using electron beams

Industry

CPC
H01J2237/31754

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31754using electron beams

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 12,087,543
- Issue date Sep 10, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correcting method, master plate manufacturing meth...
- Patent number 11,742,179
- Issue date Aug 29, 2023
- Kioxia Corporation
- Yoshinori Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,545,339
- Issue date Jan 3, 2023
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus, and multi-charged pa...
- Patent number 11,508,553
- Issue date Nov 22, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanofabrication using a new class of electron beam induced surface...
- Patent number 11,377,740
- Issue date Jul 5, 2022
- FEI Company
- James Bishop
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 11,276,558
- Issue date Mar 15, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anomaly determination method and writing apparatus
- Patent number 11,275,044
- Issue date Mar 15, 2022
- NuFlare Technology, Inc.
- Shun Kanezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing method and apparatus using b...
- Patent number 10,978,273
- Issue date Apr 13, 2021
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,937,629
- Issue date Mar 2, 2021
- NuFlare Technology, Inc.
- Hironori Teguri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 10,658,157
- Issue date May 19, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Grant
Bias correction for lithography
- Patent number 10,444,629
- Issue date Oct 15, 2019
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate alignment detection using circumferentially extending tim...
- Patent number 10,134,624
- Issue date Nov 20, 2018
- Doug Carson & Associates, Inc.
- Douglas M. Carson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam lithography method and system
- Patent number 10,115,563
- Issue date Oct 30, 2018
- NATIONAL TAIWAN UNIVERSITY
- Chieh-Hsiung Kuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate alignment detection using circumferentially extending tim...
- Patent number 9,953,806
- Issue date Apr 24, 2018
- Doug Carson & Associates, Inc.
- Douglas M. Carson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating shape before shrink and CD-SEM apparatus
- Patent number 9,830,524
- Issue date Nov 28, 2017
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Nano-patterned system and magnetic-field applying device thereof
- Patent number 9,640,363
- Issue date May 2, 2017
- Institute of Physics, Chinese Academy of Sciences
- Guoqiang Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming resist film and charged particle beam writing me...
- Patent number 9,633,820
- Issue date Apr 25, 2017
- NuFlare Technology, Inc.
- Takayuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-aligned dynamic pattern generator device and method of fabrica...
- Patent number 9,536,706
- Issue date Jan 3, 2017
- Corporation for National Research Initiatives
- Michael A. Huff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shot data generation method and multi charged particle beam writing...
- Patent number 9,514,914
- Issue date Dec 6, 2016
- NuFlare Technology, Inc.
- Hideo Inoue
- G11 - INFORMATION STORAGE
Information Patent Grant
Nano-patterned system and magnetic-field applying device thereof
- Patent number 9,484,138
- Issue date Nov 1, 2016
- Institute of Physics, Chinese Academy of Sciences
- Guoqiang Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation device and power supply arrangement
- Patent number 9,455,122
- Issue date Sep 27, 2016
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus, and multi charged pa...
- Patent number 9,437,396
- Issue date Sep 6, 2016
- NuFlare Technology, Inc.
- Hironobu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating patterns to be printed on a plate or mask by...
- Patent number 9,430,597
- Issue date Aug 30, 2016
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Jerome Belledent
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-aligned dynamic pattern generator device and method of fabrica...
- Patent number 9,312,103
- Issue date Apr 12, 2016
- Corporation for National Research Initiatives
- Michael A. Huff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermionic cathode with even electric field distribution on electro...
- Patent number 9,299,525
- Issue date Mar 29, 2016
- NUFLARE TECHNOLOGY, INC.
- Ryoei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus, and multi charged pa...
- Patent number 9,190,246
- Issue date Nov 17, 2015
- NuFlare Technology, Inc.
- Hironobu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...
- Publication number 20240363307
- Publication date Oct 31, 2024
- NuFlare Technology, Inc.
- Hiroshi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242922
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230056463
- Publication date Feb 23, 2023
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...
- Publication number 20220238303
- Publication date Jul 28, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200341380
- Publication date Oct 29, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...
- Publication number 20200251306
- Publication date Aug 6, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Application
NANOFABRICATION USING A NEW CLASS OF ELECTRON BEAM INDUCED SURFACE...
- Publication number 20200190669
- Publication date Jun 18, 2020
- FEI Company
- James Bishop
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20200135428
- Publication date Apr 30, 2020
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200118791
- Publication date Apr 16, 2020
- NuFlare Technology, Inc.
- Hironori TEGURI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANOMALY DETERMINATION METHOD AND WRITING APPARATUS
- Publication number 20200072777
- Publication date Mar 5, 2020
- NuFlare Technology, Inc.
- Shun KANEZAWA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...
- Publication number 20190304747
- Publication date Oct 3, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Christophe CONSTANCIAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...
- Publication number 20190198294
- Publication date Jun 27, 2019
- NuFlare Technology, Inc.
- Hideo INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Irradiating a Target Using Restricted Placement Grids
- Publication number 20190088448
- Publication date Mar 21, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Alignment Detection Using Circumferentially Extending Tim...
- Publication number 20180197763
- Publication date Jul 12, 2018
- Doug Carson & Associates, Inc.
- Douglas M. Carson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Beam Lithography Method and System
- Publication number 20180149980
- Publication date May 31, 2018
- National Taiwan University
- Chieh-Hsiung KUAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nano-Patterned System And Magnetic-Field Applying Device Thereof
- Publication number 20170018395
- Publication date Jan 19, 2017
- INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES
- Guoqiang Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING ME...
- Publication number 20160111253
- Publication date Apr 21, 2016
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150131075
- Publication date May 14, 2015
- Canon Kabushiki Kaisha
- Tatsuro KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PA...
- Publication number 20140346369
- Publication date Nov 27, 2014
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SETTLING TIME ACQUISITION METHOD
- Publication number 20140284500
- Publication date Sep 25, 2014
- NuFlure Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...
- Publication number 20140268076
- Publication date Sep 18, 2014
- Corporation for National Research Initiatives
- Michael A. HUFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...
- Publication number 20140180462
- Publication date Jun 26, 2014
- ASELTA NANOGRAPHICS
- Jerome BELLEDENT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20140138527
- Publication date May 22, 2014
- NuFlare Technology, Inc.
- Yasuo KATO
- B82 - NANO-TECHNOLOGY
Information Patent Application
THERMIONIC CATHODE AND METHOD FOR MANUFACTURING THERMIONIC CATHODE
- Publication number 20140139100
- Publication date May 22, 2014
- NuFlare Technology, Inc.
- Ryoei KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC LENS UNIT
- Publication number 20140077096
- Publication date Mar 20, 2014
- Takashi Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming Non-Manhattan Patterns Using Variable...
- Publication number 20130306884
- Publication date Nov 21, 2013
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN DATA SYSTEM FOR HIGH-PERFORMANCE MASKLESS ELECTRON BEAM LIT...
- Publication number 20130205267
- Publication date Aug 8, 2013
- KLA-Tencor Corporation
- Allen CARROLL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of manufacturing semiconductor device and semiconductor manu...
- Publication number 20130115723
- Publication date May 9, 2013
- Advantest Corporation
- Masahiro Ishida
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION ME...
- Publication number 20130078577
- Publication date Mar 28, 2013
- Canon Kabushiki Kaisha
- Toru Yamazaki
- B82 - NANO-TECHNOLOGY

