Tuning means

Industry

CPC
H01J37/32256

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32256Tuning means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Fleetwide impedance tuning performance optimization
- Patent number 12,165,843
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 11,702,749
- Issue date Jul 18, 2023
- Board of Trustees of Michigan State University
- Jes Asmussen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,670,489
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for decapsulation of plastic integrated circuit p...
- Patent number 11,295,968
- Issue date Apr 5, 2022
- JIACO Instruments Holding B.V.
- Jiaqi Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chemical vapor deposition reactor with a microwave resonant...
- Patent number 11,270,869
- Issue date Mar 8, 2022
- Taiyuan University of Technology
- Shengwang Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,049,694
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source
- Patent number 10,923,324
- Issue date Feb 16, 2021
- Verity Instruments, Inc.
- Mark A. Meloni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma generating device for plasma oxidation of SiC
- Patent number 10,734,199
- Issue date Aug 4, 2020
- Institute of Microelectronics, Chinese Academy of Sciences
- Xinyu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave control method
- Patent number 10,679,826
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for microwave plasma assisted chemical vapor...
- Patent number 10,494,719
- Issue date Dec 3, 2019
- Board of Trustees of Michigan State University
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for large area plasma processing
- Patent number 10,242,843
- Issue date Mar 26, 2019
- HELYSSEN Sàrl
- Philippe Guittienne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,096,454
- Issue date Oct 9, 2018
- Tokyo Electron Limited
- Naohiko Okunishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactors
- Patent number 9,890,457
- Issue date Feb 13, 2018
- Board of Trustees of Michigan State University
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing insulating film laminated structure
- Patent number 9,887,081
- Issue date Feb 6, 2018
- Tokyo Electron Limited
- Junya Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma tuning rods in microwave resonator plasma sources
- Patent number 9,728,416
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for presetting tuner of plasma processing apparatus and plas...
- Patent number 9,659,752
- Issue date May 23, 2017
- Tokyo Electron Limited
- Ryo Miyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition RF plasma shield deposit control
- Patent number 9,605,341
- Issue date Mar 28, 2017
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,583,314
- Issue date Feb 28, 2017
- Hitachi High-Technologies Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma tuning rods in microwave resonator processing systems
- Patent number 9,396,955
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for performing a plasma chemical vapour deposition process
- Patent number 9,376,753
- Issue date Jun 28, 2016
- Draka Comteq B.V.
- Mattheus Jacobus Nicolaas van Stralen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and high frequency generator
- Patent number 9,373,483
- Issue date Jun 21, 2016
- Tokyo Electron Limited
- Kazushi Kaneko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave introducing mechanism, microwave plasma source and microw...
- Patent number 9,281,154
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hybrid plasma source
- Patent number 9,215,789
- Issue date Dec 15, 2015
- King Abdulaziz City for Science and Technology
- Ahmed M. Hala
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave power delivery system for plasma reactors
- Patent number 9,142,389
- Issue date Sep 22, 2015
- Element Six Technologies Limited
- Christopher John Howard Wort
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma reactors
- Patent number 9,139,909
- Issue date Sep 22, 2015
- Board of Trustees of Michigan State University
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma tuning rods in microwave resonator plasma sources
- Patent number 9,111,727
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning hardware for plasma ashing apparatus and methods of use thereof
- Patent number 8,906,195
- Issue date Dec 9, 2014
- Lam Research Corporation
- Aseem K. Srivastava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma tuning rods in microwave processing systems
- Patent number 8,808,496
- Issue date Aug 19, 2014
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma reactors
- Patent number 8,316,797
- Issue date Nov 27, 2012
- Board of Trustees of Michigan State University Fraunhofer USA
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tuner and microwave plasma source
- Patent number 8,308,898
- Issue date Nov 13, 2012
- Tokyo Electron Limited
- Shigeru Kasai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
FLEETWIDE IMPEDANCE TUNING PERFORMANCE OPTIMIZATION
- Publication number 20250095965
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Method for Measuring Resonance Freq...
- Publication number 20250095973
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242937
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD
- Publication number 20240203692
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Shin OOWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION DEVICE
- Publication number 20240158910
- Publication date May 16, 2024
- Wuhan Youmeike Automation Co., Ltd
- Zhiwen KANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLEETWIDE IMPEDANCE TUNING PERFORMANCE OPTIMIZATION
- Publication number 20240153743
- Publication date May 9, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-port Phase Compensation Nested Microwave-plasma Apparatus for...
- Publication number 20230260756
- Publication date Aug 17, 2023
- Hangzhou Dianzi University
- Jie Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210313153
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210098236
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR...
- Publication number 20200216960
- Publication date Jul 9, 2020
- Board of Trustees of Michigan State University
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHEMICAL VAPOR DEPOSITION REACTOR WITH A MICROWAVE RESONANT...
- Publication number 20200105504
- Publication date Apr 2, 2020
- TAIYUAN UNIVERSITY OF TECHNOLOGY
- Shengwang Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE PLASMA GENERATING DEVICE FOR PLASMA OXIDATION OF SIC
- Publication number 20190362945
- Publication date Nov 28, 2019
- Institute of Microelectronics, Chinese Academy of Sciences
- Xinyu LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE PLASMA SOURCE
- Publication number 20190157045
- Publication date May 23, 2019
- Verity Instruments, Inc.
- Mark A. Meloni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE CONTROL METHOD
- Publication number 20180019103
- Publication date Jan 18, 2018
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Decapsulation of Plastic Integrated Circuit P...
- Publication number 20170365494
- Publication date Dec 21, 2017
- JIACO Instruments Holding B.V.
- Jiaqi Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Efficient Coaxial Delivery of Microwaves into a Mode Stab...
- Publication number 20170253963
- Publication date Sep 7, 2017
- II-VI Incorporated
- David Sabens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR...
- Publication number 20170183778
- Publication date Jun 29, 2017
- Board of Trustees of Michigan State University
- Jes Asmussen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYBRID PLASMA SOURCE
- Publication number 20150342020
- Publication date Nov 26, 2015
- KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
- Ahmed M. HALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150262793
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Naohiko OKUNISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING
- Publication number 20140262040
- Publication date Sep 18, 2014
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA REACTORS
- Publication number 20140220261
- Publication date Aug 7, 2014
- Board of Trustees of Michigan State University
- Jes Asmussen
- C30 - CRYSTAL GROWTH
Information Patent Application
MICROWAVE POWER DELIVERY SYSTEM FOR PLASMA REACTORS
- Publication number 20130334964
- Publication date Dec 19, 2013
- ELEMENT SIX LIMITED
- Christopher John Howard Wort
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TUNING RODS IN MICROWAVE RESONATOR PLASMA SOURCES
- Publication number 20130224961
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TUNING RODS IN MICROWAVE RESONATOR PROCESSING SYSTEMS
- Publication number 20130203261
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE INTRODUCING MECHANISM, MICROWAVE PLASMA SOURCE AND MICROW...
- Publication number 20130180661
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS
- Publication number 20130125817
- Publication date May 23, 2013
- Draka Comteq B.V.
- Mattheus Jacobus Nicolaas van Stralen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE PLASMA REACTORS
- Publication number 20130101730
- Publication date Apr 25, 2013
- Fraunhofer USA
- Jes Asmussen
- C30 - CRYSTAL GROWTH
Information Patent Application
Plasma Tuning Rods in Microwave Processing Systems
- Publication number 20130081762
- Publication date Apr 4, 2013
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Tuning Rods in Microwave Resonator Plasma Sources
- Publication number 20130082030
- Publication date Apr 4, 2013
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Tuning means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Fleetwide impedance tuning performance optimization

