Use of plasma, radiation or electromagnetic fields

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CPC
C23C16/45536

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/45536Use of plasma, radiation or electromagnetic fields

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Synthesis and use of precursors for ALD of molybdenum or tungsten c...
- Patent number 12,365,981
- Issue date Jul 22, 2025
- ASM IP Holding B.V.
- Tiina McKee
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Methods for forming a boron nitride film by a plasma enhanced atomi...
- Patent number 12,365,983
- Issue date Jul 22, 2025
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,362,156
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Atsushi Kubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and substrate processing apparatus
- Patent number 12,362,142
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Takashi Chiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium aluminum oxide coatings deposited by atomic layer deposition
- Patent number 12,351,910
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- David Fenwick
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrophobic low-dielectric-constant film and preparation method the...
- Patent number 12,351,911
- Issue date Jul 8, 2025
- JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming plasma coating
- Patent number 12,347,652
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Lance A. Scudder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing copper-containing layer
- Patent number 12,344,931
- Issue date Jul 1, 2025
- Adeka Corporation
- Akihiro Nishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing chamber for improved precursor flow
- Patent number 12,340,979
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultraviolet radiation activated atomic layer deposition
- Patent number 12,327,721
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y. Ouyang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,325,915
- Issue date Jun 10, 2025
- Picosun Oy
- Timo Vähä-Ojala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Step coverage using an inhibitor molecule for high aspect ratio str...
- Patent number 12,312,677
- Issue date May 27, 2025
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Wontae Noh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a tungsten or molybdenum layer in the presen...
- Patent number 12,312,678
- Issue date May 27, 2025
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silylcyclodisilazane compound and method for manufacturing silicon-...
- Patent number 12,304,924
- Issue date May 20, 2025
- DNF Co., Ltd.
- Se Jin Jang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 12,300,488
- Issue date May 13, 2025
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,300,523
- Issue date May 13, 2025
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Depositing coatings on and within housings, apparatus, or tools
- Patent number 12,291,775
- Issue date May 6, 2025
- Halliburton Energy Services, Inc.
- James M. Price
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for film formation
- Patent number 12,293,900
- Issue date May 6, 2025
- Gallium Enterprises Pty Ltd.
- Satyanarayan Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing gap filling fluids and related systems and d...
- Patent number 12,293,942
- Issue date May 6, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,288,683
- Issue date Apr 29, 2025
- Kokusai Electric Corporation
- Yasunobu Koshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modifying hydrophobicity of a wafer surface using an organosilicon...
- Patent number 12,288,685
- Issue date Apr 29, 2025
- Lam Research Corporation
- Jeremy D. Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing metal films
- Patent number 12,281,387
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor deposition monitoring device
- Patent number 12,283,497
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Young Uk Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 12,283,479
- Issue date Apr 22, 2025
- ASM IP Holding B.V.
- JaeOk Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclical deposition method and apparatus for filling a recess forme...
- Patent number 12,272,593
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of SiOC thin films
- Patent number 12,272,546
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced atomic layer deposition with radio-frequency power...
- Patent number 12,270,103
- Issue date Apr 8, 2025
- Lam Research Corporation
- Jeremy David Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250236951
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FILLING A GAP
- Publication number 20250232974
- Publication date Jul 17, 2025
- ASM IP HOLDING B.V.
- Sungdae Woo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE CONTROL OF MULTI-STATION PROCESSING CHAMBER COMPONENTS
- Publication number 20250230546
- Publication date Jul 17, 2025
- LAM RESEARCH CORPORATION
- Douglas Walter Agnew
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR FILM FORMATION
- Publication number 20250232958
- Publication date Jul 17, 2025
- Gallium Enterprises Pty Ltd
- Satyanarayan Barik
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT FOR LARGE AREA GAPFILL
- Publication number 20250230540
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250226207
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Yasunobu KOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR FILLING A GAP
- Publication number 20250226214
- Publication date Jul 10, 2025
- ASM IP HOLDING B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250218782
- Publication date Jul 3, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Eunhyoung CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-BASED THIN FILM MODIFIER, THIN FILM MODIFICATION COMPOSITION...
- Publication number 20250207251
- Publication date Jun 26, 2025
- Soulbrain Co., LTD
- Chang Bong YEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20250210345
- Publication date Jun 26, 2025
- Kokusai Electric Corporation
- Kimihiko NAKATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NIT...
- Publication number 20250197996
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ENHANCED ATOMIC LAYER DEPOSITION WITH RADIO-FREQUENCY POWER...
- Publication number 20250197995
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Jeremy David Fields
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM-FREE AND CRACK-FREE DEPOSITION
- Publication number 20250188609
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Device for Performing Plasma Treatment, and Method for Performing P...
- Publication number 20250188610
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Jianming HAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE INHIBITION ATOMIC LAYER DEPOSITION
- Publication number 20250179632
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Tao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A SUBSTRATE PROCESSING APPARATUS AND A METHOD
- Publication number 20250163580
- Publication date May 22, 2025
- Picosun Oy
- Antti KUITUNEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS
- Publication number 20250163578
- Publication date May 22, 2025
- Applied Materials, Inc.
- Hanhong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECURSOR FOR FORMING METAL THIN FILM, MANUFACTURING METHOD USING T...
- Publication number 20250154648
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Hyunwoo KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...
- Publication number 20250154644
- Publication date May 15, 2025
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20250149330
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
- Publication number 20250149295
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Alok Ranjan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AREA SELECTIVE DEPOSITION OF HARDMASKS FOR VACUUM GAP FORMATION
- Publication number 20250140550
- Publication date May 1, 2025
- Noel Arellano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT...
- Publication number 20250132147
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Jae Young PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN BARRIERS AND RELATED STRUCTURES, SYSTEMS, AND METHODS
- Publication number 20250132149
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Aditya Chauhan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSOR FOR FORMING YTTRIUM- OR SCANDIUM-CONTAINING THIN FILM, ME...
- Publication number 20250122619
- Publication date Apr 17, 2025
- SK TRI CHEM CO., LTD.
- Han Sol OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250122617
- Publication date Apr 17, 2025
- ASM IP HOLDING B.V.
- Seungju Chun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSOR FOR FORMING LANTHANIDE METAL-CONTAINING THIN FILM, METHOD...
- Publication number 20250122620
- Publication date Apr 17, 2025
- SK TRI CHEM CO., LTD.
- Han Sol OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING CHAMBER WITH RF RETURN PATH
- Publication number 20250118593
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Vellaichamy NAGAPPAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Use of plasma, radiation or electromagnetic fields

