using high-frequency excitation

Industry

CPC
H01J27/16

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J27/00Ion beam tubes

Current Industry

H01J27/16using high-frequency excitation

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,810,758
- Issue date Nov 7, 2023
- Tokyo Electron Limited
- Satoshi Itou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source having a magnetic field translatable along an axis of th...
- Patent number 11,574,788
- Issue date Feb 7, 2023
- Adelphi Technology, Inc.
- David Lowndes Williams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid assembly and ion beam etching apparatus
- Patent number 11,508,545
- Issue date Nov 22, 2022
- CANON ANELVA CORPORATION
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High reliability, long lifetime, negative ion source
- Patent number 10,950,409
- Issue date Mar 16, 2021
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source
- Patent number 10,798,810
- Issue date Oct 6, 2020
- Polygon Physics
- Pascal Sortais
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation processes and apparatus
- Patent number 10,497,532
- Issue date Dec 3, 2019
- Entegris, Inc.
- Oleg Byl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metallic ion source
- Patent number 10,418,220
- Issue date Sep 17, 2019
- ION LAB Co., Ltd.
- Masanobu Nunogaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High reliability, long lifetime, negative ion source
- Patent number 10,297,412
- Issue date May 21, 2019
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 10,290,470
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Means of introducing an analyte into liquid sampling atmospheric pr...
- Patent number 10,269,525
- Issue date Apr 23, 2019
- Clemson University Research Foundation
- R. Kenneth Marcus
- G01 - MEASURING TESTING
Information Patent Grant
MPD thruster that accelerates electrodeless plasma and electrodeles...
- Patent number 10,260,487
- Issue date Apr 16, 2019
- Mitsubishi Heavy Industries, Ltd.
- Takuya Yamazaki
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Grant
RF ion source with dynamic volume control
- Patent number 10,134,568
- Issue date Nov 20, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma ion source with tunable radio frequency...
- Patent number 10,128,076
- Issue date Nov 13, 2018
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle translation slide control apparatus and method of...
- Patent number 9,907,981
- Issue date Mar 6, 2018
- Susan L. Michaud
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Ambient desorption, ionization, and excitation for spectrometry
- Patent number 9,875,884
- Issue date Jan 23, 2018
- Agilent Technologies, Inc.
- Viorica Lopez-Avila
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High reliability, long lifetime, negative ion source
- Patent number 9,847,205
- Issue date Dec 19, 2017
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio-frequency ionization of chemicals
- Patent number 9,818,593
- Issue date Nov 14, 2017
- University of Maine System Board of Trustees
- Touradj Solouki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for forming a quasi-neutral beam of oppositely charged parti...
- Patent number 9,776,742
- Issue date Oct 3, 2017
- Ecole Polytechnique
- Dmytro Rafalskyi
- B64 - AIRCRAFT AVIATION COSMONAUTICS
Information Patent Grant
Plasma ion source and charged particle beam apparatus
- Patent number 9,773,646
- Issue date Sep 26, 2017
- Hitachi High-Technologies Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ribbon ion beams from pulsed plasmas
- Patent number 9,734,991
- Issue date Aug 15, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid, method of manufacturing the same, and ion beam processing app...
- Patent number 9,721,747
- Issue date Aug 1, 2017
- Canon Anelva Corporation
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF system, magnetic filter, and high voltage isolation for an induc...
- Patent number 9,655,223
- Issue date May 16, 2017
- Oregon Physics, LLC
- Noel S. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for a focused ion beam system
- Patent number 9,640,367
- Issue date May 2, 2017
- FEI Company
- John Keller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source for selectively providing positively or negatively charged p...
- Patent number 9,601,312
- Issue date Mar 21, 2017
- FEI Company
- Brian Roberts Routh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage isolation of an inductively coupled plasma ion source...
- Patent number 9,591,735
- Issue date Mar 7, 2017
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Means of introducing an analyte into liquid sampling atmospheric pr...
- Patent number 9,536,725
- Issue date Jan 3, 2017
- Clemson University
- R. Kenneth Marcus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for attachment of an electrode into an inductively-coupled p...
- Patent number 9,530,625
- Issue date Dec 27, 2016
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam uniformity control
- Patent number 9,520,259
- Issue date Dec 13, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,401,262
- Issue date Jul 26, 2016
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for forming a plasma beam
- Patent number 9,398,678
- Issue date Jul 19, 2016
- Astrium SAS
- Ane Aanesland
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...

