using masks

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H01L21/308

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/308using masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Memory circuitry and method used in forming memory circuitry
- Patent number 12,369,321
- Issue date Jul 22, 2025
- Micron Technology, Inc.
- John D. Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective film agent and processing method of workpiece
- Patent number 12,368,049
- Issue date Jul 22, 2025
- Disco Corporation
- Sho Osawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
LDMOS device having isolation regions comprising DTI regions extend...
- Patent number 12,368,070
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chieh Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure, and semiconductor...
- Patent number 12,362,192
- Issue date Jul 15, 2025
- CHANGXI MEMORY TECHNOLOGIES, INC.
- Yexiao Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and semiconductor production apparatus
- Patent number 12,359,308
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yusuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self aligned contact scheme
- Patent number 12,362,239
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation structures of semiconductor devices
- Patent number 12,363,963
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Li Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 12,363,895
- Issue date Jul 15, 2025
- Micron Technology, Inc.
- Justin B. Dorhout
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin height and STI depth for performance improvement in semiconduct...
- Patent number 12,356,710
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kun-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device and manufacturing method therefor
- Patent number 12,356,605
- Issue date Jul 8, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xingsong Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices and pattern formation...
- Patent number 12,354,874
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement buried power rail in backside power delivery
- Patent number 12,354,991
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hoyoung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion source
- Patent number 12,349,435
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation method of high-linearity GaN-based millimeter wave device
- Patent number 12,349,388
- Issue date Jul 1, 2025
- ZHONGSHAN INSTITUTE OF MODERN INDUSTRIAL TECHNOLOGY, SOUTH CHINA UNIVERSITY O...
- Hong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical solution-resistant protective film forming composition con...
- Patent number 12,344,758
- Issue date Jul 1, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Semiconductor device structure and method for preparing the same
- Patent number 12,347,686
- Issue date Jul 1, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Hsiang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench plug hardmask for advanced integrated circuit structure fabr...
- Patent number 12,349,450
- Issue date Jul 1, 2025
- Intel Corporation
- Anthony St. Amour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with Fin-top hard mask and methods for fabric...
- Patent number 12,349,378
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Ruei Jhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom-up fill dielectric materials for semiconductor structure fab...
- Patent number 12,341,061
- Issue date Jun 24, 2025
- Intel Corporation
- Florian Gstrein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning underlying structure
- Patent number 12,341,007
- Issue date Jun 24, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Yun-An Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,342,565
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Cheng Chao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for etch depth control in III-V semiconductor dev...
- Patent number 12,334,352
- Issue date Jun 17, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Wayne Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming material layer
- Patent number 12,334,357
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Kyung-Eun Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor FinFET device and method
- Patent number 12,327,729
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High electron mobility transistor and method for fabricating the same
- Patent number 12,328,889
- Issue date Jun 10, 2025
- United Microelectronics Corp.
- Chun-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-color self-aligned double patterning (SADP) to yield static ran...
- Patent number 12,327,730
- Issue date Jun 10, 2025
- Adeia Semiconductor Solutions LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 12,322,601
- Issue date Jun 3, 2025
- Adeia Semiconductor Solutions LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating Fin-type field-effect transistor device havin...
- Patent number 12,324,224
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20250239451
- Publication date Jul 24, 2025
- Samsung SDI Co., Ltd.
- Yejin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250239458
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN-BASED ADDITIVE FOR THROUGH-SUBSTRATE ETCHING
- Publication number 20250239457
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Scott Lefevre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING A WIDE BAN...
- Publication number 20250239459
- Publication date Jul 24, 2025
- INFINEON TECHNOLOGIES AG
- Hans Weber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING VERTICAL DEVICE BY FIRSTLY ETCHING ACTIVE R...
- Publication number 20250240995
- Publication date Jul 24, 2025
- BEIJINGSUPERSTRIN ACADEMY OF MEMORY TECHNOLOGY
- Wenliang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATION STRUCTURES AND METHODS OF FORMING THE SAME
- Publication number 20250241005
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chung-Huai CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250237954
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR AUTO-ALIGNED MANUFACTURING OF A VDMOS TRANSISTOR, AND AU...
- Publication number 20250241044
- Publication date Jul 24, 2025
- STMicroelectronics S.r.l.
- Vincenzo ENEA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST
- Publication number 20250231491
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDATION BASED ATOMIC LAYER ETCHING
- Publication number 20250232982
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Kangyi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING MULTILAYER HORIZONTAL NOR-TYPE THIN-FILM MEMORY...
- Publication number 20250234550
- Publication date Jul 17, 2025
- Sunrise Memory Corporation
- Scott Brad Herner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES AND SEMICONDUCTO...
- Publication number 20250234582
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Hung Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A STRUCTURE COMPRISING AT LEAST TWO CHIPS ON A...
- Publication number 20250226225
- Publication date Jul 10, 2025
- SOITEC
- Bruno Ghyselen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...
- Publication number 20250226235
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Yung-chen LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIODE AND TRANSISTOR DEVICES AND FABRICATION TECHNIQUES
- Publication number 20250227944
- Publication date Jul 10, 2025
- Murata Manufactunng Co., Ltd.
- Jagar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURES AND METHODS OF FORMING THE SAME
- Publication number 20250226219
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER
- Publication number 20250218774
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MID-PROCESSING REMOVAL OF SEMICONDUCTOR FINS DURING FABRICATION OF...
- Publication number 20250218787
- Publication date Jul 3, 2025
- Intel Corporation
- Mehmet O. Baykan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250215320
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INTEGRATION OF MULTIPLE TRANSISTORS HAVING FIN AND MESA STRUCTURES
- Publication number 20250221033
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS
- Publication number 20250210362
- Publication date Jun 26, 2025
- SPTS TECHNOLOGIES LIMITED
- Eloise BOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT HAVING AT LEAST ONE FEATURE FORMED BY APPLYING AT LEAST T...
- Publication number 20250210365
- Publication date Jun 26, 2025
- Quantinuum LLC
- Adam Jay OLLANIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH REDUCED LOADING EFFECT
- Publication number 20250212497
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Lun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE
- Publication number 20250210367
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER METAL-INSULATOR-METAL CAPACITORS FOR INCREASED CAPACITAN...
- Publication number 20250203888
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Sunil Kumar SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR MONITORING HYBRID BONDS IN A SEMICONDUCTOR CHIP PACKAGE
- Publication number 20250201638
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Nicholas Alexander POLOMOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED MASK LAYER
- Publication number 20250201562
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chen CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCHING METHOD AND SEMICONDUCTOR STRUCTURE MANUFACTURED U...
- Publication number 20250201571
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da HUANG
- H01 - BASIC ELECTRIC ELEMENTS

using masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Memory circuitry and method used in forming memory circuitry

Protective film agent and processing method of workpiece

LDMOS device having isolation regions comprising DTI regions extend...

Method for manufacturing semiconductor structure, and semiconductor...

Film forming method and semiconductor production apparatus

Self aligned contact scheme

Resist underlayer film-forming composition

Isolation structures of semiconductor devices

Integrated assemblies and methods of forming integrated assemblies

Fin height and STI depth for performance improvement in semiconduct...

Memory device and manufacturing method therefor

Method of manufacturing semiconductor devices and pattern formation...

Replacement buried power rail in backside power delivery

Vertical device having a protrusion source

Preparation method of high-linearity GaN-based millimeter wave device

Chemical solution-resistant protective film forming composition con...

Semiconductor device structure and method for preparing the same

Trench plug hardmask for advanced integrated circuit structure fabr...

Semiconductor devices with Fin-top hard mask and methods for fabric...

Bottom-up fill dielectric materials for semiconductor structure fab...

Method of patterning underlying structure

Semiconductor devices and methods of manufacturing thereof

Method and system for etch depth control in III-V semiconductor dev...

Metal oxide resists for EUV patterning and methods for developing t...

Method of forming material layer

Semiconductor FinFET device and method

High electron mobility transistor and method for fabricating the same

Two-color self-aligned double patterning (SADP) to yield static ran...

Alternating hardmasks for tight-pitch line formation

Method of fabricating Fin-type field-effect transistor device havin...

Patents Applicationslast 30 patents

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

Composition For Forming Metal-Containing Film And Patterning Process

TUNGSTEN-BASED ADDITIVE FOR THROUGH-SUBSTRATE ETCHING

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING A WIDE BAN...

Composition For Forming Adhesive Film And Patterning Process

METHOD OF MANUFACTURING VERTICAL DEVICE BY FIRSTLY ETCHING ACTIVE R...

ISOLATION STRUCTURES AND METHODS OF FORMING THE SAME

Composition For Forming Metal-Containing Film And Patterning Process

METHOD FOR AUTO-ALIGNED MANUFACTURING OF A VDMOS TRANSISTOR, AND AU...

PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST

OXIDATION BASED ATOMIC LAYER ETCHING

METHODS FOR FORMING MULTILAYER HORIZONTAL NOR-TYPE THIN-FILM MEMORY...

METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES AND SEMICONDUCTO...

METHOD FOR PRODUCING A STRUCTURE COMPRISING AT LEAST TWO CHIPS ON A...

TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...

DIODE AND TRANSISTOR DEVICES AND FABRICATION TECHNIQUES

SEMICONDUCTOR DEVICE STRUCTURES AND METHODS OF FORMING THE SAME

HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER

MID-PROCESSING REMOVAL OF SEMICONDUCTOR FINS DURING FABRICATION OF...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

INTEGRATION OF MULTIPLE TRANSISTORS HAVING FIN AND MESA STRUCTURES

METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS

COMPONENT HAVING AT LEAST ONE FEATURE FORMED BY APPLYING AT LEAST T...

Compound For Forming Metal-Containing Film, Composition For Forming...

SEMICONDUCTOR DEVICE WITH REDUCED LOADING EFFECT

ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE

MULTILAYER METAL-INSULATOR-METAL CAPACITORS FOR INCREASED CAPACITAN...

STRUCTURE FOR MONITORING HYBRID BONDS IN A SEMICONDUCTOR CHIP PACKAGE

METHOD FOR FORMING PATTERNED MASK LAYER

SELECTIVE ETCHING METHOD AND SEMICONDUCTOR STRUCTURE MANUFACTURED U...