Use of plasma, radiation or electromagnetic fields

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CPC
C23C16/45536

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45536Use of plasma, radiation or electromagnetic fields

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ultraviolet radiation activated atomic layer deposition
- Patent number 12,327,721
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,325,915
- Issue date Jun 10, 2025
- Picosun Oy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Step coverage using an inhibitor molecule for high aspect ratio str...
- Patent number 12,312,677
- Issue date May 27, 2025
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Wontae Noh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a tungsten or molybdenum layer in the presen...
- Patent number 12,312,678
- Issue date May 27, 2025
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silylcyclodisilazane compound and method for manufacturing silicon-...
- Patent number 12,304,924
- Issue date May 20, 2025
- DNF Co., Ltd.
- Se Jin Jang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 12,300,488
- Issue date May 13, 2025
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,300,523
- Issue date May 13, 2025
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Depositing coatings on and within housings, apparatus, or tools
- Patent number 12,291,775
- Issue date May 6, 2025
- Halliburton Energy Services, Inc.
- James M. Price
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for film formation
- Patent number 12,293,900
- Issue date May 6, 2025
- Gallium Enterprises Pty Ltd.
- Satyanarayan Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing gap filling fluids and related systems and d...
- Patent number 12,293,942
- Issue date May 6, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,288,683
- Issue date Apr 29, 2025
- Kokusai Electric Corporation
- Yasunobu Koshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modifying hydrophobicity of a wafer surface using an organosilicon...
- Patent number 12,288,685
- Issue date Apr 29, 2025
- Lam Research Corporation
- Jeremy D. Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing metal films
- Patent number 12,281,387
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor deposition monitoring device
- Patent number 12,283,497
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Young Uk Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 12,283,479
- Issue date Apr 22, 2025
- ASM IP Holding B.V.
- JaeOk Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition method and apparatus for filling a recess forme...
- Patent number 12,272,593
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced atomic layer deposition with radio-frequency power...
- Patent number 12,270,103
- Issue date Apr 8, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of SiOC thin films
- Patent number 12,272,546
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film thickness uniformity improvement using edge ring and bias elec...
- Patent number 12,266,560
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- Kin Pong Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for performing film forming process on substrate and meth...
- Patent number 12,247,287
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Manabu Honma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling radio frequency electrode imp...
- Patent number 12,249,484
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Jian Janson Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with multiple plasma units
- Patent number 12,230,479
- Issue date Feb 18, 2025
- Applied Materials, Inc.
- Kazuya Daito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of material comprising silicon and oxygen usin...
- Patent number 12,227,835
- Issue date Feb 18, 2025
- ASM IP Holding B.V.
- Viraj Madhiwala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ruthenium film forming method and substrate processing system
- Patent number 12,227,841
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods of control for plasma processing
- Patent number 12,230,475
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing silicon nitride films
- Patent number 12,230,495
- Issue date Feb 18, 2025
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,227,837
- Issue date Feb 18, 2025
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SURFACE INHIBITION ATOMIC LAYER DEPOSITION
- Publication number 20250179632
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Tao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A SUBSTRATE PROCESSING APPARATUS AND A METHOD
- Publication number 20250163580
- Publication date May 22, 2025
- Picosun Oy
- Antti KUITUNEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECURSOR FOR FORMING METAL THIN FILM, MANUFACTURING METHOD USING T...
- Publication number 20250154648
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Hyunwoo KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...
- Publication number 20250154644
- Publication date May 15, 2025
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20250149330
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20250149295
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AREA SELECTIVE DEPOSITION OF HARDMASKS FOR VACUUM GAP FORMATION
- Publication number 20250140550
- Publication date May 1, 2025
- Noel Arellano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT...
- Publication number 20250132147
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Jae Young PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN BARRIERS AND RELATED STRUCTURES, SYSTEMS, AND METHODS
- Publication number 20250132149
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Aditya Chauhan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSOR FOR FORMING YTTRIUM- OR SCANDIUM-CONTAINING THIN FILM, ME...
- Publication number 20250122619
- Publication date Apr 17, 2025
- SK TRI CHEM CO., LTD.
- Han Sol OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250122617
- Publication date Apr 17, 2025
- ASM IP HOLDING B.V.
- Seungju Chun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSOR FOR FORMING LANTHANIDE METAL-CONTAINING THIN FILM, METHOD...
- Publication number 20250122620
- Publication date Apr 17, 2025
- SK TRI CHEM CO., LTD.
- Han Sol OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING CHAMBER WITH RF RETURN PATH
- Publication number 20250118593
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Vellaichamy NAGAPPAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A PATTERN ON A SUBSTRATE
- Publication number 20250110411
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Kishan Ashokbhai Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYCLIC PEALD/PECVD THIN FILM ENCAPSULATION BARRIER
- Publication number 20250113718
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Wenhui LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Device
- Publication number 20250104974
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...
- Publication number 20250101581
- Publication date Mar 27, 2025
- ASM IP HOLDING B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF IODINE-CONTAINING CARBON FILMS
- Publication number 20250092518
- Publication date Mar 20, 2025
- American Air Liquide, Inc.
- Phong NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USIN...
- Publication number 20250092515
- Publication date Mar 20, 2025
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20250087480
- Publication date Mar 13, 2025
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Haifeng QIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20250081492
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Lin CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GROWTH OF THIN OXIDE LAYER WITH SILICON NITRIDE AND CONVERSION
- Publication number 20250075321
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Fredrick FISHBURN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Publication number 20250066913
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...
- Publication number 20250059645
- Publication date Feb 20, 2025
- Duck Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTUR...
- Publication number 20250054752
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL 2-IN-1 (UV-ASSISTED AND PLASMA ENHANCED) ALD & ALE CHAMBER DE...
- Publication number 20250051912
- Publication date Feb 13, 2025
- SKY TECH INC.
- JUNG-HUA CHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250051915
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF FORMING CONFORMAL TRANSITION METAL DICHALCOGENIDE FILMS
- Publication number 20250051902
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Chandan Das
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Use of plasma, radiation or electromagnetic fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ultraviolet radiation activated atomic layer deposition