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Synthesis and use of precursors for ALD of molybdenum or tungsten c...

Methods for forming a boron nitride film by a plasma enhanced atomi...

Substrate processing method and substrate processing apparatus

Plasma processing method and substrate processing apparatus

Hafnium aluminum oxide coatings deposited by atomic layer deposition

Hydrophobic low-dielectric-constant film and preparation method the...

Method for forming plasma coating

Method of producing copper-containing layer

Semiconductor processing chamber for improved precursor flow

Ultraviolet radiation activated atomic layer deposition

Substrate processing apparatus and method

Apparatus for processing substrate

Step coverage using an inhibitor molecule for high aspect ratio str...

Methods for depositing a tungsten or molybdenum layer in the presen...

Silylcyclodisilazane compound and method for manufacturing silicon-...

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Substrate processing apparatus and method

Depositing coatings on and within housings, apparatus, or tools

Apparatus and method for film formation

Throughput improvement with interval conditioning purging

Methods for depositing gap filling fluids and related systems and d...

Method of manufacturing semiconductor device, substrate processing...

Film deposition apparatus for fine pattern forming

Modifying hydrophobicity of a wafer surface using an organosilicon...

Method of depositing metal films

Semiconductor deposition monitoring device

Substrate processing method

Cyclical deposition method and apparatus for filling a recess forme...

Formation of SiOC thin films

Plasma-enhanced atomic layer deposition with radio-frequency power...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF FILLING A GAP

SELECTIVE CONTROL OF MULTI-STATION PROCESSING CHAMBER COMPONENTS

APPARATUS AND METHOD FOR FILM FORMATION

SEAM PERFORMANCE IMPROVEMENT FOR LARGE AREA GAPFILL

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

METHODS AND APPARATUSES FOR FILLING A GAP

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

VACUUM-BASED THIN FILM MODIFIER, THIN FILM MODIFICATION COMPOSITION...

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NIT...

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION WITH RADIO-FREQUENCY POWER...

SEAM-FREE AND CRACK-FREE DEPOSITION

Device for Performing Plasma Treatment, and Method for Performing P...

SURFACE INHIBITION ATOMIC LAYER DEPOSITION

A SUBSTRATE PROCESSING APPARATUS AND A METHOD

PLASMA SHOWERHEAD ASSEMBLY AND METHOD OF REDUCING DEFECTS

PRECURSOR FOR FORMING METAL THIN FILM, MANUFACTURING METHOD USING T...

HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING

AREA SELECTIVE DEPOSITION OF HARDMASKS FOR VACUUM GAP FORMATION

METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT...

HYDROGEN BARRIERS AND RELATED STRUCTURES, SYSTEMS, AND METHODS

PRECURSOR FOR FORMING YTTRIUM- OR SCANDIUM-CONTAINING THIN FILM, ME...

SUBSTRATE PROCESSING METHOD

PRECURSOR FOR FORMING LANTHANIDE METAL-CONTAINING THIN FILM, METHOD...

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

PROCESSING CHAMBER WITH RF RETURN PATH