Patents Applicationslast 30 patents

Information Patent Application
Plasma Source
- Publication number 20190394866
- Publication date Dec 26, 2019
- Polygon Physics
- Pascal SORTAIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE
- Publication number 20190279835
- Publication date Sep 12, 2019
- PHOENIX LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metallic Ion Source
- Publication number 20190198281
- Publication date Jun 27, 2019
- ION LAB Co., Ltd.
- Masanobu NUNOGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190131108
- Publication date May 2, 2019
- TOKYO ELECTRON LIMITED
- Satoshi ITOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA ION SOURCE WITH TUNABLE RADIO REQUENCY P...
- Publication number 20180330909
- Publication date Nov 15, 2018
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE
- Publication number 20180122615
- Publication date May 3, 2018
- Phoenix Nuclear Labs LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION PROCESSES AND APPARATUS
- Publication number 20170338075
- Publication date Nov 23, 2017
- Entegris, Inc.
- Oleg BYL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Ribbon Ion Beams from Pulsed Plasmas
- Publication number 20170309454
- Publication date Oct 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TRANSLATION SLIDE CONTROL APPARATUS AND METHOD OF...
- Publication number 20170252580
- Publication date Sep 7, 2017
- Susan L. Michaud
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Means of Introducing an Analyte into Liquid Sampling Atmospheric Pr...
- Publication number 20170162358
- Publication date Jun 8, 2017
- Clemson University
- R. Kenneth Marcus
- G01 - MEASURING TESTING
Information Patent Application
DEVICE FOR FORMING A QUASI-NEUTRAL BEAM OF OPPOSITELY CHARGED PARTI...
- Publication number 20170036785
- Publication date Feb 9, 2017
- ECOLE POLYTECHNIQUE
- Dmytro Rafalskyi
- B64 - AIRCRAFT AVIATION COSMONAUTICS
Information Patent Application
Negative Ribbon Ion Beams from Pulsed Plasmas
- Publication number 20170032937
- Publication date Feb 2, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Distaso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE
- Publication number 20160163495
- Publication date Jun 9, 2016
- Phoenix Nuclear Labs LLC
- Joseph D. Sherman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam Uniformity Control
- Publication number 20160111241
- Publication date Apr 21, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY IONIZATION OF CHEMICALS
- Publication number 20150221492
- Publication date Aug 6, 2015
- UNIVERSITY OF MAINE SYSTEM BOARD OF TRUSTEES
- Touradj Solouki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source for Selectively Providing Positively or Negatively Charged P...
- Publication number 20140326877
- Publication date Nov 6, 2014
- FEI Company
- Brian Roberts Routh
- G01 - MEASURING TESTING
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20140312245
- Publication date Oct 23, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR CONTROL OF A PLASMA FOR SPECTROMETRY
- Publication number 20140264000
- Publication date Sep 18, 2014
- THERMO ELECTRON MANUFACTURING LIMITED
- Stephen HARTWELL
- G01 - MEASURING TESTING
Information Patent Application
Ion Source Having Negatively Biased Extractor
- Publication number 20140263993
- Publication date Sep 18, 2014
- SCHLUMBERGER TECHNOLOGY CORPORATION
- Luke Perkins
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MICROWAVE ION SOURCE AND METHOD FOR STARTING SAME
- Publication number 20140231669
- Publication date Aug 21, 2014
- Sumitomo Heavy Industries, Ltd.
- Nobuaki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Means of Introducing an Analyte into Liquid Sampling Atmospheric Pr...
- Publication number 20140218729
- Publication date Aug 7, 2014
- Clemson University
- R. Kenneth Marcus
- G01 - MEASURING TESTING
Information Patent Application
PLASMA MICRO-THRUSTER
- Publication number 20140202131
- Publication date Jul 24, 2014
- Roderick William Boswell
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Application
Inductively Coupled Plasma ION Source Chamber with Dopant Material...
- Publication number 20140097752
- Publication date Apr 10, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUC...
- Publication number 20140077699
- Publication date Mar 20, 2014
- OREGON PHYSICS, LLC
- Roderick W. Boswell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA ION SOURCE WITH MULTIPLE ANTENNAS FOR WI...
- Publication number 20140042337
- Publication date Feb 13, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTERNALLY POWERED VEHICLE PROPULSION SYSTEM
- Publication number 20140033677
- Publication date Feb 6, 2014
- ESCAPE DYNAMICS, INC.
- Dmitriy Tseliakhovich
- B64 - AIRCRAFT AVIATION COSMONAUTICS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20130309421
- Publication date Nov 21, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR FORMING A PLASMA BEAM
- Publication number 20130300288
- Publication date Nov 14, 2013
- ASTRIUM SAS
- Ane Aanesland
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Application
System for Attachment of an Electrode into an Inductively Coupled P...
- Publication number 20130134855
- Publication date May 30, 2013
- FEI Company
- Sean Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source as an Electron Beam Source for Sp...
- Publication number 20130134307
- Publication date May 30, 2013
- FEI Company
- Brian Roberts Routh
- G01 - MEASURING TESTING

