using a spatial filtering method

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CPC
G01N21/95623

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GPHYSICS G01Measuring instruments G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES G01N21/00Investigating or analysing materials by the use of optical means

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G01N21/95623using a spatial filtering method

Industries

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Patents Grantslast 30 patents

Information Patent Grant
High throughput defect detection
- Patent number 12,092,584
- Issue date Sep 17, 2024
- Applied Materials Israel Ltd.
- Boris Golberg
- G01 - MEASURING TESTING
Information Patent Grant
Dark field microscope
- Patent number 11,940,608
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 11,092,555
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Lin Louis Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for analyzing particles
- Patent number 10,852,248
- Issue date Dec 1, 2020
- Heraeus Quarzglas GmbH & Co. KG
- Stefan Weidlich
- G01 - MEASURING TESTING
Information Patent Grant
High throughput, high resolution optical metrology for reflective a...
- Patent number 10,816,482
- Issue date Oct 27, 2020
- Board of Regents, The University of Texas System
- S. V. Sreenivasan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Urine analyzer and urinalysis method
- Patent number 10,775,362
- Issue date Sep 15, 2020
- Sysmex Corporation
- Shota Tateyama
- G01 - MEASURING TESTING
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 10,718,718
- Issue date Jul 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect detection device and defect observation device
- Patent number 10,642,164
- Issue date May 5, 2020
- Hitachi High-Technologies Corporation
- Yuko Otani
- G01 - MEASURING TESTING
Information Patent Grant
Phase contrast monitoring for extreme ultra-violet (EUV) masks defe...
- Patent number 10,634,623
- Issue date Apr 28, 2020
- KLA-Tencor Corporation
- Qiang Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective lens
- Patent number 10,598,607
- Issue date Mar 24, 2020
- Camtek Ltd.
- Zehava Ben Ezer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,599,047
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Janneke Ravensbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lighting device for inspection and inspection system
- Patent number 10,598,603
- Issue date Mar 24, 2020
- Machine Vision Lighting Inc.
- Shigeki Masumura
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus, semiconductor device manufacturing system inc...
- Patent number 10,489,902
- Issue date Nov 26, 2019
- Samsung Electronics Co., Ltd.
- Kwang Soo Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Defect classification method, method of sorting photomask blanks, a...
- Patent number 10,488,347
- Issue date Nov 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer film metrology using an effective media approximation
- Patent number 10,429,296
- Issue date Oct 1, 2019
- KLA-Tencor Corporation
- Mark A. Neil
- G02 - OPTICS
Information Patent Grant
EUV vessel inspection method and related system
- Patent number 10,429,314
- Issue date Oct 1, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis Chang
- G01 - MEASURING TESTING
Information Patent Grant
Defect detection method and defect detection device and defect obse...
- Patent number 10,267,745
- Issue date Apr 23, 2019
- Hitachi High-Technologies Corporation
- Yuko Otani
- G01 - MEASURING TESTING
Information Patent Grant
Determining a configuration for an optical element positioned in a...
- Patent number 10,215,713
- Issue date Feb 26, 2019
- KLA-Tencor Corp.
- Pavel Kolchin
- G01 - MEASURING TESTING
Information Patent Grant
Optical inspection apparatus, a method of inspecting a substrate, a...
- Patent number 9,915,623
- Issue date Mar 13, 2018
- Samsung Electronics Co., Ltd.
- Kwang Soo Kim
- G02 - OPTICS
Information Patent Grant
Inspection apparatus and method, lithographic apparatus, lithograph...
- Patent number 9,904,181
- Issue date Feb 27, 2018
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spatial-light-modulator-based signatures of intrinsic and extrinsic...
- Patent number 9,762,565
- Issue date Sep 12, 2017
- Washington State University
- Hergen Eilers
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Defect detection method and defect detection device and defect obse...
- Patent number 9,759,666
- Issue date Sep 12, 2017
- Hitachi High-Technologies Corporation
- Yuko Otani
- G01 - MEASURING TESTING
Information Patent Grant
Compressive sensing with illumination patterning
- Patent number 9,719,940
- Issue date Aug 1, 2017
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining a configuration for an optical element positioned in a...
- Patent number 9,709,510
- Issue date Jul 18, 2017
- KLA-Tencor Corp.
- Pavel Kolchin
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting defects
- Patent number 9,678,021
- Issue date Jun 13, 2017
- Hitachi High-Technologies Corporation
- Yuta Urano
- G01 - MEASURING TESTING
Information Patent Grant
System and method for apodization in a semiconductor device inspect...
- Patent number 9,645,093
- Issue date May 9, 2017
- KLA-Tencor Corporation
- Jamie M. Sullivan
- G02 - OPTICS
Information Patent Grant
Simultaneous multi-spot inspection and imaging
- Patent number 9,568,435
- Issue date Feb 14, 2017
- KLA-Tencor Corporation
- Mehdi Vaez-Iravani
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system
- Patent number 9,535,009
- Issue date Jan 3, 2017
- Hitachi High-Technologies Corporation
- Kenshiro Ohtsubo
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for inspection of articles, EUV lithography r...
- Patent number 9,488,922
- Issue date Nov 8, 2016
- ASML Netherlands B.V.
- Yuri Vainer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method of inspecting a defect of an object
- Patent number 9,453,800
- Issue date Sep 27, 2016
- Samsung Electronics Co., Ltd.