Substrate processing apparatus and method

Apparatus for processing substrate

Step coverage using an inhibitor molecule for high aspect ratio str...

Methods for depositing a tungsten or molybdenum layer in the presen...

Silylcyclodisilazane compound and method for manufacturing silicon-...

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Substrate processing apparatus and method

Depositing coatings on and within housings, apparatus, or tools

Apparatus and method for film formation

Throughput improvement with interval conditioning purging

Methods for depositing gap filling fluids and related systems and d...

Method of manufacturing semiconductor device, substrate processing...

Film deposition apparatus for fine pattern forming

Modifying hydrophobicity of a wafer surface using an organosilicon...

Method of depositing metal films

Semiconductor deposition monitoring device

Substrate processing method

Cyclical deposition method and apparatus for filling a recess forme...

Plasma-enhanced atomic layer deposition with radio-frequency power...

Formation of SiOC thin films

Film thickness uniformity improvement using edge ring and bias elec...

Apparatus for performing film forming process on substrate and meth...

Methods and apparatus for controlling radio frequency electrode imp...

Processing chamber with multiple plasma units

Selective deposition of material comprising silicon and oxygen usin...

Ruthenium film forming method and substrate processing system

Systems and methods of control for plasma processing

Method of depositing silicon nitride films

Ex situ coating of chamber components for semiconductor processing

Patents Applicationslast 30 patents

SURFACE INHIBITION ATOMIC LAYER DEPOSITION

A SUBSTRATE PROCESSING APPARATUS AND A METHOD

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

PRECURSOR FOR FORMING METAL THIN FILM, MANUFACTURING METHOD USING T...

HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

AREA SELECTIVE DEPOSITION OF HARDMASKS FOR VACUUM GAP FORMATION

METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT...

HYDROGEN BARRIERS AND RELATED STRUCTURES, SYSTEMS, AND METHODS

PRECURSOR FOR FORMING YTTRIUM- OR SCANDIUM-CONTAINING THIN FILM, ME...

SUBSTRATE PROCESSING METHOD

PRECURSOR FOR FORMING LANTHANIDE METAL-CONTAINING THIN FILM, METHOD...

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

PROCESSING CHAMBER WITH RF RETURN PATH

METHOD FOR FORMING A PATTERN ON A SUBSTRATE

CYCLIC PEALD/PECVD THIN FILM ENCAPSULATION BARRIER

Plasma Processing Device

APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...

DEPOSITION OF IODINE-CONTAINING CARBON FILMS

SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USIN...

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

GROWTH OF THIN OXIDE LAYER WITH SILICON NITRIDE AND CONVERSION

SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL

SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...

METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTUR...

NOVEL 2-IN-1 (UV-ASSISTED AND PLASMA ENHANCED) ALD & ALE CHAMBER DE...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHODS OF FORMING CONFORMAL TRANSITION METAL DICHALCOGENIDE FILMS