Use of plasma, radiation or electromagnetic fields

Industry

CPC
C23C16/45536

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45536Use of plasma, radiation or electromagnetic fields

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Vapor deposition precursor compounds and process of use
- Patent number 12,209,105
- Issue date Jan 28, 2025
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Impedance measurement jig and method of controlling a substrate-pro...
- Patent number 12,210,045
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Byeongsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for performing an in-situ etch of reaction ch...
- Patent number 12,203,166
- Issue date Jan 21, 2025
- ASM IP Holding B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning treatment for ALD productivity
- Patent number 12,195,845
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Christina L. Engler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...
- Patent number 12,195,850
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetically coupled RF filter for substrate processing chambers
- Patent number 12,198,908
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of iodine-containing carbon films
- Patent number 12,188,123
- Issue date Jan 7, 2025
- American Air Liquide, Inc.
- Phong Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...
- Patent number 12,180,586
- Issue date Dec 31, 2024
- NanoMaster, Inc.
- Birol Kuyel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and plasma processing apparatus
- Patent number 12,170,198
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,163,220
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yu Komai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate comprising a silver-plated surface protected against silv...
- Patent number 12,163,217
- Issue date Dec 10, 2024
- The Swatch Group Research and Development Ltd.
- Christian Manasterski
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic multi zone flow control for a processing system
- Patent number 12,159,785
- Issue date Dec 3, 2024
- Applied Materials, Inc.
- Daemian Raj Benjamin Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming structures using a neutral beam
- Patent number 12,129,548
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced chemical vapor deposition coating system
- Patent number 12,129,549
- Issue date Oct 29, 2024
- Benjamin Lawrence
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective processing with etch residue-based inhibitors
- Patent number 12,131,909
- Issue date Oct 29, 2024
- Lam Research Corporation
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing octahedron transition metal dichalcogenides us...
- Patent number 12,129,547
- Issue date Oct 29, 2024
- Research & Business Foundation Sungkyunkwan University
- Taesung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed-plasma deposition of thin film layers
- Patent number 12,131,903
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Faceplate having a curved surface
- Patent number 12,110,590
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Shailendra Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming topology-controlled amorphous carbon polymer film
- Patent number 12,112,940
- Issue date Oct 8, 2024
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus and method with EM radiation
- Patent number 12,110,587
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating substrate support
- Patent number 12,106,944
- Issue date Oct 1, 2024
- ASM IP Holding B.V.
- Yukihiro Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device and substrate processing method
- Patent number 12,106,941
- Issue date Oct 1, 2024
- Jusung Engineering Co., Ltd.
- Chul-Joo Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of manufacturing interconnect structures
- Patent number 12,091,752
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ting Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microstructure control of conducting materials through surface coat...
- Patent number 12,084,763
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Marc Shull
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing system, and ab...
- Patent number 12,087,562
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Kazushi Hikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidative conversion in atomic layer deposition processes
- Patent number 12,087,574
- Issue date Sep 10, 2024
- Lam Research Corporation
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYERED SILICON NITRIDE FILM
- Publication number 20250011924
- Publication date Jan 9, 2025
- VERSUM MATERIALS US, LLC
- SE-WON LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION SEAM REDUCTION
- Publication number 20250014893
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20250014904
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF
- Publication number 20250014890
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING A LAYER ONTO A SUBSTRATE AND SEMICONDUCTOR PR...
- Publication number 20250014895
- Publication date Jan 9, 2025
- ASM IP HOLDING B.V.
- René Henricus Jozef Vervuurt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250006462
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Morihito INAGAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Particle Coating Apparatus And Method Of Coating Particle
- Publication number 20250003064
- Publication date Jan 2, 2025
- SEIKO EPSON CORPORATION
- Teruaki NANBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP
- Publication number 20250006489
- Publication date Jan 2, 2025
- ASM IP HOLDING B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
- Publication number 20250006487
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Daemian Raj BENJAMIN RAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Particle Coating Apparatus And Method Of Coating Particle
- Publication number 20250003063
- Publication date Jan 2, 2025
- SEIKO EPSON CORPORATION
- Teruaki NANBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM
- Publication number 20240420958
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Venkata Surya Naga Raju Chava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITION IN HIGH ASPECT RATIO (HAR) FEATURES
- Publication number 20240420965
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Shihsheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING SUBSTRATE SUPPORT
- Publication number 20240420931
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Yukihiro Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION PART COATING CHAMBER
- Publication number 20240420926
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILA...
- Publication number 20240410053
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL IMAGING FOR ANALYSIS OF DEVICE FABRICATION TOOLS
- Publication number 20240410760
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick Leeser
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240401199
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
N-TYPE DOUBLE-SIDED SOLAR CELL PREPARATION METHOD
- Publication number 20240405151
- Publication date Dec 5, 2024
- Tongwei Solar (Meishan) Co., Ltd.
- Wenzhou XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BALANCING GAS FLOW TO MULTIPLE STATIONS USING HEATERS UPSTREAM OF F...
- Publication number 20240401202
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Brian RATLIFF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK
- Publication number 20240395542
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING CARBON-CONTAINING FILM, AND METHOD FOR FORMING H...
- Publication number 20240392432
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR LID AND AN ATOMIC LAYER DEPOSITION APPARATUS USING THE SAME
- Publication number 20240392439
- Publication date Nov 28, 2024
- ASM IP HOLDING B.V.
- SungHoon Jun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS AND METHOD WITH EM RADIATION
- Publication number 20240384409
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tze-Liang Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH...
- Publication number 20240384410
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Hao LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING
- Publication number 20240387226
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Aaron Blake MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF MANUFACTURING INTERCONNECT STRUCTURES
- Publication number 20240384408
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF SUBSTRATE PROCESSING AND METHODS OF MANUFACTURING SEMICO...
- Publication number 20240376600
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Cheng WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROSTRUCTURE CONTROL OF CONDUCTING MATERIALS THROUGH SURFACE COAT...
- Publication number 20240376595
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Marc Shull
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
SELECTIVE CARBON DEPOSITION
- Publication number 20240368761
- Publication date Nov 7, 2024
- LAM RESEARCH CORPORATION
- Awnish GUPTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...
- Publication number 20240371613
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Use of plasma, radiation or electromagnetic fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vapor deposition precursor compounds and process of use

