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H01L21/308

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/308using masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Film forming method and semiconductor production apparatus
- Patent number 12,359,308
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yusuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor structure, and semiconductor...
- Patent number 12,362,192
- Issue date Jul 15, 2025
- CHANGXI MEMORY TECHNOLOGIES, INC.
- Yexiao Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned contact scheme
- Patent number 12,362,239
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 12,363,895
- Issue date Jul 15, 2025
- Micron Technology, Inc.
- Justin B. Dorhout
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation structures of semiconductor devices
- Patent number 12,363,963
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Li Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin height and STI depth for performance improvement in semiconduct...
- Patent number 12,356,710
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kun-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device and manufacturing method therefor
- Patent number 12,356,605
- Issue date Jul 8, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xingsong Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices and pattern formation...
- Patent number 12,354,874
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement buried power rail in backside power delivery
- Patent number 12,354,991
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hoyoung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion source
- Patent number 12,349,435
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical solution-resistant protective film forming composition con...
- Patent number 12,344,758
- Issue date Jul 1, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation method of high-linearity GaN-based millimeter wave device
- Patent number 12,349,388
- Issue date Jul 1, 2025
- ZHONGSHAN INSTITUTE OF MODERN INDUSTRIAL TECHNOLOGY, SOUTH CHINA UNIVERSITY O...
- Hong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with Fin-top hard mask and methods for fabric...
- Patent number 12,349,378
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Ruei Jhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench plug hardmask for advanced integrated circuit structure fabr...
- Patent number 12,349,450
- Issue date Jul 1, 2025
- Intel Corporation
- Anthony St. Amour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and method for preparing the same
- Patent number 12,347,686
- Issue date Jul 1, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Hsiang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom-up fill dielectric materials for semiconductor structure fab...
- Patent number 12,341,061
- Issue date Jun 24, 2025
- Intel Corporation
- Florian Gstrein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning underlying structure
- Patent number 12,341,007
- Issue date Jun 24, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Yun-An Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing thereof
- Patent number 12,342,565
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Cheng Chao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for etch depth control in III-V semiconductor dev...
- Patent number 12,334,352
- Issue date Jun 17, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Wayne Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming material layer
- Patent number 12,334,357
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Kyung-Eun Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor FinFET device and method
- Patent number 12,327,729
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High electron mobility transistor and method for fabricating the same
- Patent number 12,328,889
- Issue date Jun 10, 2025
- United Microelectronics Corp.
- Chun-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-color self-aligned double patterning (SADP) to yield static ran...
- Patent number 12,327,730
- Issue date Jun 10, 2025
- Adeia Semiconductor Solutions LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 12,322,601
- Issue date Jun 3, 2025
- Adeia Semiconductor Solutions LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating Fin-type field-effect transistor device havin...
- Patent number 12,324,224
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,322,590
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced directed self-assembly in the presence of low Tg oligomers...
- Patent number 12,319,810
- Issue date Jun 3, 2025
- Merck Patent GmbH
- Durairaj Baskaran
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,313,972
- Issue date May 27, 2025
- NISSAN CHEMICAL CORPORATION
- Hiroto Ogata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OXIDATION BASED ATOMIC LAYER ETCHING
- Publication number 20250232982
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Kangyi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST
- Publication number 20250231491
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING MULTILAYER HORIZONTAL NOR-TYPE THIN-FILM MEMORY...
- Publication number 20250234550
- Publication date Jul 17, 2025
- Sunrise Memory Corporation
- Scott Brad Herner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES AND SEMICONDUCTO...
- Publication number 20250234582
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Hung Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A STRUCTURE COMPRISING AT LEAST TWO CHIPS ON A...
- Publication number 20250226225
- Publication date Jul 10, 2025
- SOITEC
- Bruno Ghyselen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...
- Publication number 20250226235
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Yung-chen LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIODE AND TRANSISTOR DEVICES AND FABRICATION TECHNIQUES
- Publication number 20250227944
- Publication date Jul 10, 2025
- Murata Manufactunng Co., Ltd.
- Jagar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURES AND METHODS OF FORMING THE SAME
- Publication number 20250226219
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER
- Publication number 20250218774
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MID-PROCESSING REMOVAL OF SEMICONDUCTOR FINS DURING FABRICATION OF...
- Publication number 20250218787
- Publication date Jul 3, 2025
- Intel Corporation
- Mehmet O. Baykan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250215320
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INTEGRATION OF MULTIPLE TRANSISTORS HAVING FIN AND MESA STRUCTURES
- Publication number 20250221033
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS
- Publication number 20250210362
- Publication date Jun 26, 2025
- SPTS TECHNOLOGIES LIMITED
- Eloise BOND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT HAVING AT LEAST ONE FEATURE FORMED BY APPLYING AT LEAST T...
- Publication number 20250210365
- Publication date Jun 26, 2025
- Quantinuum LLC
- Adam Jay OLLANIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH REDUCED LOADING EFFECT
- Publication number 20250212497
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Lun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE
- Publication number 20250210367
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER METAL-INSULATOR-METAL CAPACITORS FOR INCREASED CAPACITAN...
- Publication number 20250203888
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Sunil Kumar SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR MONITORING HYBRID BONDS IN A SEMICONDUCTOR CHIP PACKAGE
- Publication number 20250201638
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Nicholas Alexander POLOMOFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED MASK LAYER
- Publication number 20250201562
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chen CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCHING METHOD AND SEMICONDUCTOR STRUCTURE MANUFACTURED U...
- Publication number 20250201571
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250201624
- Publication date Jun 19, 2025
- NANYA TECHNOLOGY CORPORATION
- Ming-Yang HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...
- Publication number 20250201518
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...
- Publication number 20250194201
- Publication date Jun 12, 2025
- Intel Corporation
- Subhash M. JOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHED DIE SINGULATION SYSTEMS AND RELATED METHODS
- Publication number 20250191975
- Publication date Jun 12, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Bingzhi SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20250191878
- Publication date Jun 12, 2025
- Kokusai Electric Corporation
- Takeshi YASUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOS-GATED TRENCH DEVICE HAVING SHALLOW GATE TRENCHES AND DEEP ISOLA...
- Publication number 20250194134
- Publication date Jun 12, 2025
- PAKAL TECHNOLOGIES INC
- Paul M. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SEMICONDUCTO...
- Publication number 20250191933
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Do Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION
- Publication number 20250189896
- Publication date Jun 12, 2025
- NISSAN CHEMICAL CORPORATION
- Yuki MITSUTAKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE PHOTORESIST APPLICATION METHOD AND SEMICONDUCTOR PACKAGE...
- Publication number 20250180994
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Juhyung Lee
- H01 - BASIC ELECTRIC ELEMENTS

using masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Film forming method and semiconductor production apparatus

Method for manufacturing semiconductor structure, and semiconductor...

Self aligned contact scheme

Resist underlayer film-forming composition

Integrated assemblies and methods of forming integrated assemblies

Isolation structures of semiconductor devices

Fin height and STI depth for performance improvement in semiconduct...

Memory device and manufacturing method therefor

Method of manufacturing semiconductor devices and pattern formation...

Replacement buried power rail in backside power delivery

Vertical device having a protrusion source

Chemical solution-resistant protective film forming composition con...

Preparation method of high-linearity GaN-based millimeter wave device

Semiconductor devices with Fin-top hard mask and methods for fabric...

Trench plug hardmask for advanced integrated circuit structure fabr...

Semiconductor device structure and method for preparing the same

Bottom-up fill dielectric materials for semiconductor structure fab...

Method of patterning underlying structure

Semiconductor devices and methods of manufacturing thereof

Method and system for etch depth control in III-V semiconductor dev...

Metal oxide resists for EUV patterning and methods for developing t...

Method of forming material layer

Semiconductor FinFET device and method

High electron mobility transistor and method for fabricating the same

Two-color self-aligned double patterning (SADP) to yield static ran...

Alternating hardmasks for tight-pitch line formation

Method of fabricating Fin-type field-effect transistor device havin...

Semiconductor device and method

Enhanced directed self-assembly in the presence of low Tg oligomers...

Resist underlayer film-forming composition

Patents Applicationslast 30 patents

OXIDATION BASED ATOMIC LAYER ETCHING

PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST

METHODS FOR FORMING MULTILAYER HORIZONTAL NOR-TYPE THIN-FILM MEMORY...

METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES AND SEMICONDUCTO...

METHOD FOR PRODUCING A STRUCTURE COMPRISING AT LEAST TWO CHIPS ON A...

TIN OXIDE AND TIN CARBIDE MATERIALS FOR SEMICONDUCTOR PATTERNING AP...

DIODE AND TRANSISTOR DEVICES AND FABRICATION TECHNIQUES

SEMICONDUCTOR DEVICE STRUCTURES AND METHODS OF FORMING THE SAME

HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER

MID-PROCESSING REMOVAL OF SEMICONDUCTOR FINS DURING FABRICATION OF...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

INTEGRATION OF MULTIPLE TRANSISTORS HAVING FIN AND MESA STRUCTURES

METHODS OF TREATING A SEMICONDUCTOR SUBSTRATE AND APPARATUS

COMPONENT HAVING AT LEAST ONE FEATURE FORMED BY APPLYING AT LEAST T...

Compound For Forming Metal-Containing Film, Composition For Forming...

SEMICONDUCTOR DEVICE WITH REDUCED LOADING EFFECT

ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE

MULTILAYER METAL-INSULATOR-METAL CAPACITORS FOR INCREASED CAPACITAN...

STRUCTURE FOR MONITORING HYBRID BONDS IN A SEMICONDUCTOR CHIP PACKAGE

METHOD FOR FORMING PATTERNED MASK LAYER

SELECTIVE ETCHING METHOD AND SEMICONDUCTOR STRUCTURE MANUFACTURED U...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PLASMA UNIT, SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING,...

TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...

ETCHED DIE SINGULATION SYSTEMS AND RELATED METHODS

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

MOS-GATED TRENCH DEVICE HAVING SHALLOW GATE TRENCHES AND DEEP ISOLA...

SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SEMICONDUCTO...

RESIST UNDERLAYER FILM FORMATION COMPOSITION

SELECTIVE PHOTORESIST APPLICATION METHOD AND SEMICONDUCTOR PACKAGE...