- Akio Ishikawa
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MEASURING SURFACE PARAMETER OF COPPER FOIL, AND METHOD F...
- Publication number 20240418504
- Publication date Dec 19, 2024
- Mitsui Mining and Smelting Co., Ltd.
- Hiroaki KURIHARA
- G01 - MEASURING TESTING
Information Patent Application
DARK FIELD MICROSCOPE
- Publication number 20240231065
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH THROUGHPUT DEFECT DETECTION
- Publication number 20230341334
- Publication date Oct 26, 2023
- APPLIED MATERIALS ISRAEL LTD.
- Boris Golberg
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING CONTACT HEIGHT OF A PACKAGED CHIP
- Publication number 20230324312
- Publication date Oct 12, 2023
- Vitrox Technologies Sdn. Bhd.
- Heng Juan Tan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
- Publication number 20220350260
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Armand Eugene Albert
- G01 - MEASURING TESTING
Information Patent Application
DARK FIELD MICROSCOPE
- Publication number 20220229278
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR PASSIVELY MONITORING A SAMPLE
- Publication number 20210172883
- Publication date Jun 10, 2021
- ContinUse Biometrics Ltd.
- Zeev ZALEVSKY
- G01 - MEASURING TESTING
Information Patent Application
Finding Semiconductor Defects Using Convolutional Context Attributes
- Publication number 20210158223
- Publication date May 27, 2021
- KLA Corporation
- Abdurrahman Sezginer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM
- Publication number 20200348241
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis CHANG
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR ANALYZING PARTICLES
- Publication number 20200033272
- Publication date Jan 30, 2020
- Heraeus Quarzglas GmbH & Co. KG
- Stefan Weidlich
- G01 - MEASURING TESTING
Information Patent Application
EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM
- Publication number 20200025688
- Publication date Jan 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis CHANG
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT APPARATUS, MEASUREMENT METHOD, AND MEASUREMENT METHOD
- Publication number 20190380598
- Publication date Dec 19, 2019
- KYOCERA CORPORATION
- Daisuke HIGUCHI
- G01 - MEASURING TESTING
Information Patent Application
High Throughput, High Resolution Optical Metrology For Reflective A...
- Publication number 20190250107
- Publication date Aug 15, 2019
- Board of Regents, The University of Texas System
- S. V. Sreenivasan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer Film Metrology Using An Effective Media Approximation
- Publication number 20190033211
- Publication date Jan 31, 2019
- KLA-Tencor Corporation
- Mark A. Neil
- G02 - OPTICS
Information Patent Application
EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM
- Publication number 20190033225
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Lin Louis CHANG
- G01 - MEASURING TESTING
Information Patent Application
URINE ANALYZER AND URINALYSIS METHOD
- Publication number 20180348200
- Publication date Dec 6, 2018
- SYSMEX CORPORATION
- Shota TATEYAMA
- G01 - MEASURING TESTING
Information Patent Application
LIGHTING DEVICE FOR INSPECTION AND INSPECTION SYSTEM
- Publication number 20180299386
- Publication date Oct 18, 2018
- MACHINE VISION LIGHTING INC.
- Shigeki Masumura
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR SURFACE INSPECTION
- Publication number 20180017501
- Publication date Jan 18, 2018
- SIGHTLINE INNOVATION INC.
- Wallace TRENHOLM
- G01 - MEASURING TESTING
Information Patent Application
DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSE...
- Publication number 20170363547
- Publication date Dec 21, 2017
- Hitachi High-Technologies Corporation
- Yuko OTANI
- G01 - MEASURING TESTING
Information Patent Application
DEFECT OBSERVATION METHOD AND DEFECT OBSERVATION DEVICE
- Publication number 20170328842
- Publication date Nov 16, 2017
- Hitachi High-Technologies Corporation
- Yuko Otani
- G01 - MEASURING TESTING
Information Patent Application
Determining a Configuration for an Optical Element Positioned in a...
- Publication number 20170292918
- Publication date Oct 12, 2017
- KLA-Tencor Corporation
- Pavel Kolchin
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM INC...
- Publication number 20170116727
- Publication date Apr 27, 2017
- Samsung Electronics Co., Ltd.
- Kwang Soo KIM
- G02 - OPTICS
Information Patent Application
Inspection Apparatus and Method, Lithographic Apparatus, Lithograph...
- Publication number 20160377990
- Publication date Dec 29, 2016
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Simultaneous Multi-Spot Inspection and Imaging
- Publication number 20140362372
- Publication date Dec 11, 2014
- Mehdi Vaez-Iravani
- G01 - MEASURING TESTING
Information Patent Application
Defect Inspecting Apparatus and Defect Inspecting Method
- Publication number 20140233024
- Publication date Aug 21, 2014
- Hitachi High-Techmologies Corporation
- Atsushi Taniguchi
- G02 - OPTICS
Information Patent Application
Apparatus and Method of Inspecting a Defect of an Object
- Publication number 20140185044
- Publication date Jul 3, 2014
- Samsung Electronics Co., Ltd.
- Akio Ishikawa
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Inspection of Articles, EUV Lithography R...
- Publication number 20140146297
- Publication date May 29, 2014
- ASML NETHERLANDS B.V.
- Yuri Vainer
- G01 - MEASURING TESTING
Information Patent Application
DEFECT DETECTION METHOD
- Publication number 20140055774
- Publication date Feb 27, 2014
- NuFlare Technology, Inc.
- Shinji SUGIHARA
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Apodization in a Semiconductor Device Inspect...
- Publication number 20140016125
- Publication date Jan 16, 2014
- KLA-Tencor Corporation
- Jamie M. Sullivan
- G02 - OPTICS
Information Patent Application
INSPECTION APPARATUS
- Publication number 20140002810
- Publication date Jan 2, 2014
- Hitachi High-Technologies Corporation
- Masaaki Ito
- G01 - MEASURING TESTING