Impedance measurement jig and method of controlling a substrate-pro...

Method for depositing film and film deposition system

Apparatus and methods for performing an in-situ etch of reaction ch...

Conditioning treatment for ALD productivity

Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...

Magnetically coupled RF filter for substrate processing chambers

Deposition of iodine-containing carbon films

Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...

Deposition method and plasma processing apparatus

Deposition method and deposition apparatus

Substrate comprising a silver-plated surface protected against silv...

Ex situ coating of chamber components for semiconductor processing

Plasma processing apparatus and plasma processing method

Dynamic multi zone flow control for a processing system

Method of forming structures using a neutral beam

Plasma-enhanced chemical vapor deposition coating system

Selective processing with etch residue-based inhibitors

Method for producing octahedron transition metal dichalcogenides us...

Pulsed-plasma deposition of thin film layers

Faceplate having a curved surface

Substrate processing apparatus and method

Method of forming topology-controlled amorphous carbon polymer film

Deposition apparatus and method with EM radiation

Rotating substrate support

Substrate processing device and substrate processing method

Apparatus and method of manufacturing interconnect structures

Microstructure control of conducting materials through surface coat...

Substrate processing apparatus, substrate processing system, and ab...

Oxidative conversion in atomic layer deposition processes

Patents Applicationslast 30 patents

MULTILAYERED SILICON NITRIDE FILM

ATOMIC LAYER DEPOSITION SEAM REDUCTION

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF

METHOD FOR DEPOSITING A LAYER ONTO A SUBSTRATE AND SEMICONDUCTOR PR...

SUBSTRATE PROCESSING METHOD

Particle Coating Apparatus And Method Of Coating Particle

METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP

DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM

Particle Coating Apparatus And Method Of Coating Particle

METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM

METHOD OF DEPOSITION IN HIGH ASPECT RATIO (HAR) FEATURES

ROTATING SUBSTRATE SUPPORT

ATOMIC LAYER DEPOSITION PART COATING CHAMBER

CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILA...

THERMAL IMAGING FOR ANALYSIS OF DEVICE FABRICATION TOOLS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

N-TYPE DOUBLE-SIDED SOLAR CELL PREPARATION METHOD

BALANCING GAS FLOW TO MULTIPLE STATIONS USING HEATERS UPSTREAM OF F...

HIGH ETCH SELECTIVITY, LOW STRESS ASHABLE CARBON HARD MASK

METHOD FOR FORMING CARBON-CONTAINING FILM, AND METHOD FOR FORMING H...

REACTOR LID AND AN ATOMIC LAYER DEPOSITION APPARATUS USING THE SAME

DEPOSITION APPARATUS AND METHOD WITH EM RADIATION

SYSTEM AND METHOD FOR PLASMA ENHANCED ATOMIC LAYER DEPOSITION WITH...

REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING

APPARATUS AND METHOD OF MANUFACTURING INTERCONNECT STRUCTURES

METHODS OF SUBSTRATE PROCESSING AND METHODS OF MANUFACTURING SEMICO...

MICROSTRUCTURE CONTROL OF CONDUCTING MATERIALS THROUGH SURFACE COAT...

SELECTIVE CARBON DEPOSITION

HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...