using charged particles

Industry

CPC
H01J37/3233

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3233using charged particles

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Vacuum deposition into trenches and vias and etch of trenches and via
- Patent number 12,170,185
- Issue date Dec 17, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle emission device, system, method, and program
- Patent number 12,154,762
- Issue date Nov 26, 2024
- Shishido Electrostatic, Ltd.
- Katsuyuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion extraction assembly having variable electrode thickness for bea...
- Patent number 12,125,680
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and ion beam irradiati...
- Patent number 12,040,155
- Issue date Jul 16, 2024
- Kioxia Corporation
- Junichi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for pulsed laser deposition and a substrate with a substrate...
- Patent number 11,655,535
- Issue date May 23, 2023
- Lam Research Corporation
- Jan Arnaud Janssens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-based process for production of F and HF from benign precurs...
- Patent number 11,626,291
- Issue date Apr 11, 2023
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Grant
Rotating lamp for laser-sustained plasma illumination source
- Patent number 11,596,048
- Issue date Feb 28, 2023
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 11,557,463
- Issue date Jan 17, 2023
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,456,156
- Issue date Sep 27, 2022
- NuFlare Technology, Inc.
- Keisuke Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-based process for production of F and HF from benign precurs...
- Patent number 11,404,280
- Issue date Aug 2, 2022
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Grant
Apparatuses and methods for plasma processing
- Patent number 11,393,662
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor manu...
- Patent number 11,217,431
- Issue date Jan 4, 2022
- Kioxia Corporation
- Ryuichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam treatment apparatus
- Patent number 11,183,370
- Issue date Nov 23, 2021
- Sumitomo Heavy Industries, Ltd.
- Nagaaki Kamiguchi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Beam intensity converting film, and method of manufacturing beam in...
- Patent number 11,177,116
- Issue date Nov 16, 2021
- Kaneka Corporation
- Mutsuaki Murakami
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for pulsed laser deposition
- Patent number 11,177,117
- Issue date Nov 16, 2021
- Solmates B.V.
- Jan Arnaud Janssens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,133,157
- Issue date Sep 28, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Light source apparatus
- Patent number 11,128,097
- Issue date Sep 21, 2021
- Samsung Electronics Co., Ltd.
- Akihiro Komatsu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion-ion plasma atomic layer etch process
- Patent number 11,101,113
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for temperature control in plasma processing system
- Patent number 10,998,244
- Issue date May 4, 2021
- Tokyo Electron Limited
- Anton J. deVilliers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 10,937,635
- Issue date Mar 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicide interconnection nanowire struc...
- Patent number 10,930,472
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,886,135
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-based process for production of F and HF from benign precurs...
- Patent number 10,854,441
- Issue date Dec 1, 2020
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Grant
Stand alone microfluidic analytical chip device
- Patent number 10,832,895
- Issue date Nov 10, 2020
- Plasmotica, LLC
- Nedal Saleh
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Confocal imaging technique in a charged particle microscope
- Patent number 10,699,875
- Issue date Jun 30, 2020
- FEI Company
- Mark Williamson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser induced plasma micromachining (LIPMM)
- Patent number 10,692,700
- Issue date Jun 23, 2020
- Northwestern University
- Kumar Pallav
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
X-ray spectroscopy in a charged-particle microscope
- Patent number 10,620,142
- Issue date Apr 14, 2020
- FEI Company
- Michael James Owen
- G01 - MEASURING TESTING
Information Patent Grant
Deposition or treatment of diamond-like carbon in a plasma reactor
- Patent number 10,544,505
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system, electron beam generator, and method of fa...
- Patent number 10,522,332
- Issue date Dec 31, 2019
- Samsung Electronics Co., Ltd.
- Yeongkwang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of active cleaning of EUV optic with RF pl...
- Patent number 10,493,504
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
LASER-SUSTAINED PLASMA GENERATION IN SUPERSONIC GAS JETS
- Publication number 20250016905
- Publication date Jan 9, 2025
- KLA Corporation
- Oleg Khodykin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Semiconductor Structure
- Publication number 20240379354
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- David Eitan Barlaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITION OF EXTERNAL ULTRAVIOLET LIGHT FOR IMPROVED PLASMA STRIKE C...
- Publication number 20240162011
- Publication date May 16, 2024
- Applied Materials, Inc.
- Eric Kihara SHONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
- Publication number 20240055231
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM DEPOSITION INTO TRENCHES AND VIAS AND ETCH OF TRENCHES AND VIA
- Publication number 20240021411
- Publication date Jan 18, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VIRTUAL SHUTTER IN ION BEAM SYSTEM
- Publication number 20230343557
- Publication date Oct 26, 2023
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE
- Publication number 20230290617
- Publication date Sep 14, 2023
- Clean Crop Technologies, Inc.
- Yaqoot Shaharyar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOELECTRON ASSISTED PLASMA IGNITION
- Publication number 20230207274
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- Lee CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...
- Publication number 20230125435
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Process for Production of F and HF from Benign Precurs...
- Publication number 20220328322
- Publication date Oct 13, 2022
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND ION BEAM IRRADIATI...
- Publication number 20220301809
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Junichi HASHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE IRRADIATING DEVICE, SYSTEM, METHOD, AND PROGRAM
- Publication number 20220301819
- Publication date Sep 22, 2022
- Shishido Electrostatic, Ltd.
- Katsuyuki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE IRRADIATING DEVICE, SYSTEM, METHOD, AND PROGRAM
- Publication number 20220301820
- Publication date Sep 22, 2022
- Shishido Electrostatic, Ltd.
- Katsuyuki TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IGNITING PLASMA AND PLASMA GENERATING SYSTEM
- Publication number 20220115211
- Publication date Apr 14, 2022
- SPP TECHNOLOGIES CO., LTD.
- Bryan LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020569
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20210151298
- Publication date May 20, 2021
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING LAMP FOR LASER-SUSTAINED PLASMA ILLUMINATION SOURCE
- Publication number 20210092826
- Publication date Mar 25, 2021
- KLA Corporation
- Ilya Bezel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Process for Production of F and HF from Benign Precurs...
- Publication number 20210082687
- Publication date Mar 18, 2021
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT SOURCE APPARATUS
- Publication number 20210036477
- Publication date Feb 4, 2021
- Samsung Electronics Co., Ltd.
- Akihiro Komatsu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUSES AND METHODS FOR PLASMA PROCESSING
- Publication number 20200365369
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200365368
- Publication date Nov 19, 2020
- NuFlare Technology, Inc.
- Keisuke GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-TEMPERATURE IONIZATION OF METASTABLE ATOMS EMITTED BY AN INDUCT...
- Publication number 20200350142
- Publication date Nov 5, 2020
- ZEROK NANO TECH CORPORATION
- Brenton J. KNUFFMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM TREATMENT APPARATUS
- Publication number 20200303165
- Publication date Sep 24, 2020
- Sumitomo Heavy Industries, Ltd.
- Nagaaki Kamiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFOCAL IMAGING TECHNIQUE IN A CHARGED PARTICLE MICROSCOP
- Publication number 20200152420
- Publication date May 14, 2020
- FEI Company
- Mark WILLIAMSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS
- Publication number 20200035454
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-Based Process for Production of F and HF from Benign Precurs...
- Publication number 20190378691
- Publication date Dec 12, 2019
- The Government of the United States of America, as represented by the Secreta...
- David R. Boris
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANU...
- Publication number 20190341229
- Publication date Nov 7, 2019
- Toshiba Memory Corporation
- Ryuichi Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING SYSTEM, ELECTRON BEAM GENERATOR, AND METHOD OF FA...
- Publication number 20190279846
- Publication date Sep 12, 2019
- Samsung Electronics Co., Ltd.
- YEONGKWANG LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Pulsed Laser Deposition
- Publication number 20190279847
- Publication date Sep 12, 2019
- SOLMATES B.V.
- Jan Arnaud Janssens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190244794
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

