using multiple exposure

Industry

CPC
H01J2237/31771

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31771using multiple exposure

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,687,006
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam optical apparatus, exposure apparatus, exposu...
- Patent number 11,387,074
- Issue date Jul 12, 2022
- Nikon Corporation
- Hiroyuki Nagasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,327,405
- Issue date May 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam optical apparatus, exposure apparatus, exposu...
- Patent number 10,984,982
- Issue date Apr 20, 2021
- Nikon Corporation
- Hiroyuki Nagasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 10,816,892
- Issue date Oct 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaped beam lithography including temperature effects
- Patent number 10,460,071
- Issue date Oct 29, 2019
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 10,431,422
- Issue date Oct 1, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, systems and computer program products configured to adjust...
- Patent number 10,224,178
- Issue date Mar 5, 2019
- Samsung Electronics Co., Ltd.
- Yongseok Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam writing method and multi charged partic...
- Patent number 10,020,159
- Issue date Jul 10, 2018
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 9,859,100
- Issue date Jan 2, 2018
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,625,809
- Issue date Apr 18, 2017
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing method and multi charged partic...
- Patent number 9,570,267
- Issue date Feb 14, 2017
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for forming patterns with charged particle beam l...
- Patent number 9,465,297
- Issue date Oct 11, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Providing electron beam proximity effect correction by simulating w...
- Patent number 9,418,191
- Issue date Aug 16, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,372,391
- Issue date Jun 21, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,336,994
- Issue date May 10, 2016
- NuFlare Technology, Inc.
- Yasuo Kato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing method and multi charged partic...
- Patent number 9,202,673
- Issue date Dec 1, 2015
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,063,440
- Issue date Jun 23, 2015
- Nuflare Technology, Inc.
- Yasuo Kato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography apparatus including display unit for updating data and...
- Patent number 9,053,548
- Issue date Jun 9, 2015
- Canon Kabushiki Kaisha
- Chiaki Sato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming patterns with charged particle beam l...
- Patent number 9,034,542
- Issue date May 19, 2015
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming high precision patterns using charged...
- Patent number 8,745,549
- Issue date Jun 3, 2014
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for high volume e-beam lithography
- Patent number 8,468,473
- Issue date Jun 18, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus and control method thereof
- Patent number 8,466,440
- Issue date Jun 18, 2013
- Nuflare Technology, Inc.
- Jun Yashima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Providing electron beam proximity effect correction by simulating w...
- Patent number 8,464,186
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing semiconductor device by correcting overlap...
- Patent number 8,458,624
- Issue date Jun 4, 2013
- Samsung Electronics Co., Ltd.
- Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and projection method
- Patent number 7,842,936
- Issue date Nov 30, 2010
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSU...
- Publication number 20210225611
- Publication date Jul 22, 2021
- Nikon Corporation
- Hiroyuki NAGASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20200098545
- Publication date Mar 26, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20190148110
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Cheng CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...
- Publication number 20180261421
- Publication date Sep 13, 2018
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20180108513
- Publication date Apr 19, 2018
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods, Systems, and Computer Program Products Configured to Adjus...
- Publication number 20180082820
- Publication date Mar 22, 2018
- Yongseok JUNG
- G01 - MEASURING TESTING
Information Patent Application
Method and System for Forming Patterns Using Charged Particle Beam...
- Publication number 20170213698
- Publication date Jul 27, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...
- Publication number 20170023862
- Publication date Jan 26, 2017
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20140361193
- Publication date Dec 11, 2014
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...
- Publication number 20140229904
- Publication date Aug 14, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...
- Publication number 20140124684
- Publication date May 8, 2014
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20140129996
- Publication date May 8, 2014
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20140129997
- Publication date May 8, 2014
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20140077103
- Publication date Mar 20, 2014
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME
- Publication number 20140065548
- Publication date Mar 6, 2014
- Canon Kabushiki Kaisha
- Chiaki SATO
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROVIDING ELECRON BEAM PROXIMITY EFFECT CORRECTION BY SIMULATING WR...
- Publication number 20140033144
- Publication date Jan 30, 2014
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHAR...
- Publication number 20130252143
- Publication date Sep 26, 2013
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING HIGH PRECISION PATTERNS USING CHARGED...
- Publication number 20130205264
- Publication date Aug 8, 2013
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Optimization of an Image on a Substrate to be...
- Publication number 20130070222
- Publication date Mar 21, 2013
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming Patterns with Charged Particle Beam L...
- Publication number 20120329289
- Publication date Dec 27, 2012
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHAR...
- Publication number 20120221980
- Publication date Aug 30, 2012
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING...
- Publication number 20120221985
- Publication date Aug 30, 2012
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20120217421
- Publication date Aug 30, 2012
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20120219886
- Publication date Aug 30, 2012
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING

using multiple exposure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing photo masks

Method and system for determining a charged particle beam exposure...

Method of manufacturing photo masks

Charged particle beam optical apparatus, exposure apparatus, exposu...

Method of manufacturing photo masks

Method and system for determining a charged particle beam exposure...

Charged particle beam optical apparatus, exposure apparatus, exposu...

Method of manufacturing photo masks

Method and system for determining a charged particle beam exposure...

Shaped beam lithography including temperature effects

Method and system for dimensional uniformity using charged particle...

Methods, systems and computer program products configured to adjust...

Multi charged particle beam writing method and multi charged partic...

Method and system for dimensional uniformity using charged particle...

Method and system for forming patterns using charged particle beam...

Multi charged particle beam writing method and multi charged partic...

Method and system for forming patterns with charged particle beam l...

Providing electron beam proximity effect correction by simulating w...

Method and system for forming patterns using charged particle beam...

Multi charged particle beam writing apparatus and multi charged par...

Multi charged particle beam writing method and multi charged partic...

Charged particle beam writing apparatus and charged particle beam w...

Lithography apparatus including display unit for updating data and...

Method and system for forming patterns with charged particle beam l...

Method and system for forming high precision patterns using charged...

Method for high volume e-beam lithography

Charged particle beam drawing apparatus and control method thereof

Providing electron beam proximity effect correction by simulating w...

Method for manufacturing semiconductor device by correcting overlap...

Lithography system and projection method

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING PHOTO MASKS

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSU...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

Dummy Insertion for Improving Throughput of Electron Beam Lithography

METHOD OF MANUFACTURING PHOTO MASKS

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

Methods, Systems, and Computer Program Products Configured to Adjus...

Method and System for Forming Patterns Using Charged Particle Beam...

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTIC...

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME

PROVIDING ELECRON BEAM PROXIMITY EFFECT CORRECTION BY SIMULATING WR...

METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHAR...

METHOD AND SYSTEM FOR FORMING HIGH PRECISION PATTERNS USING CHARGED...

Method and System for Optimization of an Image on a Substrate to be...

Method and System for Forming Patterns with Charged Particle Beam L...

METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHAR...

METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING...

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...