using electron beams

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-charged particle beam writing apparatus, and multi-charged pa...

Proximity effect correcting method, master plate manufacturing meth...

Method for irradiating a target using restricted placement grids

Multi-charged particle beam writing apparatus, and multi-charged pa...

Multi-charged particle beam writing apparatus, and multi-charged pa...

Nanofabrication using a new class of electron beam induced surface...

Exposure apparatus and exposure method, lithography method, and dev...

Anomaly determination method and writing apparatus

Bias correction for lithography

Multiple charged particle beam writing method and apparatus using b...

Multi charged particle beam writing apparatus and multi charged par...

Method for projecting a beam of particles onto a substrate with cor...

Bias correction for lithography

Exposure apparatus and exposure method, lithography method, and dev...

Bias correction for lithography

Substrate alignment detection using circumferentially extending tim...

Electron-beam lithography method and system

Substrate alignment detection using circumferentially extending tim...

Method for estimating shape before shrink and CD-SEM apparatus

Nano-patterned system and magnetic-field applying device thereof

Method for forming resist film and charged particle beam writing me...

Self-aligned dynamic pattern generator device and method of fabrica...

Shot data generation method and multi charged particle beam writing...

Nano-patterned system and magnetic-field applying device thereof

Modulation device and power supply arrangement

Multi charged particle beam writing apparatus, and multi charged pa...

Method for estimating patterns to be printed on a plate or mask by...

Self-aligned dynamic pattern generator device and method of fabrica...

Thermionic cathode with even electric field distribution on electro...

Multi charged particle beam writing apparatus, and multi charged pa...

Patents Applicationslast 30 patents

MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

Multi-Beam Pattern Definition Device

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...

BIAS CORRECTION FOR LITHOGRAPHY

EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...

NANOFABRICATION USING A NEW CLASS OF ELECTRON BEAM INDUCED SURFACE...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

ANOMALY DETERMINATION METHOD AND WRITING APPARATUS

METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND MULTIPLE CHARGED...

Method for Irradiating a Target Using Restricted Placement Grids

Substrate Alignment Detection Using Circumferentially Extending Tim...

Electron-Beam Lithography Method and System

Nano-Patterned System And Magnetic-Field Applying Device Thereof

METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING ME...

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PA...

SETTLING TIME ACQUISITION METHOD

SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...

METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM D...

THERMIONIC CATHODE AND METHOD FOR MANUFACTURING THERMIONIC CATHODE

ELECTROSTATIC LENS UNIT

Method and System for Forming Non-Manhattan Patterns Using Variable...

PATTERN DATA SYSTEM FOR HIGH-PERFORMANCE MASKLESS ELECTRON BEAM LIT...

Method of manufacturing semiconductor device and semiconductor manu...

CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION ME...