Methods and apparatus for microwave plasma assisted chemical vapor...

Modular microwave source with embedded ground surface

System and method for decapsulation of plastic integrated circuit p...

Plasma chemical vapor deposition reactor with a microwave resonant...

Modular microwave source with embedded ground surface

Microwave plasma source

Microwave plasma generating device for plasma oxidation of SiC

Microwave control method

Methods and apparatus for microwave plasma assisted chemical vapor...

Apparatus for large area plasma processing

Plasma processing apparatus

Microwave plasma reactors

Method for manufacturing insulating film laminated structure

Plasma tuning rods in microwave resonator plasma sources

Method for presetting tuner of plasma processing apparatus and plas...

Physical vapor deposition RF plasma shield deposit control

Plasma processing apparatus

Plasma tuning rods in microwave resonator processing systems

Apparatus for performing a plasma chemical vapour deposition process

Plasma processing apparatus and high frequency generator

Microwave introducing mechanism, microwave plasma source and microw...

Hybrid plasma source

Microwave power delivery system for plasma reactors

Microwave plasma reactors

Plasma tuning rods in microwave resonator plasma sources

Tuning hardware for plasma ashing apparatus and methods of use thereof

Plasma tuning rods in microwave processing systems

Microwave plasma reactors

Tuner and microwave plasma source

Patents Applicationslast 30 patents

FLEETWIDE IMPEDANCE TUNING PERFORMANCE OPTIMIZATION

Plasma Processing Apparatus and Method for Measuring Resonance Freq...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION DEVICE

FLEETWIDE IMPEDANCE TUNING PERFORMANCE OPTIMIZATION

Multi-port Phase Compensation Nested Microwave-plasma Apparatus for...

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

METHODS AND APPARATUS FOR MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR...

PLASMA CHEMICAL VAPOR DEPOSITION REACTOR WITH A MICROWAVE RESONANT...

MICROWAVE PLASMA GENERATING DEVICE FOR PLASMA OXIDATION OF SIC

MICROWAVE PLASMA SOURCE

MICROWAVE CONTROL METHOD

System and Method for Decapsulation of Plastic Integrated Circuit P...

Method of Efficient Coaxial Delivery of Microwaves into a Mode Stab...

METHODS AND APPARATUS FOR MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR...

HYBRID PLASMA SOURCE

PLASMA PROCESSING APPARATUS

METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING

MICROWAVE PLASMA REACTORS

MICROWAVE POWER DELIVERY SYSTEM FOR PLASMA REACTORS

PLASMA TUNING RODS IN MICROWAVE RESONATOR PLASMA SOURCES

PLASMA TUNING RODS IN MICROWAVE RESONATOR PROCESSING SYSTEMS

MICROWAVE INTRODUCING MECHANISM, MICROWAVE PLASMA SOURCE AND MICROW...

APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS

MICROWAVE PLASMA REACTORS

Plasma Tuning Rods in Microwave Processing Systems

Plasma Tuning Rods in Microwave Resonator Plasma Sources