using high-frequency excitation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus

Ion source having a magnetic field translatable along an axis of th...

Grid assembly and ion beam etching apparatus

High reliability, long lifetime, negative ion source

Plasma source

Ion implantation processes and apparatus

Metallic ion source

High reliability, long lifetime, negative ion source

Negative ribbon ion beams from pulsed plasmas

Means of introducing an analyte into liquid sampling atmospheric pr...

MPD thruster that accelerates electrodeless plasma and electrodeles...

RF ion source with dynamic volume control

Inductively coupled plasma ion source with tunable radio frequency...

Charged particle translation slide control apparatus and method of...

Ambient desorption, ionization, and excitation for spectrometry

High reliability, long lifetime, negative ion source

Radio-frequency ionization of chemicals

Device for forming a quasi-neutral beam of oppositely charged parti...

Plasma ion source and charged particle beam apparatus

Negative ribbon ion beams from pulsed plasmas

Grid, method of manufacturing the same, and ion beam processing app...

RF system, magnetic filter, and high voltage isolation for an induc...

Plasma source for a focused ion beam system

Source for selectively providing positively or negatively charged p...

High voltage isolation of an inductively coupled plasma ion source...

Means of introducing an analyte into liquid sampling atmospheric pr...

Method for attachment of an electrode into an inductively-coupled p...

Ion beam uniformity control

Multi-source plasma focused ion beam system

Method and device for forming a plasma beam

Patents Applicationslast 30 patents

Plasma Source

HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE

Metallic Ion Source

PLASMA PROCESSING APPARATUS

INDUCTIVELY COUPLED PLASMA ION SOURCE WITH TUNABLE RADIO REQUENCY P...

HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE

ION IMPLANTATION PROCESSES AND APPARATUS

Negative Ribbon Ion Beams from Pulsed Plasmas

CHARGED PARTICLE TRANSLATION SLIDE CONTROL APPARATUS AND METHOD OF...

Means of Introducing an Analyte into Liquid Sampling Atmospheric Pr...

DEVICE FOR FORMING A QUASI-NEUTRAL BEAM OF OPPOSITELY CHARGED PARTI...

Negative Ribbon Ion Beams from Pulsed Plasmas

HIGH RELIABILITY, LONG LIFETIME, NEGATIVE ION SOURCE

Ion Beam Uniformity Control

RADIO-FREQUENCY IONIZATION OF CHEMICALS

Source for Selectively Providing Positively or Negatively Charged P...

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

METHOD AND APPARATUS FOR CONTROL OF A PLASMA FOR SPECTROMETRY

Ion Source Having Negatively Biased Extractor

MICROWAVE ION SOURCE AND METHOD FOR STARTING SAME

Means of Introducing an Analyte into Liquid Sampling Atmospheric Pr...

PLASMA MICRO-THRUSTER

Inductively Coupled Plasma ION Source Chamber with Dopant Material...

RF SYSTEM, MAGNETIC FILTER, AND HIGH VOLTAGE ISOLATION FOR AN INDUC...

INDUCTIVELY COUPLED PLASMA ION SOURCE WITH MULTIPLE ANTENNAS FOR WI...

EXTERNALLY POWERED VEHICLE PROPULSION SYSTEM

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

METHOD AND DEVICE FOR FORMING A PLASMA BEAM

System for Attachment of an Electrode into an Inductively Coupled P...

Inductively Coupled Plasma Source as an Electron Beam Source for Sp...