation
C02F1/465
by electroflotation
C02F1/467
by electrochemical desinfection; by electrooxydation or by electroreduction
C02F1/4672
by electrooxydation
C02F1/4674
with halogen or compound of halogens
C02F1/4676
by electroreduction
C02F1/4678
of metals
C02F1/469
by electrochemical separation
C02F1/4691
Capacitive deionisation
C02F1/4693
electrodialysis
C02F1/4695
electrodeionisation
C02F1/4696
electrophoresis
C02F1/4698
electro-osmosis
C02F1/48
with magnetic or electric fields
C02F1/481
using permanent magnets
C02F1/482
located on the outer wall of the treatment device, i.e. not in contact with the liquid to be treated
C02F1/484
using electromagnets
C02F1/485
located on the outer wall of the treatment device, i.e. not in contact with the liquid to be treated
C02F1/487
using high frequency electromagnetic fields
C02F1/488
for separation of magnetic materials
C02F1/50
by addition or application of a germicide or by oligodynamic treatment
C02F1/505
by oligodynamic treatment
C02F1/52
by flocculation or precipitation of suspended impurities
C02F1/5209
Regulation methods for flocculation or precipitation
C02F1/5227
Processes for facilitating the dissolution of solid flocculants in water
C02F1/5236
using inorganic agents
C02F1/5245
using basic salts
C02F1/5254
using magnesium compounds and phosphoric acid for removing ammonia
C02F1/5263
using natural chemical compounds
C02F1/5272
using specific organic precipitants
C02F1/5281
Installations for water purification using chemical agents
C02F1/529
Processes or devices for preparing lime water
C02F1/54
using organic material
C02F1/542
Phosphorus compounds
C02F1/545
Silicon compounds
C02F1/547
Tensides
C02F1/56
Macromolecular compounds
C02F1/58
by removing specified dissolved compounds
C02F1/583
by removing fluoride or fluorine compounds
C02F1/586
by removing ammoniacal nitrogen
C02F1/60
Silicon compounds
C02F1/62
Heavy metal compounds
C02F1/64
of iron or manganese
C02F1/645
Devices for iron precipitation and treatment by air
C02F1/66
by neutralisation pH adjustment
C02F1/68
by addition of specified substances
C02F1/681
by addition of solid materials for removing an oily layer on water
C02F1/682
by addition of chemical compounds for dispersing an oily layer on water
C02F1/683
by addition of complex-forming compounds
C02F1/685
Devices for dosing the additives
C02F1/686
Devices for dosing liquid additives
C02F1/687
Devices for dosing solid compounds
C02F1/688
Devices in which the water progressively dissolves a solid compound
C02F1/70
by reduction
C02F1/705
Reduction by metals
C02F1/72
by oxidation
C02F1/722
Oxidation by peroxides
C02F1/725
by catalytic oxidation
C02F1/727
using pure oxygen or oxygen rich gas
C02F1/74
with air
C02F1/76
with halogens or compounds of halogens
C02F1/763
Devices for the addition of such compounds in gaseous form
C02F1/766
by means of halogens other than chlorine or of halogenated compounds containing halogen other than chlorine
C02F1/78
with ozone
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