using a spatial filtering method

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High throughput defect detection

Dark field microscope

EUV vessel inspection method and related system

Apparatus and method for analyzing particles

High throughput, high resolution optical metrology for reflective a...

Urine analyzer and urinalysis method

EUV vessel inspection method and related system

Defect detection device and defect observation device

Phase contrast monitoring for extreme ultra-violet (EUV) masks defe...

Objective lens

Metrology apparatus, lithographic system, and method of measuring a...

Lighting device for inspection and inspection system

Inspection apparatus, semiconductor device manufacturing system inc...

Defect classification method, method of sorting photomask blanks, a...

Multilayer film metrology using an effective media approximation

EUV vessel inspection method and related system

Defect detection method and defect detection device and defect obse...

Determining a configuration for an optical element positioned in a...

Optical inspection apparatus, a method of inspecting a substrate, a...

Inspection apparatus and method, lithographic apparatus, lithograph...

Spatial-light-modulator-based signatures of intrinsic and extrinsic...

Defect detection method and defect detection device and defect obse...

Compressive sensing with illumination patterning

Determining a configuration for an optical element positioned in a...

Method and apparatus for inspecting defects

System and method for apodization in a semiconductor device inspect...

Simultaneous multi-spot inspection and imaging

Inspection system

Methods and apparatus for inspection of articles, EUV lithography r...

Apparatus and method of inspecting a defect of an object

Patents Applicationslast 30 patents

METHOD FOR MEASURING SURFACE PARAMETER OF COPPER FOIL, AND METHOD F...

DARK FIELD MICROSCOPE

HIGH THROUGHPUT DEFECT DETECTION

SYSTEM AND METHOD FOR DETERMINING CONTACT HEIGHT OF A PACKAGED CHIP

A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS

DARK FIELD MICROSCOPE

SYSTEM AND METHOD FOR PASSIVELY MONITORING A SAMPLE

Finding Semiconductor Defects Using Convolutional Context Attributes

EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM

APPARATUS AND METHOD FOR ANALYZING PARTICLES

EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM

MEASUREMENT APPARATUS, MEASUREMENT METHOD, AND MEASUREMENT METHOD

High Throughput, High Resolution Optical Metrology For Reflective A...

Multilayer Film Metrology Using An Effective Media Approximation

EUV VESSEL INSPECTION METHOD AND RELATED SYSTEM

URINE ANALYZER AND URINALYSIS METHOD

LIGHTING DEVICE FOR INSPECTION AND INSPECTION SYSTEM

SYSTEM AND METHOD FOR SURFACE INSPECTION

DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSE...

DEFECT OBSERVATION METHOD AND DEFECT OBSERVATION DEVICE

Determining a Configuration for an Optical Element Positioned in a...

INSPECTION APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM INC...

Inspection Apparatus and Method, Lithographic Apparatus, Lithograph...

Simultaneous Multi-Spot Inspection and Imaging

Defect Inspecting Apparatus and Defect Inspecting Method

Apparatus and Method of Inspecting a Defect of an Object

Methods and Apparatus for Inspection of Articles, EUV Lithography R...

DEFECT DETECTION METHOD

System and Method for Apodization in a Semiconductor Device Inspect...

INSPECTION APPARATUS