using charged particles

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum deposition into trenches and vias and etch of trenches and via

Charged particle emission device, system, method, and program

Ion extraction assembly having variable electrode thickness for bea...

Method of manufacturing semiconductor device and ion beam irradiati...

Device for pulsed laser deposition and a substrate with a substrate...

Plasma-based process for production of F and HF from benign precurs...

Rotating lamp for laser-sustained plasma illumination source

Vacuum processing apparatus

Charged particle beam apparatus

Plasma-based process for production of F and HF from benign precurs...

Apparatuses and methods for plasma processing

Method of manufacturing semiconductor device and semiconductor manu...

Charged particle beam treatment apparatus

Beam intensity converting film, and method of manufacturing beam in...

Method for pulsed laser deposition

Plasma processing apparatus

Light source apparatus

Ion-ion plasma atomic layer etch process

System and method for temperature control in plasma processing system

Vacuum processing apparatus

Methods for forming a metal silicide interconnection nanowire struc...

Substrate processing method and substrate processing apparatus

Plasma-based process for production of F and HF from benign precurs...

Stand alone microfluidic analytical chip device

Confocal imaging technique in a charged particle microscope

Laser induced plasma micromachining (LIPMM)

X-ray spectroscopy in a charged-particle microscope

Deposition or treatment of diamond-like carbon in a plasma reactor

Plasma processing system, electron beam generator, and method of fa...

Apparatus for and method of active cleaning of EUV optic with RF pl...

Patents Applicationslast 30 patents

LASER-SUSTAINED PLASMA GENERATION IN SUPERSONIC GAS JETS

System and Method for Semiconductor Structure

ADDITION OF EXTERNAL ULTRAVIOLET LIGHT FOR IMPROVED PLASMA STRIKE C...

PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE

VACUUM DEPOSITION INTO TRENCHES AND VIAS AND ETCH OF TRENCHES AND VIA

VIRTUAL SHUTTER IN ION BEAM SYSTEM

PLASMA TREATMENT DEVICE

PHOTOELECTRON ASSISTED PLASMA IGNITION

ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...

Plasma-Based Process for Production of F and HF from Benign Precurs...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND ION BEAM IRRADIATI...

CHARGED PARTICLE IRRADIATING DEVICE, SYSTEM, METHOD, AND PROGRAM

CHARGED PARTICLE IRRADIATING DEVICE, SYSTEM, METHOD, AND PROGRAM

METHOD OF IGNITING PLASMA AND PLASMA GENERATING SYSTEM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

VACUUM PROCESSING APPARATUS

ROTATING LAMP FOR LASER-SUSTAINED PLASMA ILLUMINATION SOURCE

Plasma-Based Process for Production of F and HF from Benign Precurs...

LIGHT SOURCE APPARATUS

APPARATUSES AND METHODS FOR PLASMA PROCESSING

CHARGED PARTICLE BEAM APPARATUS

LOW-TEMPERATURE IONIZATION OF METASTABLE ATOMS EMITTED BY AN INDUCT...

CHARGED PARTICLE BEAM TREATMENT APPARATUS

CONFOCAL IMAGING TECHNIQUE IN A CHARGED PARTICLE MICROSCOP

ION-ION PLASMA ATOMIC LAYER ETCH PROCESS

Plasma-Based Process for Production of F and HF from Benign Precurs...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANU...

PLASMA PROCESSING SYSTEM, ELECTRON BEAM GENERATOR, AND METHOD OF FA...

Method for Pulsed Laser Deposition

PLASMA PROCESSING APPARATUS